KR101869149B1 - 외부 강자성 바이어싱 필름을 사용하는 전압 제어 자기 이방성 전환 디바이스 - Google Patents
외부 강자성 바이어싱 필름을 사용하는 전압 제어 자기 이방성 전환 디바이스 Download PDFInfo
- Publication number
- KR101869149B1 KR101869149B1 KR1020160068948A KR20160068948A KR101869149B1 KR 101869149 B1 KR101869149 B1 KR 101869149B1 KR 1020160068948 A KR1020160068948 A KR 1020160068948A KR 20160068948 A KR20160068948 A KR 20160068948A KR 101869149 B1 KR101869149 B1 KR 101869149B1
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- South Korea
- Prior art keywords
- layer
- ferromagnetic layer
- ferromagnetic
- magnet
- magnetization
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/80—Constructional details
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- H01L43/02—
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/161—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/165—Auxiliary circuits
- G11C11/1673—Reading or sensing circuits or methods
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/165—Auxiliary circuits
- G11C11/1675—Writing or programming circuits or methods
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- H01L43/08—
-
- H01L43/10—
-
- H01L43/12—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B61/00—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/80—Constructional details
- H10N50/85—Materials of the active region
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Hall/Mr Elements (AREA)
- Mram Or Spin Memory Techniques (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/728,788 | 2015-06-02 | ||
| US14/728,788 US9620562B2 (en) | 2015-06-02 | 2015-06-02 | Voltage-controlled magnetic anisotropy switching device using an external ferromagnetic biasing film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20160142255A KR20160142255A (ko) | 2016-12-12 |
| KR101869149B1 true KR101869149B1 (ko) | 2018-06-19 |
Family
ID=56410819
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020160068948A Active KR101869149B1 (ko) | 2015-06-02 | 2016-06-02 | 외부 강자성 바이어싱 필름을 사용하는 전압 제어 자기 이방성 전환 디바이스 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9620562B2 (enExample) |
| JP (1) | JP2016225633A (enExample) |
| KR (1) | KR101869149B1 (enExample) |
| CN (1) | CN106374035B (enExample) |
| DE (1) | DE102016006651A1 (enExample) |
| FR (1) | FR3037185B1 (enExample) |
| GB (1) | GB2539102B (enExample) |
| TW (1) | TWI602331B (enExample) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10103317B2 (en) | 2015-01-05 | 2018-10-16 | Inston, Inc. | Systems and methods for implementing efficient magnetoelectric junctions |
| US10217798B2 (en) | 2015-01-13 | 2019-02-26 | Inston, Inc. | Systems and methods for implementing select devices constructed from 2D materials |
| US9978931B2 (en) | 2015-02-13 | 2018-05-22 | Inston Inc. | Systems and methods for implementing robust magnetoelectric junctions |
| US20170033281A1 (en) * | 2015-07-29 | 2017-02-02 | Inston Inc. | Systems and Methods for Implementing Magnetoelectric Junctions Including Integrated Magnetization Components |
| CN109690675B (zh) | 2016-06-28 | 2022-11-04 | 赢世通股份有限公司 | 一种可应用于磁电隧道结的新型字线脉冲写入方法 |
| WO2018198713A1 (ja) * | 2017-04-28 | 2018-11-01 | 国立研究開発法人産業技術総合研究所 | 磁気素子 |
| US10861527B2 (en) | 2017-06-27 | 2020-12-08 | Inston, Inc. | Systems and methods for optimizing magnetic torque and pulse shaping for reducing write error rate in magnetoelectric random access memory |
| WO2019006037A1 (en) | 2017-06-27 | 2019-01-03 | Inston, Inc. | REDUCTION OF WRITE ERROR RATE IN MAGNETOELECTRIC RAM |
| JP2019057601A (ja) | 2017-09-20 | 2019-04-11 | 東芝メモリ株式会社 | 磁気記憶装置 |
| US10593866B2 (en) * | 2018-06-27 | 2020-03-17 | Globalfoundries Singapore Pte. Ltd. | Magnetic field assisted MRAM structures, integrated circuits, and methods for fabricating the same |
| JP7005452B2 (ja) * | 2018-07-30 | 2022-01-21 | 株式会社東芝 | 磁気記憶装置 |
| US10636962B2 (en) | 2018-08-21 | 2020-04-28 | Qualcomm Incorporated | Spin-orbit torque (SOT) magnetic tunnel junction (MTJ) (SOT-MTJ) devices employing perpendicular and in-plane free layer magnetic anisotropy to facilitate perpendicular magnetic orientation switching, suitable for use in memory systems for storing data |
