KR101359045B1 - Vapor deposition mask, vapor deposition mask device, method of producing vapor deposition mask, method of producing vapor deposition mask device and method of producing sheet shape member for vapor deposition mask - Google Patents
Vapor deposition mask, vapor deposition mask device, method of producing vapor deposition mask, method of producing vapor deposition mask device and method of producing sheet shape member for vapor deposition mask Download PDFInfo
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- KR101359045B1 KR101359045B1 KR1020080082293A KR20080082293A KR101359045B1 KR 101359045 B1 KR101359045 B1 KR 101359045B1 KR 1020080082293 A KR1020080082293 A KR 1020080082293A KR 20080082293 A KR20080082293 A KR 20080082293A KR 101359045 B1 KR101359045 B1 KR 101359045B1
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- sheet
- deposition mask
- resin sheet
- laminate
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
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- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
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- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Provided is a method of making a deposition mask that produces a deposition mask that makes it possible to perform very high resolution patterning. In the manufacturing method of a vapor deposition mask, a hole is formed in a metal sheet by an etching. The metal sheet to be etched is supplied as a laminate supported on a resin sheet. After the etching, the resin sheet of the laminate is removed.
Deposition mask, sheet-shaped member, laminated body, supply core, removal apparatus
Description
BACKGROUND OF THE
The present invention also relates to a deposition mask apparatus having a deposition mask used for depositing in a desired pattern, and in particular, a deposition mask apparatus having a deposition mask capable of precisely depositing a pattern with a very high resolution. It is about.
Furthermore, the present invention relates to a method of manufacturing a deposition mask used to perform deposition in a desired pattern, and more particularly, to a method of manufacturing a deposition mask that can accurately perform deposition in a pattern of very high resolution.
In addition, the present invention relates to a method for manufacturing a deposition mask apparatus having a deposition mask used to perform deposition in a desired pattern, in particular having a deposition mask capable of precisely depositing a pattern with a very high resolution. A method of manufacturing a deposition mask device.
Further, the present invention relates to a method for manufacturing a sheet-like member used for a deposition mask used for deposition in a desired pattern, and in particular, a deposition mask sheet capable of precisely performing deposition in a pattern having a very high resolution. The manufacturing method of a shape member is related.
Background Art Conventionally, a method of forming a thin film in a desired pattern by using a deposition mask including holes arranged in a desired pattern is known. In recent years, it is strongly desired to perform patterning with a very high resolution by vapor deposition, for example, in the case of depositing an organic material on a substrate at the time of manufacturing an organic EL display device.
In addition, such a deposition mask can generally be manufactured by forming a hole in a metal plate by etching using a photolithography technique (for example, JP 2004-39319A). Moreover, when forming a hole in a metal plate by etching, there exists a method of etching from the surface of both sides of a metal plate, and the method of only etching from the surface of one side of a metal plate.
However, in the case of using a deposition mask produced by etching, there is a problem in that deposition in a pattern of very high resolution cannot be performed with high accuracy. As a result of investigating and researching the cause of this problem, the inventors confirmed the following.
In etching using a photolithography technique, erosion is started from a region of the metal plate not covered with the resist film. Thereafter, the erosion does not proceed only in the thickness direction of the metal plate, but also in the direction along the plate surface of the metal plate. Therefore, a thin hole is formed by etching. For this reason, when etching is performed from the surface of both sides of the
On the other hand, in the case where the metal plate is etched only from the upper side surface, the etching liquid, which has already been used for erosion and the erosion ability is lowered, remains in the thin hole formed by erosion. Then, when the hole of a metal plate reaches the lower side surface, the etching liquid which remained in the hole up to that time flows out from the lower surface, and flows into the hole in which the fresh etching liquid with high erosion ability was formed. At this time, the liquid pressure increases in the lower region in the hole where the cross-sectional area (opening hole area) becomes small, and the lower region in the hole is violently eroded by the fresh etching liquid. As a result, protrusions are formed in the holes as in the case of etching from both sides of the metal plate.
In addition, when the
From these, even when the metal plate is etched only from one side surface, the edge of the deposition pattern is blurred (the outline of the deposition pattern is not clear). In the beginning, when etching a metal plate from one surface side, the cross-sectional shape of a hole may be crushed by the pressure which arises when a hole penetrates and an etching liquid starts to flow in. In this case, it is difficult to form the hole with a desired shape with high accuracy. This phenomenon becomes more remarkable in the deposition mask for performing the high resolution patterning described above. In view of the above, even when the metal plate is etched only from one side surface, deposition in a pattern having a very high resolution cannot be performed with high accuracy.
Therefore, the present invention is based on these findings, and an object of the present invention is to provide a vapor deposition mask that enables patterning of very high resolution.
