JP2005145713A - Conveying device of substrate - Google Patents

Conveying device of substrate Download PDF

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JP2005145713A
JP2005145713A JP2004016073A JP2004016073A JP2005145713A JP 2005145713 A JP2005145713 A JP 2005145713A JP 2004016073 A JP2004016073 A JP 2004016073A JP 2004016073 A JP2004016073 A JP 2004016073A JP 2005145713 A JP2005145713 A JP 2005145713A
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substrate
cassette
transfer
manufacturing apparatus
manufacturing
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Hiroshi Chinbe
弘 珍部
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Hitachi Kiden Kogyo Ltd
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Hitachi Kiden Kogyo Ltd
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<P>PROBLEM TO BE SOLVED: To provide a conveying device of a substrate which does not generate time loss in delivery of the substrate and can improve production efficiency, when substrate conveyance to a manufacturing device or the like is performed every one substrate. <P>SOLUTION: The conveying device of the substrate performs delivery of the substrates W every one substrate to a manufacturing device 5. A cassette 3A capable of storing the substrates W is mounted to a lifting device 34, the cassette 3A is lifted so as to substantially match the transfer surface of a substrate transferring mechanism 4 disposed between the lifting device 34 and the manufacturing device 5 or the like with a substrate storing position of the cassette 3A, and the substrates W are transferred at substantially the same level between the cassette 3A and the manufacturing device 5 or the like. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、液晶や半導体の製造工場において、クリーンルーム中に設置されている液晶や半導体の製造装置又は検査装置(以下、「製造装置等」という。)との間で、液晶基板や半導体ウエハ(以下、「基板」という。)の受け渡しを行うための基板の搬送装置に関し、特に、製造装置等との間で、1枚単位で基板の受け渡しを行うための基板の搬送装置に関するものである。   The present invention relates to a liquid crystal substrate or a semiconductor wafer (hereinafter referred to as a “manufacturing apparatus”) or a liquid crystal or semiconductor manufacturing apparatus or inspection apparatus (hereinafter referred to as “manufacturing apparatus”) installed in a clean room in a liquid crystal or semiconductor manufacturing factory. The present invention relates to a substrate transfer apparatus for transferring a substrate), and more particularly to a substrate transfer apparatus for transferring a substrate in units of one unit with a manufacturing apparatus or the like.

従来、基板は、専用の基板収納用のカセットに収納され、製造装置等との間で搬送したり、一時貯留されている(特許文献1参照)。   Conventionally, a substrate is stored in a dedicated substrate storage cassette and is transported to and temporarily stored in a manufacturing apparatus or the like (see Patent Document 1).

ところで、製造装置等との間での基板の搬送を、専用の基板収納用カセットに収納して行う方法は、基板が小形の場合は、多数の基板の搬送を効率よく行うことができる利点がある反面、近年、基板が大形化するに伴って、カセットと製造装置等との間での基板の受け渡しを行うための機構が複雑となり、時間的なロスが生じたり、事故が生じやすくなるという問題があった。   By the way, the method of carrying a substrate with a manufacturing apparatus or the like by storing it in a dedicated substrate storage cassette has an advantage that a large number of substrates can be efficiently carried when the substrate is small. On the other hand, in recent years, as the size of the substrate increases, the mechanism for transferring the substrate between the cassette and the manufacturing apparatus becomes complicated, and time loss or accidents are likely to occur. There was a problem.

この問題点に対処するため、大形の基板を対象とする設備においては、製造装置等との間での基板の搬送を、基板1枚単位で行うことも試みられてきている(特許文献2参照)。   In order to cope with this problem, it has been attempted to transfer a substrate to / from a manufacturing apparatus or the like in units of one substrate in a facility for a large substrate (Patent Document 2). reference).

