KR101328574B1 - Apparatus for transferring substrate - Google Patents

Apparatus for transferring substrate Download PDF

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Publication number
KR101328574B1
KR101328574B1 KR1020120106111A KR20120106111A KR101328574B1 KR 101328574 B1 KR101328574 B1 KR 101328574B1 KR 1020120106111 A KR1020120106111 A KR 1020120106111A KR 20120106111 A KR20120106111 A KR 20120106111A KR 101328574 B1 KR101328574 B1 KR 101328574B1
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KR
South Korea
Prior art keywords
magnet
tray
substrate
shaft
coupled
Prior art date
Application number
KR1020120106111A
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Korean (ko)
Inventor
최창식
이영종
임영
Original Assignee
주식회사 선익시스템
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Priority to KR1020120106111A priority Critical patent/KR101328574B1/en
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Publication of KR101328574B1 publication Critical patent/KR101328574B1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/061—Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G54/00—Non-mechanical conveyors not otherwise provided for
    • B65G54/02—Non-mechanical conveyors not otherwise provided for electrostatic, electric, or magnetic
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16H—GEARING
    • F16H49/00—Other gearings
    • F16H49/005—Magnetic gearings with physical contact between gears
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67709—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations using magnetic elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/6773—Conveying cassettes, containers or carriers

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

Disclosed is an apparatus for transferring a substrate. According to the embodiment of the present invention, the apparatus for transferring a substrate comprises a base which is installed along the moving direction of a substrate; a magnet row which is equipped with multiple a first magnets that are combined with the base while being separated from one another along the moving direction of the substrate; a tray which moves along the base and where the substrate is seated; a second magnet which is combined with the tray in order to be opposite to the first magnet and has the same polarity as the first magnet; multiple roller units which correspond to the multiple first magnets respectively and move the tray; and a balance regulating unit which is included between the roller unit and the first magnet in order to elevate the first magnet in an opposite direction to the elevation of the roller unit. According to the embodiment of the present invention, the apparatus for transferring a substrate can prevent the apparatus for transferring a substrate from damage due to the weight of the tray during a substrate transferring process and can reduce the occurrence of particles due to friction between the roller unit and the tray.

Description

Substrate transfer device {Apparatus for transferring substrate}

The present invention relates to a substrate transfer apparatus. More particularly, the present invention relates to a substrate transfer apparatus for transferring a tray on which a substrate is placed while supporting the same.

2. Description of the Related Art In recent years, there has been an increasing demand for image display devices such as an LCD (Liquid Crystal Display) and OLED (Organic Light Emitting Diodes) display capable of displaying information on information devices due to an increase in demand for information devices. The above-mentioned flat panel display has been enlarged to display more information comfortably, and the display panel has been made larger in order to make the display manufacturing process more efficient. In recent years, production of an 8th generation substrate having a length of at least 2 meters on one side has been attempted.

The fabrication process of the flat panel display includes a preprocessing process for performing firing and the like on the substrate, an electrode formation process for forming an electrode on the processed substrate, a color development layer formation process for forming a color development layer on the formed electrode, And a post-processing process for processing the display panel.

However, as the substrate becomes larger, the weight of the substrate increases, and the weight of the tray used to transport the substrate also increases. As the weight of the substrate and the tray increases, friction with the conveying device for conveying the tray increases, and particles are generated in the tray and the substrate conveying device due to friction. Part of the particles generated during the transfer process can be adhered to the substrate, which causes the defect rate of the substrate to increase. In addition, there is a problem that the substrate transfer device is damaged due to the load of the tray.

The present invention provides a substrate transfer apparatus capable of preventing damage to the substrate transfer apparatus, which may occur due to the load of the tray in the substrate transfer process, and reducing generation of particles due to friction between the roller portion and the tray.

According to an aspect of the present invention, there is provided an apparatus for transporting a substrate, comprising: a base installed along a moving direction of the substrate; A magnet array having a plurality of first magnets spaced apart from each other along the moving direction of the substrate and coupled to the base; A tray moving along the base, on which the substrate is placed; A second magnet coupled to the tray so as to face the first magnet and having the same polarity as the first magnet; And a plurality of roller parts corresponding to the plurality of first magnets, respectively, for moving the tray; A substrate transfer device is provided between the roller unit and the first magnet, and includes a balance adjusting unit for elevating the first magnet in a direction opposite to that of the roller unit.

