KR101850584B1 - 조명 장치, 노광 장치, 조정 방법 및 물품의 제조 방법 - Google Patents

조명 장치, 노광 장치, 조정 방법 및 물품의 제조 방법 Download PDF

Info

Publication number
KR101850584B1
KR101850584B1 KR1020150084943A KR20150084943A KR101850584B1 KR 101850584 B1 KR101850584 B1 KR 101850584B1 KR 1020150084943 A KR1020150084943 A KR 1020150084943A KR 20150084943 A KR20150084943 A KR 20150084943A KR 101850584 B1 KR101850584 B1 KR 101850584B1
Authority
KR
South Korea
Prior art keywords
light
light source
optical system
intensity distribution
illumination optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020150084943A
Other languages
English (en)
Korean (ko)
Other versions
KR20150144711A (ko
Inventor
요시쿠니 요네야마
겐타로오 히루마
노보루 오사카
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20150144711A publication Critical patent/KR20150144711A/ko
Application granted granted Critical
Publication of KR101850584B1 publication Critical patent/KR101850584B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21S—NON-PORTABLE LIGHTING DEVICES; SYSTEMS THEREOF; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLE EXTERIORS
    • F21S2/00—Systems of lighting devices, not provided for in main groups F21S4/00 - F21S10/00 or F21S19/00, e.g. of modular construction
    • F21S2/005—Systems of lighting devices, not provided for in main groups F21S4/00 - F21S10/00 or F21S19/00, e.g. of modular construction of modular construction
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21S—NON-PORTABLE LIGHTING DEVICES; SYSTEMS THEREOF; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLE EXTERIORS
    • F21S10/00—Lighting devices or systems producing a varying lighting effect
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V11/00—Screens not covered by groups F21V1/00, F21V3/00, F21V7/00 or F21V9/00
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V29/00—Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
    • F21V29/50—Cooling arrangements
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V5/00—Refractors for light sources
    • F21V5/007—Array of lenses or refractors for a cluster of light sources, e.g. for arrangement of multiple light sources in one plane
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0028—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed refractive and reflective surfaces, e.g. non-imaging catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21W—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO USES OR APPLICATIONS OF LIGHTING DEVICES OR SYSTEMS
    • F21W2131/00—Use or application of lighting devices or systems not provided for in codes F21W2102/00-F21W2121/00
    • F21W2131/40—Lighting for industrial, commercial, recreational or military use
    • F21W2131/403—Lighting for industrial, commercial, recreational or military use for machines

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020150084943A 2014-06-17 2015-06-16 조명 장치, 노광 장치, 조정 방법 및 물품의 제조 방법 Expired - Fee Related KR101850584B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014124752A JP6362095B2 (ja) 2014-06-17 2014-06-17 照明装置、露光装置、調整方法、及び、物品の製造方法
JPJP-P-2014-124752 2014-06-17

Publications (2)

Publication Number Publication Date
KR20150144711A KR20150144711A (ko) 2015-12-28
KR101850584B1 true KR101850584B1 (ko) 2018-04-19

Family

ID=54836065

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020150084943A Expired - Fee Related KR101850584B1 (ko) 2014-06-17 2015-06-16 조명 장치, 노광 장치, 조정 방법 및 물품의 제조 방법

Country Status (5)

Country Link
US (1) US9632423B2 (https=)
JP (1) JP6362095B2 (https=)
KR (1) KR101850584B1 (https=)
CN (1) CN105278258B (https=)
TW (1) TWI587097B (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202016103819U1 (de) * 2016-07-14 2017-10-20 Suss Microtec Lithography Gmbh Lichtquellenanordnung für ein Belichtungssystem sowie Fotolithografie-Belichtungssystem
CN107179653B (zh) * 2017-07-20 2018-10-19 武汉华星光电技术有限公司 一种曝光机及其发光装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100259740A1 (en) * 2009-04-13 2010-10-14 Canon Kabushiki Kaisha Exposure method, exposure apparatus, and device manufacturing method
JP4990416B2 (ja) 2010-08-23 2012-08-01 三菱電機株式会社 投写型表示装置