しかしながら、製造装置等との間を含む基板の搬送を、基板1枚単位で行うようにした場合、特に、ハンドの可動範囲内の任意の位置へ基板を載置することが可能な搬送移載機構を用いた基板の受け渡し時に時間的なロスを生じ、生産効率が低下するという問題があった。
特開平11−334810号公報 特開2003−243482号公報
However, when transferring the substrate including between the manufacturing apparatus and the like in units of one substrate, it is possible to transfer the substrate to any position within the movable range of the hand. There was a problem that a time loss occurred during the delivery of the substrate using the mechanism, and the production efficiency was lowered.
JP-A-11-334810 JP 2003-243482 A

本発明は、上記従来の基板の搬送装置が有する問題点に鑑み、製造装置等との間での基板の搬送を、基板1枚単位で行うようにした場合において、基板の受け渡し時に時間的なロスが生じず、生産効率を向上することができる基板の搬送装置を提供することを目的とする。   In view of the problems of the conventional substrate transfer device, the present invention is time-consuming at the time of substrate transfer when the substrate is transferred to and from the manufacturing apparatus or the like in units of one substrate. It is an object of the present invention to provide a substrate transfer apparatus that does not cause loss and can improve production efficiency.

上記目的を達成するため、本発明の基板の搬送装置は、製造装置等との間で、1枚単位で基板の受け渡しを行うようにした基板の搬送装置において、基板を収容可能なカセットを昇降装置に載置し、昇降装置と製造装置等との間に配設した基板移載機構の移載面と、前記カセットの基板収納位置とが略一致するようにカセットを昇降することにより、カセットと製造装置等との間で基板を略同一レベルで移載するようにしたことを特徴とする。   In order to achieve the above object, a substrate transfer apparatus according to the present invention moves up and down a cassette that can accommodate a substrate in a substrate transfer apparatus that transfers a substrate in units of one unit with a manufacturing apparatus or the like. By placing the cassette up and down, the cassette is moved up and down so that the transfer surface of the substrate transfer mechanism disposed between the lifting device and the manufacturing device etc. and the substrate storage position of the cassette substantially coincide with each other. And a manufacturing apparatus or the like, the substrate is transferred at substantially the same level.

この場合において、前記昇降装置に載置したカセットと基板移載機構との間に区画壁を配設し、該区画壁に基板が通過可能なスリット部を形成することができる。   In this case, a partition wall can be provided between the cassette placed on the lifting device and the substrate transfer mechanism, and a slit portion through which the substrate can pass can be formed in the partition wall.

また、前記区画壁により区画された製造装置等及び基板移載機構を配設した区画の内圧を、搬送移載機及び複数台のカセットを収容可能なカセット収納棚を配設した区画の内圧より高く維持するようにすることができる。   Further, the internal pressure of the compartment provided with the manufacturing apparatus etc. and the substrate transfer mechanism partitioned by the partition wall is determined from the internal pressure of the compartment provided with the transfer / transfer machine and a cassette storage shelf that can accommodate a plurality of cassettes. Can be kept high.

本発明の基板の搬送装置によれば、製造装置等との間で、1枚単位で基板の受け渡しを行うようにした基板の搬送装置において、基板を収容可能なカセットを昇降装置に載置し、昇降装置と製造装置等との間に配設した基板移載機構の移載面と、前記カセットの基板収納位置とが略一致するようにカセットを昇降することにより、カセットと製造装置等との間で基板を略同一レベルで移載するようにしたことから、製造装置等との間での基板の受け渡し時に時間的なロスが生じず、生産効率を向上することができ、特に、カセットと製造装置等との間で基板を略同一レベルで移載することにより、大形の基板の場合でも、基板の変形を抑えて移載することが可能となり、事故の発生を低減することができる。   According to the substrate transfer apparatus of the present invention, in the substrate transfer apparatus that transfers the substrate in units of one unit with a manufacturing apparatus or the like, a cassette that can accommodate the substrate is placed on the lifting device. The cassette and the manufacturing apparatus, etc., by moving the cassette up and down so that the transfer surface of the substrate transfer mechanism disposed between the lifting apparatus and the manufacturing apparatus etc. and the substrate storage position of the cassette substantially coincide with each other. Since the substrate is transferred at substantially the same level between the two, there is no time loss when transferring the substrate to and from the manufacturing apparatus, and the production efficiency can be improved. Can be transferred with the deformation of the substrate suppressed even in the case of a large substrate, and the occurrence of accidents can be reduced. it can.