Moreover, an object of this invention is to provide the vapor deposition mask apparatus provided with the vapor deposition mask which makes it possible to perform the patterning of very high resolution.
Moreover, an object of this invention is to provide the manufacturing method of a deposition mask which manufactures a deposition mask which makes it possible to perform patterning of very high resolution.
Moreover, an object of this invention is to provide the manufacturing method of the deposition mask apparatus which manufactures the deposition mask apparatus provided with the deposition mask which makes it possible to perform patterning of very high resolution.
Moreover, an object of this invention is to provide the manufacturing method of the sheet-like member for deposition masks which manufactures the sheet-like member used for the deposition mask which makes it possible to perform patterning of very high resolution.
The manufacturing method of the vapor deposition mask which concerns on this invention forms the process of supplying the laminated body which has a resin sheet and the metal sheet laminated | stacked on the said resin sheet, and etchings the supplied laminated body, and forms many holes in a metal sheet. And a step of removing the resin sheet from the laminate after the etching step.
In the method of manufacturing a deposition mask according to the present invention, in the step of etching the laminate, a plurality of holes are arranged side by side in one direction, each of which extends in a different direction orthogonal to the one direction. May be formed. In the process of removing the said resin sheet of the manufacturing method of such a vapor deposition mask, you may make it isolate | separate the said metal sheet and the said resin sheet along the said other direction. Moreover, in the manufacturing method of such a vapor deposition mask, the said laminated body may be supplied along the said other direction.
Moreover, in the process of etching the said laminated body of the manufacturing method of the vapor deposition mask which concerns on this invention, two or more porous area | regions in which the some hole was arrange | positioned by the predetermined pattern are formed in a metal sheet, and it can be attached by multiple sides by this. The vapor deposition mask may be made.
Moreover, in the process of supplying the said laminated body of the manufacturing method of the vapor deposition mask by this invention, when the UV light is irradiated, the laminated body containing the resin sheet comprised so that the bonding force with respect to the said metal sheet may fall is supplied, and the said resin In the step of removing the first sheet, the resin sheet may be irradiated with UV light to separate the metal sheet and the resin sheet.
Moreover, in the process of supplying the said laminated body of the manufacturing method of the vapor deposition mask which concerns on this invention, you may make it supply the laminated body which unwinds the winding body which wound the said laminated body, and extends in strip shape.
The deposition mask according to the present invention is a deposition mask manufactured by any one of the above-described manufacturing methods, and gradually decreases in the cross-sectional area of the hole formed in the deposition mask from one side of the deposition mask to the other side. Features
In the deposition mask according to the present invention, in a cross section orthogonal to the sheet surface of the deposition mask, a straight line connecting an end portion on one side of the hole and an end portion on the other side of the hole and an angle formed by the other side May be 60 ° or less.
The deposition mask apparatus according to the present invention includes a deposition mask manufactured by any one of the above-described manufacturing methods, a frame fixed to the deposition mask, and the deposition mask toward the other surface from one side of the deposition mask. It is characterized by gradually decreasing the cross-sectional area of the formed hole.
In the vapor deposition mask apparatus according to the present invention, in a cross section orthogonal to the sheet surface of the vapor deposition mask, a straight line connecting an end portion on one side of the hole and an end portion on the other side of the hole and the other surface is formed. The angle may be 60 ° or less.
The manufacturing method of the vapor deposition mask apparatus which concerns on this invention is a manufacturing method of the vapor deposition mask apparatus provided with the vapor deposition mask, the vapor deposition mask, and the fixed frame, Comprising: It has a resin sheet and the metal sheet laminated | stacked on the said resin sheet. A step of supplying a laminate, a step of forming a plurality of holes in a metal sheet by etching the supplied laminate, a step of removing the resin sheet from the laminate after an etching step, and a metal sheet after an etching step It characterized in that it comprises a step of installing the frame in the.
In the manufacturing method of the vapor deposition mask apparatus by this invention, after removing the said resin sheet, you may make it perform the process of providing the said frame to the said metal sheet. Or in the manufacturing method of the vapor deposition mask apparatus by this invention, after the process of providing the said frame, the process of removing the said resin sheet may be performed.
In the step of etching the laminate in the method of manufacturing a deposition mask apparatus according to the present invention, a plurality of holes are arranged side by side in one direction, and a plurality of holes are formed, each extending in a different direction orthogonal to the one direction. It may be possible. In the process of removing the said resin sheet of the manufacturing method of such a vapor deposition mask apparatus, you may make the said metal sheet and the said resin sheet separate along the said other direction. Moreover, in the manufacturing method of such a vapor deposition mask apparatus, the said laminated body may be supplied along the said other direction.