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2899026B2 (ja) 1989-11-27 1999-06-02 株式会社日立製作所 マーク検出装置
JP2890892B2 (ja) * 1991-04-30 1999-05-17 キヤノン株式会社 露光装置及びそれを用いた素子製造方法
US5305054A (en) * 1991-02-22 1994-04-19 Canon Kabushiki Kaisha Imaging method for manufacture of microdevices
JP2633091B2 (ja) * 1991-02-22 1997-07-23 キヤノン株式会社 像投影方法、回路製造方法及び投影露光装置
CN1045103C (zh) 1994-06-18 1999-09-15 兰州炼油化工总厂三星公司 一种烷基水杨酸盐润滑油添加剂
JP2000075496A (ja) * 1998-08-31 2000-03-14 Canon Inc 冷却機構を有する光源、光源装置及びこれを用いた露光装置
JP2000098099A (ja) * 1998-09-21 2000-04-07 Nikon Corp Ｘ線照明装置及びｘ線投影露光装置
US6704090B2 (en) * 2000-05-11 2004-03-09 Nikon Corporation Exposure method and exposure apparatus
JP2001326171A (ja) * 2000-05-18 2001-11-22 Canon Inc 照明装置
DE60217771T3 (de) 2001-07-27 2012-02-09 Canon K.K. Belichtungssystem, Projektionsbelichtungsapparat und Verfahren zur Herstellung eines Artikels
JP2004063988A (ja) * 2002-07-31 2004-02-26 Canon Inc 照明光学系、当該照明光学系を有する露光装置及びデバイス製造方法
JP4086582B2 (ja) * 2002-08-06 2008-05-14 キヤノン株式会社 照明装置及び露光装置
JP2004079254A (ja) * 2002-08-13 2004-03-11 Canon Inc 光源装置及び露光装置
JP4470558B2 (ja) * 2004-03-31 2010-06-02 ウシオ電機株式会社 光照射装置
TWI401538B (zh) 2007-03-28 2013-07-11 Orc Mfg Co Ltd Exposure drawing device
KR102331533B1 (ko) * 2007-04-12 2021-11-26 가부시키가이샤 니콘 방전램프

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100259740A1 (en) * 2009-04-13 2010-10-14 Canon Kabushiki Kaisha Exposure method, exposure apparatus, and device manufacturing method
JP4990416B2 (ja) 2010-08-23 2012-08-01 三菱電機株式会社 投写型表示装置

Also Published As

Publication number Publication date
US9632423B2 (en) 2017-04-25
JP2016004921A (ja) 2016-01-12
US20150362843A1 (en) 2015-12-17
TWI587097B (zh) 2017-06-11
TW201600936A (zh) 2016-01-01
CN105278258A (zh) 2016-01-27
CN105278258B (zh) 2017-10-24
KR20150144711A (ko) 2015-12-28
JP6362095B2 (ja) 2018-07-25

Similar Documents

Publication Publication Date Title
US11255514B2 (en) Illumination apparatus having planar array of LEDs and movable pair of lens arrays for modifying light output
KR20180007672A (ko) 노광 장치, 노광 방법 및 물품 제조 방법
US11841614B2 (en) Exposure apparatus, exposure method, and article manufacturing method
JP3200244B2 (ja) 走査型露光装置
TW200839460A (en) Exposure apparatus and semiconductor device fabrication method
KR102212855B1 (ko) 조명 광학계, 리소그래피 장치, 및 물품 제조 방법
JP6098950B2 (ja) 照明光学ユニット
JP6243616B2 (ja) 露光装置および物品の製造方法
KR101850584B1 (ko) 조명 장치, 노광 장치, 조정 방법 및 물품의 제조 방법
JP6139870B2 (ja) 露光方法、露光装置および物品の製造方法
JP5388019B2 (ja) 露光照明装置及び露光パターンの位置ずれ調整方法
JP5239829B2 (ja) 照明光学系、露光装置及びデバイスの製造方法
JP7336922B2 (ja) 露光装置及び物品の製造方法
JP5239830B2 (ja) 照明光学系、露光装置及びデバイスの製造方法
KR20180028969A (ko) 조명 광학계, 노광 장치 및 물품 제조 방법
JP2008124308A (ja) 露光方法及び露光装置、それを用いたデバイス製造方法
JP2023148840A (ja) 照明光学系、露光装置および物品製造方法
JP5532620B2 (ja) 照明光学系、露光装置及びデバイスの製造方法
JP5470984B2 (ja) 照明装置、露光装置、及びデバイス製造方法
JP2013165196A (ja) 照明光学系、露光装置、およびデバイス製造方法
JP2009145452A (ja) 光照射装置
JP2017198759A (ja) 照明装置、照明方法、露光装置、およびデバイス製造方法
WO2010073801A1 (ja) 照明光学系、露光装置及びデバイスの製造方法

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20250414

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

H13 Ip right lapsed

Free format text: ST27 STATUS EVENT CODE: N-4-6-H10-H13-OTH-PC1903 (AS PROVIDED BY THE NATIONAL OFFICE); TERMINATION CATEGORY : DEFAULT_OF_REGISTRATION_FEE

Effective date: 20250414

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20250414