KR101737495B1 - 단순화된 입자 이미터 및 상기 입자 이미터의 동작 방법 - Google Patents

단순화된 입자 이미터 및 상기 입자 이미터의 동작 방법 Download PDF

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Publication number
KR101737495B1
KR101737495B1 KR1020110106613A KR20110106613A KR101737495B1 KR 101737495 B1 KR101737495 B1 KR 101737495B1 KR 1020110106613 A KR1020110106613 A KR 1020110106613A KR 20110106613 A KR20110106613 A KR 20110106613A KR 101737495 B1 KR101737495 B1 KR 101737495B1
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KR
South Korea
Prior art keywords
emitter
charged particle
potential
particle beam
extractor
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KR1020110106613A
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Korean (ko)
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KR20120040676A (ko
Inventor
슈테판 라니오
위르겐 프로지엔
Original Assignee
아이씨티 인티그레이티드 써킷 테스팅 게젤샤프트 퓌어 할프라이터프뤼프테크닉 엠베하
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Publication of KR20120040676A publication Critical patent/KR20120040676A/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/063—Geometrical arrangement of electrodes for beam-forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06375—Arrangement of electrodes

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
KR1020110106613A 2010-10-19 2011-10-18 단순화된 입자 이미터 및 상기 입자 이미터의 동작 방법 Active KR101737495B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP10187979.9A EP2444990B1 (en) 2010-10-19 2010-10-19 Simplified particle emitter and method of operating thereof
EP10187979.9 2010-10-19

Publications (2)

Publication Number Publication Date
KR20120040676A KR20120040676A (ko) 2012-04-27
KR101737495B1 true KR101737495B1 (ko) 2017-05-18

Family

ID=43971540

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110106613A Active KR101737495B1 (ko) 2010-10-19 2011-10-18 단순화된 입자 이미터 및 상기 입자 이미터의 동작 방법

Country Status (5)

Country Link
US (2) US20120091359A1 (enExample)
EP (1) EP2444990B1 (enExample)
JP (1) JP5734809B2 (enExample)
KR (1) KR101737495B1 (enExample)
TW (1) TWI485740B (enExample)

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EP2672502B1 (en) * 2012-06-06 2017-08-09 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH electron beam optical system comprising high brightness electron gun with moving axis condenser lens
KR20140067578A (ko) * 2012-11-27 2014-06-05 삼성전자주식회사 전자빔 노광 장치
US8933414B2 (en) * 2013-02-27 2015-01-13 Fei Company Focused ion beam low kV enhancement
US9053893B2 (en) * 2013-03-14 2015-06-09 Schlumberger Technology Corporation Radiation generator having bi-polar electrodes
EP2779201A1 (en) * 2013-03-15 2014-09-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH High brightness electron gun, system using the same, and method of operating the same
EP2816585A1 (en) * 2013-06-17 2014-12-24 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam system and method of operating thereof
JP6943701B2 (ja) * 2017-09-15 2021-10-06 日本電子株式会社 冷陰極電界放出型電子銃の調整方法
EP4117016A1 (en) * 2021-07-05 2023-01-11 ASML Netherlands B.V. Charged particle detector
US11860143B2 (en) * 2021-12-21 2024-01-02 Dionex Corporation Method and system for self-regulating a suppressor
WO2024018570A1 (ja) * 2022-07-20 2024-01-25 株式会社日立ハイテク 荷電粒子源、荷電粒子銃、荷電粒子ビーム装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070215802A1 (en) 2006-03-20 2007-09-20 Alis Technology Corporation Systems and methods for a gas field ion microscope

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JPS60211753A (ja) * 1984-04-04 1985-10-24 Hitachi Ltd 電子線照射装置
JPH01260742A (ja) * 1988-04-11 1989-10-18 Mitsubishi Electric Corp 荷電ビーム銃
JPH02192649A (ja) * 1989-01-20 1990-07-30 Toshiba Corp リニア電子銃装置
JPH03141543A (ja) * 1989-10-27 1991-06-17 Hitachi Ltd 電界放出形電子銃
JPH11185647A (ja) * 1997-12-22 1999-07-09 Nec Corp イオン源装置
US6171165B1 (en) * 1998-11-19 2001-01-09 Etec Systems, Inc. Precision alignment of microcolumn tip to a micron-size extractor aperture
US6331713B1 (en) * 1999-10-06 2001-12-18 Applied Materials, Inc. Movable ion source assembly
US6797953B2 (en) * 2001-02-23 2004-09-28 Fei Company Electron beam system using multiple electron beams
DE60308482T2 (de) * 2003-04-28 2007-06-21 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Vorrichtung und Verfahren zur Untersuchung einer Probe eines Spezimen mittels eines Elektronenstrahls
EP1515359A1 (en) * 2003-09-12 2005-03-16 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Chamber with low electron stimulated desorption
US7368727B2 (en) * 2003-10-16 2008-05-06 Alis Technology Corporation Atomic level ion source and method of manufacture and operation
US7511279B2 (en) * 2003-10-16 2009-03-31 Alis Corporation Ion sources, systems and methods
US7554096B2 (en) * 2003-10-16 2009-06-30 Alis Corporation Ion sources, systems and methods
EP1779403A4 (en) * 2004-07-05 2009-05-06 Cebt Co Ltd METHOD FOR CONTROLLING AN ELECTRON BEAM IN A MULTIPLE-MICROSULE AND MULTIPLE MICROSULE THEREWITH
US7067807B2 (en) * 2004-09-08 2006-06-27 Applied Materials, Israel, Ltd. Charged particle beam column and method of its operation
JP2006324119A (ja) * 2005-05-19 2006-11-30 Hitachi Ltd 電子銃
EP1993119B1 (en) * 2005-09-05 2017-11-08 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam emitting device and method for operating a charged particle beam emitting device
WO2007067296A2 (en) * 2005-12-02 2007-06-14 Alis Corporation Ion sources, systems and methods
US7465922B1 (en) * 2006-07-12 2008-12-16 Kla-Tencor Technologies Corporation Accelerating electrostatic lens gun for high-speed electron beam inspection
JP4920385B2 (ja) * 2006-11-29 2012-04-18 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置、走査型電子顕微鏡、及び試料観察方法
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Also Published As

Publication number Publication date
TWI485740B (zh) 2015-05-21
US20180254165A1 (en) 2018-09-06
JP5734809B2 (ja) 2015-06-17
KR20120040676A (ko) 2012-04-27
US10699867B2 (en) 2020-06-30
EP2444990A1 (en) 2012-04-25
EP2444990B1 (en) 2014-06-25
JP2012089506A (ja) 2012-05-10
US20120091359A1 (en) 2012-04-19
TW201230128A (en) 2012-07-16

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