KR101857480B1 - 트라이할로실란의 제조 방법 - Google Patents

트라이할로실란의 제조 방법 Download PDF

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Publication number
KR101857480B1
KR101857480B1 KR1020137018671A KR20137018671A KR101857480B1 KR 101857480 B1 KR101857480 B1 KR 101857480B1 KR 1020137018671 A KR1020137018671 A KR 1020137018671A KR 20137018671 A KR20137018671 A KR 20137018671A KR 101857480 B1 KR101857480 B1 KR 101857480B1
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catalyst
reaction
hydrogen
reactor
trihalosilane
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KR20130132920A (ko
Inventor
스테파니 베르거
디미트리스 캣솔리스
로버트 토마스 라르센
매튜 제이. 맥러플린
운니크리시난 알. 필라이
조나단 데이비드 와인랜드
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다우 실리콘즈 코포레이션
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Catalysts (AREA)
  • Silicon Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
KR1020137018671A 2010-12-17 2011-12-13 트라이할로실란의 제조 방법 Active KR101857480B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201061424118P 2010-12-17 2010-12-17
US61/424,118 2010-12-17
PCT/US2011/064544 WO2012082686A1 (en) 2010-12-17 2011-12-13 Method of making a trihalosilane

Publications (2)

Publication Number Publication Date
KR20130132920A KR20130132920A (ko) 2013-12-05
KR101857480B1 true KR101857480B1 (ko) 2018-05-14

Family

ID=45446220

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020137018671A Active KR101857480B1 (ko) 2010-12-17 2011-12-13 트라이할로실란의 제조 방법

Country Status (9)

Country Link
US (2) USRE46657E1 (https=)
EP (1) EP2651954B1 (https=)
JP (1) JP5792828B2 (https=)
KR (1) KR101857480B1 (https=)
CN (1) CN103261207B (https=)
AU (1) AU2011344089A1 (https=)
BR (1) BR112013013894A2 (https=)
RU (1) RU2013117809A (https=)
WO (1) WO2012082686A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011002436A1 (de) * 2011-01-04 2012-07-05 Evonik Degussa Gmbh Hydrierung von Organochlorsilanen und Siliciumtetrachlorid
DE102011005643A1 (de) * 2011-03-16 2012-09-20 Evonik Degussa Gmbh Reaktorkonzept zur Umsetzung von Organochlorsilanen und Siliciumtetrachlorid zu wasserstoffhaltigen Chlorsilanen
CN103930430B (zh) * 2011-11-17 2016-03-16 道康宁公司 制备二有机二卤代硅烷的方法
CN104610336B (zh) * 2015-01-08 2018-02-13 山东大学 一种硅氢化合物的制备方法
CN112739672B (zh) * 2018-08-24 2024-09-13 霍尼韦尔国际公司 用于产生三氟碘甲烷的方法
US10696613B1 (en) * 2019-07-09 2020-06-30 Honeywell International Inc. Gas phase process for chlorotrifluoroethylene