また、昇降装置に載置したカセットとコンベア機構との間に区画壁を配設し、該区画壁に基板が通過可能なスリット部を形成することにより、高いクリーン度が要求される製造装置等を、発塵の多い搬送移載機から隔離することができる。   In addition, a partition wall is provided between the cassette placed on the lifting device and the conveyor mechanism, and a slit portion through which the substrate can pass is formed on the partition wall, so that a manufacturing device that requires a high degree of cleanliness, etc. Can be isolated from a transfer and transfer machine that generates a lot of dust.

また、区画壁により区画された製造装置等及び基板移載機構を配設した区画の内圧を、搬送移載機及び複数台のカセットを収容可能なカセット収納棚を配設した区画の内圧より高く維持するようにすることにより、区画壁により区画された製造装置等及びコンベア機構を配設した区画内を高いクリーン度に維持することができる。   In addition, the internal pressure of the compartment provided with the manufacturing apparatus and the substrate transfer mechanism partitioned by the partition wall is higher than the internal pressure of the compartment provided with the transfer / transfer machine and the cassette storage shelf that can accommodate a plurality of cassettes. By maintaining it, it is possible to maintain a high degree of cleanness in the compartment where the manufacturing apparatus and the conveyor mechanism partitioned by the partition wall are disposed.

また、前記昇降装置及び基板移載機構を製造装置等に対応して設置するとともに、搬送移載機により、昇降装置と複数台のカセットを収容可能なカセット収納棚との間でのカセットの搬送を行うようにすることにより、多数の基板の搬送を効率よく行うことができる。   In addition, the lifting device and the substrate transfer mechanism are installed corresponding to the manufacturing device and the like, and the transfer of the cassette between the lifting device and a cassette storage shelf capable of storing a plurality of cassettes is performed by the transfer device. By carrying out the above, it is possible to efficiently carry a large number of substrates.

以下、本発明の基板の搬送装置の実施の形態を、図面に基づいて説明する。   Embodiments of a substrate transfer apparatus according to the present invention will be described below with reference to the drawings.

図1〜図10に、本発明の基板の搬送装置を適用した液晶の製造設備の一実施例を示す。
この液晶の製造設備は、大形の基板Wを対象とするもので、製造装置等5との間での基板Wの搬送を、基板1枚単位で行うようにしたものである。
1 to 10 show an embodiment of a liquid crystal manufacturing facility to which the substrate transfer apparatus of the present invention is applied.
This liquid crystal manufacturing facility is intended for a large substrate W, and the substrate W is transferred to and from the manufacturing apparatus 5 or the like in units of one substrate.

そして、この液晶の製造設備に適用した基板の搬送装置は、少なくともハンド11の可動範囲内の任意の位置へ複数枚の基板Wを収容可能なカセット3を搬送・移載することが可能な搬送移載機1(本実施例においては、搬送移載機1により、昇降装置34と、複数台のカセット3を収容可能なカセット収納棚(ストッカ)Sとの間で、カセット3の搬送・移載を行うようにしているが、搬送移載機1により基板Wを、基板1枚単位で搬送・移載するようにすることもできる。)を備え、基板Wを収容可能なカセット3Aを昇降装置34に載置し、昇降装置34と製造装置等5との間に配設した基板移載機構としてのコンベア機構4の移載面と、カセット3Aの基板収納位置とが略一致するようにカセット3Aを昇降することにより、カセット3Aと製造装置等5との間で基板Wを略同一レベル(略同一の高さ)で移載するようにしている。   The substrate transfer apparatus applied to this liquid crystal manufacturing facility is capable of transferring and transferring the cassette 3 that can accommodate a plurality of substrates W to any position within at least the movable range of the hand 11. The transfer machine 1 (in this embodiment, the transfer / transfer machine 1 transfers and transfers the cassette 3 between the lifting device 34 and a cassette storage shelf (stocker) S capable of storing a plurality of cassettes 3. However, it is also possible to transport and transfer the substrate W in units of one substrate by the transport / transfer machine 1), and move up and down the cassette 3 </ b> A that can accommodate the substrate W. The transfer surface of the conveyor mechanism 4 as a substrate transfer mechanism placed between the lifting device 34 and the manufacturing device 5 is placed on the device 34 so that the substrate storage position of the cassette 3A substantially coincides. By moving the cassette 3A up and down, 3A to be adapted to transfer the substrate W at substantially the same level (substantially the same height) between the manufacturing apparatus 5.

