KR101948943B1 - Icp 장치 및 분광 분석 장치와 질량 분석 장치 - Google Patents

Icp 장치 및 분광 분석 장치와 질량 분석 장치 Download PDF

Info

Publication number
KR101948943B1
KR101948943B1 KR1020130071401A KR20130071401A KR101948943B1 KR 101948943 B1 KR101948943 B1 KR 101948943B1 KR 1020130071401 A KR1020130071401 A KR 1020130071401A KR 20130071401 A KR20130071401 A KR 20130071401A KR 101948943 B1 KR101948943 B1 KR 101948943B1
Authority
KR
South Korea
Prior art keywords
gas
plasma
bonnet
correction
capillary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020130071401A
Other languages
English (en)
Korean (ko)
Other versions
KR20140001125A (ko
Inventor
오사무 마츠자와
겐이치 아카마츠
노부오 나카노
유타카 잇쿠
히데노리 다나베
가츠미 나츠이
Original Assignee
가부시키가이샤 히다치 하이테크 사이언스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 히다치 하이테크 사이언스 filed Critical 가부시키가이샤 히다치 하이테크 사이언스
Publication of KR20140001125A publication Critical patent/KR20140001125A/ko
Application granted granted Critical
Publication of KR101948943B1 publication Critical patent/KR101948943B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
    • G01N21/73—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/06—Electron- or ion-optical arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/26—Mass spectrometers or separator tubes

Landscapes

  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Plasma & Fusion (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)
KR1020130071401A 2012-06-27 2013-06-21 Icp 장치 및 분광 분석 장치와 질량 분석 장치 Active KR101948943B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2012-144604 2012-06-27
JP2012144604A JP5965743B2 (ja) 2012-06-27 2012-06-27 Ｉｃｐ装置及び分光分析装置並びに質量分析装置

Publications (2)

Publication Number Publication Date
KR20140001125A KR20140001125A (ko) 2014-01-06
KR101948943B1 true KR101948943B1 (ko) 2019-02-15

Family

ID=49897722

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020130071401A Active KR101948943B1 (ko) 2012-06-27 2013-06-21 Icp 장치 및 분광 분석 장치와 질량 분석 장치

Country Status (3)

Country Link
JP (1) JP5965743B2 (enExample)
KR (1) KR101948943B1 (enExample)
CN (1) CN103515184B (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109314025B (zh) * 2017-04-06 2020-05-15 株式会社爱发科 离子源以及离子注入装置
CN108732234B (zh) * 2017-04-24 2020-09-29 上海新昇半导体科技有限公司 等离子体发生装置
DE112018002448T5 (de) 2017-05-12 2020-02-20 Sumco Corporation Sprühkammer, Probenzerstäubungs- und -einführungsvorrichtung, Analysevorrichtung sowie Verfahren zur Analyse von Bestandteilen einer Probe
CN107464735A (zh) * 2017-06-28 2017-12-12 中国地质科学院水文地质环境地质研究所 一种新型氯/溴同位素质谱仪及其分析方法
CN108181374A (zh) * 2018-02-08 2018-06-19 聚光科技(杭州)股份有限公司 等离子体-质谱分析系统的工作方法
CN110519904B (zh) * 2019-08-16 2020-09-29 中国地质大学（武汉） 一种基于集磁器的icp等离子源形成装置及方法
CN110677972A (zh) * 2019-10-17 2020-01-10 中国人民解放军国防科技大学 用于SiC光学镜面加工的等离子体发生器及其应用方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5642190A (en) 1995-09-01 1997-06-24 Thermo Jarrell Ash Corp. Dual-axis plasma imaging system for use in spectroscopic analysis
JP2003194723A (ja) 2001-12-27 2003-07-09 Rikogaku Shinkokai プラズマトーチ
JP2010197207A (ja) * 2009-02-25 2010-09-09 Shimadzu Corp 発光分光分析方法及び発光分光分析装置
WO2011140168A1 (en) * 2010-05-05 2011-11-10 Perkinelmer Health Sciences, Inc. Inductive devices and low flow plasmas using them

