JP2011501411A5 - - Google Patents

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Publication number
JP2011501411A5
JP2011501411A5 JP2010528919A JP2010528919A JP2011501411A5 JP 2011501411 A5 JP2011501411 A5 JP 2011501411A5 JP 2010528919 A JP2010528919 A JP 2010528919A JP 2010528919 A JP2010528919 A JP 2010528919A JP 2011501411 A5 JP2011501411 A5 JP 2011501411A5
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JP
Japan
Prior art keywords
fluid
plenum
cleaning
cleaning fluid
ports
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010528919A
Other languages
English (en)
Japanese (ja)
Other versions
JP5579068B2 (ja
JP2011501411A (ja
Filing date
Publication date
Priority claimed from US11/869,340 external-priority patent/US7736441B2/en
Application filed filed Critical
Publication of JP2011501411A publication Critical patent/JP2011501411A/ja
Publication of JP2011501411A5 publication Critical patent/JP2011501411A5/ja
Application granted granted Critical
Publication of JP5579068B2 publication Critical patent/JP5579068B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2010528919A 2007-10-09 2008-09-09 電極アセンブリのプレナムを洗浄する洗浄用取付具及び洗浄方法 Expired - Fee Related JP5579068B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/869,340 US7736441B2 (en) 2007-10-09 2007-10-09 Cleaning fixtures and methods of cleaning electrode assembly plenums
US11/869,340 2007-10-09
PCT/US2008/075675 WO2009048702A1 (en) 2007-10-09 2008-09-09 Cleaning fixtures and methods of cleaning electrode assembly plenums

Publications (3)

Publication Number Publication Date
JP2011501411A JP2011501411A (ja) 2011-01-06
JP2011501411A5 true JP2011501411A5 (enExample) 2012-06-07
JP5579068B2 JP5579068B2 (ja) 2014-08-27

Family

ID=40522244

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010528919A Expired - Fee Related JP5579068B2 (ja) 2007-10-09 2008-09-09 電極アセンブリのプレナムを洗浄する洗浄用取付具及び洗浄方法

Country Status (5)

Country Link
US (1) US7736441B2 (enExample)
JP (1) JP5579068B2 (enExample)
KR (1) KR101555389B1 (enExample)
TW (1) TWI390613B (enExample)
WO (1) WO2009048702A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10391526B2 (en) 2013-12-12 2019-08-27 Lam Research Corporation Electrostatic chuck cleaning fixture
JP5764228B1 (ja) * 2014-03-18 2015-08-12 株式会社日立国際電気 基板処理装置、半導体装置の製造方法、プログラム及び記録媒体
JP5885870B2 (ja) * 2015-04-06 2016-03-16 株式会社日立国際電気 基板処理装置、半導体装置の製造方法、プログラム及び記録媒体
CN112222096B (zh) * 2019-07-15 2023-10-10 长鑫存储技术有限公司 清洁装置以及晶圆处理设备以及晶圆载台的清洁方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5273588A (en) * 1992-06-15 1993-12-28 Materials Research Corporation Semiconductor wafer processing CVD reactor apparatus comprising contoured electrode gas directing means
US5266153A (en) * 1992-06-16 1993-11-30 National Semiconductor Corp. Gas distribution head for plasma deposition and etch systems
JP2005109194A (ja) * 2003-09-30 2005-04-21 Japan Steel Works Ltd:The Ｃｖｄ反応室のクリーニング装置
JP2005167087A (ja) * 2003-12-04 2005-06-23 Tokyo Electron Ltd クリーニング方法及び半導体製造装置
US7645341B2 (en) * 2003-12-23 2010-01-12 Lam Research Corporation Showerhead electrode assembly for plasma processing apparatuses
JP2006128485A (ja) * 2004-10-29 2006-05-18 Asm Japan Kk 半導体処理装置
US7052553B1 (en) * 2004-12-01 2006-05-30 Lam Research Corporation Wet cleaning of electrostatic chucks
US7442114B2 (en) * 2004-12-23 2008-10-28 Lam Research Corporation Methods for silicon electrode assembly etch rate and etch uniformity recovery
US7247579B2 (en) * 2004-12-23 2007-07-24 Lam Research Corporation Cleaning methods for silicon electrode assembly surface contamination removal
US7507670B2 (en) * 2004-12-23 2009-03-24 Lam Research Corporation Silicon electrode assembly surface decontamination by acidic solution
US7638004B1 (en) * 2006-05-31 2009-12-29 Lam Research Corporation Method for cleaning microwave applicator tube
US7942973B2 (en) * 2006-10-16 2011-05-17 Lam Research Corporation Methods and apparatus for wet cleaning electrode assemblies for plasma processing apparatuses
US8221552B2 (en) * 2007-03-30 2012-07-17 Lam Research Corporation Cleaning of bonded silicon electrodes
US7578889B2 (en) * 2007-03-30 2009-08-25 Lam Research Corporation Methodology for cleaning of surface metal contamination from electrode assemblies
JP2007204855A (ja) * 2007-05-20 2007-08-16 Tokyo Electron Ltd 成膜装置

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