BR112013013894A2 - método para fabricação de um tri-halossilano - Google Patents

método para fabricação de um tri-halossilano

Info

Publication number
BR112013013894A2
BR112013013894A2 BR112013013894A BR112013013894A BR112013013894A2 BR 112013013894 A2 BR112013013894 A2 BR 112013013894A2 BR 112013013894 A BR112013013894 A BR 112013013894A BR 112013013894 A BR112013013894 A BR 112013013894A BR 112013013894 A2 BR112013013894 A2 BR 112013013894A2
Authority
BR
Brazil
Prior art keywords
trihalosilane
manufacture
Prior art date
Application number
BR112013013894A
Other languages
English (en)
Inventor
Dimitris Katsoulis
Jonathan David Wineland
Matthew J Mclaughlin
Robert Thomas Larsen
Stephanie Berger
Unnikrishnan R Pillai
Original Assignee
Dow Corning
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning filed Critical Dow Corning
Publication of BR112013013894A2 publication Critical patent/BR112013013894A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Catalysts (AREA)
  • Silicon Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
BR112013013894A 2010-12-17 2011-12-13 método para fabricação de um tri-halossilano BR112013013894A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201061424118P 2010-12-17 2010-12-17
PCT/US2011/064544 WO2012082686A1 (en) 2010-12-17 2011-12-13 Method of making a trihalosilane

Publications (1)

Publication Number Publication Date
BR112013013894A2 true BR112013013894A2 (pt) 2016-09-13

Family

ID=45446220

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112013013894A BR112013013894A2 (pt) 2010-12-17 2011-12-13 método para fabricação de um tri-halossilano

Country Status (9)

Country Link
US (2) USRE46657E1 (pt)
EP (1) EP2651954B1 (pt)
JP (1) JP5792828B2 (pt)
KR (1) KR101857480B1 (pt)
CN (1) CN103261207B (pt)
AU (1) AU2011344089A1 (pt)
BR (1) BR112013013894A2 (pt)
RU (1) RU2013117809A (pt)
WO (1) WO2012082686A1 (pt)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011002436A1 (de) * 2011-01-04 2012-07-05 Evonik Degussa Gmbh Hydrierung von Organochlorsilanen und Siliciumtetrachlorid
DE102011005643A1 (de) * 2011-03-16 2012-09-20 Evonik Degussa Gmbh Reaktorkonzept zur Umsetzung von Organochlorsilanen und Siliciumtetrachlorid zu wasserstoffhaltigen Chlorsilanen
KR20140093946A (ko) * 2011-11-17 2014-07-29 다우 코닝 코포레이션 다이오가노다이할로실란의 제조 방법
CN104610336B (zh) * 2015-01-08 2018-02-13 山东大学 一种硅氢化合物的制备方法

