KR101734821B1 - 전자 디바이스 제조시 기판들을 프로세싱하도록 적응된 프로세싱 시스템들, 장치, 및 방법들 - Google Patents

전자 디바이스 제조시 기판들을 프로세싱하도록 적응된 프로세싱 시스템들, 장치, 및 방법들 Download PDF

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KR101734821B1
KR101734821B1 KR1020157029256A KR20157029256A KR101734821B1 KR 101734821 B1 KR101734821 B1 KR 101734821B1 KR 1020157029256 A KR1020157029256 A KR 1020157029256A KR 20157029256 A KR20157029256 A KR 20157029256A KR 101734821 B1 KR101734821 B1 KR 101734821B1
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chamber
electronic device
main frame
processing system
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KR20150132416A (ko
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스티브 에스. 홍캄
폴 비. 로이터
에릭 에이. 잉글하르트
가네쉬 발라수브라마니안
싱롱 첸
주안카를로스 로카-알바레즈
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어플라이드 머티어리얼스, 인코포레이티드
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    • H01L21/67184—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0451—Apparatus for manufacturing or treating in a plurality of work-stations
    • H10P72/0461—Apparatus for manufacturing or treating in a plurality of work-stations characterised by the presence of two or more transfer chambers
    • H01L21/6719—
    • H01L21/67196—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/86187—Plural tanks or compartments connected for serial flow

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
KR1020157029256A 2013-03-15 2014-03-10 전자 디바이스 제조시 기판들을 프로세싱하도록 적응된 프로세싱 시스템들, 장치, 및 방법들 Active KR101734821B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361788825P 2013-03-15 2013-03-15
US61/788,825 2013-03-15
PCT/US2014/022656 WO2014150234A1 (en) 2013-03-15 2014-03-10 Processing systems, apparatus, and methods adapted to process substrates in electronic device manufacturing

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Publication Number Publication Date
KR20150132416A KR20150132416A (ko) 2015-11-25
KR101734821B1 true KR101734821B1 (ko) 2017-05-12

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US (1) US9524889B2 (https=)
JP (1) JP6178488B2 (https=)
KR (1) KR101734821B1 (https=)
CN (1) CN105051861B (https=)
TW (1) TWI623055B (https=)
WO (1) WO2014150234A1 (https=)

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JP6466955B2 (ja) 2013-11-04 2019-02-06 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 側面数増強対応移送チャンバ、半導体デバイスの製造処理ツール及び処理方法
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US20140263165A1 (en) 2014-09-18
JP6178488B2 (ja) 2017-08-09
TW201442138A (zh) 2014-11-01
CN105051861A (zh) 2015-11-11
CN105051861B (zh) 2017-11-14
KR20150132416A (ko) 2015-11-25
WO2014150234A1 (en) 2014-09-25
JP2016512925A (ja) 2016-05-09
US9524889B2 (en) 2016-12-20
TWI623055B (zh) 2018-05-01

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