IN2012DN00528A - - Google Patents

Download PDF

Info

Publication number
IN2012DN00528A
IN2012DN00528A IN528DEN2012A IN2012DN00528A IN 2012DN00528 A IN2012DN00528 A IN 2012DN00528A IN 528DEN2012 A IN528DEN2012 A IN 528DEN2012A IN 2012DN00528 A IN2012DN00528 A IN 2012DN00528A
Authority
IN
India
Prior art keywords
substrate
nickel layer
producing
layer
subjecting
Prior art date
Application number
Inventor
Ota Hajime
Konishi Masaya
Yamaguchi Takashi
Original Assignee
Sumitomo Electric Industries
Toyo Kohan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries, Toyo Kohan Co Ltd filed Critical Sumitomo Electric Industries
Publication of IN2012DN00528A publication Critical patent/IN2012DN00528A/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B12/00Superconductive or hyperconductive conductors, cables, or transmission lines
    • H01B12/02Superconductive or hyperconductive conductors, cables, or transmission lines characterised by their form
    • H01B12/06Films or wires on bases or cores
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • H01B1/026Alloys based on copper
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00Apparatus or processes specially adapted for manufacturing conductors or cables
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment
    • H10N60/0268Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0576Processes for depositing or forming copper oxide superconductor layers characterised by the substrate
    • H10N60/0632Intermediate layers, e.g. for growth control
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E40/00Technologies for an efficient electrical power generation, transmission or distribution
    • Y02E40/60Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)

Abstract

Method of Producing Substrate and Superconducting Wire The present invention relates to a method of producing a substrate, including the steps of preparing a substrate having a nickel layer (3) formed on a copper layer (2) through plating, subjecting the nickel layer (3) to thermal treatment at 800-1000°C, and epitaxial-growing an intermediate layer (4) on the nickel layer (3), after the step of subjecting the nickel layer (3) to thermal treatment. According to the present invention, there can be provided a substrate that allows the orientation and flatness at the surface of a nickel layer (3) to be improved, and a method of producing the substrate.
IN528DEN2012 2009-07-10 2010-10-07 IN2012DN00528A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009163513A JP5096422B2 (en) 2009-07-10 2009-07-10 Substrate and superconducting wire manufacturing method
PCT/JP2010/060102 WO2011004684A1 (en) 2009-07-10 2010-06-15 Method for producing substrate and superconductive wire rod

Publications (1)

Publication Number Publication Date
IN2012DN00528A true IN2012DN00528A (en) 2015-08-21

Family

ID=43429108

Family Applications (1)

Application Number Title Priority Date Filing Date
IN528DEN2012 IN2012DN00528A (en) 2009-07-10 2010-10-07

Country Status (7)

Country Link
US (1) US9306147B2 (en)
EP (1) EP2453446A4 (en)
JP (1) JP5096422B2 (en)
KR (1) KR101685732B1 (en)
CN (1) CN102473488B (en)
IN (1) IN2012DN00528A (en)
WO (1) WO2011004684A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012132128A1 (en) * 2011-03-28 2012-10-04 株式会社村田製作所 Detection device, method for producing same, sensor electrode, gap-disposed structure, and detection method using same
JP2013089354A (en) * 2011-10-14 2013-05-13 Sumitomo Electric Ind Ltd Intermediate layer-formed base material for superconducting thin film wiring material, its manufacturing method and superconducting thin film wiring material
US10174420B2 (en) 2013-09-04 2019-01-08 Toyo Kohan Co., Ltd. Method for forming oxide layer, laminated substrate for epitaxial growth, and method for producing the same

