CN103515184B - 感应耦合等离子体装置、分光分析装置以及质量分析装置 - Google Patents
感应耦合等离子体装置、分光分析装置以及质量分析装置 Download PDFInfo
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- CN103515184B CN103515184B CN201310261620.6A CN201310261620A CN103515184B CN 103515184 B CN103515184 B CN 103515184B CN 201310261620 A CN201310261620 A CN 201310261620A CN 103515184 B CN103515184 B CN 103515184B
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- gas
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
- G01N21/73—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/06—Electron- or ion-optical arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/26—Mass spectrometers or separator tubes
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- Analytical Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Biochemistry (AREA)
- Plasma & Fusion (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Electron Tubes For Measurement (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012-144604 | 2012-06-27 | ||
| JP2012144604A JP5965743B2 (ja) | 2012-06-27 | 2012-06-27 | Icp装置及び分光分析装置並びに質量分析装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103515184A CN103515184A (zh) | 2014-01-15 |
| CN103515184B true CN103515184B (zh) | 2017-06-16 |
Family
ID=49897722
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310261620.6A Active CN103515184B (zh) | 2012-06-27 | 2013-06-27 | 感应耦合等离子体装置、分光分析装置以及质量分析装置 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5965743B2 (enExample) |
| KR (1) | KR101948943B1 (enExample) |
| CN (1) | CN103515184B (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109314025B (zh) * | 2017-04-06 | 2020-05-15 | 株式会社爱发科 | 离子源以及离子注入装置 |
| CN108732234B (zh) * | 2017-04-24 | 2020-09-29 | 上海新昇半导体科技有限公司 | 等离子体发生装置 |
| DE112018002448T5 (de) | 2017-05-12 | 2020-02-20 | Sumco Corporation | Sprühkammer, Probenzerstäubungs- und -einführungsvorrichtung, Analysevorrichtung sowie Verfahren zur Analyse von Bestandteilen einer Probe |
| CN107464735A (zh) * | 2017-06-28 | 2017-12-12 | 中国地质科学院水文地质环境地质研究所 | 一种新型氯/溴同位素质谱仪及其分析方法 |
| CN108181374A (zh) * | 2018-02-08 | 2018-06-19 | 聚光科技(杭州)股份有限公司 | 等离子体-质谱分析系统的工作方法 |
| CN110519904B (zh) * | 2019-08-16 | 2020-09-29 | 中国地质大学(武汉) | 一种基于集磁器的icp等离子源形成装置及方法 |
| CN110677972A (zh) * | 2019-10-17 | 2020-01-10 | 中国人民解放军国防科技大学 | 用于SiC光学镜面加工的等离子体发生器及其应用方法 |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4760253A (en) * | 1986-01-31 | 1988-07-26 | Vg Instruments Group Limited | Mass spectrometer |
| US4926021A (en) * | 1988-09-09 | 1990-05-15 | Amax Inc. | Reactive gas sample introduction system for an inductively coupled plasma mass spectrometer |
| JPH05135896A (ja) * | 1991-11-11 | 1993-06-01 | Sansha Electric Mfg Co Ltd | インダクシヨンプラズマトーチ |
| US5642190A (en) * | 1995-09-01 | 1997-06-24 | Thermo Jarrell Ash Corp. | Dual-axis plasma imaging system for use in spectroscopic analysis |
| JPH11111491A (ja) * | 1997-10-01 | 1999-04-23 | Yokogawa Analytical Systems Inc | プラズマ発生器 |
| CN1235274A (zh) * | 1997-12-29 | 1999-11-17 | 液体空气乔治洛德方法利用和研究有限公司 | 有可调喷射器的等离子喷管和使用该喷管的气体分析仪 |
| JP2003194723A (ja) * | 2001-12-27 | 2003-07-09 | Rikogaku Shinkokai | プラズマトーチ |
| JP2004327243A (ja) * | 2003-04-24 | 2004-11-18 | Tdk Corp | Icp質量分析装置及び質量分析方法 |
| JP2010197080A (ja) * | 2009-02-23 | 2010-09-09 | Sii Nanotechnology Inc | 誘導結合プラズマ分析装置 |
| WO2011140168A1 (en) * | 2010-05-05 | 2011-11-10 | Perkinelmer Health Sciences, Inc. | Inductive devices and low flow plasmas using them |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS584062U (ja) * | 1981-06-30 | 1983-01-11 | 日本ジヤ−レル・アツシユ株式会社 | 高周波誘導プラズマト−チ管 |
| JP2010197207A (ja) * | 2009-02-25 | 2010-09-09 | Shimadzu Corp | 発光分光分析方法及び発光分光分析装置 |
-
2012
- 2012-06-27 JP JP2012144604A patent/JP5965743B2/ja active Active
-
2013
- 2013-06-21 KR KR1020130071401A patent/KR101948943B1/ko active Active
- 2013-06-27 CN CN201310261620.6A patent/CN103515184B/zh active Active
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4760253A (en) * | 1986-01-31 | 1988-07-26 | Vg Instruments Group Limited | Mass spectrometer |
| US4926021A (en) * | 1988-09-09 | 1990-05-15 | Amax Inc. | Reactive gas sample introduction system for an inductively coupled plasma mass spectrometer |
| JPH05135896A (ja) * | 1991-11-11 | 1993-06-01 | Sansha Electric Mfg Co Ltd | インダクシヨンプラズマトーチ |
| US5642190A (en) * | 1995-09-01 | 1997-06-24 | Thermo Jarrell Ash Corp. | Dual-axis plasma imaging system for use in spectroscopic analysis |
| JPH11111491A (ja) * | 1997-10-01 | 1999-04-23 | Yokogawa Analytical Systems Inc | プラズマ発生器 |
| CN1235274A (zh) * | 1997-12-29 | 1999-11-17 | 液体空气乔治洛德方法利用和研究有限公司 | 有可调喷射器的等离子喷管和使用该喷管的气体分析仪 |
| JP2003194723A (ja) * | 2001-12-27 | 2003-07-09 | Rikogaku Shinkokai | プラズマトーチ |
| JP2004327243A (ja) * | 2003-04-24 | 2004-11-18 | Tdk Corp | Icp質量分析装置及び質量分析方法 |
| JP2010197080A (ja) * | 2009-02-23 | 2010-09-09 | Sii Nanotechnology Inc | 誘導結合プラズマ分析装置 |
| WO2011140168A1 (en) * | 2010-05-05 | 2011-11-10 | Perkinelmer Health Sciences, Inc. | Inductive devices and low flow plasmas using them |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101948943B1 (ko) | 2019-02-15 |
| CN103515184A (zh) | 2014-01-15 |
| JP5965743B2 (ja) | 2016-08-10 |
| KR20140001125A (ko) | 2014-01-06 |
| JP2014009961A (ja) | 2014-01-20 |
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| GR01 | Patent grant | ||
| CP03 | Change of name, title or address |
Address after: Tokyo, Japan Patentee after: Hitachi High Tech Analysis Co.,Ltd. Country or region after: Japan Address before: Tokyo, Japan Patentee before: HITACHI HIGH-TECH SCIENCE Corp. Country or region before: Japan |
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| CP03 | Change of name, title or address |