この場合において、昇降装置34に載置することにより昇降可能に構成したカセット3Aとコンベア機構4との間に区画壁7を配設し、この区画壁7に基板Wが通過可能なスリット部71を形成するようにする。
これにより、高いクリーン度が要求される製造装置等5を、発塵の多い搬送移載機1等から隔離することができる。
なお、区画壁7に形成したスリット部71には、シャッタ(図示省略)を配設することもできるが、スリット部71を基板Wが通過可能な範囲の小さい寸法に形成することにより、シャッタを配設することなく区画壁7により区画された製造装置等5を配設した区画R1を高いクリーン度に維持することができる。
In this case, a partition wall 7 is disposed between the cassette 3A configured to be moved up and down by being placed on the lifting device 34 and the conveyor mechanism 4, and a slit portion 71 through which the substrate W can pass through the partition wall 7. To form.
Thereby, the manufacturing apparatus 5 etc. in which a high cleanliness degree is required can be isolated from the conveyance transfer machine 1 etc. with much dust generation.
Note that a shutter (not shown) can be provided in the slit portion 71 formed in the partition wall 7, but the shutter is formed by forming the slit portion 71 in a small dimension that allows the substrate W to pass through. The partition R1 in which the manufacturing apparatus 5 and the like partitioned by the partition wall 7 is disposed without being disposed can be maintained at a high degree of cleanliness.

また、区画壁7により区画された製造装置等5及びコンベア機構4を配設した区画R1の内圧を、例えば、コンベア機構4の上方に配設した空気清浄機構6からのダウンフローによって、送移載機構1及びカセット収納棚Sを配設した区画R2の内圧より高く維持するようにするようにする。
これにより、区画壁7により区画された製造装置等5及びコンベア機構4を配設した区画R1内を高いクリーン度に維持することができる。
Further, the internal pressure of the section R1 in which the manufacturing apparatus 5 and the conveyor mechanism 4 partitioned by the partition wall 7 are disposed is transferred by, for example, a downflow from the air cleaning mechanism 6 disposed above the conveyor mechanism 4. The pressure is maintained higher than the internal pressure of the section R2 in which the loading mechanism 1 and the cassette storage shelf S are disposed.
Thereby, the inside of division R1 in which the manufacturing apparatus 5 etc. and the conveyor mechanism 4 which were divided by the division wall 7 were arrange | positioned can be maintained at a high cleanliness.

また、搬送移載機1として、本実施例においては、スタッカクレーンを用い、スタッカクレーンが移動するレール2を複数台の製造装置等5に跨って敷設することにより、複数台の各製造装置等5に対応して配設した昇降可能に構成した昇降装置34にカセット3Aを搬送・移載できるようにしている。
このように、各製造装置等5に対応して配設した昇降装置34間、昇降装置34と複数台のカセット3を収容可能なカセット収納棚Sとの間でカセット3の搬送を行うようにすることにより、多数の基板Wの搬送を効率よく行うことができる。
Further, in the present embodiment, a stacker crane is used as the transfer / transfer machine 1, and a rail 2 on which the stacker crane moves is laid across a plurality of manufacturing apparatuses 5, etc. The cassette 3 </ b> A can be transported / transferred to a lifting / lowering device 34 that can be lifted / lowered corresponding to 5.
As described above, the cassettes 3 are transported between the lifting devices 34 arranged corresponding to the respective manufacturing devices 5, and between the lifting devices 34 and the cassette storage shelves S that can store a plurality of cassettes 3. By doing so, a large number of substrates W can be transported efficiently.