The base may include a pair of sidewalls extending from the base adjacent to opposite ends of the tray and guiding movement of the tray.

The roller unit includes a shaft passing through the side wall; A feed roller coupled to one end of the shaft and in contact with the tray, wherein the balance adjusting unit comprises: a first rod having one end coupled to the shaft; A second rod disposed in parallel with the first rod and having one end coupled to the first magnet; A central portion may be rotatably coupled to the rotation shaft, and both ends may include a balance bar hinged to the other ends of the first rod and the second rod.

At one end of the first rod, a connection block having an inner diameter larger than the outer diameter of the shaft and penetrated by the shaft may be provided.

The base may include a guide rail formed along a moving direction of the substrate, and the tray may include a guide block guided by the guide rail.

According to another aspect of the invention, the base is provided along the moving direction of the substrate; A magnet array having a plurality of first magnets spaced apart from each other along the moving direction of the substrate and coupled to the base; A tray moving along the base, on which the substrate is placed; A second magnet coupled to the tray so as to face the first magnet and having the same polarity as the first magnet; And a plurality of roller parts corresponding to the plurality of first magnets, respectively, for moving the tray; A balance adjusting part interposed between the roller part and the first magnet to lift and lower the first magnet in a direction opposite to that of the roller part;

The roller unit includes a shaft passing through the side wall; A feed roller coupled to one end of the shaft and in contact with the tray, wherein the balance adjusting unit includes: a first support having one side coupled to the shaft and a first rack formed at the other side; A second support having one side coupled to the first magnet and having a second rack formed at the other side; It may include a pinion meshed with the first rack and the second rack and interposed between the first rack and the second rack.

One end of the first support, the inner diameter larger than the outer diameter of the shaft, may be provided with a connection block penetrated by the shaft.

The base may include a guide rail formed along a moving direction of the substrate, and the tray may include a guide block guided by the guide rail.

The substrate transfer apparatus according to the embodiment of the present invention prevents damage to the substrate transfer apparatus that may occur due to the load of the tray in the substrate transfer process, and reduces generation of particles due to friction between the roller portion and the tray. .

1 is a cross-sectional view of a substrate transfer apparatus according to an embodiment of the present invention;
2 is a view for explaining the structure of a connection block according to an embodiment of the present invention.
3 is a plan view of a substrate transfer apparatus according to an embodiment of the present invention.
4 is a view for explaining a modification of the substrate transfer apparatus according to an embodiment of the present invention.
5 is a cross-sectional view of a substrate transfer apparatus according to another embodiment of the present invention.

BRIEF DESCRIPTION OF THE DRAWINGS The present invention is capable of various modifications and various embodiments, and specific embodiments are illustrated in the drawings and described in detail in the detailed description. It is to be understood, however, that the invention is not to be limited to the specific embodiments, but includes all modifications, equivalents, and alternatives falling within the spirit and scope of the invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT Hereinafter, embodiments of a substrate transfer apparatus according to the present invention will be described in detail with reference to the accompanying drawings, wherein like reference numerals refer to the same or corresponding components, A description thereof will be omitted.

1 is a cross-sectional view of a substrate transfer apparatus according to an embodiment of the present invention, Figure 2 is a view for explaining the structure of the connection block according to an embodiment of the present invention, Figure 3 is an embodiment of the present invention It is a top view of the board | substrate conveying apparatus. And, Figure 4 is a view for explaining a modification of the substrate transfer apparatus according to an embodiment of the present invention.

1 to 4, the base 10, the first magnet 12, the magnet row 14, the tray 16, the second magnet 18, the roller part 20, the side wall 22, and the shaft 24. ), Feed roller 26, balance adjusting unit 52, the first rod 54, the second rod 56, the balance bar 58, the rotating shaft 60, the hinge 62, the connecting block 64 Is shown. 4 shows the base 10, the first magnet 12, the magnet row 14, the tray 16, the second magnet 18, the roller portion 20, the side wall 22, the shaft 24, and the transfer. The roller 26, the guide rail 36 and the guide block 38 are shown. (Enumerate with)

The substrate transfer apparatus according to the present embodiment includes an apparatus for transferring a substrate, the base 10 being installed along a moving direction of the substrate; A magnet array (14) having a plurality of first magnets (12) spaced apart from one another along the moving direction of the substrate and coupled to the base (10); A tray (16) moving along the base (10) and on which the substrate is placed; A second magnet (18) coupled to the tray (16) so as to face the first magnet (12) and having the same polarity as the first magnet (12); And a plurality of roller parts 20 corresponding to the plurality of first magnets 12, respectively, for moving the tray 16; Including a balance adjusting portion 52 interposed between the roller portion 20 and the first magnet 12 to elevate the first magnet 12 in a direction opposite to the lifting and lowering of the roller portion 20, In the substrate transfer process, damage to the substrate transfer apparatus, which may occur due to the load of the tray 16, may be prevented, and generation of particles due to friction between the roller unit 20 and the tray 16 may be reduced.

