KR101792771B1 - 기판처리장치 - Google Patents
기판처리장치 Download PDFInfo
- Publication number
- KR101792771B1 KR101792771B1 KR1020160075242A KR20160075242A KR101792771B1 KR 101792771 B1 KR101792771 B1 KR 101792771B1 KR 1020160075242 A KR1020160075242 A KR 1020160075242A KR 20160075242 A KR20160075242 A KR 20160075242A KR 101792771 B1 KR101792771 B1 KR 101792771B1
- Authority
- KR
- South Korea
- Prior art keywords
- magnetic force
- carrier
- substrate
- force generating
- substrate processing
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67709—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations using magnetic elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/6773—Conveying cassettes, containers or carriers
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020160075242A KR101792771B1 (ko) | 2016-06-16 | 2016-06-16 | 기판처리장치 |
PCT/KR2017/006340 WO2017217816A1 (ko) | 2016-06-16 | 2017-06-16 | 기판처리장치 |
CN201780037309.XA CN109690751B (zh) | 2016-06-16 | 2017-06-16 | 基板处理装置 |
TW106120109A TW201810500A (zh) | 2016-06-16 | 2017-06-16 | 基板處理裝置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020160075242A KR101792771B1 (ko) | 2016-06-16 | 2016-06-16 | 기판처리장치 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020170140239A Division KR20170142131A (ko) | 2017-10-26 | 2017-10-26 | 기판처리장치 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR101792771B1 true KR101792771B1 (ko) | 2017-11-20 |
Family
ID=60664177
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020160075242A KR101792771B1 (ko) | 2016-06-16 | 2016-06-16 | 기판처리장치 |
Country Status (4)
Country | Link |
---|---|
KR (1) | KR101792771B1 (zh) |
CN (1) | CN109690751B (zh) |
TW (1) | TW201810500A (zh) |
WO (1) | WO2017217816A1 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190132099A (ko) | 2018-05-18 | 2019-11-27 | 어플라이드 머티어리얼스, 인코포레이티드 | 마스크이송장치 |
KR20190132096A (ko) | 2018-05-18 | 2019-11-27 | 어플라이드 머티어리얼스, 인코포레이티드 | 기판이송장치 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020001751A1 (en) * | 2018-06-26 | 2020-01-02 | Applied Materials, Inc. | Magnetic levitation system for transporting a carrier, carrier for a magnetic levitation system, apparatus for transportation of a carrier, processing system for vertically processing a substrate, and method of switching a transport path of a carrier |
CN116490697A (zh) * | 2020-11-13 | 2023-07-25 | 应用材料公司 | 载体运输系统、磁稳定单元、载体和用于非接触式运输载体的方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05105232A (ja) * | 1991-10-17 | 1993-04-27 | Ebara Corp | 搬送台退避機構 |
JPH07117849A (ja) * | 1993-10-22 | 1995-05-09 | Ebara Corp | 磁気浮上搬送装置 |
JPH11195687A (ja) * | 1997-12-27 | 1999-07-21 | Nippon Seiko Kk | 基板搬送装置 |
KR101086191B1 (ko) * | 2004-03-24 | 2011-11-25 | 엘지디스플레이 주식회사 | 기판 이송장치 |
