KR101405854B1 - 스핀 토크 스위칭을 보조하는 층을 갖는 스핀 토크 스위칭을 이용하는 자기 스택 - Google Patents
스핀 토크 스위칭을 보조하는 층을 갖는 스핀 토크 스위칭을 이용하는 자기 스택 Download PDFInfo
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- KR101405854B1 KR101405854B1 KR1020117028451A KR20117028451A KR101405854B1 KR 101405854 B1 KR101405854 B1 KR 101405854B1 KR 1020117028451 A KR1020117028451 A KR 1020117028451A KR 20117028451 A KR20117028451 A KR 20117028451A KR 101405854 B1 KR101405854 B1 KR 101405854B1
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- magnetic
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- magnetization orientation
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- Expired - Fee Related
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/80—Constructional details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/161—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3254—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the spacer being semiconducting or insulating, e.g. for spin tunnel junction [STJ]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3286—Spin-exchange coupled multilayers having at least one layer with perpendicular magnetic anisotropy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/329—Spin-exchange coupled multilayers wherein the magnetisation of the free layer is switched by a spin-polarised current, e.g. spin torque effect
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3295—Spin-exchange coupled multilayers wherein the magnetic pinned or free layers are laminated without anti-parallel coupling within the pinned and free layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3263—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being symmetric, e.g. for dual spin valve, e.g. NiO/Co/Cu/Co/Cu/Co/NiO
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Power Engineering (AREA)
- Nanotechnology (AREA)
- Computer Hardware Design (AREA)
- Mram Or Spin Memory Techniques (AREA)
- Hall/Mr Elements (AREA)
- Semiconductor Memories (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/431,162 | 2009-04-28 | ||
| US12/431,162 US7936598B2 (en) | 2009-04-28 | 2009-04-28 | Magnetic stack having assist layer |
| PCT/US2010/032483 WO2010126854A1 (en) | 2009-04-28 | 2010-04-27 | Magnetic stack with spin torque switching having a layer assisting said switching |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20120025489A KR20120025489A (ko) | 2012-03-15 |
| KR101405854B1 true KR101405854B1 (ko) | 2014-06-12 |
Family
ID=42246351
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020117028451A Expired - Fee Related KR101405854B1 (ko) | 2009-04-28 | 2010-04-27 | 스핀 토크 스위칭을 보조하는 층을 갖는 스핀 토크 스위칭을 이용하는 자기 스택 |
Country Status (5)
| Country | Link |
|---|---|
| US (3) | US7936598B2 (enExample) |
| JP (1) | JP5623507B2 (enExample) |
| KR (1) | KR101405854B1 (enExample) |
| CN (1) | CN102414756B (enExample) |
| WO (1) | WO2010126854A1 (enExample) |
Families Citing this family (155)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7911832B2 (en) * | 2003-08-19 | 2011-03-22 | New York University | High speed low power magnetic devices based on current induced spin-momentum transfer |
| US8755222B2 (en) | 2003-08-19 | 2014-06-17 | New York University | Bipolar spin-transfer switching |
| FR2924261A1 (fr) * | 2007-11-26 | 2009-05-29 | Commissariat Energie Atomique | Support d'enregistrement magnetique |
| EP2224477B1 (en) * | 2007-12-19 | 2017-05-31 | III Holdings 3, LLC | Magnetic memory element, method for driving the magnetic memory element, and nonvolatile storage device |
| US7940600B2 (en) | 2008-12-02 | 2011-05-10 | Seagate Technology Llc | Non-volatile memory with stray magnetic field compensation |
| US7936598B2 (en) * | 2009-04-28 | 2011-05-03 | Seagate Technology | Magnetic stack having assist layer |
| JP5479487B2 (ja) * | 2010-03-31 | 2014-04-23 | 株式会社東芝 | 磁気抵抗素子及び磁気メモリ |
| US8604572B2 (en) * | 2010-06-14 | 2013-12-10 | Regents Of The University Of Minnesota | Magnetic tunnel junction device |
| US8772886B2 (en) * | 2010-07-26 | 2014-07-08 | Avalanche Technology, Inc. | Spin transfer torque magnetic random access memory (STTMRAM) having graded synthetic free layer |
| JP5786341B2 (ja) * | 2010-09-06 | 2015-09-30 | ソニー株式会社 | 記憶素子、メモリ装置 |
| US8565010B2 (en) * | 2011-02-16 | 2013-10-22 | Avalanche Technology, Inc. | Magnetic random access memory with field compensating layer and multi-level cell |
| FR2966636B1 (fr) * | 2010-10-26 | 2012-12-14 | Centre Nat Rech Scient | Element magnetique inscriptible |
| US20120104522A1 (en) * | 2010-11-01 | 2012-05-03 | Seagate Technology Llc | Magnetic tunnel junction cells having perpendicular anisotropy and enhancement layer |
| US8399941B2 (en) * | 2010-11-05 | 2013-03-19 | Grandis, Inc. | Magnetic junction elements having an easy cone anisotropy and a magnetic memory using such magnetic junction elements |
