KR101840960B1 - 스티렌 및 메틸 메타크릴레이트 기재의 비구조화 블록 코폴리머를 사용하는 블록 코폴리머 필름의 나노구조화 방법, 및 나노구조화 블록 코폴리머 필름 - Google Patents

스티렌 및 메틸 메타크릴레이트 기재의 비구조화 블록 코폴리머를 사용하는 블록 코폴리머 필름의 나노구조화 방법, 및 나노구조화 블록 코폴리머 필름 Download PDF

Info

Publication number
KR101840960B1
KR101840960B1 KR1020167019169A KR20167019169A KR101840960B1 KR 101840960 B1 KR101840960 B1 KR 101840960B1 KR 1020167019169 A KR1020167019169 A KR 1020167019169A KR 20167019169 A KR20167019169 A KR 20167019169A KR 101840960 B1 KR101840960 B1 KR 101840960B1
Authority
KR
South Korea
Prior art keywords
block
block copolymer
monomers
monomer
styrene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020167019169A
Other languages
English (en)
Korean (ko)
Other versions
KR20160100351A (ko
Inventor
크리스토쁘 나바로
셀리아 니꼴레
사비에 슈발리에
Original Assignee
아르끄마 프랑스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 아르끄마 프랑스 filed Critical 아르끄마 프랑스
Publication of KR20160100351A publication Critical patent/KR20160100351A/ko
Application granted granted Critical
Publication of KR101840960B1 publication Critical patent/KR101840960B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/08—Heat treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2353/00—Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/945—Special, e.g. metal
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S524/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S524/905—Etch masking compositions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S525/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S525/915—Polymer from monoethylenic cyclic hydrocarbon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Inorganic Chemistry (AREA)
  • Composite Materials (AREA)
  • Thermal Sciences (AREA)
  • Graft Or Block Polymers (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
KR1020167019169A 2013-12-17 2014-12-15 스티렌 및 메틸 메타크릴레이트 기재의 비구조화 블록 코폴리머를 사용하는 블록 코폴리머 필름의 나노구조화 방법, 및 나노구조화 블록 코폴리머 필름 Expired - Fee Related KR101840960B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FRFR1362735 2013-12-17
FR1362735A FR3014877B1 (fr) 2013-12-17 2013-12-17 Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure
PCT/FR2014/053329 WO2015092241A1 (fr) 2013-12-17 2014-12-15 Procédé de nanostructuration d'un film de copolymère a blocs a partir d'un copolymère a blocs non structure a base de styrène et de methacrylate de méthyle, et film de copolymère a blocs nanostructure

Publications (2)

Publication Number Publication Date
KR20160100351A KR20160100351A (ko) 2016-08-23
KR101840960B1 true KR101840960B1 (ko) 2018-03-21

Family

ID=50289951

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167019169A Expired - Fee Related KR101840960B1 (ko) 2013-12-17 2014-12-15 스티렌 및 메틸 메타크릴레이트 기재의 비구조화 블록 코폴리머를 사용하는 블록 코폴리머 필름의 나노구조화 방법, 및 나노구조화 블록 코폴리머 필름

Country Status (9)

Country Link
US (1) US10011675B2 (OSRAM)
EP (1) EP3083488A1 (OSRAM)
JP (2) JP2017501270A (OSRAM)
KR (1) KR101840960B1 (OSRAM)
CN (1) CN105829239A (OSRAM)
FR (1) FR3014877B1 (OSRAM)
SG (1) SG11201604475WA (OSRAM)
TW (1) TWI548657B (OSRAM)
WO (1) WO2015092241A1 (OSRAM)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3029921B1 (fr) * 2014-12-16 2018-06-29 Arkema France Procede de controle de la synthese d'un copolymere a blocs contenant au moins un bloc apolaire et au moins un bloc polaire et utilisation d'un tel copolymere a blocs dans des applications de nano-lithographie par auto-assemblage direct.
FR3045643A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'amelioration de l'uniformite de dimension critique de films ordonnes de copolymere a blocs
FR3045642A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede de reduction du temps de structuration de films ordonnes de copolymere a blocs
FR3045645B1 (fr) * 2015-12-18 2019-07-05 Arkema France Procede de reduction des defauts dans un film ordonne de copolymeres a blocs
FR3045644A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'obtention de films ordonnes epais et de periodes elevees comprenant un copolymere a blocs
CN109906237B (zh) * 2016-11-30 2021-08-03 株式会社Lg化学 嵌段共聚物
CN112358643B (zh) * 2020-11-10 2022-09-30 浙江工业大学 一种基于嵌段共聚物本体聚合的均孔膜制备方法
JP2024501808A (ja) * 2020-12-17 2024-01-16 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング 誘導自己集合化のための交互コポリマーセグメントからなる調整可能な高カイジブロックコポリマー及びそれの応用

