KR101847226B1 - 포토마스크 건조 장치 및 방법 - Google Patents

포토마스크 건조 장치 및 방법 Download PDF

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Publication number
KR101847226B1
KR101847226B1 KR1020127034279A KR20127034279A KR101847226B1 KR 101847226 B1 KR101847226 B1 KR 101847226B1 KR 1020127034279 A KR1020127034279 A KR 1020127034279A KR 20127034279 A KR20127034279 A KR 20127034279A KR 101847226 B1 KR101847226 B1 KR 101847226B1
Authority
KR
South Korea
Prior art keywords
photomask
chamber
infrared radiation
temperature
gas
Prior art date
Application number
KR1020127034279A
Other languages
English (en)
Korean (ko)
Other versions
KR20130124177A (ko
Inventor
씬디 또벡스
베뜨랑 벨레
Original Assignee
파이퍼 배큠
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 파이퍼 배큠 filed Critical 파이퍼 배큠
Publication of KR20130124177A publication Critical patent/KR20130124177A/ko
Application granted granted Critical
Publication of KR101847226B1 publication Critical patent/KR101847226B1/ko

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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B5/00—Drying solid materials or objects by processes not involving the application of heat
    • F26B5/04—Drying solid materials or objects by processes not involving the application of heat by evaporation or sublimation of moisture under reduced pressure, e.g. in a vacuum
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
    • F26B21/14—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects using gases or vapours other than air or steam, e.g. inert gases
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B5/00—Drying solid materials or objects by processes not involving the application of heat
    • F26B5/04—Drying solid materials or objects by processes not involving the application of heat by evaporation or sublimation of moisture under reduced pressure, e.g. in a vacuum
    • F26B5/048—Drying solid materials or objects by processes not involving the application of heat by evaporation or sublimation of moisture under reduced pressure, e.g. in a vacuum in combination with heat developed by electro-magnetic means, e.g. microwave energy
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B7/00—Drying solid materials or objects by processes using a combination of processes not covered by a single one of groups F26B3/00 and F26B5/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • Drying Of Solid Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1020127034279A 2010-06-30 2011-06-27 포토마스크 건조 장치 및 방법 KR101847226B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1002765 2010-06-30
FR1002765A FR2962198B1 (fr) 2010-06-30 2010-06-30 Dispositif de sechage d'un photomasque
PCT/EP2011/060750 WO2012000951A1 (fr) 2010-06-30 2011-06-27 Dispositif et procédé de séchage d'un photomasque

Publications (2)

Publication Number Publication Date
KR20130124177A KR20130124177A (ko) 2013-11-13
KR101847226B1 true KR101847226B1 (ko) 2018-04-09

Family

ID=43480763

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020127034279A KR101847226B1 (ko) 2010-06-30 2011-06-27 포토마스크 건조 장치 및 방법

Country Status (8)

Country Link
US (1) US8724078B2 (de)
EP (1) EP2588823B1 (de)
JP (1) JP5801391B2 (de)
KR (1) KR101847226B1 (de)
FR (1) FR2962198B1 (de)
SG (1) SG186346A1 (de)
TW (1) TWI473959B (de)
WO (1) WO2012000951A1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107917598A (zh) * 2017-11-02 2018-04-17 东台市苏泰饲料有限公司 一种小型高效稻谷烘干机

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006183934A (ja) * 2004-12-27 2006-07-13 Seiko Epson Corp 溶媒除去装置および溶媒除去方法
JP2006332198A (ja) 2005-05-24 2006-12-07 Dainippon Screen Mfg Co Ltd 基板処理装置および基板乾燥方法
WO2009112655A1 (fr) * 2008-03-05 2009-09-17 Alcatel Lucent Procede de fabrication de photomasques et dispositif pour sa mise en œuvre

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01225120A (ja) * 1988-03-03 1989-09-08 Nec Corp プレベーク装置
JPH1197508A (ja) * 1997-09-18 1999-04-09 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2004047515A (ja) * 2002-07-08 2004-02-12 Shin Etsu Chem Co Ltd 石英基板の乾燥方法及び石英基板
TW200729292A (en) * 2005-12-22 2007-08-01 Qimonda Ag Apparatus for preserving and using at least one photolithograph projection photo mask and the method using the same in the exposure apparatus
US7927969B2 (en) * 2006-03-08 2011-04-19 Stmicroelectronics S.A. Cleaning of photolithography masks
EP1925909A1 (de) * 2006-11-21 2008-05-28 Alcatel Lucent Vorrichtung zur Reinigung und Beseitigung von Schadstoffen eines Gegenstands mit eingeschränkter, durchlässiger Umgebung, die durch eine Folienwand begrenzt wird
JP2009200423A (ja) * 2008-02-25 2009-09-03 Asahi Glass Co Ltd Ｅｕｖリソグラフィ用反射型マスクの製造方法
JP2009250514A (ja) * 2008-04-04 2009-10-29 Nippon Steel Corp 加熱装置およびその制御方法
JP5469852B2 (ja) * 2008-11-21 2014-04-16 株式会社ニコン 搬送装置、搬送方法、露光装置、露光方法、及びデバイス製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006183934A (ja) * 2004-12-27 2006-07-13 Seiko Epson Corp 溶媒除去装置および溶媒除去方法
JP2006332198A (ja) 2005-05-24 2006-12-07 Dainippon Screen Mfg Co Ltd 基板処理装置および基板乾燥方法
WO2009112655A1 (fr) * 2008-03-05 2009-09-17 Alcatel Lucent Procede de fabrication de photomasques et dispositif pour sa mise en œuvre

Also Published As

Publication number Publication date
US8724078B2 (en) 2014-05-13
US20130094007A1 (en) 2013-04-18
SG186346A1 (en) 2013-01-30
FR2962198B1 (fr) 2014-04-11
EP2588823B1 (de) 2016-05-18
TWI473959B (zh) 2015-02-21
WO2012000951A1 (fr) 2012-01-05
JP2013536453A (ja) 2013-09-19
TW201224379A (en) 2012-06-16
JP5801391B2 (ja) 2015-10-28
EP2588823A1 (de) 2013-05-08
FR2962198A1 (fr) 2012-01-06
KR20130124177A (ko) 2013-11-13

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