| KR101463948B1 (ko) * | 2010-11-08 | 2014-11-27 | 삼성전자주식회사 | 자기 기억 소자 |
| US8508973B2 (en) | 2010-11-16 | 2013-08-13 | Seagate Technology Llc | Method of switching out-of-plane magnetic tunnel junction cells |
| US8274811B2 (en) * | 2010-11-22 | 2012-09-25 | Headway Technologies, Inc. | Assisting FGL oscillations with perpendicular anisotropy for MAMR |
| US8406045B1 (en) * | 2011-01-19 | 2013-03-26 | Grandis Inc. | Three terminal magnetic element |
| US9196332B2 (en) * | 2011-02-16 | 2015-11-24 | Avalanche Technology, Inc. | Perpendicular magnetic tunnel junction (pMTJ) with in-plane magneto-static switching-enhancing layer |
| US8456894B2 (en) | 2011-05-03 | 2013-06-04 | International Business Machines Corporation | Noncontact writing of nanometer scale magnetic bits using heat flow induced spin torque effect |
| US8754491B2 (en) | 2011-05-03 | 2014-06-17 | International Business Machines Corporation | Spin torque MRAM using bidirectional magnonic writing |
| US8456895B2 (en) * | 2011-05-03 | 2013-06-04 | International Business Machines Corporation | Magnonic magnetic random access memory device |
| JP2012238631A (ja) * | 2011-05-10 | 2012-12-06 | Sony Corp | 記憶素子、記憶装置 |
| CN103563000B (zh) | 2011-05-19 | 2016-12-07 | 加利福尼亚大学董事会 | 电压控制的磁各向异性(vcma)开关和电磁存储器(meram) |
| US9007818B2 (en) | 2012-03-22 | 2015-04-14 | Micron Technology, Inc. | Memory cells, semiconductor device structures, systems including such cells, and methods of fabrication |
| US20130307097A1 (en) * | 2012-05-15 | 2013-11-21 | Ge Yi | Magnetoresistive random access memory cell design |
| US9054030B2 (en) | 2012-06-19 | 2015-06-09 | Micron Technology, Inc. | Memory cells, semiconductor device structures, memory systems, and methods of fabrication |
| US8923038B2 (en) | 2012-06-19 | 2014-12-30 | Micron Technology, Inc. | Memory cells, semiconductor device structures, memory systems, and methods of fabrication |
| WO2014022304A1 (en) | 2012-07-30 | 2014-02-06 | The Regents Of The University Of California | Multiple-bits-per-cell voltage-controlled magnetic memory |
| US9231191B2 (en) * | 2012-08-20 | 2016-01-05 | Industrial Technology Research Institute | Magnetic tunnel junction device and method of making same |
| US8754500B2 (en) * | 2012-08-29 | 2014-06-17 | International Business Machines Corporation | Plated lamination structures for integrated magnetic devices |
| KR101266792B1 (ko) * | 2012-09-21 | 2013-05-27 | 고려대학교 산학협력단 | 면내 전류와 전기장을 이용한 수평형 자기메모리 소자 |
| KR101266791B1 (ko) * | 2012-09-21 | 2013-05-27 | 고려대학교 산학협력단 | 면내 전류와 전기장을 이용한 자기메모리 소자 |
| US8773821B2 (en) * | 2012-10-05 | 2014-07-08 | Nve Corporation | Magnetoresistive-based mixed anisotropy high field sensor |
| US9082888B2 (en) | 2012-10-17 | 2015-07-14 | New York University | Inverted orthogonal spin transfer layer stack |
| US9082950B2 (en) | 2012-10-17 | 2015-07-14 | New York University | Increased magnetoresistance in an inverted orthogonal spin transfer layer stack |
| US9379315B2 (en) | 2013-03-12 | 2016-06-28 | Micron Technology, Inc. | Memory cells, methods of fabrication, semiconductor device structures, and memory systems |
| US8982613B2 (en) | 2013-06-17 | 2015-03-17 | New York University | Scalable orthogonal spin transfer magnetic random access memory devices with reduced write error rates |
| US9368714B2 (en) | 2013-07-01 | 2016-06-14 | Micron Technology, Inc. | Memory cells, methods of operation and fabrication, semiconductor device structures, and memory systems |
| US9466787B2 (en) | 2013-07-23 | 2016-10-11 | Micron Technology, Inc. | Memory cells, methods of fabrication, semiconductor device structures, memory systems, and electronic systems |
| EP2846334B1 (en) * | 2013-09-05 | 2017-11-08 | Deutsches Elektronen-Synchrotron DESY | Method of producing a multilayer magnetoelectronic device and magnetoelectronic device |
| US9461242B2 (en) | 2013-09-13 | 2016-10-04 | Micron Technology, Inc. | Magnetic memory cells, methods of fabrication, semiconductor devices, memory systems, and electronic systems |
| US9608197B2 (en) | 2013-09-18 | 2017-03-28 | Micron Technology, Inc. | Memory cells, methods of fabrication, and semiconductor devices |
| US9306155B2 (en) | 2013-11-11 | 2016-04-05 | Samsung Electronics Co., Ltd. | Method and system for providing a bulk perpendicular magnetic anisotropy free layer in a perpendicular magnetic junction usable in spin transfer torque magnetic random access memory applications |
| US10454024B2 (en) | 2014-02-28 | 2019-10-22 | Micron Technology, Inc. | Memory cells, methods of fabrication, and memory devices |
| US9344345B2 (en) * | 2014-03-19 | 2016-05-17 | Micron Technology, Inc. | Memory cells having a self-aligning polarizer |
