KR101555389B1 - 전극 어셈블리 플레넘을 세정하는 방법 및 세정 픽스쳐 - Google Patents

전극 어셈블리 플레넘을 세정하는 방법 및 세정 픽스쳐 Download PDF

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Publication number
KR101555389B1
KR101555389B1 KR1020107010167A KR20107010167A KR101555389B1 KR 101555389 B1 KR101555389 B1 KR 101555389B1 KR 1020107010167 A KR1020107010167 A KR 1020107010167A KR 20107010167 A KR20107010167 A KR 20107010167A KR 101555389 B1 KR101555389 B1 KR 101555389B1
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South Korea
Prior art keywords
fluid
plenum
cleaning
ports
cleaning fluid
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KR1020107010167A
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Korean (ko)
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KR20100090768A (ko
Inventor
듀안 아웃카
빌 덴티
라진더 딘드사
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램 리써치 코포레이션
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid

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  • Drying Of Semiconductors (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020107010167A 2007-10-09 2008-09-09 전극 어셈블리 플레넘을 세정하는 방법 및 세정 픽스쳐 Active KR101555389B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/869,340 US7736441B2 (en) 2007-10-09 2007-10-09 Cleaning fixtures and methods of cleaning electrode assembly plenums
US11/869,340 2007-10-09

Publications (2)

Publication Number Publication Date
KR20100090768A KR20100090768A (ko) 2010-08-17
KR101555389B1 true KR101555389B1 (ko) 2015-09-23

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ID=40522244

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Application Number Title Priority Date Filing Date
KR1020107010167A Active KR101555389B1 (ko) 2007-10-09 2008-09-09 전극 어셈블리 플레넘을 세정하는 방법 및 세정 픽스쳐

Country Status (5)

Country Link
US (1) US7736441B2 (enExample)
JP (1) JP5579068B2 (enExample)
KR (1) KR101555389B1 (enExample)
TW (1) TWI390613B (enExample)
WO (1) WO2009048702A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10391526B2 (en) 2013-12-12 2019-08-27 Lam Research Corporation Electrostatic chuck cleaning fixture
JP5764228B1 (ja) * 2014-03-18 2015-08-12 株式会社日立国際電気 基板処理装置、半導体装置の製造方法、プログラム及び記録媒体
JP5885870B2 (ja) * 2015-04-06 2016-03-16 株式会社日立国際電気 基板処理装置、半導体装置の製造方法、プログラム及び記録媒体
CN112222096B (zh) * 2019-07-15 2023-10-10 长鑫存储技术有限公司 清洁装置以及晶圆处理设备以及晶圆载台的清洁方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005109194A (ja) * 2003-09-30 2005-04-21 Japan Steel Works Ltd:The Ｃｖｄ反応室のクリーニング装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5273588A (en) * 1992-06-15 1993-12-28 Materials Research Corporation Semiconductor wafer processing CVD reactor apparatus comprising contoured electrode gas directing means
US5266153A (en) * 1992-06-16 1993-11-30 National Semiconductor Corp. Gas distribution head for plasma deposition and etch systems
JP2005167087A (ja) * 2003-12-04 2005-06-23 Tokyo Electron Ltd クリーニング方法及び半導体製造装置
US7645341B2 (en) * 2003-12-23 2010-01-12 Lam Research Corporation Showerhead electrode assembly for plasma processing apparatuses
JP2006128485A (ja) * 2004-10-29 2006-05-18 Asm Japan Kk 半導体処理装置
US7052553B1 (en) * 2004-12-01 2006-05-30 Lam Research Corporation Wet cleaning of electrostatic chucks
US7442114B2 (en) * 2004-12-23 2008-10-28 Lam Research Corporation Methods for silicon electrode assembly etch rate and etch uniformity recovery
US7247579B2 (en) * 2004-12-23 2007-07-24 Lam Research Corporation Cleaning methods for silicon electrode assembly surface contamination removal
US7507670B2 (en) * 2004-12-23 2009-03-24 Lam Research Corporation Silicon electrode assembly surface decontamination by acidic solution
US7638004B1 (en) * 2006-05-31 2009-12-29 Lam Research Corporation Method for cleaning microwave applicator tube
US7942973B2 (en) * 2006-10-16 2011-05-17 Lam Research Corporation Methods and apparatus for wet cleaning electrode assemblies for plasma processing apparatuses
US8221552B2 (en) * 2007-03-30 2012-07-17 Lam Research Corporation Cleaning of bonded silicon electrodes
US7578889B2 (en) * 2007-03-30 2009-08-25 Lam Research Corporation Methodology for cleaning of surface metal contamination from electrode assemblies
JP2007204855A (ja) * 2007-05-20 2007-08-16 Tokyo Electron Ltd 成膜装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005109194A (ja) * 2003-09-30 2005-04-21 Japan Steel Works Ltd:The Ｃｖｄ反応室のクリーニング装置

Also Published As

Publication number Publication date
US7736441B2 (en) 2010-06-15
WO2009048702A1 (en) 2009-04-16
JP5579068B2 (ja) 2014-08-27
JP2011501411A (ja) 2011-01-06
TW200933713A (en) 2009-08-01
US20090090393A1 (en) 2009-04-09
KR20100090768A (ko) 2010-08-17
TWI390613B (zh) 2013-03-21

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