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS584062U (ja) * 1981-06-30 1983-01-11 日本ジヤ−レル・アツシユ株式会社 高周波誘導プラズマト−チ管
GB8602463D0 (en) * 1986-01-31 1986-03-05 Vg Instr Group Mass spectrometer
US4926021A (en) * 1988-09-09 1990-05-15 Amax Inc. Reactive gas sample introduction system for an inductively coupled plasma mass spectrometer
JPH0782918B2 (ja) * 1991-11-11 1995-09-06 株式会社三社電機製作所 インダクションプラズマトーチ
JPH11111491A (ja) * 1997-10-01 1999-04-23 Yokogawa Analytical Systems Inc プラズマ発生器
EP0930810A1 (fr) * 1997-12-29 1999-07-21 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Torche à plasma à injecteur réglable et installation d'analyse d'un gaz utilisant une telle torche
JP2004327243A (ja) * 2003-04-24 2004-11-18 Tdk Corp Ｉｃｐ質量分析装置及び質量分析方法
JP2010197080A (ja) * 2009-02-23 2010-09-09 Sii Nanotechnology Inc 誘導結合プラズマ分析装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5642190A (en) 1995-09-01 1997-06-24 Thermo Jarrell Ash Corp. Dual-axis plasma imaging system for use in spectroscopic analysis
JP2003194723A (ja) 2001-12-27 2003-07-09 Rikogaku Shinkokai プラズマトーチ
JP2010197207A (ja) * 2009-02-25 2010-09-09 Shimadzu Corp 発光分光分析方法及び発光分光分析装置
WO2011140168A1 (en) * 2010-05-05 2011-11-10 Perkinelmer Health Sciences, Inc. Inductive devices and low flow plasmas using them

Also Published As

Publication number Publication date
CN103515184A (zh) 2014-01-15
JP5965743B2 (ja) 2016-08-10
CN103515184B (zh) 2017-06-16
KR20140001125A (ko) 2014-01-06
JP2014009961A (ja) 2014-01-20

Similar Documents

Publication Publication Date Title
KR101948943B1 (ko) Icp 장치 및 분광 분석 장치와 질량 분석 장치
RU2016106108A (ru) Устройства для плазменных дуговых горелок с газовым охлаждением и относящиеся к ним системы и способы
CN107421952A (zh) 气体分析装置
US9048079B2 (en) Method and apparatus for improving ion transmission into a mass spectrometer
CN105474352B (zh) 混合离子源以及质量分析装置
WO2010018738A1 (ja) 分析方法および分析システム
US8674294B2 (en) System of electrospray ion generator
SG193126A1 (en) Laser machining apparatus
WO2018189655A1 (en) Torches and systems and methods using them
JP2014009961A5 (enExample)
JP2008157895A (ja) 試料導入装置
RU2012155864A (ru) Устройство для уф-спектрометрического анализа газообразных соединений
KR20200030006A (ko) 검출 감도 향상을 위한 레이저 탈착-dart-ms 시스템 및 이에 사용되는 인터페이스 유닛
TWI756241B (zh) 電子束照射裝置
CA1116247A (en) Plasma jet device and method of operating same
JP2010197080A (ja) 誘導結合プラズマ分析装置
JP2016061574A (ja) Ｉｃｐ分析装置
KR20180100115A (ko) 전자선 조사 장치 및 전자선 조사 방법
RU2657999C1 (ru) Электронная сигарета
US5731872A (en) Plasma manipulator
JPH11258163A (ja) Ｉｃｐ分析装置
JP2009121846A (ja) 試料送液ポンプおよび送液ポンプを用いたｉｃｐ発光分析装置
JP2014190958A (ja) Ｉｃｐ発光分光分析装置
JP2001305059A (ja) 誘導結合プラズマ発光分光分析装置と方法
JP2018179555A (ja) 発光分析装置

Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20130621

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20180620

Comment text: Request for Examination of Application

Patent event code: PA02011R01I

Patent event date: 20130621

Comment text: Patent Application

PA0302 Request for accelerated examination

Patent event date: 20180620

Patent event code: PA03022R01D

Comment text: Request for Accelerated Examination

Patent event date: 20130621

Patent event code: PA03021R01I

Comment text: Patent Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20180828

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20181207

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20190211

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20190211

End annual number: 3

Start annual number: 1

PG1601 Publication of registration
PR1001 Payment of annual fee

Payment date: 20220103

Start annual number: 4

End annual number: 4

PR1001 Payment of annual fee

Payment date: 20240102

Start annual number: 6

End annual number: 6

PR1001 Payment of annual fee

Payment date: 20241230

Start annual number: 7

End annual number: 7