| US9281466B2 (en) | 2014-04-09 | 2016-03-08 | Micron Technology, Inc. | Memory cells, semiconductor structures, semiconductor devices, and methods of fabrication |
| US9269888B2 (en) | 2014-04-18 | 2016-02-23 | Micron Technology, Inc. | Memory cells, methods of fabrication, and semiconductor devices |
| US9336797B2 (en) * | 2014-05-29 | 2016-05-10 | HGST Netherlands B.V. | Extended spin torque oscillator |
| US9792971B2 (en) | 2014-07-02 | 2017-10-17 | Samsung Electronics Co., Ltd. | Method and system for providing magnetic junctions with rare earth-transition metal layers |
| US9263667B1 (en) | 2014-07-25 | 2016-02-16 | Spin Transfer Technologies, Inc. | Method for manufacturing MTJ memory device |
| KR102080631B1 (ko) * | 2014-08-08 | 2020-02-24 | 고쿠리츠 다이가쿠 호진 도호쿠 다이가쿠 | 자기 저항 효과 소자 및 자기 메모리 장치 |
| US9337412B2 (en) * | 2014-09-22 | 2016-05-10 | Spin Transfer Technologies, Inc. | Magnetic tunnel junction structure for MRAM device |
| US9349945B2 (en) | 2014-10-16 | 2016-05-24 | Micron Technology, Inc. | Memory cells, semiconductor devices, and methods of fabrication |
| US9768377B2 (en) | 2014-12-02 | 2017-09-19 | Micron Technology, Inc. | Magnetic cell structures, and methods of fabrication |
| US10439131B2 (en) | 2015-01-15 | 2019-10-08 | Micron Technology, Inc. | Methods of forming semiconductor devices including tunnel barrier materials |
| US9728712B2 (en) | 2015-04-21 | 2017-08-08 | Spin Transfer Technologies, Inc. | Spin transfer torque structure for MRAM devices having a spin current injection capping layer |
| US10468590B2 (en) | 2015-04-21 | 2019-11-05 | Spin Memory, Inc. | High annealing temperature perpendicular magnetic anisotropy structure for magnetic random access memory |
| US9853206B2 (en) | 2015-06-16 | 2017-12-26 | Spin Transfer Technologies, Inc. | Precessional spin current structure for MRAM |
| US9773974B2 (en) | 2015-07-30 | 2017-09-26 | Spin Transfer Technologies, Inc. | Polishing stop layer(s) for processing arrays of semiconductor elements |
| US10163479B2 (en) | 2015-08-14 | 2018-12-25 | Spin Transfer Technologies, Inc. | Method and apparatus for bipolar memory write-verify |
| US20170077387A1 (en) * | 2015-09-16 | 2017-03-16 | Qualcomm Incorporated | Magnetic tunnel junction (mtj) devices particularly suited for efficient spin-torque-transfer (stt) magnetic random access memory (mram) (stt mram) |
| US10134808B2 (en) * | 2015-11-02 | 2018-11-20 | Qualcomm Incorporated | Magnetic tunnel junction (MTJ) devices with heterogeneous free layer structure, particularly suited for spin-torque-transfer (STT) magnetic random access memory (MRAM) (STT MRAM) |
| US11563169B2 (en) | 2015-11-18 | 2023-01-24 | Tohoku University | Magnetic tunnel junction element and magnetic memory |
| KR102482373B1 (ko) | 2015-11-24 | 2022-12-29 | 삼성전자주식회사 | 자기 저항 메모리 장치 및 그 제조 방법 |
| US9741926B1 (en) | 2016-01-28 | 2017-08-22 | Spin Transfer Technologies, Inc. | Memory cell having magnetic tunnel junction and thermal stability enhancement layer |
| US10418545B2 (en) * | 2016-07-29 | 2019-09-17 | Tdk Corporation | Spin current magnetization reversal element, element assembly, and method for producing spin current magnetization reversal element |
| US12262644B2 (en) * | 2016-07-29 | 2025-03-25 | Tdk Corporation | Spin current magnetization reversal element, element assembly, and method for producing spin current magnetization reversal element |
| US10818331B2 (en) | 2016-09-27 | 2020-10-27 | Spin Memory, Inc. | Multi-chip module for MRAM devices with levels of dynamic redundancy registers |
| US10437491B2 (en) | 2016-09-27 | 2019-10-08 | Spin Memory, Inc. | Method of processing incomplete memory operations in a memory device during a power up sequence and a power down sequence using a dynamic redundancy register |
| US11151042B2 (en) | 2016-09-27 | 2021-10-19 | Integrated Silicon Solution, (Cayman) Inc. | Error cache segmentation for power reduction |
| US10546625B2 (en) | 2016-09-27 | 2020-01-28 | Spin Memory, Inc. | Method of optimizing write voltage based on error buffer occupancy |
| US10446210B2 (en) | 2016-09-27 | 2019-10-15 | Spin Memory, Inc. | Memory instruction pipeline with a pre-read stage for a write operation for reducing power consumption in a memory device that uses dynamic redundancy registers |
| US10460781B2 (en) | 2016-09-27 | 2019-10-29 | Spin Memory, Inc. | Memory device with a dual Y-multiplexer structure for performing two simultaneous operations on the same row of a memory bank |
| US10437723B2 (en) | 2016-09-27 | 2019-10-08 | Spin Memory, Inc. | Method of flushing the contents of a dynamic redundancy register to a secure storage area during a power down in a memory device |
| US10366774B2 (en) | 2016-09-27 | 2019-07-30 | Spin Memory, Inc. | Device with dynamic redundancy registers |