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2406605A (en) * 1945-03-15 1946-08-27 Gen Electric Hydrogenation of halogenosilanes
BE473151A (https=) 1945-03-15
US2458703A (en) * 1947-06-11 1949-01-11 Libbey Owens Ford Glass Co Reduction of compounds of silicon and halogen
US2888476A (en) 1956-08-01 1959-05-26 Du Pont Preparation of long-chain alkylhalosilanes
US3057686A (en) * 1957-08-01 1962-10-09 Du Pont Process for preparing silanes
JPS5747917B2 (https=) * 1974-08-20 1982-10-13
FR2342981A1 (fr) * 1976-03-05 1977-09-30 Rhone Poulenc Ind Procede de preparation d'hydrogenosilanes
US4079071A (en) * 1977-03-28 1978-03-14 Union Carbide Corporation Synthesis of hydrosilanes from methylchloropolysilanes
US4314908A (en) 1979-10-24 1982-02-09 Union Carbide Corporation Preparation of reaction mass for the production of methylchlorosilane
DE3024319C2 (de) 1980-06-27 1983-07-21 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Kontinuierliches Verfahren zur Herstellung von Trichlorsilan
US4390510A (en) * 1982-02-16 1983-06-28 General Electric Company Process for treating spent silicon-containing reaction masses to produce halosilanes
FR2530638A1 (fr) 1982-07-26 1984-01-27 Rhone Poulenc Spec Chim Procede de preparation d'un melange a base de trichlorosilane utilisable pour la preparation de silicium de haute purete
US4526769A (en) 1983-07-18 1985-07-02 Motorola, Inc. Trichlorosilane production process
JPS6325211A (ja) * 1986-07-10 1988-02-02 Chiyoda Chem Eng & Constr Co Ltd トリクロロシランの製造方法
US4973725A (en) 1988-06-28 1990-11-27 Union Carbide Chemicals And Plastics Company Inc. Direct synthesis process for organohalohydrosilanes
US4946980A (en) 1988-10-17 1990-08-07 Dow Corning Corporation Preparation of organosilanes
US4888435A (en) 1989-06-22 1989-12-19 Dow Corning Corporation Integrated process for alkylation and redistribution of halosilanes
DE4041644A1 (de) 1990-12-22 1992-06-25 Nuenchritz Chemie Gmbh Verfahren zur reduktiven umwandlung von siliciumtetrachlorid in trichlorsilan
TW232751B (en) 1992-10-09 1994-10-21 Semiconductor Energy Res Co Ltd Semiconductor device and method for forming the same
DE19654154A1 (de) 1995-12-25 1997-06-26 Tokuyama Corp Verfahren zur Herstellung von Trichlorsilan
US7223879B2 (en) 1998-07-10 2007-05-29 Massachusetts Institute Of Technology Ligands for metals and improved metal-catalyzed processes based thereon
US6156380A (en) 1998-10-05 2000-12-05 Shin-Etsu Chemical Co., Ltd. Method for preparing contact mass for organohalosilane synthesis
DE10044796A1 (de) 2000-09-11 2002-04-04 Bayer Ag Verfahren zur Herstellung von Chlorsilanen
DE10061682A1 (de) 2000-12-11 2002-07-04 Solarworld Ag Verfahren zur Herstellung von Reinstsilicium
US20020187096A1 (en) * 2001-06-08 2002-12-12 Kendig James Edward Process for preparation of polycrystalline silicon
ES2300652T3 (es) 2002-08-06 2008-06-16 Loma Linda University Sustancias para prevenir y tratar enfermedades autoinmunes.
CN1222471C (zh) * 2002-10-23 2005-10-12 同济大学 用三氯氢硅和四氯化硅混合源生产多晶硅的方法
US7716590B1 (en) 2002-10-28 2010-05-11 Oracle International Corporation Method and apparatus for dynamically updating a secondary form element based on a selection in a primary form element
JP4841954B2 (ja) 2003-11-28 2011-12-21 北興化学工業株式会社 ホスホニウムボレート化合物の製造方法、新規なホスホニウムボレート化合物およびその使用方法
JP2005292324A (ja) 2004-03-31 2005-10-20 Canon Inc 画像形成装置のクリーニング装置
DE102005046703A1 (de) * 2005-09-29 2007-04-05 Wacker Chemie Ag Verfahren und Vorrichtung zur Hydrierung von Chlorsilanen
CN101479192A (zh) * 2006-11-07 2009-07-08 三菱麻铁里亚尔株式会社 三氯硅烷的制备方法和三氯硅烷的制备装置
EP2039669A1 (en) 2007-09-19 2009-03-25 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Use of a mixture of an ordered intermetallic compound and an inert material as a catalyst and corresponding hydrogenation processes
JP2009111202A (ja) 2007-10-31 2009-05-21 Panasonic Corp 半導体装置及びその製造方法
DE102011002436A1 (de) * 2011-01-04 2012-07-05 Evonik Degussa Gmbh Hydrierung von Organochlorsilanen und Siliciumtetrachlorid
DE102011005643A1 (de) * 2011-03-16 2012-09-20 Evonik Degussa Gmbh Reaktorkonzept zur Umsetzung von Organochlorsilanen und Siliciumtetrachlorid zu wasserstoffhaltigen Chlorsilanen
DE102011005647A1 (de) 2011-03-16 2012-10-04 Evonik Degussa Gmbh Verbundverfahren zur Umstetzung von STC-haltigen und OCS-haltigen Nebenströmen zu wasserstoffhaltigen Chlorsilanen
WO2013138461A1 (en) * 2012-03-14 2013-09-19 Centrotherm Photovoltaics Usa, Inc. Trichlorosilane production

Also Published As

Publication number Publication date
JP5792828B2 (ja) 2015-10-14
EP2651954A1 (en) 2013-10-23
CN103261207A (zh) 2013-08-21
CN103261207B (zh) 2015-09-23
JP2014503456A (ja) 2014-02-13
USRE46657E1 (en) 2018-01-02
AU2011344089A1 (en) 2013-05-09
BR112013013894A2 (pt) 2016-09-13
US8697022B2 (en) 2014-04-15
US20130251617A1 (en) 2013-09-26
WO2012082686A1 (en) 2012-06-21
EP2651954B1 (en) 2015-09-16
KR20130132920A (ko) 2013-12-05
RU2013117809A (ru) 2015-01-27

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