KR101940328B1 - 냉각 플레이트가 있는 유기 증기 젯 프린팅 장치 - Google Patents

냉각 플레이트가 있는 유기 증기 젯 프린팅 장치 Download PDF

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KR101940328B1
KR101940328B1 KR1020127008157A KR20127008157A KR101940328B1 KR 101940328 B1 KR101940328 B1 KR 101940328B1 KR 1020127008157 A KR1020127008157 A KR 1020127008157A KR 20127008157 A KR20127008157 A KR 20127008157A KR 101940328 B1 KR101940328 B1 KR 101940328B1
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nozzle
cooling system
active cooling
jet printing
organic
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KR20120058591A (ko
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폴 이 버로우스
시드하르드 하리크리쉬나 모한
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유니버셜 디스플레이 코포레이션
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
KR1020127008157A 2009-09-03 2010-09-02 냉각 플레이트가 있는 유기 증기 젯 프린팅 장치 Active KR101940328B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US23965609P 2009-09-03 2009-09-03
US61/239,656 2009-09-03
US12/870,125 US20110097495A1 (en) 2009-09-03 2010-08-27 Organic vapor jet printing with chiller plate
US12/870,125 2010-08-27
PCT/US2010/047625 WO2011028867A1 (en) 2009-09-03 2010-09-02 Organic vapor jet printing device with a chiller plate

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020167032350A Division KR20160136469A (ko) 2009-09-03 2010-09-02 냉각 플레이트가 있는 유기 증기 젯 프린팅 장치

Publications (2)

Publication Number Publication Date
KR20120058591A KR20120058591A (ko) 2012-06-07
KR101940328B1 true KR101940328B1 (ko) 2019-01-18

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KR1020127008157A Active KR101940328B1 (ko) 2009-09-03 2010-09-02 냉각 플레이트가 있는 유기 증기 젯 프린팅 장치
KR1020167032350A Ceased KR20160136469A (ko) 2009-09-03 2010-09-02 냉각 플레이트가 있는 유기 증기 젯 프린팅 장치

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KR1020167032350A Ceased KR20160136469A (ko) 2009-09-03 2010-09-02 냉각 플레이트가 있는 유기 증기 젯 프린팅 장치

Country Status (6)

Country Link
US (1) US20110097495A1 (https=)
EP (1) EP2473646B1 (https=)
KR (2) KR101940328B1 (https=)
CN (1) CN102597299B (https=)
IN (1) IN2012DN02784A (https=)
WO (1) WO2011028867A1 (https=)

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WO2012011913A1 (en) * 2010-07-22 2012-01-26 Universal Display Corporation Organic vapor jet printing
US20130273239A1 (en) * 2012-03-13 2013-10-17 Universal Display Corporation Nozzle design for organic vapor jet printing
US8728858B2 (en) 2012-08-27 2014-05-20 Universal Display Corporation Multi-nozzle organic vapor jet printing
CN103972095B (zh) * 2013-02-01 2017-06-13 中国科学院苏州纳米技术与纳米仿生研究所 金属氧化物薄膜场效应晶体管的制备方法
CN103972392A (zh) * 2013-02-01 2014-08-06 中国科学院苏州纳米技术与纳米仿生研究所 有机薄膜场效应晶体管的制备方法
EP2960059B1 (en) 2014-06-25 2018-10-24 Universal Display Corporation Systems and methods of modulating flow during vapor jet deposition of organic materials
US11220737B2 (en) 2014-06-25 2022-01-11 Universal Display Corporation Systems and methods of modulating flow during vapor jet deposition of organic materials
US11267012B2 (en) 2014-06-25 2022-03-08 Universal Display Corporation Spatial control of vapor condensation using convection
US9583707B2 (en) 2014-09-19 2017-02-28 Universal Display Corporation Micro-nozzle and micro-nozzle array for OVJP and method of manufacturing the same
US10566534B2 (en) 2015-10-12 2020-02-18 Universal Display Corporation Apparatus and method to deliver organic material via organic vapor-jet printing (OVJP)
US10704144B2 (en) 2015-10-12 2020-07-07 Universal Display Corporation Apparatus and method for printing multilayer organic thin films from vapor phase in an ultra-pure gas ambient
US10170701B2 (en) 2016-03-04 2019-01-01 Universal Display Corporation Controlled deposition of materials using a differential pressure regime
KR102369676B1 (ko) 2017-04-10 2022-03-04 삼성디스플레이 주식회사 표시 장치의 제조장치 및 표시 장치의 제조방법
KR20200138391A (ko) * 2018-06-15 2020-12-09 어플라이드 머티어리얼스, 인코포레이티드 증착 영역을 냉각시키기 위한 냉각 시스템, 증착 영역에서 재료를 증착하기 위한 어레인지먼트, 및 증착 영역에서 기판 상에 증착하는 방법
US20190386256A1 (en) 2018-06-18 2019-12-19 Universal Display Corporation Sequential material sources for thermally challenged OLED materials
CN108909184A (zh) * 2018-07-17 2018-11-30 深圳市华星光电技术有限公司 具有温度调节功能的打印喷头、打印装置
WO2023014528A1 (en) * 2021-08-05 2023-02-09 Sekisui Kydex, Llc Multi-station dye sublimation apparatus for pre-heating and for facilitating simultaneous sublimation cycles
US20230063757A1 (en) * 2021-08-18 2023-03-02 Universal Display Corporation Actively cooled heat sink for OVJP print head
US20230363244A1 (en) * 2022-05-09 2023-11-09 Universal Display Corporation Organic vapor jet printing system
US20230357918A1 (en) * 2022-05-09 2023-11-09 Universal Display Corporation Organic vapor jet printing system

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Also Published As

Publication number Publication date
US20110097495A1 (en) 2011-04-28
KR20120058591A (ko) 2012-06-07
IN2012DN02784A (https=) 2015-09-18
CN102597299B (zh) 2015-05-13
CN102597299A (zh) 2012-07-18
WO2011028867A1 (en) 2011-03-10
EP2473646A1 (en) 2012-07-11
EP2473646B1 (en) 2018-12-05
KR20160136469A (ko) 2016-11-29

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