| US10991410B2 (en) | 2016-09-27 | 2021-04-27 | Spin Memory, Inc. | Bi-polar write scheme |
| US10628316B2 (en) | 2016-09-27 | 2020-04-21 | Spin Memory, Inc. | Memory device with a plurality of memory banks where each memory bank is associated with a corresponding memory instruction pipeline and a dynamic redundancy register |
| US11119910B2 (en) | 2016-09-27 | 2021-09-14 | Spin Memory, Inc. | Heuristics for selecting subsegments for entry in and entry out operations in an error cache system with coarse and fine grain segments |
| US11119936B2 (en) | 2016-09-27 | 2021-09-14 | Spin Memory, Inc. | Error cache system with coarse and fine segments for power optimization |
| US10360964B2 (en) | 2016-09-27 | 2019-07-23 | Spin Memory, Inc. | Method of writing contents in memory during a power up sequence using a dynamic redundancy register in a memory device |
| KR101998268B1 (ko) | 2016-10-21 | 2019-07-11 | 한국과학기술원 | 반도체 소자 |
| CN109891613B (zh) * | 2016-10-21 | 2023-09-19 | 韩国科学技术院 | 半导体器件和半导体逻辑器件 |
| US10319901B2 (en) | 2016-10-27 | 2019-06-11 | Tdk Corporation | Spin-orbit torque type magnetization reversal element, magnetic memory, and high frequency magnetic device |
| US10439130B2 (en) | 2016-10-27 | 2019-10-08 | Tdk Corporation | Spin-orbit torque type magnetoresistance effect element, and method for producing spin-orbit torque type magnetoresistance effect element |
| US11276815B2 (en) | 2016-10-27 | 2022-03-15 | Tdk Corporation | Spin-orbit torque type magnetization reversal element, magnetic memory, and high frequency magnetic device |
| US10079337B2 (en) * | 2017-01-11 | 2018-09-18 | International Business Machines Corporation | Double magnetic tunnel junction with dynamic reference layer |
| US10665777B2 (en) | 2017-02-28 | 2020-05-26 | Spin Memory, Inc. | Precessional spin current structure with non-magnetic insertion layer for MRAM |
| US10672976B2 (en) | 2017-02-28 | 2020-06-02 | Spin Memory, Inc. | Precessional spin current structure with high in-plane magnetization for MRAM |
| US10032978B1 (en) | 2017-06-27 | 2018-07-24 | Spin Transfer Technologies, Inc. | MRAM with reduced stray magnetic fields |
| US10656994B2 (en) | 2017-10-24 | 2020-05-19 | Spin Memory, Inc. | Over-voltage write operation of tunnel magnet-resistance (“TMR”) memory device and correcting failure bits therefrom by using on-the-fly bit failure detection and bit redundancy remapping techniques |
| US10529439B2 (en) | 2017-10-24 | 2020-01-07 | Spin Memory, Inc. | On-the-fly bit failure detection and bit redundancy remapping techniques to correct for fixed bit defects |
| US10481976B2 (en) | 2017-10-24 | 2019-11-19 | Spin Memory, Inc. | Forcing bits as bad to widen the window between the distributions of acceptable high and low resistive bits thereby lowering the margin and increasing the speed of the sense amplifiers |
| US10489245B2 (en) | 2017-10-24 | 2019-11-26 | Spin Memory, Inc. | Forcing stuck bits, waterfall bits, shunt bits and low TMR bits to short during testing and using on-the-fly bit failure detection and bit redundancy remapping techniques to correct them |
| US10679685B2 (en) | 2017-12-27 | 2020-06-09 | Spin Memory, Inc. | Shared bit line array architecture for magnetoresistive memory |
| US10360962B1 (en) | 2017-12-28 | 2019-07-23 | Spin Memory, Inc. | Memory array with individually trimmable sense amplifiers |
| US10891997B2 (en) | 2017-12-28 | 2021-01-12 | Spin Memory, Inc. | Memory array with horizontal source line and a virtual source line |
| US10424726B2 (en) | 2017-12-28 | 2019-09-24 | Spin Memory, Inc. | Process for improving photoresist pillar adhesion during MRAM fabrication |
| US10516094B2 (en) | 2017-12-28 | 2019-12-24 | Spin Memory, Inc. | Process for creating dense pillars using multiple exposures for MRAM fabrication |
| US10971293B2 (en) * | 2017-12-28 | 2021-04-06 | Tdk Corporation | Spin-orbit-torque magnetization rotational element, spin-orbit-torque magnetoresistance effect element, and spin-orbit-torque magnetization rotational element manufacturing method |
| US10811594B2 (en) | 2017-12-28 | 2020-10-20 | Spin Memory, Inc. | Process for hard mask development for MRAM pillar formation using photolithography |
| US10395712B2 (en) | 2017-12-28 | 2019-08-27 | Spin Memory, Inc. | Memory array with horizontal source line and sacrificial bitline per virtual source |
| US10395711B2 (en) | 2017-12-28 | 2019-08-27 | Spin Memory, Inc. | Perpendicular source and bit lines for an MRAM array |
| US10546624B2 (en) | 2017-12-29 | 2020-01-28 | Spin Memory, Inc. | Multi-port random access memory |
| US10270027B1 (en) | 2017-12-29 | 2019-04-23 | Spin Memory, Inc. | Self-generating AC current assist in orthogonal STT-MRAM |
| US10784439B2 (en) | 2017-12-29 | 2020-09-22 | Spin Memory, Inc. | Precessional spin current magnetic tunnel junction devices and methods of manufacture |
