KR101685732B1 - 기판 및 초전도 선재의 제조 방법 - Google Patents

기판 및 초전도 선재의 제조 방법 Download PDF

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Publication number
KR101685732B1
KR101685732B1 KR1020127003395A KR20127003395A KR101685732B1 KR 101685732 B1 KR101685732 B1 KR 101685732B1 KR 1020127003395 A KR1020127003395 A KR 1020127003395A KR 20127003395 A KR20127003395 A KR 20127003395A KR 101685732 B1 KR101685732 B1 KR 101685732B1
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South Korea
Prior art keywords
layer
substrate
nickel
nickel layer
superconducting
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Korean (ko)
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KR20120051010A (ko
Inventor
하지메 오타
마사야 고니시
다카시 야마구치
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스미토모 덴키 고교 가부시키가이샤
도요 고한 가부시키가이샤
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Publication of KR20120051010A publication Critical patent/KR20120051010A/ko
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B12/00Superconductive or hyperconductive conductors, cables, or transmission lines
    • H01B12/02Superconductive or hyperconductive conductors, cables, or transmission lines characterised by their form
    • H01B12/06Films or wires on bases or cores
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • H01B1/026Alloys based on copper
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00Apparatus or processes specially adapted for manufacturing conductors or cables
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment
    • H10N60/0268Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0576Processes for depositing or forming copper oxide superconductor layers characterised by the substrate
    • H10N60/0632Intermediate layers, e.g. for growth control
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E40/00Technologies for an efficient electrical power generation, transmission or distribution
    • Y02E40/60Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
KR1020127003395A 2009-07-10 2010-06-15 기판 및 초전도 선재의 제조 방법 Expired - Fee Related KR101685732B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2009-163513 2009-07-10
JP2009163513A JP5096422B2 (ja) 2009-07-10 2009-07-10 基板および超電導線材の製造方法
PCT/JP2010/060102 WO2011004684A1 (ja) 2009-07-10 2010-06-15 基板および超電導線材の製造方法

Publications (2)

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KR20120051010A KR20120051010A (ko) 2012-05-21
KR101685732B1 true KR101685732B1 (ko) 2016-12-12

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KR1020127003395A Expired - Fee Related KR101685732B1 (ko) 2009-07-10 2010-06-15 기판 및 초전도 선재의 제조 방법

Country Status (7)

Country Link
US (1) US9306147B2 (enExample)
EP (1) EP2453446A4 (enExample)
JP (1) JP5096422B2 (enExample)
KR (1) KR101685732B1 (enExample)
CN (1) CN102473488B (enExample)
IN (1) IN2012DN00528A (enExample)
WO (1) WO2011004684A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012132128A1 (ja) * 2011-03-28 2012-10-04 株式会社村田製作所 検出デバイスおよびその製造方法、センサ電極、ならびに、空隙配置構造体およびそれを用いた検出方法
JP2013089354A (ja) * 2011-10-14 2013-05-13 Sumitomo Electric Ind Ltd 超電導薄膜線材用の中間層付基材とその製造方法、および超電導薄膜線材
US10174420B2 (en) 2013-09-04 2019-01-08 Toyo Kohan Co., Ltd. Method for forming oxide layer, laminated substrate for epitaxial growth, and method for producing the same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006127847A (ja) 2004-10-27 2006-05-18 Sumitomo Electric Ind Ltd 膜形成用配向基板および超電導線材
JP2007188756A (ja) 2006-01-13 2007-07-26 Internatl Superconductivity Technology Center 希土類系テープ状酸化物超電導体
US20080261072A1 (en) 2007-04-17 2008-10-23 Naoji Kashima Clad textured metal substrate for forming epitaxial thin film thereon and method for manufacturing the same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1364321B (zh) 1999-07-23 2010-06-02 美国超导体公司 多层制品及其制造方法
KR100352976B1 (ko) * 1999-12-24 2002-09-18 한국기계연구원 전기도금법에 의한 2축 집합조직을 갖는 니켈 도금층 및 그 제조방법
GB0010494D0 (en) * 2000-04-28 2000-06-14 Isis Innovation Textured metal article
US6500568B1 (en) * 2001-06-06 2002-12-31 3M Innovative Properties Company Biaxially textured metal substrate with palladium layer
JP2005516882A (ja) 2001-07-31 2005-06-09 アメリカン スーパーコンダクター コーポレイション 超電導体の作製方法及び反応装置
JP2005001935A (ja) 2003-06-11 2005-01-06 Sumitomo Electric Ind Ltd 酸化物薄膜の製造方法
US7816303B2 (en) 2004-10-01 2010-10-19 American Superconductor Corporation Architecture for high temperature superconductor wire
KR101441139B1 (ko) 2005-07-29 2014-09-17 아메리칸 수퍼컨덕터 코포레이션 고온 초전도 와이어 및 코일
JP5156188B2 (ja) * 2005-12-14 2013-03-06 公益財団法人国際超電導産業技術研究センター 厚膜テープ状re系(123)超電導体の製造方法
US7674751B2 (en) * 2006-01-10 2010-03-09 American Superconductor Corporation Fabrication of sealed high temperature superconductor wires
JP5324763B2 (ja) * 2007-08-21 2013-10-23 中部電力株式会社 エピタキシャル膜形成用配向基板及びエピタキシャル膜形成用配向基板の表面改質方法
JP5400416B2 (ja) * 2009-02-20 2014-01-29 中部電力株式会社 超電導線材

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006127847A (ja) 2004-10-27 2006-05-18 Sumitomo Electric Ind Ltd 膜形成用配向基板および超電導線材
JP2007188756A (ja) 2006-01-13 2007-07-26 Internatl Superconductivity Technology Center 希土類系テープ状酸化物超電導体
US20080261072A1 (en) 2007-04-17 2008-10-23 Naoji Kashima Clad textured metal substrate for forming epitaxial thin film thereon and method for manufacturing the same

Also Published As

Publication number Publication date
CN102473488B (zh) 2015-05-06
US20120108439A1 (en) 2012-05-03
KR20120051010A (ko) 2012-05-21
US9306147B2 (en) 2016-04-05
JP2011018598A (ja) 2011-01-27
EP2453446A4 (en) 2015-04-22
EP2453446A1 (en) 2012-05-16
IN2012DN00528A (enExample) 2015-08-21
JP5096422B2 (ja) 2012-12-12
WO2011004684A1 (ja) 2011-01-13
CN102473488A (zh) 2012-05-23

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