The base 10 is provided along the moving direction of the substrate. The substrate may have a planar shape, and the width of the base 10 may be made wider than the width of the planar substrate. The base 10 may be formed in a linear or curved shape along the moving direction of the substrate. The base 10 may have a sufficient length to perform the substrate processing process.

The base 10 may include a pair of side walls 22 adjacent to opposite ends of the tray 16 and extending from the base 10 and guiding movement of the tray 16. The side wall 22 may be integrally formed with the base 10 and may guide the tray 16 to move along the base 10. The pair of side walls 22 extend in the base 10 higher than the height of the movement reference plane of the tray 16 to prevent the tray 16 from being detached from the base 10. [

The magnet rows 14 have a plurality of first magnets 12 that are spaced apart from each other along the moving direction of the substrate and coupled to the base 10. The first magnet 12 has N poles and S poles, and one of the poles may be coupled to the base 10 so as to be exposed. The first magnet 12 may be composed of a neodymium magnet, a samarium magnet, a cobalt magnet, or a rare earth sintered magnet of neodymium, iron or boron, which is a magnetic material having a high magnetic force, or may be an electromagnet. One end of the first magnet 12 exposed to the base 10 has the same polarity as the other end of the second magnet 18 described later. Therefore, a repulsive force acts between the first magnet 12 and the second magnet 18, and the weight of the tray 16 can be canceled.

The tray 16 moves along the base 10, and the substrate is seated. The tray 16 may have a width that is wider than the width of the substrate and narrower than the width of the base 10. The tray 16 is moved along the base 10 by the roller unit 20 to be described later.

 The second magnet 18 is coupled to the tray 16 so as to face the first magnet 12 and has the same polarity as the first magnet 12. The second magnet 18 has N poles and S poles, and one of the poles may be coupled to expose one surface of the tray 16. The second magnet 18 may be a magnet having the same material as that of the first magnet 12. The other end of the second magnet 18 exposed on one side of the tray 16 has the same polarity as one end of the first magnet 12. Therefore, a repulsive force acts between the first magnet 12 and the second magnet 18, and the weight of the tray 16 can be canceled.

The first magnet 12 coupled to the base 10 and the second magnet 18 coupled to the tray 16 are partially exposed so that the same polarity is opposite to each other, And the load of the substrate is canceled. The movement of the tray 16 is performed by the roller portion 20 in contact with one end of the tray 16.

The roller part 20 corresponds to the 1st magnet 12, respectively, and moves the tray 16. As shown in FIG. One end of the roller portion 20 is in contact with the tray 16, the other end is connected to the power source, it is possible to move the tray 16 by the power supplied from the power source. The roller part 20 is paired with the first magnet 12, and the roller part 20 and the first magnet 12 which are paired with each other are provided with a balance adjusting part 52 which will be described later.

Particles may be generated due to the weight of the tray 16 at the junction of the tray 16 and the roller portion 20, but the tray (reduced by the repulsive force acting between the first magnet 12 and the second magnet 18 By partially offsetting the weight of 16), the frictional force can be reduced to reduce the generation of particles. In addition, deformation of the roller portion 20 due to the weight of the tray 16 can also be prevented by the above repulsive force.

The roller unit 20 may include a shaft 24 penetrating the side wall 22 and a feed roller 26 coupled to one end of the shaft 24 and in contact with the tray 16. The shaft 24 passes through the side wall 22 formed in the base 10 and the diameter of the shaft 24 is smaller than the inner diameter of the through-hole formed in the side wall 22. Thus, the sidewall 22 does not affect the rotation of the shaft 24.

The conveying roller 26 is coupled to one end of the shaft 24 and abuts on the tray 16. The shaft 24 and the feed roller 26 are rotated by the rotation of the motor, which will be described later, and the tray 16 can be moved along the base 10 by the rotation of the feed roller 26. Since the conveying roller 26 is in contact with the tray 16, it rubs against the tray 16 and particles may be generated by friction. However, due to the repulsive force between the first magnet 12 and the second magnet 18 The load of the tray 16 is canceled, so that generation of particles can be reduced.