| US10199083B1 (en) | 2017-12-29 | 2019-02-05 | Spin Transfer Technologies, Inc. | Three-terminal MRAM with ac write-assist for low read disturb |
| US10236047B1 (en) | 2017-12-29 | 2019-03-19 | Spin Memory, Inc. | Shared oscillator (STNO) for MRAM array write-assist in orthogonal STT-MRAM |
| US10840436B2 (en) | 2017-12-29 | 2020-11-17 | Spin Memory, Inc. | Perpendicular magnetic anisotropy interface tunnel junction devices and methods of manufacture |
| US10367139B2 (en) | 2017-12-29 | 2019-07-30 | Spin Memory, Inc. | Methods of manufacturing magnetic tunnel junction devices |
| US10840439B2 (en) | 2017-12-29 | 2020-11-17 | Spin Memory, Inc. | Magnetic tunnel junction (MTJ) fabrication methods and systems |
| US10886330B2 (en) | 2017-12-29 | 2021-01-05 | Spin Memory, Inc. | Memory device having overlapping magnetic tunnel junctions in compliance with a reference pitch |
| US10360961B1 (en) | 2017-12-29 | 2019-07-23 | Spin Memory, Inc. | AC current pre-charge write-assist in orthogonal STT-MRAM |
| US10424723B2 (en) | 2017-12-29 | 2019-09-24 | Spin Memory, Inc. | Magnetic tunnel junction devices including an optimization layer |
| US10236048B1 (en) | 2017-12-29 | 2019-03-19 | Spin Memory, Inc. | AC current write-assist in orthogonal STT-MRAM |
| US10141499B1 (en) | 2017-12-30 | 2018-11-27 | Spin Transfer Technologies, Inc. | Perpendicular magnetic tunnel junction device with offset precessional spin current layer |
| US10229724B1 (en) | 2017-12-30 | 2019-03-12 | Spin Memory, Inc. | Microwave write-assist in series-interconnected orthogonal STT-MRAM devices |
| US10319900B1 (en) | 2017-12-30 | 2019-06-11 | Spin Memory, Inc. | Perpendicular magnetic tunnel junction device with precessional spin current layer having a modulated moment density |
| US10236439B1 (en) | 2017-12-30 | 2019-03-19 | Spin Memory, Inc. | Switching and stability control for perpendicular magnetic tunnel junction device |
| US10339993B1 (en) | 2017-12-30 | 2019-07-02 | Spin Memory, Inc. | Perpendicular magnetic tunnel junction device with skyrmionic assist layers for free layer switching |
| US10255962B1 (en) | 2017-12-30 | 2019-04-09 | Spin Memory, Inc. | Microwave write-assist in orthogonal STT-MRAM |
| US10468588B2 (en) | 2018-01-05 | 2019-11-05 | Spin Memory, Inc. | Perpendicular magnetic tunnel junction device with skyrmionic enhancement layers for the precessional spin current magnetic layer |
| CN108267698B (zh) * | 2018-01-08 | 2020-07-14 | 上海交通大学 | 一种提高层叠复合磁传感器灵敏度的方法 |
| US10438996B2 (en) | 2018-01-08 | 2019-10-08 | Spin Memory, Inc. | Methods of fabricating magnetic tunnel junctions integrated with selectors |
| US10438995B2 (en) | 2018-01-08 | 2019-10-08 | Spin Memory, Inc. | Devices including magnetic tunnel junctions integrated with selectors |
| US10446744B2 (en) | 2018-03-08 | 2019-10-15 | Spin Memory, Inc. | Magnetic tunnel junction wafer adaptor used in magnetic annealing furnace and method of using the same |
| US10388861B1 (en) | 2018-03-08 | 2019-08-20 | Spin Memory, Inc. | Magnetic tunnel junction wafer adaptor used in magnetic annealing furnace and method of using the same |
| US11107974B2 (en) | 2018-03-23 | 2021-08-31 | Spin Memory, Inc. | Magnetic tunnel junction devices including a free magnetic trench layer and a planar reference magnetic layer |
| US20190296228A1 (en) | 2018-03-23 | 2019-09-26 | Spin Transfer Technologies, Inc. | Three-Dimensional Arrays with Magnetic Tunnel Junction Devices Including an Annular Free Magnetic Layer and a Planar Reference Magnetic Layer |
| US10784437B2 (en) | 2018-03-23 | 2020-09-22 | Spin Memory, Inc. | Three-dimensional arrays with MTJ devices including a free magnetic trench layer and a planar reference magnetic layer |
| US11107978B2 (en) | 2018-03-23 | 2021-08-31 | Spin Memory, Inc. | Methods of manufacturing three-dimensional arrays with MTJ devices including a free magnetic trench layer and a planar reference magnetic layer |
| US10411185B1 (en) | 2018-05-30 | 2019-09-10 | Spin Memory, Inc. | Process for creating a high density magnetic tunnel junction array test platform |
| US10593396B2 (en) | 2018-07-06 | 2020-03-17 | Spin Memory, Inc. | Multi-bit cell read-out techniques for MRAM cells with mixed pinned magnetization orientations |
| US10600478B2 (en) | 2018-07-06 | 2020-03-24 | Spin Memory, Inc. | Multi-bit cell read-out techniques for MRAM cells with mixed pinned magnetization orientations |
| US10559338B2 (en) | 2018-07-06 | 2020-02-11 | Spin Memory, Inc. | Multi-bit cell read-out techniques |
| US10692569B2 (en) | 2018-07-06 | 2020-06-23 | Spin Memory, Inc. | Read-out techniques for multi-bit cells |
| US10650875B2 (en) | 2018-08-21 | 2020-05-12 | Spin Memory, Inc. | System for a wide temperature range nonvolatile memory |
