JP2016509337A - 電磁波−高周波混成プラズマトーチ - Google Patents
電磁波−高周波混成プラズマトーチ Download PDFInfo
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- JP2016509337A JP2016509337A JP2015550319A JP2015550319A JP2016509337A JP 2016509337 A JP2016509337 A JP 2016509337A JP 2015550319 A JP2015550319 A JP 2015550319A JP 2015550319 A JP2015550319 A JP 2015550319A JP 2016509337 A JP2016509337 A JP 2016509337A
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- electromagnetic wave
- plasma
- discharge tube
- high frequency
- cooling water
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- 239000000498 cooling water Substances 0.000 claims abstract description 42
- 230000006698 induction Effects 0.000 claims abstract description 42
- 230000005540 biological transmission Effects 0.000 claims abstract description 17
- 239000007789 gas Substances 0.000 claims description 39
- 239000012495 reaction gas Substances 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 238000010791 quenching Methods 0.000 abstract description 6
- 238000001816 cooling Methods 0.000 abstract 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 230000000171 quenching effect Effects 0.000 description 4
- 239000000376 reactant Substances 0.000 description 4
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 230000004941 influx Effects 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 238000004056 waste incineration Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/28—Cooling arrangements
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/3405—Arrangements for stabilising or constricting the arc, e.g. by an additional gas flow
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/4622—Microwave discharges using waveguides
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Plasma Technology (AREA)
- Coating By Spraying Or Casting (AREA)
Abstract
Description
Claims (5)
- 電磁波を発振させる電磁波発振器、
前記電磁波発振器に電源を供給する電源供給部、
前記電磁波発振器から発生した電磁波が伝送される電磁波伝送ライン、
プラズマ形成ガスを注入するための第一プラズマ形成ガス供給部、
前記電磁波伝送ラインから流入された電磁波と前記第一プラズマ形成ガス供給部から注入されたプラズマ形成ガスによりプラズマが発生される電磁波放電管、
前記電磁波放電管から電磁波プラズマフローが流入される高周波放電管、
前記高周波放電管と同軸であり、内部に誘導コイルが挿入されている円筒形の誘導コイル構造体、
前記誘導コイル構造体を取り囲む外壁、
前記高周波放電管を中心に冷却水が流入されて排出される冷却水路、及び
前記高周波放電管にプラズマ形成ガスが流入される第2プラズマ形成ガス供給部
を含む、電磁波−高周波混成プラズマトーチ。 - 前記高周波放電管に反応ガスを注入するための反応ガス供給部をさらに含む、請求項1に記載の電磁波−高周波混成プラズマトーチ。
- 前記誘導コイル構造体に高周波を入出力するための高周波入出力用の銅管をさらに含む、請求項2に記載の電磁波−高周波混成プラズマトーチ。
- 前記プラズマ形成ガスはCO2であり、前記反応ガスはCH4、H2OまたはO2のうち、一つである、請求項2に記載の電磁波−高周波混成プラズマトーチ。
- 前記冷却水路は、前記外壁と前記誘導コイル構造体との間に存在する環状の第1冷却水路、及び前記誘導コイル構造体と前記高周波放電管との間に存在する環状の第2冷却水路を含み、前記第1冷却水路及び前記第2冷却水路は、連結されて外部から隔離されて前記冷却水路の一側部に注入された冷却水が前記冷却水路に沿って循環して他側部に排出が可能な、請求項2に記載の電磁波−高周波混成プラズマトーチ。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2012-0154137 | 2012-12-27 | ||
KR1020120154137A KR101359320B1 (ko) | 2012-12-27 | 2012-12-27 | 전자파-고주파 혼성 플라즈마 토치 |
PCT/KR2013/012252 WO2014104780A1 (ko) | 2012-12-27 | 2013-12-27 | 전자파-고주파 혼성 플라즈마 토치 |
Publications (2)
