KR101475963B1 - 방출된 복사에 대해 투과성인 전기 전도 접촉층을 포함하는 복사 방출 반도체 몸체 - Google Patents

방출된 복사에 대해 투과성인 전기 전도 접촉층을 포함하는 복사 방출 반도체 몸체 Download PDF

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KR101475963B1
KR101475963B1 KR1020097019554A KR20097019554A KR101475963B1 KR 101475963 B1 KR101475963 B1 KR 101475963B1 KR 1020097019554 A KR1020097019554 A KR 1020097019554A KR 20097019554 A KR20097019554 A KR 20097019554A KR 101475963 B1 KR101475963 B1 KR 101475963B1
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KR20090113338A (ko
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랄프 워스
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오스람 옵토 세미컨덕터스 게엠베하
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/83—Electrodes
    • H10H20/832—Electrodes characterised by their material
    • H10H20/833—Transparent materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/85—Packages
    • H10H20/858—Means for heat extraction or cooling
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
    • H10H29/80—Constructional details
    • H10H29/832—Electrodes
    • H10H29/8322—Electrodes characterised by their materials
    • H10H29/8323—Transparent materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
    • H10H29/10—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00
    • H10H29/14—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00 comprising multiple light-emitting semiconductor components
    • H10H29/142—Two-dimensional arrangements, e.g. asymmetric LED layout
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
    • H10H29/80—Constructional details
    • H10H29/85—Packages
    • H10H29/857—Interconnections
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/85—Packages
    • H10H20/857—Interconnections, e.g. lead-frames, bond wires or solder balls
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations

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KR1020097019554A 2007-02-21 2008-01-31 방출된 복사에 대해 투과성인 전기 전도 접촉층을 포함하는 복사 방출 반도체 몸체 Active KR101475963B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102007008524A DE102007008524A1 (de) 2007-02-21 2007-02-21 Strahlung emittierender Chip mit mindestens einem Halbleiterkörper
DE102007008524.0 2007-02-21
PCT/DE2008/000172 WO2008101456A1 (de) 2007-02-21 2008-01-31 Strahlung emittierender halbleiterkörper mit einer für die emittierte strahlung durchlässigen, elektrisch leitenden kontaktschicht

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KR20090113338A KR20090113338A (ko) 2009-10-29
KR101475963B1 true KR101475963B1 (ko) 2014-12-23

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US (1) US8067783B2 (enExample)
EP (1) EP2122697B1 (enExample)
JP (1) JP5210327B2 (enExample)
KR (1) KR101475963B1 (enExample)
CN (1) CN101617414B (enExample)
DE (1) DE102007008524A1 (enExample)
TW (1) TWI514612B (enExample)
WO (1) WO2008101456A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102036071B1 (ko) 2018-06-12 2019-10-24 경희대학교 산학협력단 다층 복사 냉각 구조
KR102036069B1 (ko) 2018-06-12 2019-10-24 경희대학교 산학협력단 공극 패턴을 포함하는 복사 냉각 구조 및 그것의 형성 방법

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US9660153B2 (en) 2007-11-14 2017-05-23 Cree, Inc. Gap engineering for flip-chip mounted horizontal LEDs
US9640737B2 (en) 2011-01-31 2017-05-02 Cree, Inc. Horizontal light emitting diodes including phosphor particles
US9754926B2 (en) * 2011-01-31 2017-09-05 Cree, Inc. Light emitting diode (LED) arrays including direct die attach and related assemblies
DE102008030815A1 (de) * 2008-06-30 2009-12-31 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung einer Vielzahl von optoelektronischen Bauelementen
US9117944B2 (en) * 2008-09-24 2015-08-25 Koninklijke Philips N.V. Semiconductor light emitting devices grown on composite substrates
US9831220B2 (en) 2011-01-31 2017-11-28 Cree, Inc. Light emitting diode (LED) arrays including direct die attach and related assemblies
US9673363B2 (en) 2011-01-31 2017-06-06 Cree, Inc. Reflective mounting substrates for flip-chip mounted horizontal LEDs
JP6077201B2 (ja) 2011-08-11 2017-02-08 昭和電工株式会社 発光ダイオードおよびその製造方法
JP6038443B2 (ja) * 2011-11-21 2016-12-07 スタンレー電気株式会社 半導体発光装置および半導体発光装置の製造方法
DE102012007727A1 (de) 2012-04-18 2013-10-24 Mühlbauer Ag Festkörper-Leuchtmittelanordnung sowie Vorrichtung und Verfahren zu deren Herstellung
DE102018111324A1 (de) * 2018-05-11 2019-11-14 Osram Opto Semiconductors Gmbh Optoelektronischer Halbleiterchip
DE102019131502A1 (de) * 2019-08-29 2021-03-04 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Verfahren zur herstellung strahlungsemittierender halbleiterchips, strahlungsemittierender halbleiterchip und strahlungsemittierendes bauelement

