KR101749844B1 - 공중합체, 그것을 함유하는 감광성 수지 조성물 및 수지막 - Google Patents

공중합체, 그것을 함유하는 감광성 수지 조성물 및 수지막 Download PDF

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Publication number
KR101749844B1
KR101749844B1 KR1020157016081A KR20157016081A KR101749844B1 KR 101749844 B1 KR101749844 B1 KR 101749844B1 KR 1020157016081 A KR1020157016081 A KR 1020157016081A KR 20157016081 A KR20157016081 A KR 20157016081A KR 101749844 B1 KR101749844 B1 KR 101749844B1
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KR
South Korea
Prior art keywords
copolymer
acrylate
meth
resin composition
photosensitive resin
Prior art date
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KR1020157016081A
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English (en)
Korean (ko)
Other versions
KR20150086336A (ko
Inventor
마사유키 고바야시
아츠시 우미노
유미 츠지무라
아츠오 엔도
Original Assignee
쇼와 덴코 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 쇼와 덴코 가부시키가이샤 filed Critical 쇼와 덴코 가부시키가이샤
Publication of KR20150086336A publication Critical patent/KR20150086336A/ko
Application granted granted Critical
Publication of KR101749844B1 publication Critical patent/KR101749844B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/20—Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F220/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C08F2220/325—
    • C08F2220/365—
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/07—Aldehydes; Ketones
    • C08K5/08—Quinones

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1020157016081A 2012-12-14 2013-10-10 공중합체, 그것을 함유하는 감광성 수지 조성물 및 수지막 KR101749844B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2012-273067 2012-12-14
JP2012273067 2012-12-14
PCT/JP2013/077643 WO2014091818A1 (ja) 2012-12-14 2013-10-10 共重合体、それを含有する感光性樹脂組成物及び樹脂膜

Publications (2)

Publication Number Publication Date
KR20150086336A KR20150086336A (ko) 2015-07-27
KR101749844B1 true KR101749844B1 (ko) 2017-06-21

Family

ID=50934117

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020157016081A KR101749844B1 (ko) 2012-12-14 2013-10-10 공중합체, 그것을 함유하는 감광성 수지 조성물 및 수지막

Country Status (5)

Country Link
JP (1) JP6258866B2 (zh)
KR (1) KR101749844B1 (zh)
CN (1) CN104870499B (zh)
TW (1) TWI570139B (zh)
WO (1) WO2014091818A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020132749A (ja) * 2019-02-19 2020-08-31 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ ポリマー、ポリマーを含んでなる半導体組成物、および半導体組成物を用いた膜の製造方法
WO2020240993A1 (ja) 2019-05-30 2020-12-03 昭和電工株式会社 樹脂組成物および樹脂膜

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007033518A (ja) * 2005-07-22 2007-02-08 Showa Highpolymer Co Ltd 感光性樹脂組成物
JP2012167190A (ja) * 2011-02-15 2012-09-06 Daicel Corp 共重合体

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006307129A (ja) * 2005-03-30 2006-11-09 Asahi Glass Co Ltd 撥油性組成物および撥油膜
CN101151319A (zh) * 2005-03-30 2008-03-26 旭硝子株式会社 拒油性组合物和拒油性膜
JP2007246585A (ja) * 2006-03-14 2007-09-27 Jsr Corp 側鎖不飽和重合体、感放射線性樹脂組成物および液晶表示素子用スペーサー
JP2009275068A (ja) * 2008-05-12 2009-11-26 Daicel Chem Ind Ltd 共重合体
TWI452444B (zh) * 2008-07-14 2014-09-11 Jsr Corp 光阻圖型不溶化樹脂組成物及使用其之光阻圖型形成方法
JP5636918B2 (ja) * 2010-11-30 2014-12-10 Jsr株式会社 感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法、及び表示素子
JP5950125B2 (ja) * 2011-07-07 2016-07-13 日産化学工業株式会社 樹脂組成物

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007033518A (ja) * 2005-07-22 2007-02-08 Showa Highpolymer Co Ltd 感光性樹脂組成物
JP2012167190A (ja) * 2011-02-15 2012-09-06 Daicel Corp 共重合体

Also Published As

Publication number Publication date
KR20150086336A (ko) 2015-07-27
TWI570139B (zh) 2017-02-11
JP6258866B2 (ja) 2018-01-10
JPWO2014091818A1 (ja) 2017-01-05
CN104870499B (zh) 2016-11-23
CN104870499A (zh) 2015-08-26
WO2014091818A1 (ja) 2014-06-19
TW201434863A (zh) 2014-09-16

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