KR101883028B1 - 접합 시스템, 기판 처리 시스템 및 접합 방법 - Google Patents

접합 시스템, 기판 처리 시스템 및 접합 방법 Download PDF

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Publication number
KR101883028B1
KR101883028B1 KR1020147000945A KR20147000945A KR101883028B1 KR 101883028 B1 KR101883028 B1 KR 101883028B1 KR 1020147000945 A KR1020147000945 A KR 1020147000945A KR 20147000945 A KR20147000945 A KR 20147000945A KR 101883028 B1 KR101883028 B1 KR 101883028B1
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South Korea
Prior art keywords
substrate
wafer
processed
support
bonding
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KR1020147000945A
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English (en)
Korean (ko)
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KR20140051243A (ko
Inventor
오사무 히라카와
나오토 요시타카
마사타카 마츠나가
노리히코 오카모토
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도쿄엘렉트론가부시키가이샤
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Publication of KR20140051243A publication Critical patent/KR20140051243A/ko
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Publication of KR101883028B1 publication Critical patent/KR101883028B1/ko
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0432—Apparatus for thermal treatment mainly by conduction

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020147000945A 2011-07-15 2012-06-25 접합 시스템, 기판 처리 시스템 및 접합 방법 Active KR101883028B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011156437A JP5478565B2 (ja) 2011-07-15 2011-07-15 接合システム
JPJP-P-2011-156437 2011-07-15
PCT/JP2012/066135 WO2013011806A1 (ja) 2011-07-15 2012-06-25 接合システム、基板処理システム及び接合方法

Publications (2)

Publication Number Publication Date
KR20140051243A KR20140051243A (ko) 2014-04-30
KR101883028B1 true KR101883028B1 (ko) 2018-07-27

Family

ID=47557987

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147000945A Active KR101883028B1 (ko) 2011-07-15 2012-06-25 접합 시스템, 기판 처리 시스템 및 접합 방법

Country Status (5)

Country Link
US (1) US20140158303A1 (https=)
JP (1) JP5478565B2 (https=)
KR (1) KR101883028B1 (https=)
TW (1) TWI529841B (https=)
WO (1) WO2013011806A1 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014165217A (ja) * 2013-02-21 2014-09-08 Tokyo Electron Ltd 基板搬送装置および剥離システム
JP6568773B2 (ja) * 2015-11-10 2019-08-28 東京エレクトロン株式会社 基板搬送装置及び剥離システム
US20200019071A1 (en) * 2016-09-30 2020-01-16 Nikon Corporation Carrier device, exposure apparatus, exposure method, manufacturing method of flat-panel display, device manufacturing method, and carrying method
JP2017085177A (ja) * 2017-02-10 2017-05-18 東京エレクトロン株式会社 基板搬送装置および剥離システム
KR102459089B1 (ko) 2017-12-21 2022-10-27 삼성전자주식회사 반도체 패키징 장비 및 이를 이용한 반도체 소자의 제조방법
US10665494B2 (en) 2018-01-31 2020-05-26 Applied Materials, Inc. Automated apparatus to temporarily attach substrates to carriers without adhesives for processing
JP7129793B2 (ja) 2018-03-06 2022-09-02 シャープ株式会社 接合装置
KR20260047323A (ko) * 2018-03-14 2026-04-07 도쿄엘렉트론가부시키가이샤 기판 가공 장치 및 기판 가공 방법
TWI797461B (zh) * 2019-07-26 2023-04-01 日商新川股份有限公司 封裝裝置
TWI899196B (zh) * 2020-04-13 2025-10-01 日商東京威力科創股份有限公司 接合系統
JP7709877B2 (ja) * 2021-09-15 2025-07-17 株式会社Ｓｃｒｅｅｎホールディングス 端部状態確認装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020148570A1 (en) 1998-06-11 2002-10-17 Canon Kabushiki Kaisha Sample processing system
JP2008166536A (ja) * 2006-12-28 2008-07-17 Tokyo Ohka Kogyo Co Ltd 貼り合わせ装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002100595A (ja) * 2000-07-21 2002-04-05 Enya Systems Ltd ウエ−ハ剥離装置及び方法並びにこれを用いたウエ−ハ処理装置
KR100877044B1 (ko) * 2000-10-02 2008-12-31 도쿄엘렉트론가부시키가이샤 세정처리장치
KR20070000183A (ko) * 2005-06-27 2007-01-02 삼성전자주식회사 웨이퍼 이송 장치
JP5027460B2 (ja) * 2006-07-28 2012-09-19 東京応化工業株式会社 ウエハの接着方法、薄板化方法、及び剥離方法
JP2008153337A (ja) * 2006-12-15 2008-07-03 Tokyo Electron Ltd 貼り合せ基板の分離方法、貼り合せ基板の分離装置及びプログラムを記録したコンピュータ読み取り可能な記録媒体
JP2008182016A (ja) 2007-01-24 2008-08-07 Tokyo Electron Ltd 貼り合わせ装置、貼り合わせ方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020148570A1 (en) 1998-06-11 2002-10-17 Canon Kabushiki Kaisha Sample processing system
JP2008166536A (ja) * 2006-12-28 2008-07-17 Tokyo Ohka Kogyo Co Ltd 貼り合わせ装置

Also Published As

Publication number Publication date
KR20140051243A (ko) 2014-04-30
JP5478565B2 (ja) 2014-04-23
TWI529841B (zh) 2016-04-11
US20140158303A1 (en) 2014-06-12
WO2013011806A1 (ja) 2013-01-24
JP2013026260A (ja) 2013-02-04
TW201316442A (zh) 2013-04-16

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