| US11195991B2 (en) * | 2018-09-27 | 2021-12-07 | Taiwan Semiconductor Manufacturing Company, Ltd. | Magnetic random access memory assisted devices and methods of making |
| EP3671874B1 (en) | 2018-12-21 | 2022-06-22 | IMEC vzw | Zero-field switching for sot technology |
| CN110061127B (zh) * | 2019-05-20 | 2023-08-08 | 中国科学院微电子研究所 | 磁隧道结的形成方法及磁阻式随机存储器 |
| CN112310274A (zh) * | 2019-07-31 | 2021-02-02 | 中电海康集团有限公司 | 自旋轨道矩磁性存储单元及其制备方法 |
| US11069390B2 (en) * | 2019-09-06 | 2021-07-20 | Wisconsin Alumni Research Foundation | Spin-orbit torque magnetoresistive random access memory with magnetic field-free current-induced perpendicular magnetization reversal |
| CN111490156A (zh) * | 2020-04-21 | 2020-08-04 | 浙江驰拓科技有限公司 | 自旋轨道力矩磁存储器件及其制备方法 |
| WO2022046237A1 (en) * | 2020-08-27 | 2022-03-03 | Western Digital Technologies, Inc. | Multiferroic-assisted voltage controlled magnetic anisotropy memory device and methods of manufacturing the same |
| US11276446B1 (en) | 2020-08-27 | 2022-03-15 | Western Digital Technologies, Inc. | Multiferroic-assisted voltage controlled magnetic anisotropy memory device and methods of manufacturing the same |
| US11264562B1 (en) | 2020-08-27 | 2022-03-01 | Western Digital Technologies, Inc. | Multiferroic-assisted voltage controlled magnetic anisotropy memory device and methods of manufacturing the same |
| US12093812B2 (en) | 2020-10-02 | 2024-09-17 | Sandisk Technologies Llc | Ultralow power inference engine with external magnetic field programming assistance |
| US11729996B2 (en) | 2021-07-30 | 2023-08-15 | International Business Machines Corporation | High retention eMRAM using VCMA-assisted writing |
| JP2023074096A (ja) * | 2021-11-17 | 2023-05-29 | ソニーセミコンダクタソリューションズ株式会社 | 磁気抵抗効果メモリ、メモリアレイ及びメモリシステム |
| US12471497B2 (en) | 2022-01-25 | 2025-11-11 | International Business Machines Corporation | Magnetic tunnel junction device with magnetoelectric assist |
| US20230298646A1 (en) * | 2022-03-21 | 2023-09-21 | International Business Machines Corporation | Deterministic voltage-controlled magnetic anisotropy (vcma) mram with spin-transfer torque (stt) mram assistance |
| WO2025074925A1 (ja) * | 2023-10-03 | 2025-04-10 | ソニーセミコンダクタソリューションズ株式会社 | 記憶装置および電子機器 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006179524A (ja) * | 2004-12-20 | 2006-07-06 | Toshiba Corp | 磁気記録素子、磁気記録装置、および情報の記録方法 |
| US20120002463A1 (en) * | 2006-02-25 | 2012-01-05 | Avalanche Technology, Inc. | high capacity low cost multi-state magnetic memory |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5729410A (en) | 1996-11-27 | 1998-03-17 | International Business Machines Corporation | Magnetic tunnel junction device with longitudinal biasing |
| US5936293A (en) * | 1998-01-23 | 1999-08-10 | International Business Machines Corporation | Hard/soft magnetic tunnel junction device with stable hard ferromagnetic layer |
| US6114719A (en) | 1998-05-29 | 2000-09-05 | International Business Machines Corporation | Magnetic tunnel junction memory cell with in-stack biasing of the free ferromagnetic layer and memory array using the cell |
| US8755222B2 (en) * | 2003-08-19 | 2014-06-17 | New York University | Bipolar spin-transfer switching |
| US7285836B2 (en) * | 2005-03-09 | 2007-10-23 | Maglabs, Inc. | Magnetic random access memory with stacked memory cells having oppositely-directed hard-axis biasing |
| US7230845B1 (en) * | 2005-07-29 | 2007-06-12 | Grandis, Inc. | Magnetic devices having a hard bias field and magnetic memory devices using the magnetic devices |
| US7777261B2 (en) | 2005-09-20 | 2010-08-17 | Grandis Inc. | Magnetic device having stabilized free ferromagnetic layer |
| JP2008135432A (ja) * | 2006-11-27 | 2008-06-12 | Tdk Corp | トンネル磁気抵抗効果素子及びその製造方法 |
| JP2008171882A (ja) * | 2007-01-09 | 2008-07-24 | Sony Corp | 記憶素子及びメモリ |
| JP4435189B2 (ja) * | 2007-02-15 | 2010-03-17 | 株式会社東芝 | 磁気記憶素子及び磁気記憶装置 |
| FR2914482B1 (fr) * | 2007-03-29 | 2009-05-29 | Commissariat Energie Atomique | Memoire magnetique a jonction tunnel magnetique |
| EP2015307B8 (en) * | 2007-07-13 | 2013-05-15 | Hitachi Ltd. | Magnetoresistive device |
| JP5077019B2 (ja) * | 2008-03-31 | 2012-11-21 | Tdk株式会社 | 磁気記憶装置 |
| US8039913B2 (en) * | 2008-10-09 | 2011-10-18 | Seagate Technology Llc | Magnetic stack with laminated layer |