When the substrate is seated on the tray 16, the load of the substrate and the tray 16 is supported by the repulsive force between the roller portion 20 and the two magnets, the substrate transfer apparatus according to the present embodiment, the roller portion 20 And a balance adjusting portion 52 is interposed between the roller portion 20 and the first magnet 12 to distribute the load acting on the magnet.

The balance adjusting part 52 is interposed between the roller part 20 and the 1st magnet 12, and raises and lowers the 1st magnet 12 in the direction opposite to the lifting and lowering of the roller part 20, and the roller part 20 And distribute the load acting on the magnet.

The balance adjusting unit 52 according to the present exemplary embodiment includes a first rod 54 having one end coupled to the shaft 24 and a first rod 54 disposed in parallel with the first rod 54 and having one end mounted on the first magnet 12. The second rod 56 and the central portion is rotatably coupled to the rotation shaft 60, both ends are coupled to the hinge 62 to the other end of the first rod 54 and the second rod 56 And a balance bar 58.

The connecting block 64 may be interposed between the shaft 24 and the first rod 54. If the load of the tray 16 is not heavy, the shaft 24 passes through the hollow portion formed in the connecting block 64, rotatable without interruption to the first rod 54, the load of the tray 16 is heavy When the shaft 24 is lowered, the first rod 54 may be lowered in contact with the connecting block 64.

By the load of the tray 16, the shaft 24 of the roller portion 20 can be lowered, and eventually the first rod 54 coupled to the shaft 24 is lowered. Due to the lowering of the first rod 54, one end of the balance bar 58 is lowered about the rotation axis 60 of the center portion, and thus the other end of the balance bar 58 is raised. As the other end of the balance bar 58 rises, the second rod 56 hinged around the hinge axis 62 as the other end of the balance bar 58 ascends and the first magnet seated on the base 10 ( 12) will rise.

The tray 16 on which the repulsive force is applied is raised by the lifting of the first magnet 12 and the load applied to the conveying roller 26 is reduced by the counter force of the tray 16 due to the repulsive force, (24) rises. As the shaft 24 rises, the first magnet 12 is lowered according to the above-described principle. This process is repeated to distribute the load acting on the roller portion 20 and the magnet.

This modified example is for more precise transfer of the substrate, in addition to the configuration of the substrate transfer apparatus according to the above-described embodiment, to form a guide rail 36 formed along the moving direction of the substrate in the base 10, The guide block 38 guided by the guide rail 36 is formed in the tray 16.

The guide block 38 of the tray 16 is guided by the guide rails 36 of the base 10 in accordance with the operation of the driving part 20,

5 is a cross-sectional view of a substrate transfer apparatus according to another embodiment of the present invention. 5, the base 10, the first magnet 12, the magnet row 14, the tray 16, the second magnet 18, the roller portion 20, the side wall 22, the shaft 24, Feed roller 26, connecting block 64, first support 70, second support 72, first rack 74, second rack 76, pinion 78 are shown.

The balance adjusting unit 52 according to the present embodiment includes: a first support 70 having one side coupled to the shaft 24 and a first rack 74 formed at the other side; A second support 72 having one side coupled to the first magnet 12 and having a second rack 76 formed on the other side thereof; And a pinion 78 engaged with the first rack 74 and the second rack 76 and interposed between the first rack 74 and the second rack 76.

At one end of the first support 70, a connection block 64 having an inner diameter larger than the outer diameter of the shaft 24 and penetrated by the shaft 24 may be provided. If the load of the tray 16 is not heavy, the shaft 24 passes through the hollow portion formed in the connecting block 64, rotatable irrespective of the first support 70, the load of the tray 16 is heavy When the shaft 24 is lowered, the first support 70 may be lowered in contact with the connecting block 64.

By the load of the tray 16, the shaft 24 of the roller portion 20 can be lowered, one side of the first support 70 coupled to the shaft 24 is lowered. Due to the lowering of the first support 70, the first rack 74 formed on the other side of the first support 70 descends, and the pinion engaged between the first rack 74 and the second rack 76 ( The second rack 76 is raised by the rotation of 78. As the second rack 76 is raised, the second support 72 is raised, connected to one side of the second support 72, and the first magnet 12 disposed at the base 10 is raised.