ここで、この液晶の製造設備において用いる製造装置等5に対応して配設した昇降装置34を含むカセット3Aに収容された基板Wの搬送機構の具体的な一例を以下説明する。
このカセット3Aは、図3以下に示すように、カセット3Aの基板収納部31に複数の並列する支持部材32を延設し、該支持部材32を上下に複数段設置することにより複数の基板Wを収納できるようにしている(他のカセット3も同様)。
ところで、この例においては、基板収納部31の支持部材32を、基板収納部31の両側から対向方向にそれぞれ複数の並列する支持部材32を延設するようにしているが、支持部材32の形状は、これに限定されず。例えば、支持部材32を基板収納部31の両側に架け渡すようにすることもできる。
そして、この基板Wの搬送機構は、カセット3Aを載置する昇降装置34と、カセット3A、すなわち、基板収納部31の昇降により支持部材32間に挿入され、支持部材32に支持された基板Wを受け取る複数の搬送用支持部材35と、この搬送用支持部材35の先端に設けられ、受け取った基板Wを基板収納部31の外に送り出す送り機構36とを備えている。
Here, a specific example of the transport mechanism of the substrate W accommodated in the cassette 3A including the lifting device 34 disposed corresponding to the manufacturing apparatus 5 used in the liquid crystal manufacturing facility will be described below.
As shown in FIG. 3 and the subsequent drawings, the cassette 3A has a plurality of parallel supporting members 32 extending from the substrate storage portion 31 of the cassette 3A, and a plurality of substrates W are provided by arranging the supporting members 32 vertically in a plurality of stages. (Other cassettes 3 are also the same).
By the way, in this example, the support member 32 of the substrate storage part 31 is extended from the both sides of the substrate storage part 31 in the opposing direction, respectively. Is not limited to this. For example, the support member 32 can be bridged on both sides of the substrate storage unit 31.
The transport mechanism for the substrate W includes a lifting / lowering device 34 for placing the cassette 3 </ b> A, and a substrate W inserted between the support members 32 by the lifting / lowering of the cassette 3 </ b> A, that is, the substrate storage unit 31, and supported by the support member 32. And a feeding mechanism 36 that feeds the received substrate W to the outside of the substrate storage portion 31.

基板収納部31は、前後が開放され、両側から対向方向にそれぞれ複数の並列する支持部材32を延設するとともに、これらの支持部材32を上下に複数段設置することにより複数の基板Wを所定間隔を開けて収納するようになっている。   The substrate storage unit 31 is open at the front and rear, and a plurality of support members 32 arranged in parallel in opposite directions from both sides are extended, and a plurality of substrates W are arranged in a predetermined manner by installing these support members 32 in a plurality of stages up and down. It is designed to be stored at an interval.

昇降装置34は、例えば、カセット3Aの基板収納部31の下部4箇所を支持する複数台のシリンダからなり、基板収納部31を少なくともその高さの範囲で昇降させることができるようにされている。
この昇降装置34は、台車により移動可能に設けられたベース37に固定されている。
The elevating device 34 includes, for example, a plurality of cylinders that support the lower four positions of the substrate storage unit 31 of the cassette 3A, and can elevate and lower the substrate storage unit 31 at least within the height range. .
The lifting device 34 is fixed to a base 37 that is movably provided by a carriage.

搬送用支持部材35は、カセット3Aの基板収納部31の昇降により支持部材32間に挿入される複数の棒状のものからなり、先端に備えた送り機構36を介して、支持部材32に支持された基板Wを受け取るようにされている。
この搬送用支持部材35は、基板Wを幅方向と長さ方向で略均等に支持できるように、複数の搬送用支持部材35が所定の配置でベース37に固定されている。
The transport support member 35 is composed of a plurality of rod-like members inserted between the support members 32 by raising and lowering the substrate storage portion 31 of the cassette 3A, and is supported by the support member 32 via a feed mechanism 36 provided at the tip. The substrate W is received.
The transport support members 35 have a plurality of transport support members 35 fixed to the base 37 in a predetermined arrangement so that the substrate W can be supported substantially uniformly in the width direction and the length direction.