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE473151A (pt) 1945-03-15
US2406605A (en) * 1945-03-15 1946-08-27 Gen Electric Hydrogenation of halogenosilanes
US2458703A (en) * 1947-06-11 1949-01-11 Libbey Owens Ford Glass Co Reduction of compounds of silicon and halogen
US2888476A (en) 1956-08-01 1959-05-26 Du Pont Preparation of long-chain alkylhalosilanes
US3057686A (en) 1957-08-01 1962-10-09 Du Pont Process for preparing silanes
JPS5747917B2 (pt) 1974-08-20 1982-10-13
FR2342981A1 (fr) * 1976-03-05 1977-09-30 Rhone Poulenc Ind Procede de preparation d'hydrogenosilanes
US4079071A (en) * 1977-03-28 1978-03-14 Union Carbide Corporation Synthesis of hydrosilanes from methylchloropolysilanes
US4314908A (en) 1979-10-24 1982-02-09 Union Carbide Corporation Preparation of reaction mass for the production of methylchlorosilane
DE3024319C2 (de) 1980-06-27 1983-07-21 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Kontinuierliches Verfahren zur Herstellung von Trichlorsilan
US4390510A (en) * 1982-02-16 1983-06-28 General Electric Company Process for treating spent silicon-containing reaction masses to produce halosilanes
FR2530638A1 (fr) 1982-07-26 1984-01-27 Rhone Poulenc Spec Chim Procede de preparation d'un melange a base de trichlorosilane utilisable pour la preparation de silicium de haute purete
US4526769A (en) 1983-07-18 1985-07-02 Motorola, Inc. Trichlorosilane production process
JPS6325211A (ja) * 1986-07-10 1988-02-02 Chiyoda Chem Eng & Constr Co Ltd トリクロロシランの製造方法
US4973725A (en) 1988-06-28 1990-11-27 Union Carbide Chemicals And Plastics Company Inc. Direct synthesis process for organohalohydrosilanes
US4946980A (en) 1988-10-17 1990-08-07 Dow Corning Corporation Preparation of organosilanes
US4888435A (en) 1989-06-22 1989-12-19 Dow Corning Corporation Integrated process for alkylation and redistribution of halosilanes
DE4041644A1 (de) 1990-12-22 1992-06-25 Nuenchritz Chemie Gmbh Verfahren zur reduktiven umwandlung von siliciumtetrachlorid in trichlorsilan
TW232751B (en) 1992-10-09 1994-10-21 Semiconductor Energy Res Co Ltd Semiconductor device and method for forming the same
DE19654154A1 (de) 1995-12-25 1997-06-26 Tokuyama Corp Verfahren zur Herstellung von Trichlorsilan
US7223879B2 (en) 1998-07-10 2007-05-29 Massachusetts Institute Of Technology Ligands for metals and improved metal-catalyzed processes based thereon
US6156380A (en) 1998-10-05 2000-12-05 Shin-Etsu Chemical Co., Ltd. Method for preparing contact mass for organohalosilane synthesis
DE10044796A1 (de) 2000-09-11 2002-04-04 Bayer Ag Verfahren zur Herstellung von Chlorsilanen
DE10061682A1 (de) 2000-12-11 2002-07-04 Solarworld Ag Verfahren zur Herstellung von Reinstsilicium
US20020187096A1 (en) * 2001-06-08 2002-12-12 Kendig James Edward Process for preparation of polycrystalline silicon
ATE344316T1 (de) 2002-08-06 2006-11-15 Univ Loma Linda Substanzen zur vorbeugung und behandlung von autoimmunkrankheiten
CN1222471C (zh) * 2002-10-23 2005-10-12 同济大学 用三氯氢硅和四氯化硅混合源生产多晶硅的方法
US7716590B1 (en) 2002-10-28 2010-05-11 Oracle International Corporation Method and apparatus for dynamically updating a secondary form element based on a selection in a primary form element
JP4841954B2 (ja) 2003-11-28 2011-12-21 北興化学工業株式会社 ホスホニウムボレート化合物の製造方法、新規なホスホニウムボレート化合物およびその使用方法
JP2005292324A (ja) 2004-03-31 2005-10-20 Canon Inc 画像形成装置のクリーニング装置
DE102005046703A1 (de) * 2005-09-29 2007-04-05 Wacker Chemie Ag Verfahren und Vorrichtung zur Hydrierung von Chlorsilanen
CN101479192A (zh) * 2006-11-07 2009-07-08 三菱麻铁里亚尔株式会社 三氯硅烷的制备方法和三氯硅烷的制备装置
EP2039669A1 (en) 2007-09-19 2009-03-25 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Use of a mixture of an ordered intermetallic compound and an inert material as a catalyst and corresponding hydrogenation processes
JP2009111202A (ja) 2007-10-31 2009-05-21 Panasonic Corp 半導体装置及びその製造方法
DE102011002436A1 (de) * 2011-01-04 2012-07-05 Evonik Degussa Gmbh Hydrierung von Organochlorsilanen und Siliciumtetrachlorid
DE102011005647A1 (de) * 2011-03-16 2012-10-04 Evonik Degussa Gmbh Verbundverfahren zur Umstetzung von STC-haltigen und OCS-haltigen Nebenströmen zu wasserstoffhaltigen Chlorsilanen
DE102011005643A1 (de) * 2011-03-16 2012-09-20 Evonik Degussa Gmbh Reaktorkonzept zur Umsetzung von Organochlorsilanen und Siliciumtetrachlorid zu wasserstoffhaltigen Chlorsilanen
WO2013138461A1 (en) * 2012-03-14 2013-09-19 Centrotherm Photovoltaics Usa, Inc. Trichlorosilane production

Also Published As

Publication number Publication date
CN103261207A (zh) 2013-08-21
CN103261207B (zh) 2015-09-23
US20130251617A1 (en) 2013-09-26
EP2651954A1 (en) 2013-10-23
WO2012082686A1 (en) 2012-06-21
JP5792828B2 (ja) 2015-10-14
USRE46657E1 (en) 2018-01-02
RU2013117809A (ru) 2015-01-27
EP2651954B1 (en) 2015-09-16
AU2011344089A1 (en) 2013-05-09
KR20130132920A (ko) 2013-12-05
KR101857480B1 (ko) 2018-05-14
JP2014503456A (ja) 2014-02-13
US8697022B2 (en) 2014-04-15

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]
B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]