KR101435123B1 - 노광방법 및 노광장치 - Google Patents

노광방법 및 노광장치 Download PDF

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Publication number
KR101435123B1
KR101435123B1 KR1020087001539A KR20087001539A KR101435123B1 KR 101435123 B1 KR101435123 B1 KR 101435123B1 KR 1020087001539 A KR1020087001539 A KR 1020087001539A KR 20087001539 A KR20087001539 A KR 20087001539A KR 101435123 B1 KR101435123 B1 KR 101435123B1
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KR
South Korea
Prior art keywords
substrate
photomask
convex shape
deforming
concave shape
Prior art date
Application number
KR1020087001539A
Other languages
English (en)
Korean (ko)
Other versions
KR20080023350A (ko
Inventor
히로노부 하시모토
토시히로 타카기
켄 미야케
Original Assignee
상에이 기켄 가부시키가이샤
신코 덴키 코교 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 상에이 기켄 가부시키가이샤, 신코 덴키 코교 가부시키가이샤 filed Critical 상에이 기켄 가부시키가이샤
Publication of KR20080023350A publication Critical patent/KR20080023350A/ko
Application granted granted Critical
Publication of KR101435123B1 publication Critical patent/KR101435123B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020087001539A 2005-06-21 2006-06-20 노광방법 및 노광장치 KR101435123B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00180085 2005-06-21
JP2005180085 2005-06-21
JP2006031178 2006-02-08
JPJP-P-2006-00031178 2006-02-08
PCT/JP2006/312319 WO2006137396A1 (ja) 2005-06-21 2006-06-20 露光方法および露光装置

Publications (2)

Publication Number Publication Date
KR20080023350A KR20080023350A (ko) 2008-03-13
KR101435123B1 true KR101435123B1 (ko) 2014-08-27

Family

ID=37570425

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087001539A KR101435123B1 (ko) 2005-06-21 2006-06-20 노광방법 및 노광장치

Country Status (5)

Country Link
JP (1) JP3983278B2 (zh)
KR (1) KR101435123B1 (zh)
CN (1) CN101194210B (zh)
TW (1) TW200707137A (zh)
WO (1) WO2006137396A1 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008139643A1 (ja) * 2007-05-10 2008-11-20 Sanei Giken Co., Ltd. 露光方法および露光装置
JP6142450B2 (ja) * 2011-09-09 2017-06-07 株式会社ブイ・テクノロジー 密着露光装置及び密着露光方法
JP6399093B2 (ja) * 2014-08-01 2018-10-03 株式会社村田製作所 直描型露光装置
TW201614446A (en) * 2014-10-14 2016-04-16 Hon Hai Prec Ind Co Ltd Curved surface touch device and manufacturing method for curved surface touch device
JP6663252B2 (ja) * 2016-03-01 2020-03-11 株式会社アドテックエンジニアリング プリント基板用露光装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002091010A (ja) 2000-09-13 2002-03-27 Dainippon Printing Co Ltd 密着露光装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6211231A (ja) * 1985-06-25 1987-01-20 Hitachi Electronics Eng Co Ltd ウエハとマスクとの密着方法
JPH11194507A (ja) * 1998-01-05 1999-07-21 Adtec Engineeng:Kk 露光装置
JPH11312635A (ja) * 1998-04-28 1999-11-09 Ushio Inc コンタクト露光方法
JP2000315638A (ja) * 1999-04-28 2000-11-14 Teosu Kk アライメント方法とその装置
JP2002367895A (ja) * 2001-06-11 2002-12-20 Fuji Photo Film Co Ltd フォトレジストの露光方法および装置並びに基板

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002091010A (ja) 2000-09-13 2002-03-27 Dainippon Printing Co Ltd 密着露光装置

Also Published As

Publication number Publication date
JPWO2006137396A1 (ja) 2009-01-22
CN101194210B (zh) 2010-06-16
TW200707137A (en) 2007-02-16
KR20080023350A (ko) 2008-03-13
CN101194210A (zh) 2008-06-04
JP3983278B2 (ja) 2007-09-26
WO2006137396A1 (ja) 2006-12-28

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