送り機構36は、この例では、搬送用支持部材35の先端に設けられた駆動ローラを備え、基板Wを幅方向と長さ方向で略均等に支持できるように、搬送用支持部材35に設けられている。
この送り機構36は、駆動ローラをモータ(図示省略)により回転させることにより、
受け取った基板Wを基板収納部31の前又は後方向に搬送して送り出すことができる。
なお、基板収納部31内に収納されている基板Wは、搬送用支持部材35と送り機構36によって、下位に位置するものから順に取り出されるようにしている。
In this example, the feed mechanism 36 includes a driving roller provided at the tip of the transport support member 35, and is provided on the transport support member 35 so that the substrate W can be supported substantially equally in the width direction and the length direction. It has been.
The feed mechanism 36 rotates the drive roller with a motor (not shown),
The received substrate W can be transported and sent out forward or backward of the substrate storage unit 31.
The substrates W stored in the substrate storage unit 31 are sequentially taken out from the lower one by the transport support member 35 and the feed mechanism 36.

そして、搬送用支持部材35及び送り機構36は、基板Wを基板収納部31の前又は後方向に搬送して外部に送り出すほか、送り出し時と逆動作を行うことにより、外部から送り込まれた基板Wを基板収納部31内に受け入れ、支持部材32に受け渡して支持されるように構成することができる。   The transport support member 35 and the feed mechanism 36 transport the substrate W in the forward or backward direction of the substrate storage unit 31 and send it out to the outside, and perform a reverse operation to that at the time of delivery, thereby feeding the substrate from the outside. It can be configured such that W is received in the substrate storage portion 31 and transferred to and supported by the support member 32.

一方、この例の基板Wの搬送機構は、上記送り機構36の間で昇降可能に設けられ、送り機構36の受け取り位置の上方で基板Wをエア浮上させながら支持するエア浮上機構38と、該エア浮上機構38により浮上支持した基板Wの位置を修正する位置決め機構39とを備えるようにしている。   On the other hand, the transport mechanism for the substrate W in this example is provided so as to be movable up and down between the feeding mechanisms 36, and an air floating mechanism 38 that supports the substrate W while floating the air above the receiving position of the feeding mechanism 36; A positioning mechanism 39 for correcting the position of the substrate W levitated and supported by the air levitating mechanism 38 is provided.

エア浮上機構38は、送り機構36の間で、駆動装置(図示省略)により昇降可能に設けられ、送り機構36の受け取り位置の上方で、基板Wをエア浮上させながら水平移動可能に支持することができる。
そして、このエア浮上機構38は、位置決め機構39により基板Wの位置修正を行った後は、エア噴出を止めて基板Wを直接支持し、さらに下降することにより、正確に位置決めした状態で基板Wを送り機構36に受け渡すことができるようにしている。
The air levitation mechanism 38 is provided between the feeding mechanisms 36 so as to be lifted and lowered by a driving device (not shown), and supports the substrate W so that the substrate W can be moved horizontally while floating on the air above the receiving position of the feeding mechanism 36. Can do.
Then, after correcting the position of the substrate W by the positioning mechanism 39, the air levitation mechanism 38 directly supports the substrate W by stopping the air ejection, and further descends so that the substrate W is accurately positioned. Can be delivered to the feed mechanism 36.

位置決め機構39は、例えば、基板収納部31の左右にそれぞれ水平方向に移動可能に設けられたプッシュロッドを備え、基板Wがエア浮上機構38により浮上した際に、左右両側から基板Wを押すことにより、その位置を適正に修正することができる。
なお、一方のプッシュロッドの先端にはばね部材が配設されており、基板Wの損傷が防止できるように配慮されている。
The positioning mechanism 39 includes, for example, push rods provided on the left and right sides of the substrate storage portion 31 so as to be movable in the horizontal direction, and pushes the substrate W from both the left and right sides when the substrate W is levitated by the air levitation mechanism 38. Thus, the position can be corrected appropriately.
Note that a spring member is disposed at the tip of one of the push rods so that damage to the substrate W can be prevented.