KR20060011586A (ko) * | 2004-07-30 | 2006-02-03 | 엘지.필립스 엘시디 주식회사 | 기판 이송 장치 및 스퍼터링 프로세스 장비 |
KR100707390B1 (ko) * | 2005-12-19 | 2007-04-13 | 주식회사 아바코 | 기판 이송장치 |
KR20080046761A (ko) * | 2006-11-23 | 2008-05-28 | 엘지디스플레이 주식회사 | 기판이송장치 및 이를 구비하는 박막 형성 장치 |
CN201369667Y (zh) * | 2009-03-12 | 2009-12-23 | 北京京东方光电科技有限公司 | 磁力传动设备 |
JP5562734B2 (ja) * | 2010-06-17 | 2014-07-30 | 住友重機械工業株式会社 | 搬送装置 |
JP5585689B2 (ja) * | 2013-06-13 | 2014-09-10 | 株式会社ニコン | 基板ホルダおよび貼り合せ装置 |
US20150034702A1 (en) * | 2013-08-01 | 2015-02-05 | Semigear Inc | Apparatus & method for treating substrate |
KR102192244B1 (ko) * | 2013-12-30 | 2020-12-17 | 삼성디스플레이 주식회사 | 기판 이송장치 |
-
2016
- 2016-06-16 KR KR1020160075242A patent/KR101792771B1/ko active IP Right Grant
-
2017
- 2017-06-16 WO PCT/KR2017/006340 patent/WO2017217816A1/ko active Application Filing
- 2017-06-16 TW TW106120109A patent/TW201810500A/zh unknown
- 2017-06-16 CN CN201780037309.XA patent/CN109690751B/zh active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190132099A (ko) | 2018-05-18 | 2019-11-27 | 어플라이드 머티어리얼스, 인코포레이티드 | 마스크이송장치 |
KR20190132096A (ko) | 2018-05-18 | 2019-11-27 | 어플라이드 머티어리얼스, 인코포레이티드 | 기판이송장치 |
Also Published As
Publication number | Publication date |
---|---|
TW201810500A (zh) | 2018-03-16 |
CN109690751B (zh) | 2023-04-28 |
WO2017217816A1 (ko) | 2017-12-21 |
CN109690751A (zh) | 2019-04-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101792771B1 (ko) | 기판처리장치 | |
US6206176B1 (en) | Substrate transfer shuttle having a magnetic drive | |
CN109154062B (zh) | 无接触对齐载具组件的方法、处理载具组件的基板的方法、和无接触对齐载具组件的设备 | |
KR102161185B1 (ko) | 기판의 진공 프로세싱을 위한 장치, 기판의 진공 프로세싱을 위한 시스템, 및 진공 챔버에서의 기판 캐리어 및 마스크 캐리어의 운송을 위한 방법 | |
KR20080014578A (ko) | 기판 이송 장치 | |
KR101271112B1 (ko) | 진공 처리 장치 | |
KR20150078173A (ko) | 기판 이송장치 | |
CN216435860U (zh) | 载体运输系统和真空沉积系统 | |
CN108966661B (zh) | 用于基板的真空处理的设备、用于具有有机材料的装置的制造的系统、和用以密封连接两个压力区域的开口的方法 | |
KR20170142131A (ko) | 기판처리장치 | |
KR101353527B1 (ko) | 기판 이송장치 | |
KR102123482B1 (ko) | 진공 시스템에서 사용하기 위한 캐리어, 진공 프로세싱을 위한 시스템, 및 기판의 진공 프로세싱을 위한 방법 | |
KR101753216B1 (ko) | 자력조절장치 | |
KR101715009B1 (ko) | 기판처리장치의 캐리어 | |
JPS60261302A (ja) | 高真空中の物品搬送装置 | |
CN217534225U (zh) | 用于引导载体的磁性引导件、用于运输载体的运输系统以及基板处理系统 | |
WO2020228939A1 (en) | Magnetic levitation system, base structure of a magnetic levitation system, and method of transporting a carrier | |
KR20190087985A (ko) | 진공 챔버 내에서의 캐리어의 이송을 위한 장치, 및 진공 챔버 내에서의 캐리어의 이송을 위한 방법 | |
KR102545664B1 (ko) | 캐리어를 운송하기 위한 장치, 기판을 수직으로 프로세싱하기 위한 프로세싱 시스템, 및 캐리어의 운송 경로를 스위칭하는 방법 | |
KR20180022520A (ko) | 기판처리장치의 캐리어 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A107 | Divisional application of patent | ||
GRNT | Written decision to grant |