TWI500790B - Plasma evaporator - Google Patents
Plasma evaporator Download PDFInfo
- Publication number
- TWI500790B TWI500790B TW103113671A TW103113671A TWI500790B TW I500790 B TWI500790 B TW I500790B TW 103113671 A TW103113671 A TW 103113671A TW 103113671 A TW103113671 A TW 103113671A TW I500790 B TWI500790 B TW I500790B
- Authority
- TW
- Taiwan
- Prior art keywords
- plasma
- film forming
- guns
- gun
- evaporation
- Prior art date
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- Physical Vapour Deposition (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013112949A JP5989601B2 (ja) | 2013-05-29 | 2013-05-29 | プラズマ蒸発装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201444996A TW201444996A (zh) | 2014-12-01 |
TWI500790B true TWI500790B (zh) | 2015-09-21 |
Family
ID=52094982
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW103113671A TWI500790B (zh) | 2013-05-29 | 2014-04-15 | Plasma evaporator |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5989601B2 (ja) |
KR (1) | KR101613562B1 (ja) |
CN (1) | CN104213081B (ja) |
TW (1) | TWI500790B (ja) |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0685003B1 (de) * | 1993-02-16 | 1996-10-16 | Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. | Verfahren zur stabilisierung der plasmaerzeugung mittels elektronenstrahlverdampfer |
JPH09256147A (ja) * | 1996-03-25 | 1997-09-30 | Sumitomo Heavy Ind Ltd | イオンプレーティング装置 |
US20060062901A1 (en) * | 2004-09-21 | 2006-03-23 | Kuo-Ching Chou | Fabrication method of front substrate of plasma display, evaporation process and evaporation apparatus |
TW200702492A (en) * | 2005-07-14 | 2007-01-16 | United Technologies Corp | Deposition apparatus and methods |
TWI344996B (ja) * | 2008-06-30 | 2011-07-11 | Shincron Co Ltd | |
TWI345590B (ja) * | 2008-06-30 | 2011-07-21 | Shincron Co Ltd |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05295526A (ja) * | 1992-04-22 | 1993-11-09 | A G Technol Kk | 蒸着方法および蒸着装置 |
US5677012A (en) * | 1994-12-28 | 1997-10-14 | Sumitomo Heavy Industries, Ltd. | Plasma processing method and plasma processing apparatus |
JP3275166B2 (ja) * | 1997-02-28 | 2002-04-15 | 住友重機械工業株式会社 | プラズマビームの偏り修正機構を備えた真空成膜装置 |
JP3564677B2 (ja) * | 1997-06-20 | 2004-09-15 | 住友重機械工業株式会社 | 金属酸化物の被覆方法 |
CN1149303C (zh) * | 1997-09-26 | 2004-05-12 | 住友重机械工业株式会社 | 离子喷镀装置 |
JP2000034560A (ja) | 1998-07-14 | 2000-02-02 | Nippon Sheet Glass Co Ltd | イオンプレーティング装置 |
JP3841962B2 (ja) * | 1998-10-30 | 2006-11-08 | 大日本印刷株式会社 | 圧力勾配型ホローカソード型イオンプレーティング装置 |
JP2003272897A (ja) * | 2002-03-14 | 2003-09-26 | Tohoku Ricoh Co Ltd | 薄膜形成装置および薄膜形成方法 |
JP2008274334A (ja) | 2007-04-26 | 2008-11-13 | Sumitomo Heavy Ind Ltd | 反射防止膜成膜装置及び反射防止膜製造方法 |
-
2013
- 2013-05-29 JP JP2013112949A patent/JP5989601B2/ja active Active
-
2014
- 2014-04-15 TW TW103113671A patent/TWI500790B/zh active
- 2014-04-18 KR KR1020140046564A patent/KR101613562B1/ko active IP Right Grant
- 2014-04-21 CN CN201410160194.1A patent/CN104213081B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0685003B1 (de) * | 1993-02-16 | 1996-10-16 | Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. | Verfahren zur stabilisierung der plasmaerzeugung mittels elektronenstrahlverdampfer |
JPH09256147A (ja) * | 1996-03-25 | 1997-09-30 | Sumitomo Heavy Ind Ltd | イオンプレーティング装置 |
US20060062901A1 (en) * | 2004-09-21 | 2006-03-23 | Kuo-Ching Chou | Fabrication method of front substrate of plasma display, evaporation process and evaporation apparatus |
TW200702492A (en) * | 2005-07-14 | 2007-01-16 | United Technologies Corp | Deposition apparatus and methods |
TWI344996B (ja) * | 2008-06-30 | 2011-07-11 | Shincron Co Ltd | |
TWI345590B (ja) * | 2008-06-30 | 2011-07-21 | Shincron Co Ltd |
Also Published As
Publication number | Publication date |
---|---|
TW201444996A (zh) | 2014-12-01 |
KR20140140480A (ko) | 2014-12-09 |
JP2014231629A (ja) | 2014-12-11 |
CN104213081A (zh) | 2014-12-17 |
JP5989601B2 (ja) | 2016-09-07 |
CN104213081B (zh) | 2017-05-24 |
KR101613562B1 (ko) | 2016-04-19 |
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