KR101682721B1 - 도포, 현상 장치 - Google Patents

도포, 현상 장치 Download PDF

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Publication number
KR101682721B1
KR101682721B1 KR1020100069751A KR20100069751A KR101682721B1 KR 101682721 B1 KR101682721 B1 KR 101682721B1 KR 1020100069751 A KR1020100069751 A KR 1020100069751A KR 20100069751 A KR20100069751 A KR 20100069751A KR 101682721 B1 KR101682721 B1 KR 101682721B1
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KR
South Korea
Prior art keywords
moving
substrate
module
carrier
feeding
Prior art date
Application number
KR1020100069751A
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English (en)
Korean (ko)
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KR20110009031A (ko
Inventor
가쯔히로 모리까와
지까라 노부꾸니
스구루 에노끼다
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20110009031A publication Critical patent/KR20110009031A/ko
Application granted granted Critical
Publication of KR101682721B1 publication Critical patent/KR101682721B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
KR1020100069751A 2009-07-21 2010-07-20 도포, 현상 장치 KR101682721B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2009-170373 2009-07-21
JP2009170373A JP5104821B2 (ja) 2009-07-21 2009-07-21 塗布、現像装置

Publications (2)

Publication Number Publication Date
KR20110009031A KR20110009031A (ko) 2011-01-27
KR101682721B1 true KR101682721B1 (ko) 2016-12-05

Family

ID=43614945

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020100069751A KR101682721B1 (ko) 2009-07-21 2010-07-20 도포, 현상 장치

Country Status (2)

Country Link
JP (1) JP5104821B2 (ja)
KR (1) KR101682721B1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWM493915U (zh) * 2014-09-24 2015-01-21 Mei Shuai Cosmetics Co Ltd 化妝盒

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006203175A (ja) 2004-12-22 2006-08-03 Tokyo Electron Ltd 真空処理装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61109995A (ja) * 1984-11-05 1986-05-28 株式会社　栗本鐵工所 分岐管の接続装置
JPH04177716A (ja) * 1990-11-13 1992-06-24 Nikon Corp 露光装置
JP4287938B2 (ja) * 1999-02-10 2009-07-01 株式会社アマダ 移動装置
JP2005133811A (ja) * 2003-10-30 2005-05-26 Sumitomo (Shi) Construction Machinery Manufacturing Co Ltd 建設機械の自動給脂装置
JP4654120B2 (ja) * 2005-12-08 2011-03-16 東京エレクトロン株式会社 塗布、現像装置及び塗布、現像方法並びにコンピュータプログラム
JP4797662B2 (ja) * 2006-02-03 2011-10-19 東京エレクトロン株式会社 塗布、現像方法、塗布、現像装置及び記憶媒体
JP4471944B2 (ja) * 2006-02-24 2010-06-02 東京エレクトロン株式会社 塗布装置
JP4853374B2 (ja) * 2007-04-27 2012-01-11 東京エレクトロン株式会社 塗布、現像装置及びその方法並びに記憶媒体

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006203175A (ja) 2004-12-22 2006-08-03 Tokyo Electron Ltd 真空処理装置

Also Published As

Publication number Publication date
JP5104821B2 (ja) 2012-12-19
JP2011029230A (ja) 2011-02-10
KR20110009031A (ko) 2011-01-27

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