KR101817626B1 - 플라즈마 용사 장치 - Google Patents

플라즈마 용사 장치 Download PDF

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Publication number
KR101817626B1
KR101817626B1 KR1020110131022A KR20110131022A KR101817626B1 KR 101817626 B1 KR101817626 B1 KR 101817626B1 KR 1020110131022 A KR1020110131022 A KR 1020110131022A KR 20110131022 A KR20110131022 A KR 20110131022A KR 101817626 B1 KR101817626 B1 KR 101817626B1
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KR
South Korea
Prior art keywords
gas
wire
primary
nozzle
plasma
Prior art date
Application number
KR1020110131022A
Other languages
English (en)
Korean (ko)
Other versions
KR20120065251A (ko
Inventor
마사노부 스기모토
켄이치 야마다
마사노부 이리에
Original Assignee
가부시키가이샤 후지엔지니어링
가부시키가이샤 후지기켄
니시니혼 고소쿠도로 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 후지엔지니어링, 가부시키가이샤 후지기켄, 니시니혼 고소쿠도로 가부시키가이샤 filed Critical 가부시키가이샤 후지엔지니어링
Publication of KR20120065251A publication Critical patent/KR20120065251A/ko
Application granted granted Critical
Publication of KR101817626B1 publication Critical patent/KR101817626B1/ko

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/42—Plasma torches using an arc with provisions for introducing materials into the plasma, e.g. powder, liquid
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/134—Plasma spraying

Landscapes

  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Nozzles (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Plasma Technology (AREA)
KR1020110131022A 2010-12-10 2011-12-08 플라즈마 용사 장치 KR101817626B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2010-276142 2010-12-10
JP2010276142A JP5649942B2 (ja) 2010-12-10 2010-12-10 プラズマ溶射装置

Publications (2)

Publication Number Publication Date
KR20120065251A KR20120065251A (ko) 2012-06-20
KR101817626B1 true KR101817626B1 (ko) 2018-01-11

Family

ID=46342470

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110131022A KR101817626B1 (ko) 2010-12-10 2011-12-08 플라즈마 용사 장치

Country Status (4)

Country Link
JP (1) JP5649942B2 (zh)
KR (1) KR101817626B1 (zh)
CN (1) CN102534458B (zh)
TW (1) TWI650182B (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5960229B2 (ja) * 2014-11-07 2016-08-02 株式会社フジエンジニアリング プラズマ溶射装置
CN109465526B (zh) * 2018-12-12 2021-04-06 江苏徐工工程机械研究院有限公司 一种小角度填丝等离子焊接装置及方法
KR102607741B1 (ko) * 2021-11-10 2023-11-29 한양대학교 에리카산학협력단 금속 와이어 및 금속 파우더를 이용한 금속 용사 장치

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008229705A (ja) * 2007-03-23 2008-10-02 Daihen Corp プラズマｇｍａ溶接トーチおよびプラズマｇｍａ溶接方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5913307B2 (ja) * 1976-05-19 1984-03-28 三菱電機株式会社 溶接方法
JP2766680B2 (ja) * 1989-08-04 1998-06-18 大阪電気株式会社 プラズマワイヤ溶射加工方法およびその装置
JPH0641039B2 (ja) * 1989-12-20 1994-06-01 特殊電極株式会社 プラズマアーク溶接法
JP3261518B2 (ja) * 1996-05-22 2002-03-04 島津工業有限会社 プラズマアークトーチ
JP2008229641A (ja) * 2007-03-19 2008-10-02 Daihen Corp プラズマミグ溶接方法
JP5512501B2 (ja) * 2010-12-10 2014-06-04 株式会社フジエンジニアリング プラズマ溶射装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008229705A (ja) * 2007-03-23 2008-10-02 Daihen Corp プラズマｇｍａ溶接トーチおよびプラズマｇｍａ溶接方法

Also Published As

Publication number Publication date
CN102534458A (zh) 2012-07-04
JP5649942B2 (ja) 2015-01-07
CN102534458B (zh) 2015-10-21
TW201233449A (en) 2012-08-16
KR20120065251A (ko) 2012-06-20
JP2012121009A (ja) 2012-06-28
TWI650182B (zh) 2019-02-11

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