KR101389901B1 - 유체 분사기 상의 비 습윤성 코팅 - Google Patents

유체 분사기 상의 비 습윤성 코팅 Download PDF

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Publication number
KR101389901B1
KR101389901B1 KR1020097013714A KR20097013714A KR101389901B1 KR 101389901 B1 KR101389901 B1 KR 101389901B1 KR 1020097013714 A KR1020097013714 A KR 1020097013714A KR 20097013714 A KR20097013714 A KR 20097013714A KR 101389901 B1 KR101389901 B1 KR 101389901B1
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KR
South Korea
Prior art keywords
layer
fluid injector
wetting
forming
fluid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020097013714A
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English (en)
Korean (ko)
Other versions
KR20090094354A (ko
Inventor
요시마사 오카무라
Original Assignee
후지필름 디마틱스, 인크.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 후지필름 디마틱스, 인크. filed Critical 후지필름 디마틱스, 인크.
Publication of KR20090094354A publication Critical patent/KR20090094354A/ko
Application granted granted Critical
Publication of KR101389901B1 publication Critical patent/KR101389901B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1606—Coating the nozzle area or the ink chamber
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/14—Structure thereof only for on-demand ink jet heads
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/14—Structure thereof only for on-demand ink jet heads
    • B41J2/14201—Structure of print heads with piezoelectric elements
    • B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
    • B05D1/185—Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Nozzles (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
KR1020097013714A 2006-12-01 2007-11-30 유체 분사기 상의 비 습윤성 코팅 Expired - Fee Related KR101389901B1 (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US86832806P 2006-12-01 2006-12-01
US60/868,328 2006-12-01
US86853606P 2006-12-04 2006-12-04
US60/868,536 2006-12-04
US87176306P 2006-12-22 2006-12-22
US60/871,763 2006-12-22
PCT/US2007/086165 WO2008070573A2 (en) 2006-12-01 2007-11-30 Non-wetting coating on a fluid ejector

Publications (2)

Publication Number Publication Date
KR20090094354A KR20090094354A (ko) 2009-09-04
KR101389901B1 true KR101389901B1 (ko) 2014-04-29

Family

ID=39493010

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020097013714A Expired - Fee Related KR101389901B1 (ko) 2006-12-01 2007-11-30 유체 분사기 상의 비 습윤성 코팅

Country Status (6)

Country Link
US (1) US8128201B2 (enExample)
EP (1) EP2089232B1 (enExample)
JP (2) JP5357768B2 (enExample)
KR (1) KR101389901B1 (enExample)
CN (2) CN101541544B (enExample)
WO (1) WO2008070573A2 (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI379771B (en) * 2005-07-01 2012-12-21 Fujifilm Dimatix Inc Non-wetting coating on a fluid ejector
US8128201B2 (en) * 2006-12-01 2012-03-06 Fujifilm Dimatix, Inc. Non-wetting coating on a fluid ejector
EP2732973B1 (en) * 2008-10-30 2015-04-15 Fujifilm Corporation Non-wetting coating on a fluid ejector
US20100110144A1 (en) * 2008-10-31 2010-05-06 Andreas Bibl Applying a Layer to a Nozzle Outlet
US8061810B2 (en) 2009-02-27 2011-11-22 Fujifilm Corporation Mitigation of fluid leaks
US8262200B2 (en) * 2009-09-15 2012-09-11 Fujifilm Corporation Non-wetting coating on a fluid ejector
US8210649B2 (en) * 2009-11-06 2012-07-03 Fujifilm Corporation Thermal oxide coating on a fluid ejector
US8292404B2 (en) * 2009-12-28 2012-10-23 Xerox Corporation Superoleophobic and superhydrophobic surfaces and method for preparing same
US8534797B2 (en) * 2009-12-28 2013-09-17 Xerox Corporation Superoleophobic and superhydrophobic devices and method for preparing same
US8567910B2 (en) 2010-03-31 2013-10-29 Fujifilm Corporation Durable non-wetting coating on fluid ejector
US8573740B2 (en) * 2010-04-09 2013-11-05 Hewlett-Packard Development Company, L.P. Manufacture of a print head
JP6039259B2 (ja) * 2011-07-25 2016-12-07 キヤノン株式会社 液体吐出ヘッド、およびその製造方法
JP5323898B2 (ja) * 2011-08-01 2013-10-23 シャープ株式会社 液体吐出ノズル、及び液体吐出ノズルにおける撥水層の再生方法
JP5752816B2 (ja) 2013-02-04 2015-07-22 富士フイルム株式会社 撥水膜の製造方法、ノズルプレート、インクジェットヘッド、及びインクジェット記録装置
JP6351274B2 (ja) * 2014-01-21 2018-07-04 キヤノン株式会社 液体吐出ヘッド及びその製造方法
US9701119B2 (en) * 2014-06-12 2017-07-11 Funai Electric Co., Ltd. Fluid ejection chip including hydrophilic and hydrophopic surfaces and methods of forming the same
JP6929517B2 (ja) * 2016-06-28 2021-09-01 セイコーエプソン株式会社 インクジェット記録方法、インクジェット記録装置の制御方法
US10006564B2 (en) 2016-08-10 2018-06-26 Ckd Corporation Corrosion resistant coating for process gas control valve
JP6900998B2 (ja) * 2017-03-29 2021-07-14 コニカミノルタ株式会社 吐出用基板、液滴吐出ヘッド及び液滴吐出装置
JP2019107857A (ja) * 2017-12-20 2019-07-04 東芝テック株式会社 薬液吐出装置及び薬液滴下装置
WO2021045783A1 (en) * 2019-09-06 2021-03-11 Hewlett-Packard Development Company, L.P. Fluid ejection face selective coating
JP7334335B2 (ja) * 2020-03-30 2023-08-28 富士フイルム株式会社 液体吐出構造体、液体吐出ヘッド及び液体吐出装置
US11203202B1 (en) * 2020-08-31 2021-12-21 Xerox Corporation System and method for attenuating ink smears on printhead faceplates during inkjet printhead maintenance
JP7540309B2 (ja) * 2020-11-17 2024-08-27 株式会社リコー 液体吐出ヘッド、液体吐出ヘッドの製造方法、液体吐出ユニット及び液体を吐出する装置

Citations (2)

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JPH05193146A (ja) * 1991-07-02 1993-08-03 Hewlett Packard Co <Hp> オリフィス・プレート、オリフィス・プレートの製造方法及びオリフィス・プレートの処理方法
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Patent Citations (2)

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Publication number Priority date Publication date Assignee Title
JPH05193146A (ja) * 1991-07-02 1993-08-03 Hewlett Packard Co <Hp> オリフィス・プレート、オリフィス・プレートの製造方法及びオリフィス・プレートの処理方法
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Publication number Publication date
CN101541544B (zh) 2012-06-20
WO2008070573A3 (en) 2008-09-04
EP2089232A2 (en) 2009-08-19
US20080136866A1 (en) 2008-06-12
WO2008070573A2 (en) 2008-06-12
CN102642404B (zh) 2015-10-28
JP5357768B2 (ja) 2013-12-04
JP5633888B2 (ja) 2014-12-03
EP2089232B1 (en) 2012-08-01
US8128201B2 (en) 2012-03-06
EP2089232A4 (en) 2011-01-26
CN101541544A (zh) 2009-09-23
CN102642404A (zh) 2012-08-22
JP2013060017A (ja) 2013-04-04
JP2010511533A (ja) 2010-04-15
KR20090094354A (ko) 2009-09-04

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