The tray 16 on which the repulsive force is applied is raised by the lifting of the first magnet 12 and the load applied to the conveying roller 26 is reduced by the counter force of the tray 16 due to the repulsive force, (24) rises. As the shaft 24 rises, according to the principle described above, the first magnet 12 is lowered. This process is repeated to distribute the load acting on the roller portion 20.

Many embodiments other than the above-described embodiments are within the scope of the claims of the present invention.

10: Base 12: 1st magnet
14: Magnet column 16: Tray
18: 2nd magnet 20: Roller part
22: side wall 24: shaft
26: feed roller 36: guide rail
38: guide block 52: balance control unit
54: first load 56: second load
58: balance bar 60: rotating shaft
62: hinge 64: connecting block
70: first support 72: second support
74: first rack 76: second rack
78: pinion

Claims (7)

An apparatus for transferring a substrate,
A base installed along the moving direction of the substrate;
A magnet array having a plurality of first magnets spaced apart from each other along the moving direction of the substrate and coupled to the base;
A tray moving along the base, on which the substrate is placed;
A second magnet coupled to the tray so as to face the first magnet and having the same polarity as the first magnet; And
A plurality of rollers respectively corresponding to the plurality of first magnets and moving the trays;
And a balance adjusting portion interposed between the roller portion and the first magnet to lift the first magnet in a direction opposite to that of the roller portion.
The method of claim 1,
The base includes:
And a pair of side walls extending from the base adjacent to both ends of the tray and guiding movement of the tray.
3. The method of claim 2,
The roller unit
A shaft passing through the side wall;
And a conveying roller coupled to one end of the shaft and contacting the tray,
Wherein the balance adjuster comprises:
A first rod having one end coupled to the shaft;
A second rod disposed parallel to the first rod and having one end coupled to the first magnet;
And a balance bar rotatably coupled to the rotary shaft at a central portion thereof and hinged to both ends of the first rod and the second rod at both ends thereof.
The method of claim 3,
One end of the first rod, the substrate transport apparatus having an inner diameter larger than the outer diameter of the shaft, the connecting block penetrated by the shaft is provided.
3. The method of claim 2,
The roller unit
A shaft passing through the side wall;
And a conveying roller coupled to one end of the shaft and contacting the tray,
Wherein the balance adjuster comprises:
A first support having one side coupled to the shaft and having a first rack formed at the other side;
A second support having one side coupled to the first magnet and having a second rack formed at the other side;
And a pinion meshed with the first rack and the second rack and interposed between the first rack and the second rack.
The method of claim 5,
One end of the first support, the substrate transport apparatus having an inner diameter larger than the outer diameter of the shaft, characterized in that the connection block penetrated by the shaft is provided.
The method of claim 1,
Wherein a guide rail is formed on the base along a moving direction of the substrate,
The tray, the substrate transport apparatus characterized in that the guide block guided by the guide rail is formed.
KR1020120106111A 2012-09-24 2012-09-24 Apparatus for transferring substrate KR101328574B1 (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109484794A (en) * 2017-09-13 2019-03-19 京东方科技集团股份有限公司 A kind of base plate transfer device
KR102168407B1 (en) * 2019-07-19 2020-10-21 주식회사 에스에프에이 Glass transfer apparatus
KR102169294B1 (en) * 2019-07-19 2020-10-23 주식회사 에스에프에이 Glass deposition apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07115120A (en) * 1993-10-18 1995-05-02 Hitachi Ltd Substrate conveying device and method thereof
KR20110091131A (en) * 2010-02-05 2011-08-11 주식회사 에스에프에이 Transferring apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07115120A (en) * 1993-10-18 1995-05-02 Hitachi Ltd Substrate conveying device and method thereof
KR20110091131A (en) * 2010-02-05 2011-08-11 주식회사 에스에프에이 Transferring apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109484794A (en) * 2017-09-13 2019-03-19 京东方科技集团股份有限公司 A kind of base plate transfer device
US11230436B2 (en) 2017-09-13 2022-01-25 Boe Technology Group Co., Ltd. Substrate conveyance device
KR102168407B1 (en) * 2019-07-19 2020-10-21 주식회사 에스에프에이 Glass transfer apparatus
KR102169294B1 (en) * 2019-07-19 2020-10-23 주식회사 에스에프에이 Glass deposition apparatus

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