カセット3Aの基板移送方向、すなわち、基板Wを送り出したり、送り出した基板Wを逆動作させることにより受け入れる方向(製造装置等5が設置された方向)には、基板移載機構としてのコンベア機構4が設置されている。
このコンベア機構4は、送り機構36と略同一レベル(略同一の高さ)で基板Wを支持する送りローラ41と、この送りローラ41によりコンベア機構4上に載置された基板Wを持ち上げ、例えば、製造装置等5の基板置台51等に受け渡すハンド42とを備えている。
なお、本実施例においては、1個のハンド42を備えるようにしているが、これに限定されず、例えば、上下複数段に重畳したハンド42を備えることもできる。
送りローラ41は、回転駆動することにより、送り機構36により送り出された基板Wをコンベア機構4上に導入する。
また、ハンド42は送りローラ41の隙間に設けられており、図10(b)〜(g)に示すように、昇降モータ42a及び前後進モータ42bにより昇降と前後移動が可能であるとともに、基板Wを吸着するための真空吸着機構43が多数設けられている。
In the substrate transfer direction of the cassette 3A, that is, the direction in which the substrate W is sent out or received by reversing the sent substrate W (the direction in which the manufacturing apparatus 5 is installed), the conveyor mechanism 4 as a substrate transfer mechanism. Is installed.
The conveyor mechanism 4 lifts the substrate W placed on the conveyor mechanism 4 by the feed roller 41 that supports the substrate W at substantially the same level (substantially the same height) as the feed mechanism 36, For example, a hand 42 is provided to be transferred to the substrate table 51 of the manufacturing apparatus 5 or the like.
In the present embodiment, one hand 42 is provided. However, the present invention is not limited to this. For example, the hand 42 superimposed on a plurality of upper and lower stages may be provided.
The feed roller 41 introduces the substrate W fed out by the feed mechanism 36 onto the conveyor mechanism 4 by being rotationally driven.
Further, the hand 42 is provided in the gap between the feed rollers 41, and as shown in FIGS. 10B to 10G, the hand 42 can be moved up and down and moved back and forth by the lift motor 42a and the forward / backward motor 42b. Many vacuum suction mechanisms 43 for adsorbing W are provided.

次に、図3〜図9を参照して、カセット3Aの動作を説明する。
図3(a)において、基板収納部31内には、基板Wが支持部材32によって支持されており、基板Wは上下に複数枚収納されている。
この場合、図3(b)に示すように、取り出し対象となる1番下位の基板Wは、基板収納部31内にて位置がずれた状態にある。
Next, the operation of the cassette 3A will be described with reference to FIGS.
In FIG. 3A, a substrate W is supported by a support member 32 in the substrate storage portion 31, and a plurality of substrates W are stored vertically.
In this case, as shown in FIG. 3B, the lowest-order substrate W to be taken out is in a position shifted in the substrate storage portion 31.

このため、図3(b)に示すように、昇降装置34により基板収納部31を下降させ、基板Wをエア浮上機構38により支持させるとともに、エア浮上機構38を作動させて基板Wをエア浮上させる。   For this reason, as shown in FIG. 3B, the substrate storage unit 31 is lowered by the elevating device 34 to support the substrate W by the air levitation mechanism 38 and the air levitation mechanism 38 is operated to air levitate the substrate W. Let

次いで、図4(c)に示すように、位置決め機構39を作動させて、エア浮上している基板Wのセンタリングを行う。
そして、図4(d)に示すように、エア浮上機構38のエア噴出を止め、基板Wをエア浮上機構38上に載置する。
Next, as shown in FIG. 4C, the positioning mechanism 39 is operated to center the substrate W floating in the air.
Then, as shown in FIG. 4D, the air ejection of the air levitation mechanism 38 is stopped, and the substrate W is placed on the air levitation mechanism 38.

さらに、図5(e)に示すように、位置決め機構39を後退させるとともに、図5(f)に示すように、エア浮上機構38を下降させることにより、基板Wを送り機構36の駆動ローラの上に載置する。   Further, as shown in FIG. 5 (e), the positioning mechanism 39 is retracted and the air floating mechanism 38 is lowered as shown in FIG. Place on top.