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US20040195576A1 (en) * 2003-03-14 2004-10-07 Toshihiko Watanabe Light-emitting device, light-emitting apparatus, image display apparatus, method of manufacturing light-emitting device, and method of manufacturing image display apparatus
JP2006237071A (ja) * 2005-02-22 2006-09-07 Toyoda Gosei Co Ltd 発光素子およびこれを用いた表示装置
US20070023765A1 (en) * 2005-07-29 2007-02-01 Thomas Alan C Acicular ITO for LED array

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JP3647968B2 (ja) 1996-04-10 2005-05-18 日本板硝子株式会社 自己走査型発光装置
US6573537B1 (en) * 1999-12-22 2003-06-03 Lumileds Lighting, U.S., Llc Highly reflective ohmic contacts to III-nitride flip-chip LEDs
DE10017336C2 (de) * 2000-04-07 2002-05-16 Vishay Semiconductor Gmbh verfahren zur Herstellung von strahlungsemittierenden Halbleiter-Wafern
DE10026254A1 (de) * 2000-04-26 2001-11-08 Osram Opto Semiconductors Gmbh Lumineszenzdiodenchip mit einer auf GaN basierenden strahlungsemittierenden Epitaxieschichtenfolge
WO2001082384A1 (de) 2000-04-26 2001-11-01 Osram Opto Semiconductors Gmbh Strahlungsmittierendes halbleiterbauelement und herstellungsverfahren
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TW577178B (en) 2002-03-04 2004-02-21 United Epitaxy Co Ltd High efficient reflective metal layer of light emitting diode
JP3896027B2 (ja) 2002-04-17 2007-03-22 シャープ株式会社 窒化物系半導体発光素子およびその製造方法
DE10308866A1 (de) 2003-02-28 2004-09-09 Osram Opto Semiconductors Gmbh Beleuchtungsmodul und Verfahren zu dessen Herstellung
US7061065B2 (en) * 2003-03-31 2006-06-13 National Chung-Hsing University Light emitting diode and method for producing the same
EP1652238B1 (en) 2003-08-08 2010-10-27 Kang, Sang-kyu Nitride micro light emitting diode with high brightness and method of manufacturing the same
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US20060002442A1 (en) * 2004-06-30 2006-01-05 Kevin Haberern Light emitting devices having current blocking structures and methods of fabricating light emitting devices having current blocking structures
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JP5305655B2 (ja) 2004-07-30 2013-10-02 オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツング 薄膜技術による半導体チップの製造方法および薄膜半導体チップ
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KR20040073040A (ko) * 2003-02-13 2004-08-19 박익성 반도체 소자의 패키지 및 그 제조 방법
US20040195576A1 (en) * 2003-03-14 2004-10-07 Toshihiko Watanabe Light-emitting device, light-emitting apparatus, image display apparatus, method of manufacturing light-emitting device, and method of manufacturing image display apparatus
JP2006237071A (ja) * 2005-02-22 2006-09-07 Toyoda Gosei Co Ltd 発光素子およびこれを用いた表示装置
US20070023765A1 (en) * 2005-07-29 2007-02-01 Thomas Alan C Acicular ITO for LED array

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102036071B1 (ko) 2018-06-12 2019-10-24 경희대학교 산학협력단 다층 복사 냉각 구조
KR102036069B1 (ko) 2018-06-12 2019-10-24 경희대학교 산학협력단 공극 패턴을 포함하는 복사 냉각 구조 및 그것의 형성 방법

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Publication number Publication date
DE102007008524A1 (de) 2008-08-28
CN101617414B (zh) 2012-07-04
US8067783B2 (en) 2011-11-29
TWI514612B (zh) 2015-12-21
EP2122697A1 (de) 2009-11-25
JP2010519744A (ja) 2010-06-03
EP2122697B1 (de) 2018-07-04
CN101617414A (zh) 2009-12-30
KR20090113338A (ko) 2009-10-29
TW200845428A (en) 2008-11-16
WO2008101456A1 (de) 2008-08-28
JP5210327B2 (ja) 2013-06-12
US20100038673A1 (en) 2010-02-18

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