KR101934228B1 - 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 - Google Patents

기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 Download PDF

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Publication number
KR101934228B1
KR101934228B1 KR1020177032390A KR20177032390A KR101934228B1 KR 101934228 B1 KR101934228 B1 KR 101934228B1 KR 1020177032390 A KR1020177032390 A KR 1020177032390A KR 20177032390 A KR20177032390 A KR 20177032390A KR 101934228 B1 KR101934228 B1 KR 101934228B1
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KR
South Korea
Prior art keywords
projection
light
optical system
substrate
illumination
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KR1020177032390A
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English (en)
Korean (ko)
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KR20170127053A (ko
Inventor
마사키 가토
Original Assignee
가부시키가이샤 니콘
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Publication of KR20170127053A publication Critical patent/KR20170127053A/ko
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Publication of KR101934228B1 publication Critical patent/KR101934228B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Microscoopes, Condenser (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
KR1020177032390A 2012-12-18 2013-11-29 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 KR101934228B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012276139 2012-12-18
JPJP-P-2012-276139 2012-12-18
PCT/JP2013/082185 WO2014097859A1 (ja) 2012-12-18 2013-11-29 基板処理装置、デバイス製造システム及びデバイス製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020157016021A Division KR101861905B1 (ko) 2012-12-18 2013-11-29 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020187037259A Division KR101988820B1 (ko) 2012-12-18 2013-11-29 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법

Publications (2)

Publication Number Publication Date
KR20170127053A KR20170127053A (ko) 2017-11-20
KR101934228B1 true KR101934228B1 (ko) 2018-12-31

Family

ID=50978197

Family Applications (6)

Application Number Title Priority Date Filing Date
KR1020177032390A KR101934228B1 (ko) 2012-12-18 2013-11-29 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법
KR1020187037259A KR101988820B1 (ko) 2012-12-18 2013-11-29 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법
KR1020197016087A KR102009138B1 (ko) 2012-12-18 2013-11-29 주사 노광 장치 및 디바이스 제조 방법
KR1020197022704A KR102075325B1 (ko) 2012-12-18 2013-11-29 주사 노광 장치 및 디바이스 제조 방법
KR1020187010045A KR101903941B1 (ko) 2012-12-18 2013-11-29 노광 장치, 디바이스 제조 시스템 및 디바이스 제조 방법
KR1020157016021A KR101861905B1 (ko) 2012-12-18 2013-11-29 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법

Family Applications After (5)

Application Number Title Priority Date Filing Date
KR1020187037259A KR101988820B1 (ko) 2012-12-18 2013-11-29 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법
KR1020197016087A KR102009138B1 (ko) 2012-12-18 2013-11-29 주사 노광 장치 및 디바이스 제조 방법
KR1020197022704A KR102075325B1 (ko) 2012-12-18 2013-11-29 주사 노광 장치 및 디바이스 제조 방법
KR1020187010045A KR101903941B1 (ko) 2012-12-18 2013-11-29 노광 장치, 디바이스 제조 시스템 및 디바이스 제조 방법
KR1020157016021A KR101861905B1 (ko) 2012-12-18 2013-11-29 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법

Country Status (6)

Country Link
JP (4) JP6217651B2 (ja)
KR (6) KR101934228B1 (ja)
CN (2) CN107247388B (ja)
HK (1) HK1208915A1 (ja)
TW (3) TWI596438B (ja)
WO (1) WO2014097859A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107255858B (zh) * 2011-12-20 2020-05-29 株式会社尼康 基底处理装置
JPWO2021193360A1 (ja) 2020-03-24 2021-09-30
CN114070971A (zh) * 2020-07-27 2022-02-18 奥林巴斯株式会社 观察装置、光偏转单元、像形成方法
CN117031720B (zh) * 2023-09-28 2023-12-29 微纳动力(北京)科技有限责任公司 一种自动化集成光学装置及系统

Citations (3)