| US10699761B2 (en) | 2018-09-18 | 2020-06-30 | Spin Memory, Inc. | Word line decoder memory architecture |
| US10971680B2 (en) | 2018-10-01 | 2021-04-06 | Spin Memory, Inc. | Multi terminal device stack formation methods |
| US11621293B2 (en) | 2018-10-01 | 2023-04-04 | Integrated Silicon Solution, (Cayman) Inc. | Multi terminal device stack systems and methods |
| US10580827B1 (en) | 2018-11-16 | 2020-03-03 | Spin Memory, Inc. | Adjustable stabilizer/polarizer method for MRAM with enhanced stability and efficient switching |
| KR102698784B1 (ko) * | 2018-11-19 | 2024-08-27 | 삼성전자주식회사 | 자기 기억 소자 |
| US10726892B2 (en) * | 2018-12-06 | 2020-07-28 | Sandisk Technologies Llc | Metallic magnetic memory devices for cryogenic operation and methods of operating the same |
| US11107979B2 (en) | 2018-12-28 | 2021-08-31 | Spin Memory, Inc. | Patterned silicide structures and methods of manufacture |
| US10852369B2 (en) * | 2019-01-09 | 2020-12-01 | Infineon Technologies Ag | Stray field robust xMR sensor using perpendicular anisotropy |
| CN112186099B (zh) * | 2019-07-02 | 2022-09-20 | 中电海康集团有限公司 | 磁性隧道结 |
| CN114503296A (zh) * | 2019-09-27 | 2022-05-13 | 华为技术有限公司 | 一种mtj单元、vcma驱动方法及mram |
| KR102632986B1 (ko) | 2019-10-01 | 2024-02-05 | 에스케이하이닉스 주식회사 | 전자 장치 |
| KR102710350B1 (ko) * | 2019-10-02 | 2024-09-27 | 삼성전자주식회사 | 자기 기억 소자 |
| KR102702693B1 (ko) * | 2019-12-13 | 2024-09-05 | 에스케이하이닉스 주식회사 | 전자 장치 |
| US11264562B1 (en) * | 2020-08-27 | 2022-03-01 | Western Digital Technologies, Inc. | Multiferroic-assisted voltage controlled magnetic anisotropy memory device and methods of manufacturing the same |
| US11276446B1 (en) | 2020-08-27 | 2022-03-15 | Western Digital Technologies, Inc. | Multiferroic-assisted voltage controlled magnetic anisotropy memory device and methods of manufacturing the same |
| US11610731B2 (en) | 2021-03-09 | 2023-03-21 | Hirofusa Otsubo | Apparatus for assembling a non-directional free electron generating repelling magnet combination |
| EP4362626A1 (en) * | 2022-10-31 | 2024-05-01 | Commissariat à l'énergie atomique et aux énergies alternatives | Magnetic device and corresponding method |
| WO2025220658A1 (ja) * | 2024-04-16 | 2025-10-23 | 国立研究開発法人物質・材料研究機構 | 磁性積層体、tmrセンサ、及び磁性積層体の製造方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070096229A1 (en) * | 2005-10-28 | 2007-05-03 | Masatoshi Yoshikawa | Magnetoresistive element and magnetic memory device |
| US20080088980A1 (en) * | 2006-10-13 | 2008-04-17 | Eiji Kitagawa | Magnetoresistive element and magnetic memory |
Family Cites Families (72)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US708869A (en) * | 1901-10-09 | 1902-09-09 | Joseph Davidoff | Folding cot. |
| US6462919B1 (en) | 1999-04-28 | 2002-10-08 | Seagate Technology Llc | Spin valve sensor with exchange tabs |
| US6650513B2 (en) | 2001-01-29 | 2003-11-18 | International Business Machines Corporation | Magnetic devices with a ferromagnetic layer having perpendicular magnetic anisotropy and an antiferromagnetic layer for perpendicularly exchange biasing the ferromagnetic layer |
| JP4944315B2 (ja) * | 2001-08-13 | 2012-05-30 | キヤノン株式会社 | 磁気抵抗効果膜、それを備えたメモリ素子及びそれを用いたメモリ |
| TWI222630B (en) | 2001-04-24 | 2004-10-21 | Matsushita Electric Industrial Co Ltd | Magnetoresistive element and magnetoresistive memory device using the same |
| JP2003124541A (ja) | 2001-10-12 | 2003-04-25 | Nec Corp | 交換結合膜、磁気抵抗効果素子、磁気ヘッド及び磁気ランダムアクセスメモリ |
| US6714444B2 (en) | 2002-08-06 | 2004-03-30 | Grandis, Inc. | Magnetic element utilizing spin transfer and an MRAM device using the magnetic element |
| US6888742B1 (en) | 2002-08-28 | 2005-05-03 | Grandis, Inc. | Off-axis pinned layer magnetic element utilizing spin transfer and an MRAM device using the magnetic element |
| US6838740B2 (en) | 2002-09-27 | 2005-01-04 | Grandis, Inc. | Thermally stable magnetic elements utilizing spin transfer and an MRAM device using the magnetic element |
| US6958927B1 (en) | 2002-10-09 | 2005-10-25 | Grandis Inc. | Magnetic element utilizing spin-transfer and half-metals and an MRAM device using the magnetic element |
| CN101114694A (zh) | 2002-11-26 | 2008-01-30 | 株式会社东芝 | 磁单元和磁存储器 |
| US7190611B2 (en) | 2003-01-07 | 2007-03-13 | Grandis, Inc. | Spin-transfer multilayer stack containing magnetic layers with resettable magnetization |
| US6829161B2 (en) | 2003-01-10 | 2004-12-07 | Grandis, Inc. | Magnetostatically coupled magnetic elements utilizing spin transfer and an MRAM device using the magnetic element |
| US6847547B2 (en) | 2003-02-28 | 2005-01-25 | Grandis, Inc. | Magnetostatically coupled magnetic elements utilizing spin transfer and an MRAM device using the magnetic element |
| US6933155B2 (en) | 2003-05-21 | 2005-08-23 | Grandis, Inc. | Methods for providing a sub .15 micron magnetic memory structure |