Moreover, in the process of etching the said laminated body of the manufacturing method of the vapor deposition mask apparatus which concerns on this invention, the vapor deposition mask arrangement | positioning which a plurality of hole area | regions by which the several hole was arrange | positioned by a predetermined pattern is formed in a metal sheet, and by which it can attach to multiple surfaces May be prepared.
Furthermore, in the process of supplying the said laminated body of the manufacturing method of the vapor deposition mask apparatus by this invention, when the UV light is irradiated, the laminated body containing the resin sheet comprised so that the bonding force with respect to the said metal sheet may fall is supplied, In the step of removing the resin sheet, the adhesive layer may be irradiated with UV light to separate the metal sheet and the resin sheet.
Moreover, in the process of supplying the said laminated body of the manufacturing method of the vapor deposition mask apparatus which concerns on this invention, you may make it supply the laminated body which unwinds the winding body which wound the said laminated body, and extends in strip shape.
The manufacturing method of the sheet-shaped member for vapor deposition masks by this invention is a manufacturing method of the sheet-shaped member for vapor deposition masks which manufactures the sheet-shaped member used for the vapor deposition mask in which many holes were formed, The resin sheet and the said resin Supplying a laminate having a metal sheet laminated on the sheet, etching the supplied laminate to form a plurality of holes in the metal sheet, and removing the resin sheet from the laminate after the etching step It is characterized by having a process to.
In the process of etching the said laminated body of the manufacturing method of the sheet-like member for vapor deposition masks which concerns on this invention, it is a several hole arrange | positioned side by side along one direction, and the multiple which extends along the other direction orthogonal to the said one direction A hole may be formed. In the process of removing the said resin sheet of the manufacturing method of the sheet-like member for vapor deposition masks, you may make the said metal sheet and the said resin sheet separate along the said other direction. Moreover, in the manufacturing method of the sheet-like member for vapor deposition masks, the said laminated body may be supplied along the said other direction.
Moreover, in the process of etching the said laminated body of the manufacturing method of the sheet-like member for vapor deposition masks which concerns on this invention, a plurality of hole area | regions in which the several hole was arrange | positioned by a predetermined pattern are formed in a metal sheet, and it can be attached by multiple sides by this. The sheet-like member used for the deposition mask may be manufactured.
Moreover, in the process of supplying the said laminated body of the manufacturing method of the sheet-like member for vapor deposition masks which concerns on this invention, when a UV light is irradiated, the laminated body containing the resin sheet in which the bonding force with respect to the said metal sheet falls is supplied. In the step of removing the resin sheet, the adhesive layer may be irradiated with UV light to separate the metal sheet and the resin sheet.
Moreover, in the process of supplying the said laminated body of the manufacturing method of the sheet-like member for vapor deposition masks which concerns on this invention, you may make it supply the laminated body which unwinds the winding body which wound the said laminated body, and extends in strip shape.
According to the present invention, it is possible to obtain a vapor deposition mask in which the cross-sectional area is gradually decreased from one side to the other side and the shape on the other side is formed with high precision. Therefore, according to this vapor deposition mask, vapor deposition in a pattern of very high resolution can be performed with high accuracy.
Hereinafter, with reference to FIGS. 1-10, one Embodiment of the deposition mask, the deposition mask apparatus, the manufacturing method of a deposition mask, the manufacturing method of a deposition mask apparatus, and the manufacturing method of the sheet-shaped member for deposition masks by this invention is demonstrated. do. 1 to 10 are views for explaining an embodiment of the present invention. In addition, in the following embodiment, when manufacturing an organic electroluminescent display apparatus, the deposition mask (deposition metal mask), deposition mask apparatus, and manufacturing method of a deposition mask which are used for patterning an organic light emitting material on a glass substrate in a desired pattern. The manufacturing method of a vapor deposition mask apparatus and the sheet-like member for vapor deposition masks are demonstrated as an example. However, the present invention is not limited to such an application, and the present invention relates to a deposition mask (deposition metal mask), a deposition mask apparatus, a manufacturing method of a deposition mask, a manufacturing method of a deposition mask apparatus, and a sheet-shaped member for a deposition mask that are used for various purposes. The invention can be applied.
First, an example of a deposition mask and a deposition mask apparatus that can be manufactured by the method for manufacturing a deposition mask and the method for manufacturing a deposition mask apparatus according to the present invention will be mainly described with reference to FIGS. 1 to 5. 1 is a perspective view illustrating an example of a deposition mask and a deposition mask apparatus, and FIG. 2 is a view for explaining a method of using the deposition mask and the deposition mask apparatus.