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007132901A1 (ja) * 2006-05-16 2007-11-22 Nippon Soda Co., Ltd. ブロックコポリマー
US20120046415A1 (en) * 2010-08-20 2012-02-23 Micron Technology, Inc. Methods of forming block copolymers, methods of forming a self-assembled block copolymer structure and related compositions

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2679237B1 (fr) 1991-07-19 1994-07-22 Atochem Systeme d'amorcage pour la polymerisation anionique de monomeres (meth) acryliques.
FR2735480B1 (fr) 1995-06-15 1997-07-18 Atochem Elf Sa Procede de polymerisation anionique en continu d'au moins un monomere (meth)acrylique pour l'obtention de polymeres a haut taux de solide
US6835778B2 (en) * 1995-08-29 2004-12-28 Chevron Phillips Chemical Company Lp Conjugated diene/monovinylarene block copolymers blends
US7255920B2 (en) * 2004-07-29 2007-08-14 3M Innovative Properties Company (Meth)acrylate block copolymer pressure sensitive adhesives
US7964107B2 (en) * 2007-02-08 2011-06-21 Micron Technology, Inc. Methods using block copolymer self-assembly for sub-lithographic patterning
US8425982B2 (en) * 2008-03-21 2013-04-23 Micron Technology, Inc. Methods of improving long range order in self-assembly of block copolymer films with ionic liquids
FR2974094A1 (fr) 2011-04-15 2012-10-19 Arkema France Procede de preparation de surfaces
EP2736931A1 (en) 2011-07-29 2014-06-04 Wisconsin Alumni Research Foundation Block copolymer materials for directed assembly of thin films

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007132901A1 (ja) * 2006-05-16 2007-11-22 Nippon Soda Co., Ltd. ブロックコポリマー
US20120046415A1 (en) * 2010-08-20 2012-02-23 Micron Technology, Inc. Methods of forming block copolymers, methods of forming a self-assembled block copolymer structure and related compositions

Also Published As

Publication number Publication date
EP3083488A1 (fr) 2016-10-26
US20170002127A1 (en) 2017-01-05
FR3014877A1 (fr) 2015-06-19
TWI548657B (zh) 2016-09-11
SG11201604475WA (en) 2016-07-28
JP2017501270A (ja) 2017-01-12
WO2015092241A1 (fr) 2015-06-25
KR20160100351A (ko) 2016-08-23
JP2019173019A (ja) 2019-10-10
US10011675B2 (en) 2018-07-03
FR3014877B1 (fr) 2017-03-31
TW201536825A (zh) 2015-10-01
CN105829239A (zh) 2016-08-03

Similar Documents

Publication Publication Date Title
KR101840960B1 (ko) 스티렌 및 메틸 메타크릴레이트 기재의 비구조화 블록 코폴리머를 사용하는 블록 코폴리머 필름의 나노구조화 방법, 및 나노구조화 블록 코폴리머 필름
JP6404353B2 (ja) ブロックコポリマーの自己組織化によりナノメートル構造体の作製を可能にする方法
JP6449342B2 (ja) スチレン及びメチルメタクリレートに基づくナノ構造化ブロック共重合体フィルムの周期をコントロールする方法、及びナノ構造化ブロック共重合体フィルム
JP6373998B2 (ja) 基材上のブロックコポリマーフィルムを生産するための方法
KR20180005224A (ko) 블록 공중합체 필름의 결함율 감소 방법
JP2015061905A (ja) ブロックコポリマーのブレンドを含むナノ構造化組織体の周期を制御する方法
JP6143955B2 (ja) ブロックコポリマーのそれぞれのブロック中に存在するモノマーとは少なくとも部分的に異なるモノマーのランダムコポリマーまたはグラジエントコポリマーを使ったブロックコポリマー・ナノドメインの垂直配向方法
JP2019500457A (ja) ブロックコポリマー秩序膜の構造化時間を短縮するための方法
KR101884102B1 (ko) 블록 공중합체의 자가-어셈블리에 의한 나노계측 구조의 제조를 가능하게 하는 방법
JP6411529B2 (ja) 基材の表面エネルギーの制御のための方法

Legal Events

Date Code Title Description
A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20250316

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20250316