Publication Number | Publication Date |
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JP2016509337A true JP2016509337A (ja) | 2016-03-24 |
JP6078169B2 JP6078169B2 (ja) | 2017-02-08 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2015550319A Active JP6078169B2 (ja) | 2012-12-27 | 2013-12-27 | 電磁波−高周波混成プラズマトーチ |
Country Status (5)
Country | Link |
---|---|
US (1) | US9451685B2 (ja) |
JP (1) | JP6078169B2 (ja) |
KR (1) | KR101359320B1 (ja) |
CN (1) | CN104956774B (ja) |
WO (1) | WO2014104780A1 (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9717139B1 (en) * | 2013-08-26 | 2017-07-25 | Elemental Scientific, Inc. | Torch cooling device |
KR101620009B1 (ko) * | 2014-07-11 | 2016-05-12 | 한국기계연구원 | 다중 특성을 가지는 플라즈마 반응기 |
CN106817834A (zh) * | 2017-02-24 | 2017-06-09 | 中国航天空气动力技术研究院 | 一种高频感应等离子发生器双水冷电感线圈 |
CN107182164B (zh) * | 2017-06-27 | 2023-12-08 | 云航时代(重庆)科技有限公司 | 一种水冷笼式高频感应耦合等离子体反应器 |
KR102124125B1 (ko) * | 2018-10-08 | 2020-06-17 | 한국기초과학지원연구원 | 이중 노즐 플라즈마 토치를 이용한 냉각 폴리머 합성장치 |
CN109585032B (zh) * | 2018-10-29 | 2021-02-02 | 大连民族大学 | 一种耐高温全钨面向等离子体反应器 |
KR102216854B1 (ko) * | 2019-09-30 | 2021-02-17 | 포항공과대학교 산학협력단 | 마이크로파 플라즈마를 이용한 아크 방전장치 및 아크 방전방법 |
KR102473148B1 (ko) * | 2020-03-27 | 2022-12-01 | 한국기계연구원 | 플라즈마 초음속 유동 발생장치 |
KR102605372B1 (ko) | 2022-12-02 | 2023-11-22 | 이상주 | 마이크로웨이브 플라즈마 생성기 및 이를 포함하는 장치 |
Citations (6)
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WO2003032693A1 (en) * | 2001-10-05 | 2003-04-17 | Universite De Sherbrooke | Multi-coil induction plasma torch for solid state power supply |
JP2004247177A (ja) * | 2003-02-13 | 2004-09-02 | Jeol Ltd | 複合型プラズマ発生装置 |
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WO2010082561A1 (ja) * | 2009-01-13 | 2010-07-22 | リバーベル株式会社 | プラズマ生成装置及び方法 |
JP2011222222A (ja) * | 2010-04-07 | 2011-11-04 | Jeol Ltd | ハイブリッドプラズマ発生装置 |
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2012
- 2012-12-27 KR KR1020120154137A patent/KR101359320B1/ko active IP Right Grant
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2013
- 2013-12-27 JP JP2015550319A patent/JP6078169B2/ja active Active
- 2013-12-27 US US14/758,093 patent/US9451685B2/en active Active
- 2013-12-27 CN CN201380068586.9A patent/CN104956774B/zh active Active
- 2013-12-27 WO PCT/KR2013/012252 patent/WO2014104780A1/ko active Application Filing
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WO2003032693A1 (en) * | 2001-10-05 | 2003-04-17 | Universite De Sherbrooke | Multi-coil induction plasma torch for solid state power supply |
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Also Published As
Publication number | Publication date |
---|---|
US20150334815A1 (en) | 2015-11-19 |
WO2014104780A1 (ko) | 2014-07-03 |
CN104956774A (zh) | 2015-09-30 |
KR101359320B1 (ko) | 2014-02-10 |
CN104956774B (zh) | 2017-05-31 |
JP6078169B2 (ja) | 2017-02-08 |
US9451685B2 (en) | 2016-09-20 |
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