1 to 4, the
As shown in Fig. 1, in the present embodiment, the
In the present embodiment, the plurality of
1 and 3, the plurality of
However, as shown in FIG. 5, when the
That is, in order to save the expensive deposition material by increasing the utilization efficiency (deposition efficiency: the ratio of adhesion to the glass substrate 42) of the deposition material, the cross section orthogonal to the sheet surface of the deposition mask 20 (cross section in Fig. 5). WHEREIN: The straight line L which connects the edge part of the
If the angle θ is made smaller, the wall surfaces of
That is, angle (theta) which the straight line L makes with respect to the
As described above, in the present embodiment, the
On the other hand, the
The vapor
Next, the manufacturing method of such a
As shown in FIG. 6, the manufacturing method of the vapor deposition mask in this embodiment has the
As shown in FIG. 6, in this embodiment, the winding
In addition, as described below, the
As the
Here,
The supplied laminated
Thereafter, as shown in FIG. 7, the resist
In addition, the area | region facing the resist
Next, as shown in FIG. 8, the
Thereafter, the resist
By the way, if the
Then, the
In addition, in this embodiment, the
In addition, when forming the
As shown in FIG. 9, the
Moreover, it is preferable that the direction which peels the
Thus, the
As described above, according to the present embodiment, the treatment is performed on the
Therefore, the
Moreover, according to this embodiment, the tension (tensile force) which acts on the
Moreover, according to this embodiment, in the process of supplying the
In addition, with respect to the above-described embodiment, various modifications are possible within the scope of the gist of the present invention. Hereinafter, an example of a modification is demonstrated.
In the above-mentioned embodiment, although the
Moreover, in embodiment mentioned above, although the example which prepares and supplies the
Moreover, in embodiment mentioned above, after forming the
In addition, although the example which cut | disconnected the
In addition, although the example which provided the
1 shows an embodiment of a deposition mask and a deposition mask apparatus according to the present invention;
FIG. 2 is a view for explaining a deposition method using the deposition mask and the deposition mask apparatus shown in FIG.
Fig. 3 is a partial plan view showing the deposition mask shown in Fig. 1;
4 is a cross-sectional view taken along a line IV-IV of FIG. 3;
5 is a view for explaining the operation of the deposition mask.
6 is a view for explaining an embodiment of a method for manufacturing a deposition mask and a method for manufacturing a deposition mask apparatus according to the present invention.
7 is a view for explaining a method of forming a resist pattern on a laminate (metal sheet).
8 is a view for explaining a method of etching a laminate (metal sheet).
9 is a view for explaining a method of removing a resin sheet from a laminate.
FIG. 10 is a view corresponding to FIG. 6, illustrating a method for manufacturing a sheet-like member for a deposition mask. FIG.
FIG. 11 is a view corresponding to FIG. 5, illustrating a deposition method using a deposition mask made of a metal plate etched from both sides. FIG.
FIG. 12 is a view corresponding to FIG. 8 for explaining a method of manufacturing a deposition mask by etching a metal plate from a lower side; FIG.
<Explanation of symbols for the main parts of the drawings>
10: deposition mask apparatus
18: sheet-shaped member
20: deposition mask
30: laminate
31: supply core
32: resin sheet
34 metal sheet
38 etching solution
42: glass substrate
44: crucible
46: heater
48: deposition material
50: etching apparatus
51: nozzle
54: removal device
57: conveying roller
Claims (28)
Applications Claiming Priority (2)
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JPJP-P-2007-00218578 | 2007-08-24 | ||
JP2007218578A JP4985227B2 (en) | 2007-08-24 | 2007-08-24 | Vapor deposition mask, vapor deposition mask device, vapor deposition mask manufacturing method, vapor deposition mask device production method, and vapor deposition mask sheet-like member production method |
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KR20090021098A KR20090021098A (en) | 2009-02-27 |
KR101359045B1 true KR101359045B1 (en) | 2014-02-05 |
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KR1020080082293A KR101359045B1 (en) | 2007-08-24 | 2008-08-22 | Vapor deposition mask, vapor deposition mask device, method of producing vapor deposition mask, method of producing vapor deposition mask device and method of producing sheet shape member for vapor deposition mask |
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JP (1) | JP4985227B2 (en) |
KR (1) | KR101359045B1 (en) |
TW (1) | TWI433941B (en) |
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KR101439219B1 (en) | 2012-01-12 | 2014-09-12 | 다이니폰 인사츠 가부시키가이샤 | Vapor deposition mask manufacturing method and organic semiconductor element manufacturing method |
WO2020076021A1 (en) * | 2018-10-11 | 2020-04-16 | 주식회사 오럼머티리얼 | Mask support template and manufacturing method therefor, and frame-integrated mask manufacturing method |
Also Published As
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JP4985227B2 (en) | 2012-07-25 |
TW200927962A (en) | 2009-07-01 |
JP2009052072A (en) | 2009-03-12 |
TWI433941B (en) | 2014-04-11 |
KR20090021098A (en) | 2009-02-27 |
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