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU1325401A (en) * 1999-07-23 2001-02-13 American Superconductor Corporation Enhanced purity oxide layer formation
KR100352976B1 (en) * 1999-12-24 2002-09-18 한국기계연구원 Electrical Plating Process and Device for Ni Plate Layer Having Biaxial Texture
GB0010494D0 (en) * 2000-04-28 2000-06-14 Isis Innovation Textured metal article
US6500568B1 (en) * 2001-06-06 2002-12-31 3M Innovative Properties Company Biaxially textured metal substrate with palladium layer
EP1419538B1 (en) 2001-07-31 2007-03-07 American Superconductor Corporation Methods and reactors for forming superconductor layers
JP2005001935A (en) 2003-06-11 2005-01-06 Sumitomo Electric Ind Ltd Method for producing oxide thin film
US7816303B2 (en) 2004-10-01 2010-10-19 American Superconductor Corporation Architecture for high temperature superconductor wire
JP5123462B2 (en) * 2004-10-27 2013-01-23 住友電気工業株式会社 Film-forming alignment substrate, superconducting wire, and method for manufacturing film-forming alignment substrate
US7781376B2 (en) 2005-07-29 2010-08-24 American Superconductor Corporation High temperature superconducting wires and coils
JP5156188B2 (en) 2005-12-14 2013-03-06 公益財団法人国際超電導産業技術研究センター Method for manufacturing thick film tape-shaped RE (123) superconductor
US7674751B2 (en) * 2006-01-10 2010-03-09 American Superconductor Corporation Fabrication of sealed high temperature superconductor wires
JP4602911B2 (en) * 2006-01-13 2010-12-22 財団法人国際超電導産業技術研究センター Rare earth tape oxide superconductor
JP5074083B2 (en) 2007-04-17 2012-11-14 中部電力株式会社 Clad-oriented metal substrate for epitaxial thin film formation and manufacturing method thereof
JP5324763B2 (en) * 2007-08-21 2013-10-23 中部電力株式会社 Alignment substrate for epitaxial film formation and surface modification method for alignment substrate for epitaxial film formation
JP5400416B2 (en) * 2009-02-20 2014-01-29 中部電力株式会社 Superconducting wire

Also Published As

Publication number Publication date
WO2011004684A1 (en) 2011-01-13
KR101685732B1 (en) 2016-12-12
EP2453446A1 (en) 2012-05-16
JP5096422B2 (en) 2012-12-12
EP2453446A4 (en) 2015-04-22
JP2011018598A (en) 2011-01-27
KR20120051010A (en) 2012-05-21
CN102473488A (en) 2012-05-23
CN102473488B (en) 2015-05-06
US20120108439A1 (en) 2012-05-03
US9306147B2 (en) 2016-04-05

Similar Documents

Publication Publication Date Title
WO2010104274A3 (en) Lead frame and method for manufacturing the same
EP2515392A3 (en) Process of fabricating a slip ring component
PH12015502834A1 (en) Method for producing plated material, and plated material
TW200711181A (en) Light-emitting device and manufacturing method thereof
TW200702494A (en) Surface treatment method for copper and copper
IL217536A (en) Composition for copper electroplating comprising a source of copper ions and at least one additive, its use for electrodeposition and a process for depositing copper layer on a substrate
TW200746199A (en) Laminated electronic component and method for manufacturing the same
TW200726336A (en) Ceramic substrate, electronic device, and manufacturing method of ceramic substrate
EP2357656A4 (en) PROCESS FOR PRODUCING METAL LAMINATED SUBSTRATE FOR OXIDE SUPERCONDUCTING CIRCUIT AND OXIDE SUPERCONDUCTING CIRCUIT USING THE SUBSTRATE
MX346351B (en) Method for producing a pane having an electrical connection element.
WO2008084524A1 (en) Process for producing semiconductor device and apparatus for semiconductor device production
MY140407A (en) Leadframe comprising tin plating or an intermetallic layer formed therefrom
GB2486116A (en) Activation of graphene buffer layers on silicon carbide
JP2013187313A5 (en)
WO2010143895A3 (en) Semiconductor substrate, semiconductor device, and manufacturing methods thereof
EP2626891A3 (en) Activation process to improve metal adhesion
EP2442367A3 (en) Improved method for forming metal contacts
TW201130046A (en) Semiconductor device and process for production of semiconductor device
MY154122A (en) Electronic circuit, method for forming same, and copper clad laminate for forming electronic circuit
IN2012DN00528A (en)
WO2012143460A3 (en) Method for manufacturing a solar cell
WO2012082956A3 (en) Methods for metal plating and related devices
IN2012DN00532A (en)
SG171520A1 (en) Semiconductor device and method of forming an inductor on polymer matrix composite substrate
WO2010098624A3 (en) Substrate having uneven portion thereon, and method for manufacturing solar cell using the same