| US6980469B2 (en) | 2003-08-19 | 2005-12-27 | New York University | High speed low power magnetic devices based on current induced spin-momentum transfer |
| US7245462B2 (en) | 2003-08-21 | 2007-07-17 | Grandis, Inc. | Magnetoresistive element having reduced spin transfer induced noise |
| US6985385B2 (en) | 2003-08-26 | 2006-01-10 | Grandis, Inc. | Magnetic memory element utilizing spin transfer switching and storing multiple bits |
| US7161829B2 (en) | 2003-09-19 | 2007-01-09 | Grandis, Inc. | Current confined pass layer for magnetic elements utilizing spin-transfer and an MRAM device using such magnetic elements |
| US20050136600A1 (en) | 2003-12-22 | 2005-06-23 | Yiming Huai | Magnetic elements with ballistic magnetoresistance utilizing spin-transfer and an MRAM device using such magnetic elements |
| US7105372B2 (en) | 2004-01-20 | 2006-09-12 | Headway Technologies, Inc. | Magnetic tunneling junction film structure with process determined in-plane magnetic anisotropy |
| US7110287B2 (en) * | 2004-02-13 | 2006-09-19 | Grandis, Inc. | Method and system for providing heat assisted switching of a magnetic element utilizing spin transfer |
| US7242045B2 (en) | 2004-02-19 | 2007-07-10 | Grandis, Inc. | Spin transfer magnetic element having low saturation magnetization free layers |
| US6967863B2 (en) * | 2004-02-25 | 2005-11-22 | Grandis, Inc. | Perpendicular magnetization magnetic element utilizing spin transfer |
| US6992359B2 (en) | 2004-02-26 | 2006-01-31 | Grandis, Inc. | Spin transfer magnetic element with free layers having high perpendicular anisotropy and in-plane equilibrium magnetization |
| US7201977B2 (en) | 2004-03-23 | 2007-04-10 | Seagate Technology Llc | Anti-ferromagnetically coupled granular-continuous magnetic recording media |
| US7233039B2 (en) | 2004-04-21 | 2007-06-19 | Grandis, Inc. | Spin transfer magnetic elements with spin depolarization layers |
| US7088609B2 (en) | 2004-05-11 | 2006-08-08 | Grandis, Inc. | Spin barrier enhanced magnetoresistance effect element and magnetic memory using the same |
| US7057921B2 (en) | 2004-05-11 | 2006-06-06 | Grandis, Inc. | Spin barrier enhanced dual magnetoresistance effect element and magnetic memory using the same |
| US7576956B2 (en) | 2004-07-26 | 2009-08-18 | Grandis Inc. | Magnetic tunnel junction having diffusion stop layer |
| US7369427B2 (en) | 2004-09-09 | 2008-05-06 | Grandis, Inc. | Magnetic elements with spin engineered insertion layers and MRAM devices using the magnetic elements |
| US7126202B2 (en) | 2004-11-16 | 2006-10-24 | Grandis, Inc. | Spin scattering and heat assisted switching of a magnetic element |
| US7313013B2 (en) | 2004-11-18 | 2007-12-25 | International Business Machines Corporation | Spin-current switchable magnetic memory element and method of fabricating the memory element |
| JP4575136B2 (ja) | 2004-12-20 | 2010-11-04 | 株式会社東芝 | 磁気記録素子、磁気記録装置、および情報の記録方法 |
| US7241631B2 (en) | 2004-12-29 | 2007-07-10 | Grandis, Inc. | MTJ elements with high spin polarization layers configured for spin-transfer switching and spintronics devices using the magnetic elements |
| FR2883066B1 (fr) | 2005-03-08 | 2007-05-11 | Valeo Vision Sa | Projecteur lumineux a plusieurs fonctions pour vehicule automobile |
| US7241632B2 (en) | 2005-04-14 | 2007-07-10 | Headway Technologies, Inc. | MTJ read head with sidewall spacers |
| US7230265B2 (en) | 2005-05-16 | 2007-06-12 | International Business Machines Corporation | Spin-polarization devices using rare earth-transition metal alloys |
| US7518835B2 (en) | 2005-07-01 | 2009-04-14 | Grandis, Inc. | Magnetic elements having a bias field and magnetic memory devices using the magnetic elements |
| US7230845B1 (en) | 2005-07-29 | 2007-06-12 | Grandis, Inc. | Magnetic devices having a hard bias field and magnetic memory devices using the magnetic devices |
| US7489541B2 (en) | 2005-08-23 | 2009-02-10 | Grandis, Inc. | Spin-transfer switching magnetic elements using ferrimagnets and magnetic memories using the magnetic elements |
| JP2007088415A (ja) | 2005-08-25 | 2007-04-05 | Fujitsu Ltd | 磁気抵抗効果素子、磁気ヘッド、磁気記憶装置、および磁気メモリ装置 |
| US20070054450A1 (en) | 2005-09-07 | 2007-03-08 | Magic Technologies, Inc. | Structure and fabrication of an MRAM cell |
| JP2007080952A (ja) | 2005-09-12 | 2007-03-29 | Fuji Electric Holdings Co Ltd | 多値記録スピン注入磁化反転素子およびこれを用いた装置 |
| US7973349B2 (en) | 2005-09-20 | 2011-07-05 | Grandis Inc. | Magnetic device having multilayered free ferromagnetic layer |
| JP4444241B2 (ja) | 2005-10-19 | 2010-03-31 | 株式会社東芝 | 磁気抵抗効果素子、磁気ランダムアクセスメモリ、電子カード及び電子装置 |
| US7486545B2 (en) | 2005-11-01 | 2009-02-03 | Magic Technologies, Inc. | Thermally assisted integrated MRAM design and process for its manufacture |
| US7880249B2 (en) | 2005-11-30 | 2011-02-01 | Magic Technologies, Inc. | Spacer structure in MRAM cell and method of its fabrication |
