KR101399686B1 - 착색 감광성 수지 조성물, 컬러 필터 및 액정 표시 디스플레이 - Google Patents

착색 감광성 수지 조성물, 컬러 필터 및 액정 표시 디스플레이 Download PDF

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Publication number
KR101399686B1
KR101399686B1 KR1020090063914A KR20090063914A KR101399686B1 KR 101399686 B1 KR101399686 B1 KR 101399686B1 KR 1020090063914 A KR1020090063914 A KR 1020090063914A KR 20090063914 A KR20090063914 A KR 20090063914A KR 101399686 B1 KR101399686 B1 KR 101399686B1
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KR
South Korea
Prior art keywords
boiling point
solvent
photosensitive resin
resin composition
colored photosensitive
Prior art date
Application number
KR1020090063914A
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English (en)
Korean (ko)
Other versions
KR20100014122A (ko
Inventor
다이 시오타
아키라 가타노
야스히데 오후치
이사오 다테노
요시노리 다도코로
Original Assignee
도쿄 오카 고교 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 도쿄 오카 고교 가부시키가이샤 filed Critical 도쿄 오카 고교 가부시키가이샤
Publication of KR20100014122A publication Critical patent/KR20100014122A/ko
Application granted granted Critical
Publication of KR101399686B1 publication Critical patent/KR101399686B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
KR1020090063914A 2008-07-31 2009-07-14 착색 감광성 수지 조성물, 컬러 필터 및 액정 표시 디스플레이 KR101399686B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008197276A JP5291405B2 (ja) 2008-07-31 2008-07-31 着色感光性樹脂組成物、カラーフィルター、及び液晶表示ディスプレイ
JPJP-P-2008-197276 2008-07-31

Related Child Applications (3)

Application Number Title Priority Date Filing Date
KR20130076630A Division KR101491269B1 (ko) 2008-07-31 2013-07-01 착색 감광성 수지 조성물, 컬러 필터 및 액정 표시 디스플레이
KR1020130076638A Division KR101517281B1 (ko) 2008-07-31 2013-07-01 착색 감광성 수지 조성물, 컬러 필터 및 액정 표시 디스플레이
KR1020130076642A Division KR101517282B1 (ko) 2008-07-31 2013-07-01 착색 감광성 수지 조성물, 컬러 필터 및 액정 표시 디스플레이

Publications (2)

Publication Number Publication Date
KR20100014122A KR20100014122A (ko) 2010-02-10
KR101399686B1 true KR101399686B1 (ko) 2014-05-27

Family

ID=41737458

Family Applications (4)

Application Number Title Priority Date Filing Date
KR1020090063914A KR101399686B1 (ko) 2008-07-31 2009-07-14 착색 감광성 수지 조성물, 컬러 필터 및 액정 표시 디스플레이
KR1020130076638A KR101517281B1 (ko) 2008-07-31 2013-07-01 착색 감광성 수지 조성물, 컬러 필터 및 액정 표시 디스플레이
KR20130076630A KR101491269B1 (ko) 2008-07-31 2013-07-01 착색 감광성 수지 조성물, 컬러 필터 및 액정 표시 디스플레이
KR1020130076642A KR101517282B1 (ko) 2008-07-31 2013-07-01 착색 감광성 수지 조성물, 컬러 필터 및 액정 표시 디스플레이

Family Applications After (3)

Application Number Title Priority Date Filing Date
KR1020130076638A KR101517281B1 (ko) 2008-07-31 2013-07-01 착색 감광성 수지 조성물, 컬러 필터 및 액정 표시 디스플레이
KR20130076630A KR101491269B1 (ko) 2008-07-31 2013-07-01 착색 감광성 수지 조성물, 컬러 필터 및 액정 표시 디스플레이
KR1020130076642A KR101517282B1 (ko) 2008-07-31 2013-07-01 착색 감광성 수지 조성물, 컬러 필터 및 액정 표시 디스플레이

Country Status (2)

Country Link
JP (1) JP5291405B2 (ja)
KR (4) KR101399686B1 (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104536263B (zh) 2008-09-26 2019-06-21 株式会社Lg化学 用于黑矩阵的光敏树脂组合物
JP2012078735A (ja) * 2010-10-06 2012-04-19 Dainippon Printing Co Ltd カラーフィルタの着色層形成用樹脂組成物と保護層形成用樹脂組成物およびカラーフィルタ
JP6009774B2 (ja) * 2011-02-22 2016-10-19 東京応化工業株式会社 感光性樹脂組成物、並びにそれを用いたカラーフィルタ及び表示装置
JP5981159B2 (ja) * 2011-02-22 2016-08-31 東京応化工業株式会社 感光性樹脂組成物、並びにそれを用いたカラーフィルタ及び表示装置
KR20130120394A (ko) * 2012-04-25 2013-11-04 스미또모 가가꾸 가부시키가이샤 감광성 수지 조성물
JP6216133B2 (ja) * 2013-03-25 2017-10-18 互応化学工業株式会社 ２液混合型の主剤及び硬化剤、並びにプリント配線板の製造方法
JP6583275B2 (ja) * 2014-08-11 2019-10-02 Jsr株式会社 着色組成物、着色硬化膜及び固体撮像素子
JP2016090797A (ja) * 2014-11-05 2016-05-23 株式会社Adeka 硬化性組成物
JP6785122B2 (ja) * 2016-10-24 2020-11-18 東京応化工業株式会社 感光性組成物、及び硬化膜の形成方法
KR102134633B1 (ko) * 2016-11-25 2020-07-16 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 블랙 화소 격벽층 및 디스플레이 장치
CN112415851B (zh) * 2019-08-21 2022-03-25 常州强力先端电子材料有限公司 感光性树脂、感光性树脂组合物及应用

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007114723A (ja) * 2005-09-22 2007-05-10 Jsr Corp 着色層形成用感放射線性組成物およびカラーフィルタ
JP2007271687A (ja) * 2006-03-30 2007-10-18 Nippon Steel Chem Co Ltd カラーフィルター用遮光性樹脂組成物及びカラーフィルター

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4727344B2 (ja) * 2005-06-09 2011-07-20 東京応化工業株式会社 感光性組成物
WO2009131189A1 (ja) * 2008-04-25 2009-10-29 三菱化学株式会社 ケトオキシムエステル系化合物及びその利用

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007114723A (ja) * 2005-09-22 2007-05-10 Jsr Corp 着色層形成用感放射線性組成物およびカラーフィルタ
JP2007271687A (ja) * 2006-03-30 2007-10-18 Nippon Steel Chem Co Ltd カラーフィルター用遮光性樹脂組成物及びカラーフィルター

Also Published As

Publication number Publication date
KR20130084277A (ko) 2013-07-24
KR101517281B1 (ko) 2015-05-04
KR101491269B1 (ko) 2015-02-10
KR20130084278A (ko) 2013-07-24
JP2010032940A (ja) 2010-02-12
KR101517282B1 (ko) 2015-05-04
JP5291405B2 (ja) 2013-09-18
KR20100014122A (ko) 2010-02-10
KR20130084276A (ko) 2013-07-24

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