KR101613562B1 - 플라즈마 증발장치 - Google Patents

플라즈마 증발장치 Download PDF

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Publication number
KR101613562B1
KR101613562B1 KR1020140046564A KR20140046564A KR101613562B1 KR 101613562 B1 KR101613562 B1 KR 101613562B1 KR 1020140046564 A KR1020140046564 A KR 1020140046564A KR 20140046564 A KR20140046564 A KR 20140046564A KR 101613562 B1 KR101613562 B1 KR 101613562B1
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KR
South Korea
Prior art keywords
plasma
axis direction
guns
film forming
gun
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KR1020140046564A
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English (en)
Korean (ko)
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KR20140140480A (ko
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마사루 미야시타
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스미도모쥬기가이고교 가부시키가이샤
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Publication of KR20140140480A publication Critical patent/KR20140140480A/ko
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  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
KR1020140046564A 2013-05-29 2014-04-18 플라즈마 증발장치 KR101613562B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2013-112949 2013-05-29
JP2013112949A JP5989601B2 (ja) 2013-05-29 2013-05-29 プラズマ蒸発装置

Publications (2)

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KR20140140480A KR20140140480A (ko) 2014-12-09
KR101613562B1 true KR101613562B1 (ko) 2016-04-19

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KR1020140046564A KR101613562B1 (ko) 2013-05-29 2014-04-18 플라즈마 증발장치

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JP (1) JP5989601B2 (ja)
KR (1) KR101613562B1 (ja)
CN (1) CN104213081B (ja)
TW (1) TWI500790B (ja)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000034560A (ja) 1998-07-14 2000-02-02 Nippon Sheet Glass Co Ltd イオンプレーティング装置
JP2008274334A (ja) 2007-04-26 2008-11-13 Sumitomo Heavy Ind Ltd 反射防止膜成膜装置及び反射防止膜製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05295526A (ja) * 1992-04-22 1993-11-09 A G Technol Kk 蒸着方法および蒸着装置
DE4304613C1 (de) * 1993-02-16 1994-05-26 Fraunhofer Ges Forschung Verfahren zur Stabilisierung der Plasmaerzeugung mittels Elektronenstrahlverdampfer
US5677012A (en) * 1994-12-28 1997-10-14 Sumitomo Heavy Industries, Ltd. Plasma processing method and plasma processing apparatus
JP2946404B2 (ja) * 1996-03-25 1999-09-06 住友重機械工業株式会社 イオンプレーティング装置
JP3275166B2 (ja) * 1997-02-28 2002-04-15 住友重機械工業株式会社 プラズマビームの偏り修正機構を備えた真空成膜装置
JP3564677B2 (ja) * 1997-06-20 2004-09-15 住友重機械工業株式会社 金属酸化物の被覆方法
CN1149303C (zh) * 1997-09-26 2004-05-12 住友重机械工业株式会社 离子喷镀装置
JP3841962B2 (ja) * 1998-10-30 2006-11-08 大日本印刷株式会社 圧力勾配型ホローカソード型イオンプレーティング装置
JP2003272897A (ja) * 2002-03-14 2003-09-26 Tohoku Ricoh Co Ltd 薄膜形成装置および薄膜形成方法
TWI254082B (en) * 2004-09-21 2006-05-01 Chunghwa Picture Tubes Ltd Fabrication method of front substrate of plasma display, evaporation process and evaporation apparatus
US8067711B2 (en) * 2005-07-14 2011-11-29 United Technologies Corporation Deposition apparatus and methods
TW201002841A (en) * 2008-06-30 2010-01-16 Shincron Co Ltd Evaporation device and method of producing thin-film component
WO2010001717A1 (ja) * 2008-06-30 2010-01-07 株式会社シンクロン 蒸着装置及び薄膜デバイスの製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000034560A (ja) 1998-07-14 2000-02-02 Nippon Sheet Glass Co Ltd イオンプレーティング装置
JP2008274334A (ja) 2007-04-26 2008-11-13 Sumitomo Heavy Ind Ltd 反射防止膜成膜装置及び反射防止膜製造方法

Also Published As

Publication number Publication date
TWI500790B (zh) 2015-09-21
TW201444996A (zh) 2014-12-01
KR20140140480A (ko) 2014-12-09
JP2014231629A (ja) 2014-12-11
CN104213081A (zh) 2014-12-17
JP5989601B2 (ja) 2016-09-07
CN104213081B (zh) 2017-05-24

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