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JP2008545153A (ja) 2005-07-01 2008-12-11 カール・ツァイス・エスエムティー・アーゲー 複数の投影対物レンズを備えた投影露光装置
JP2012004564A (ja) 2010-06-11 2012-01-05 Nikon Corp 露光方法、露光装置、デバイス製造方法
WO2013094286A1 (ja) 2011-12-20 2013-06-27 株式会社ニコン 基板処理装置、デバイス製造システム、及びデバイス製造方法

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JPH0864501A (ja) 1994-08-25 1996-03-08 Nikon Corp 投影光学系及びそれを備えた露光装置
JP2002258489A (ja) * 2000-04-20 2002-09-11 Nikon Corp 露光装置および露光方法
KR101483791B1 (ko) * 2005-06-02 2015-01-16 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 대물 렌즈
US7638780B2 (en) * 2005-06-28 2009-12-29 Eastman Kodak Company UV cure equipment with combined light path
EP2003506A2 (en) * 2006-03-20 2008-12-17 Nikon Corporation Reflective, refractive and projecting optical system; reflective, refractive and projecting device; scanning exposure device; and method of manufacturing micro device
JP4984631B2 (ja) 2006-04-28 2012-07-25 株式会社ニコン 露光装置及び方法、露光用マスク、並びにデバイス製造方法
JP4880511B2 (ja) * 2007-03-28 2012-02-22 株式会社オーク製作所 露光描画装置
US8379187B2 (en) * 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
JP2009231311A (ja) * 2008-03-19 2009-10-08 Nikon Corp 照明装置、露光装置、露光方法及びデバイス製造方法
DE102009037077B3 (de) * 2009-08-13 2011-02-17 Carl Zeiss Smt Ag Katadioptrisches Projektionsobjektiv
JP5724564B2 (ja) * 2010-04-13 2015-05-27 株式会社ニコン マスクケース、マスクユニット、露光装置、基板処理装置及びデバイス製造方法
WO2013035661A1 (ja) 2011-09-07 2013-03-14 株式会社ニコン 基板処理装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008545153A (ja) 2005-07-01 2008-12-11 カール・ツァイス・エスエムティー・アーゲー 複数の投影対物レンズを備えた投影露光装置
JP2012004564A (ja) 2010-06-11 2012-01-05 Nikon Corp 露光方法、露光装置、デバイス製造方法
WO2013094286A1 (ja) 2011-12-20 2013-06-27 株式会社ニコン 基板処理装置、デバイス製造システム、及びデバイス製造方法

Also Published As

Publication number Publication date
KR101988820B1 (ko) 2019-06-12
TW201740218A (zh) 2017-11-16
TWI596438B (zh) 2017-08-21
KR20190000398A (ko) 2019-01-02
KR101903941B1 (ko) 2018-10-02
TWI639896B (zh) 2018-11-01
TWI687779B (zh) 2020-03-11
JP6635167B2 (ja) 2020-01-22
TW201905603A (zh) 2019-02-01
CN107247388A (zh) 2017-10-13
JP2020052420A (ja) 2020-04-02
CN107247388B (zh) 2018-09-18
KR102009138B1 (ko) 2019-08-08
JPWO2014097859A1 (ja) 2017-01-12
KR20150097514A (ko) 2015-08-26
KR102075325B1 (ko) 2020-02-07
JP2019049723A (ja) 2019-03-28
WO2014097859A1 (ja) 2014-06-26
JP2017227916A (ja) 2017-12-28
KR20170127053A (ko) 2017-11-20
HK1208915A1 (en) 2016-03-18
CN104871091B (zh) 2017-06-30
KR20180040730A (ko) 2018-04-20
TW201426202A (zh) 2014-07-01
CN104871091A (zh) 2015-08-26
KR20190067258A (ko) 2019-06-14
JP6217651B2 (ja) 2017-10-25
KR20190093699A (ko) 2019-08-09
JP6414303B2 (ja) 2018-10-31
KR101861905B1 (ko) 2018-05-28

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