KR101820242B1 - 수냉식 표면파 플라즈마 발생장치 - Google Patents

수냉식 표면파 플라즈마 발생장치 Download PDF

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Publication number
KR101820242B1
KR101820242B1 KR1020160098303A KR20160098303A KR101820242B1 KR 101820242 B1 KR101820242 B1 KR 101820242B1 KR 1020160098303 A KR1020160098303 A KR 1020160098303A KR 20160098303 A KR20160098303 A KR 20160098303A KR 101820242 B1 KR101820242 B1 KR 101820242B1
Authority
KR
South Korea
Prior art keywords
waveguide
dielectric tube
antenna
tube
cooling
Prior art date
Application number
KR1020160098303A
Other languages
English (en)
Korean (ko)
Inventor
유현종
추원일
Original Assignee
한국기초과학지원연구원
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 한국기초과학지원연구원 filed Critical 한국기초과학지원연구원
Priority to KR1020160098303A priority Critical patent/KR101820242B1/ko
Priority to PCT/KR2017/007905 priority patent/WO2018026129A1/ko
Priority to CN201710609211.9A priority patent/CN107683010B/zh
Application granted granted Critical
Publication of KR101820242B1 publication Critical patent/KR101820242B1/ko

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/28—Cooling arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/3222—Antennas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32229—Waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002—Cooling arrangements

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
KR1020160098303A 2016-08-02 2016-08-02 수냉식 표면파 플라즈마 발생장치 KR101820242B1 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020160098303A KR101820242B1 (ko) 2016-08-02 2016-08-02 수냉식 표면파 플라즈마 발생장치
PCT/KR2017/007905 WO2018026129A1 (ko) 2016-08-02 2017-07-21 수냉식 표면파 플라즈마 발생장치
CN201710609211.9A CN107683010B (zh) 2016-08-02 2017-07-24 水冷式表面波等离子体发生装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020160098303A KR101820242B1 (ko) 2016-08-02 2016-08-02 수냉식 표면파 플라즈마 발생장치

Publications (1)

Publication Number Publication Date
KR101820242B1 true KR101820242B1 (ko) 2018-01-18

Family

ID=61028711

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020160098303A KR101820242B1 (ko) 2016-08-02 2016-08-02 수냉식 표면파 플라즈마 발생장치

Country Status (3)

Country Link
KR (1) KR101820242B1 (zh)
CN (1) CN107683010B (zh)
WO (1) WO2018026129A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115971169B (zh) * 2023-02-24 2023-07-07 深圳市方瑞科技有限公司 一种滚筒式真空等离子清洗机及其工作方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004304035A (ja) 2003-03-31 2004-10-28 Shibaura Mechatronics Corp プラズマ発生装置
JP2010103121A (ja) * 1995-02-16 2010-05-06 Mks Instruments Inc マイクロ波プラズマ・システム用の液体冷却マイクロ波プラズマ・アプリケータおよび液体冷却誘電体窓
US20150318148A1 (en) * 2014-03-27 2015-11-05 Mks Instruments, Inc. Microwave plasma applicator with improved power uniformity

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5625259A (en) * 1995-02-16 1997-04-29 Applied Science And Technology, Inc. Microwave plasma applicator with a helical fluid cooling channel surrounding a microwave transparent discharge tube
JP4610126B2 (ja) * 2001-06-14 2011-01-12 株式会社神戸製鋼所 プラズマｃｖｄ装置
CN1175127C (zh) * 2001-08-24 2004-11-10 北京科技大学 一种微波等离子体激励装置
JP3790216B2 (ja) * 2002-12-27 2006-06-28 芝浦メカトロニクス株式会社 プラズマ発生装置
JP4921361B2 (ja) * 2005-04-26 2012-04-25 株式会社島津製作所 表面波励起プラズマ発生装置および表面波励起プラズマ処理装置
US20070240644A1 (en) * 2006-03-24 2007-10-18 Hiroyuki Matsuura Vertical plasma processing apparatus for semiconductor process
JP4632316B2 (ja) * 2007-02-06 2011-02-16 芝浦メカトロニクス株式会社 プラズマ処理装置
CN101394705A (zh) * 2008-10-23 2009-03-25 武汉工程大学 一种产生大气压微波辉光等离子体的装置
US8415884B2 (en) * 2009-09-08 2013-04-09 Tokyo Electron Limited Stable surface wave plasma source
CN102153174A (zh) * 2010-02-12 2011-08-17 姜雄律 微波等离子水杀菌设备
CN102347205A (zh) * 2011-07-14 2012-02-08 复旦大学 由石英管引导的表面波等离子体光源
FR2993428B1 (fr) * 2012-07-11 2014-08-08 Centre Nat Rech Scient Applicateur d'onde de surface pour la production de plasma
KR101398592B1 (ko) * 2012-10-08 2014-05-22 한국기초과학지원연구원 라디칼 발생 및 이송 장치

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010103121A (ja) * 1995-02-16 2010-05-06 Mks Instruments Inc マイクロ波プラズマ・システム用の液体冷却マイクロ波プラズマ・アプリケータおよび液体冷却誘電体窓
JP2004304035A (ja) 2003-03-31 2004-10-28 Shibaura Mechatronics Corp プラズマ発生装置
US20150318148A1 (en) * 2014-03-27 2015-11-05 Mks Instruments, Inc. Microwave plasma applicator with improved power uniformity

Also Published As

Publication number Publication date
WO2018026129A1 (ko) 2018-02-08
CN107683010B (zh) 2020-03-13
CN107683010A (zh) 2018-02-09

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