| US7430135B2 (en) | 2005-12-23 | 2008-09-30 | Grandis Inc. | Current-switched spin-transfer magnetic devices with reduced spin-transfer switching current density |
| KR100706806B1 (ko) | 2006-01-27 | 2007-04-12 | 삼성전자주식회사 | 자기 메모리 소자 및 그 제조 방법 |
| US7630177B2 (en) | 2006-02-14 | 2009-12-08 | Hitachi Global Storage Technologies Netherlands B.V. | Tunnel MR head with closed-edge laminated free layer |
| JP2007266498A (ja) * | 2006-03-29 | 2007-10-11 | Toshiba Corp | 磁気記録素子及び磁気メモリ |
| US20070297220A1 (en) * | 2006-06-22 | 2007-12-27 | Masatoshi Yoshikawa | Magnetoresistive element and magnetic memory |
| JP2008028362A (ja) * | 2006-06-22 | 2008-02-07 | Toshiba Corp | 磁気抵抗素子及び磁気メモリ |
| US7738287B2 (en) | 2007-03-27 | 2010-06-15 | Grandis, Inc. | Method and system for providing field biased magnetic memory devices |
| JP2008252037A (ja) * | 2007-03-30 | 2008-10-16 | Toshiba Corp | 磁気抵抗素子及び磁気メモリ |
| JP2008252018A (ja) * | 2007-03-30 | 2008-10-16 | Toshiba Corp | 磁気抵抗効果素子およびそれを用いた磁気ランダムアクセスメモリ |
| US7486551B1 (en) | 2007-04-03 | 2009-02-03 | Grandis, Inc. | Method and system for providing domain wall assisted switching of magnetic elements and magnetic memories using such magnetic elements |
| US7486552B2 (en) | 2007-05-21 | 2009-02-03 | Grandis, Inc. | Method and system for providing a spin transfer device with improved switching characteristics |
| WO2008154519A1 (en) | 2007-06-12 | 2008-12-18 | Grandis, Inc. | Method and system for providing a magnetic element and magnetic memory being unidirectional writing enabled |
| US7742328B2 (en) | 2007-06-15 | 2010-06-22 | Grandis, Inc. | Method and system for providing spin transfer tunneling magnetic memories utilizing non-planar transistors |
| US7394248B1 (en) | 2007-08-02 | 2008-07-01 | Magic Technologies, Inc. | Method and structure to reset multi-element MTJ |
| US7982275B2 (en) | 2007-08-22 | 2011-07-19 | Grandis Inc. | Magnetic element having low saturation magnetization |
| JP4738395B2 (ja) * | 2007-09-25 | 2011-08-03 | 株式会社東芝 | 磁気抵抗効果素子およびそれを用いた磁気ランダムアクセスメモリ |
| JP4649457B2 (ja) | 2007-09-26 | 2011-03-09 | 株式会社東芝 | 磁気抵抗素子及び磁気メモリ |
| US7826258B2 (en) * | 2008-03-24 | 2010-11-02 | Carnegie Mellon University | Crossbar diode-switched magnetoresistive random access memory system |
| US20090302403A1 (en) | 2008-06-05 | 2009-12-10 | Nguyen Paul P | Spin torque transfer magnetic memory cell |
| US8054677B2 (en) * | 2008-08-07 | 2011-11-08 | Seagate Technology Llc | Magnetic memory with strain-assisted exchange coupling switch |
| US8134864B2 (en) * | 2008-08-14 | 2012-03-13 | Regents Of The University Of Minnesota | Exchange-assisted spin transfer torque switching |
| WO2010080542A1 (en) | 2008-12-17 | 2010-07-15 | Yadav Technology, Inc. | Spin-transfer torque magnetic random access memory having magnetic tunnel junction with perpendicular magnetic anisotropy |
| US7936598B2 (en) | 2009-04-28 | 2011-05-03 | Seagate Technology | Magnetic stack having assist layer |
| US8374048B2 (en) | 2010-08-11 | 2013-02-12 | Grandis, Inc. | Method and system for providing magnetic tunneling junction elements having a biaxial anisotropy |
-
2009
- 2009-04-28 US US12/431,162 patent/US7936598B2/en active Active
-
2010
- 2010-04-27 CN CN201080019289.1A patent/CN102414756B/zh not_active Expired - Fee Related
- 2010-04-27 KR KR1020117028451A patent/KR101405854B1/ko not_active Expired - Fee Related
- 2010-04-27 JP JP2012508575A patent/JP5623507B2/ja active Active
- 2010-04-27 WO PCT/US2010/032483 patent/WO2010126854A1/en not_active Ceased
- 2010-11-11 US US12/943,976 patent/US8416620B2/en not_active Expired - Fee Related
-
2013
- 2013-04-05 US US13/857,410 patent/US8670271B2/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070096229A1 (en) * | 2005-10-28 | 2007-05-03 | Masatoshi Yoshikawa | Magnetoresistive element and magnetic memory device |
| US20080088980A1 (en) * | 2006-10-13 | 2008-04-17 | Eiji Kitagawa | Magnetoresistive element and magnetic memory |
Non-Patent Citations (1)
| Title |
|---|
| SBIAA RACHID et al., "Spin transfer switching enhancement in perpendicular anisotropy magnetic tunnel junctions with a canted in-plane spin polarizer", journal of applied physics , 2009.01.06. p.13910 * |
Also Published As
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| KR20120025489A (ko) | 2012-03-15 |
| WO2010126854A1 (en) | 2010-11-04 |
| JP2012525710A (ja) | 2012-10-22 |
| US20130228884A1 (en) | 2013-09-05 |
| US20100271870A1 (en) | 2010-10-28 |
| CN102414756A (zh) | 2012-04-11 |
| JP5623507B2 (ja) | 2014-11-12 |
| US8670271B2 (en) | 2014-03-11 |
| US8416620B2 (en) | 2013-04-09 |
| US7936598B2 (en) | 2011-05-03 |
| CN102414756B (zh) | 2015-07-22 |
| US20110058412A1 (en) | 2011-03-10 |
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