TWI500790B - Plasma evaporator - Google Patents

Plasma evaporator Download PDF

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Publication number
TWI500790B
TWI500790B TW103113671A TW103113671A TWI500790B TW I500790 B TWI500790 B TW I500790B TW 103113671 A TW103113671 A TW 103113671A TW 103113671 A TW103113671 A TW 103113671A TW I500790 B TWI500790 B TW I500790B
Authority
TW
Taiwan
Prior art keywords
plasma
film forming
guns
gun
evaporation
Prior art date
Application number
TW103113671A
Other languages
English (en)
Chinese (zh)
Other versions
TW201444996A (zh
Inventor
Masaru Miyashita
Original Assignee
Sumitomo Heavy Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries filed Critical Sumitomo Heavy Industries
Publication of TW201444996A publication Critical patent/TW201444996A/zh
Application granted granted Critical
Publication of TWI500790B publication Critical patent/TWI500790B/zh

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  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
TW103113671A 2013-05-29 2014-04-15 Plasma evaporator TWI500790B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013112949A JP5989601B2 (ja) 2013-05-29 2013-05-29 プラズマ蒸発装置

Publications (2)

Publication Number Publication Date
TW201444996A TW201444996A (zh) 2014-12-01
TWI500790B true TWI500790B (zh) 2015-09-21

Family

ID=52094982

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103113671A TWI500790B (zh) 2013-05-29 2014-04-15 Plasma evaporator

Country Status (4)

Country Link
JP (1) JP5989601B2 (ja)
KR (1) KR101613562B1 (ja)
CN (1) CN104213081B (ja)
TW (1) TWI500790B (ja)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0685003B1 (de) * 1993-02-16 1996-10-16 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Verfahren zur stabilisierung der plasmaerzeugung mittels elektronenstrahlverdampfer
JPH09256147A (ja) * 1996-03-25 1997-09-30 Sumitomo Heavy Ind Ltd イオンプレーティング装置
US20060062901A1 (en) * 2004-09-21 2006-03-23 Kuo-Ching Chou Fabrication method of front substrate of plasma display, evaporation process and evaporation apparatus
TW200702492A (en) * 2005-07-14 2007-01-16 United Technologies Corp Deposition apparatus and methods
TWI344996B (ja) * 2008-06-30 2011-07-11 Shincron Co Ltd
TWI345590B (ja) * 2008-06-30 2011-07-21 Shincron Co Ltd

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05295526A (ja) * 1992-04-22 1993-11-09 A G Technol Kk 蒸着方法および蒸着装置
US5677012A (en) * 1994-12-28 1997-10-14 Sumitomo Heavy Industries, Ltd. Plasma processing method and plasma processing apparatus
JP3275166B2 (ja) * 1997-02-28 2002-04-15 住友重機械工業株式会社 プラズマビームの偏り修正機構を備えた真空成膜装置
JP3564677B2 (ja) * 1997-06-20 2004-09-15 住友重機械工業株式会社 金属酸化物の被覆方法
CN1149303C (zh) * 1997-09-26 2004-05-12 住友重机械工业株式会社 离子喷镀装置
JP2000034560A (ja) 1998-07-14 2000-02-02 Nippon Sheet Glass Co Ltd イオンプレーティング装置
JP3841962B2 (ja) * 1998-10-30 2006-11-08 大日本印刷株式会社 圧力勾配型ホローカソード型イオンプレーティング装置
JP2003272897A (ja) * 2002-03-14 2003-09-26 Tohoku Ricoh Co Ltd 薄膜形成装置および薄膜形成方法
JP2008274334A (ja) 2007-04-26 2008-11-13 Sumitomo Heavy Ind Ltd 反射防止膜成膜装置及び反射防止膜製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0685003B1 (de) * 1993-02-16 1996-10-16 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Verfahren zur stabilisierung der plasmaerzeugung mittels elektronenstrahlverdampfer
JPH09256147A (ja) * 1996-03-25 1997-09-30 Sumitomo Heavy Ind Ltd イオンプレーティング装置
US20060062901A1 (en) * 2004-09-21 2006-03-23 Kuo-Ching Chou Fabrication method of front substrate of plasma display, evaporation process and evaporation apparatus
TW200702492A (en) * 2005-07-14 2007-01-16 United Technologies Corp Deposition apparatus and methods
TWI344996B (ja) * 2008-06-30 2011-07-11 Shincron Co Ltd
TWI345590B (ja) * 2008-06-30 2011-07-21 Shincron Co Ltd

Also Published As

Publication number Publication date
TW201444996A (zh) 2014-12-01
KR20140140480A (ko) 2014-12-09
JP2014231629A (ja) 2014-12-11
CN104213081A (zh) 2014-12-17
JP5989601B2 (ja) 2016-09-07
CN104213081B (zh) 2017-05-24
KR101613562B1 (ko) 2016-04-19

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