KR101613562B1 - 플라즈마 증발장치 - Google Patents
플라즈마 증발장치 Download PDFInfo
- Publication number
- KR101613562B1 KR101613562B1 KR1020140046564A KR20140046564A KR101613562B1 KR 101613562 B1 KR101613562 B1 KR 101613562B1 KR 1020140046564 A KR1020140046564 A KR 1020140046564A KR 20140046564 A KR20140046564 A KR 20140046564A KR 101613562 B1 KR101613562 B1 KR 101613562B1
- Authority
- KR
- South Korea
- Prior art keywords
- plasma
- axis direction
- guns
- film forming
- gun
- Prior art date
Links
Images
Landscapes
- Physical Vapour Deposition (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2013-112949 | 2013-05-29 | ||
JP2013112949A JP5989601B2 (ja) | 2013-05-29 | 2013-05-29 | プラズマ蒸発装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20140140480A KR20140140480A (ko) | 2014-12-09 |
KR101613562B1 true KR101613562B1 (ko) | 2016-04-19 |
Family
ID=52094982
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020140046564A KR101613562B1 (ko) | 2013-05-29 | 2014-04-18 | 플라즈마 증발장치 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5989601B2 (ja) |
KR (1) | KR101613562B1 (ja) |
CN (1) | CN104213081B (ja) |
TW (1) | TWI500790B (ja) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000034560A (ja) | 1998-07-14 | 2000-02-02 | Nippon Sheet Glass Co Ltd | イオンプレーティング装置 |
JP2008274334A (ja) | 2007-04-26 | 2008-11-13 | Sumitomo Heavy Ind Ltd | 反射防止膜成膜装置及び反射防止膜製造方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05295526A (ja) * | 1992-04-22 | 1993-11-09 | A G Technol Kk | 蒸着方法および蒸着装置 |
DE4304613C1 (de) * | 1993-02-16 | 1994-05-26 | Fraunhofer Ges Forschung | Verfahren zur Stabilisierung der Plasmaerzeugung mittels Elektronenstrahlverdampfer |
US5677012A (en) * | 1994-12-28 | 1997-10-14 | Sumitomo Heavy Industries, Ltd. | Plasma processing method and plasma processing apparatus |
JP2946404B2 (ja) * | 1996-03-25 | 1999-09-06 | 住友重機械工業株式会社 | イオンプレーティング装置 |
JP3275166B2 (ja) * | 1997-02-28 | 2002-04-15 | 住友重機械工業株式会社 | プラズマビームの偏り修正機構を備えた真空成膜装置 |
JP3564677B2 (ja) * | 1997-06-20 | 2004-09-15 | 住友重機械工業株式会社 | 金属酸化物の被覆方法 |
CN1149303C (zh) * | 1997-09-26 | 2004-05-12 | 住友重机械工业株式会社 | 离子喷镀装置 |
JP3841962B2 (ja) * | 1998-10-30 | 2006-11-08 | 大日本印刷株式会社 | 圧力勾配型ホローカソード型イオンプレーティング装置 |
JP2003272897A (ja) * | 2002-03-14 | 2003-09-26 | Tohoku Ricoh Co Ltd | 薄膜形成装置および薄膜形成方法 |
TWI254082B (en) * | 2004-09-21 | 2006-05-01 | Chunghwa Picture Tubes Ltd | Fabrication method of front substrate of plasma display, evaporation process and evaporation apparatus |
US8067711B2 (en) * | 2005-07-14 | 2011-11-29 | United Technologies Corporation | Deposition apparatus and methods |
TW201002841A (en) * | 2008-06-30 | 2010-01-16 | Shincron Co Ltd | Evaporation device and method of producing thin-film component |
WO2010001717A1 (ja) * | 2008-06-30 | 2010-01-07 | 株式会社シンクロン | 蒸着装置及び薄膜デバイスの製造方法 |
-
2013
- 2013-05-29 JP JP2013112949A patent/JP5989601B2/ja active Active
-
2014
- 2014-04-15 TW TW103113671A patent/TWI500790B/zh active
- 2014-04-18 KR KR1020140046564A patent/KR101613562B1/ko active IP Right Grant
- 2014-04-21 CN CN201410160194.1A patent/CN104213081B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000034560A (ja) | 1998-07-14 | 2000-02-02 | Nippon Sheet Glass Co Ltd | イオンプレーティング装置 |
JP2008274334A (ja) | 2007-04-26 | 2008-11-13 | Sumitomo Heavy Ind Ltd | 反射防止膜成膜装置及び反射防止膜製造方法 |
Also Published As
Publication number | Publication date |
---|---|
TWI500790B (zh) | 2015-09-21 |
TW201444996A (zh) | 2014-12-01 |
KR20140140480A (ko) | 2014-12-09 |
JP2014231629A (ja) | 2014-12-11 |
CN104213081A (zh) | 2014-12-17 |
JP5989601B2 (ja) | 2016-09-07 |
CN104213081B (zh) | 2017-05-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101773889B1 (ko) | 성막장치 | |
KR101590090B1 (ko) | 성막장치 | |
KR101858155B1 (ko) | 성막장치 | |
KR101613562B1 (ko) | 플라즈마 증발장치 | |
KR101773890B1 (ko) | 성막장치 | |
KR20190119503A (ko) | 이온원, 이온 빔 조사 장치 및 이온원의 운전 방법 | |
KR101641169B1 (ko) | 성막장치 | |
JP7229015B2 (ja) | 成膜装置、成膜方法、および電子デバイスの製造方法 | |
KR102215483B1 (ko) | 진공 챔버에서 캐리어를 핸들링하기 위한 장치, 진공 증착 시스템, 및 진공 챔버에서 캐리어를 핸들링하는 방법 | |
JP5077599B2 (ja) | ビーム電流密度分布の調整目標設定方法及びイオン注入装置 | |
CN109891618B (zh) | 用于在真空腔室中成像的设备、用于真空处理基板的系统、和用于使真空腔室中的至少一个对象成像的方法 | |
JP2015101771A (ja) | 成膜装置 | |
JP2007154229A (ja) | 成膜装置 | |
JP6087212B2 (ja) | 蒸発装置 | |
JP2014205873A (ja) | 成膜装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20190328 Year of fee payment: 4 |