| US9728240B2 (en) | 2009-04-08 | 2017-08-08 | Avalanche Technology, Inc. | Pulse programming techniques for voltage-controlled magnetoresistive tunnel junction (MTJ) |
| US9196332B2 (en) * | 2011-02-16 | 2015-11-24 | Avalanche Technology, Inc. | Perpendicular magnetic tunnel junction (pMTJ) with in-plane magneto-static switching-enhancing layer |
| KR20140037111A (ko) * | 2011-05-19 | 2014-03-26 | 더 리전트 오브 더 유니버시티 오브 캘리포니아 | 전압 제어 자기 이방성 스위치 및 자기 전기 메모리 |
| US9293694B2 (en) * | 2011-11-03 | 2016-03-22 | Ge Yi | Magnetoresistive random access memory cell with independently operating read and write components |
| WO2014022304A1 (en) | 2012-07-30 | 2014-02-06 | The Regents Of The University Of California | Multiple-bits-per-cell voltage-controlled magnetic memory |
| KR101649978B1 (ko) | 2012-08-06 | 2016-08-22 | 코넬 유니버시티 | 자기 나노구조체들의 스핀 홀 토크 효과들에 기초한 전기적 게이트 3-단자 회로들 및 디바이스들 |
| US8988923B2 (en) | 2012-09-11 | 2015-03-24 | The Regents Of The University Of California | Nonvolatile magneto-electric random access memory circuit with burst writing and back-to-back reads |
| US9036407B2 (en) | 2012-12-07 | 2015-05-19 | The Regents Of The University Of California | Voltage-controlled magnetic memory element with canted magnetization |
-
2015
- 2015-06-02 US US14/728,788 patent/US9620562B2/en not_active Expired - Fee Related
-
2016
- 2016-06-01 GB GB1609565.5A patent/GB2539102B/en not_active Expired - Fee Related
- 2016-06-01 FR FR1654982A patent/FR3037185B1/fr not_active Expired - Fee Related
- 2016-06-02 KR KR1020160068948A patent/KR101869149B1/ko active Active
- 2016-06-02 JP JP2016111167A patent/JP2016225633A/ja active Pending
- 2016-06-02 CN CN201610826624.8A patent/CN106374035B/zh active Active
- 2016-06-02 DE DE102016006651.2A patent/DE102016006651A1/de not_active Ceased
- 2016-06-02 TW TW105117430A patent/TWI602331B/zh not_active IP Right Cessation
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006179524A (ja) * | 2004-12-20 | 2006-07-06 | Toshiba Corp | 磁気記録素子、磁気記録装置、および情報の記録方法 |
| US20120002463A1 (en) * | 2006-02-25 | 2012-01-05 | Avalanche Technology, Inc. | high capacity low cost multi-state magnetic memory |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201705568A (zh) | 2017-02-01 |
| TWI602331B (zh) | 2017-10-11 |
| FR3037185B1 (fr) | 2019-10-25 |
| CN106374035B (zh) | 2019-11-26 |
| CN106374035A (zh) | 2017-02-01 |
| GB201609565D0 (en) | 2016-07-13 |
| FR3037185A1 (enExample) | 2016-12-09 |
| JP2016225633A (ja) | 2016-12-28 |
| KR20160142255A (ko) | 2016-12-12 |
| GB2539102B (en) | 2019-09-11 |
| US20160358973A1 (en) | 2016-12-08 |
| DE102016006651A1 (de) | 2016-12-08 |
| GB2539102A (en) | 2016-12-07 |
| US9620562B2 (en) | 2017-04-11 |
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Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20160602 |
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Comment text: Notification of reason for refusal Patent event date: 20170714 Patent event code: PE09021S01D |
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Patent event date: 20180131 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20170714 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |
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Patent event code: PX09011S01I Patent event date: 20180131 Comment text: Decision to Refuse Application Patent event code: PX09012R01I Patent event date: 20170906 Comment text: Amendment to Specification, etc. |
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| PX0701 | Decision of registration after re-examination |
Patent event date: 20180319 Comment text: Decision to Grant Registration Patent event code: PX07013S01D Patent event date: 20180305 Comment text: Amendment to Specification, etc. Patent event code: PX07012R01I Patent event date: 20180131 Comment text: Decision to Refuse Application Patent event code: PX07011S01I Patent event date: 20170906 Comment text: Amendment to Specification, etc. Patent event code: PX07012R01I |
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Comment text: Registration of Establishment Patent event date: 20180612 Patent event code: PR07011E01D |
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