次に、図6(g)に示すように、駆動ローラを駆動して、基板Wを、カセット3Aと区画壁7を隔てて設けられたコンベア機構4上に移動させる。
図6(h)に示すように、コンベア機構4のハンド42が上昇すると、基板Wはコンベア機構4から離れて、ハンド42の上に載せられる。
Next, as shown in FIG. 6G, the drive roller is driven to move the substrate W onto the conveyor mechanism 4 provided with the cassette 3A and the partition wall 7 therebetween.
As shown in FIG. 6H, when the hand 42 of the conveyor mechanism 4 rises, the substrate W is separated from the conveyor mechanism 4 and placed on the hand 42.

そして、図7(i)に示すように、ハンド42が前進して製造装置等5の基板置台51の上方に基板Wを移動させる。
次いで、図7(j)に示すように、ハンド42が下降して、基板Wはカセット3Aの基板置台51の支持棒52の上に載せられる。
Then, as shown in FIG. 7 (i), the hand 42 moves forward to move the substrate W above the substrate table 51 of the manufacturing apparatus 5 or the like.
Next, as shown in FIG. 7 (j), the hand 42 is lowered and the substrate W is placed on the support bar 52 of the substrate table 51 of the cassette 3A.

図8(k)、(l)に示すように、ハンド42が後退するとともに、基板置台51側では、図8(l)に示すように、支持棒52が下降して基板Wは基板置台51の上に載せられる。
そして、図9(m)に示すように、基板置台51は製造装置等5の内部に移動する。
As shown in FIGS. 8K and 8L, the hand 42 moves backward, and on the substrate mounting table 51 side, as shown in FIG. It is put on.
Then, as shown in FIG. 9 (m), the substrate table 51 moves into the manufacturing apparatus 5 or the like.

この基板の搬送装置によれば、製造装置等5との間での基板Wの受け渡し時に時間的なロスが生じず、生産効率を向上することができる。
また、カセット3Aの全高を低くすることができるとともに、製造装置等5を配設した区画R1の高さを低減し、設備の構築コストを低減することができる。
According to this substrate transfer apparatus, no time loss occurs when the substrate W is transferred to and from the manufacturing apparatus 5 or the like, and the production efficiency can be improved.
In addition, the overall height of the cassette 3A can be reduced, and the height of the section R1 in which the manufacturing apparatus 5 and the like are disposed can be reduced, thereby reducing the construction cost of the equipment.

以上、本発明の基板の搬送装置について、その実施例を説明したが、本発明の基板の搬送装置の構成は、この実施例の記載に限定されるものではなく、その趣旨を逸脱しない範囲において適宜に変更することが可能である。   As mentioned above, although the Example was demonstrated about the board | substrate conveyance apparatus of this invention, the structure of the board | substrate conveyance apparatus of this invention is not limited to description of this Example, In the range which does not deviate from the meaning. It is possible to change appropriately.

本発明の基板の搬送装置は、製造装置等との間での基板の搬送を、基板1枚単位で行うようにした場合において、基板の受け渡し時に時間的なロスが生じず、生産効率を向上することができるという特性を有していることから、液晶の製造設備のほか半導体の製造設備に好適に用いることができる。   The substrate transfer apparatus of the present invention improves the production efficiency without causing a time loss when transferring the substrate when the substrate is transferred to and from the manufacturing apparatus in units of one substrate. Therefore, it can be suitably used for semiconductor manufacturing equipment as well as liquid crystal manufacturing equipment.

本発明の基板の搬送装置の一実施例を示す平面図である。It is a top view which shows one Example of the conveying apparatus of the board | substrate of this invention. 同正面断面図である。It is the same front sectional view. 同動作を示し、(a)は第1段階の正面断面図、(b)は第2段階の正面断面図である。The same operation | movement is shown, (a) is front sectional drawing of a 1st step, (b) is front sectional drawing of a 2nd step. 同動作を示し、(c)は第3段階の正面断面図、(d)は第4段階の正面断面図である。(C) is a front sectional view of the third stage, and (d) is a front sectional view of the fourth stage. 同動作を示し、(e)は第5段階の正面断面図、(f)は第6段階の正面断面図である。The same operation is shown, (e) is a front sectional view of the fifth stage, and (f) is a front sectional view of the sixth stage. 同動作を示し、(g)は第7段階の側面図、(h)は第8段階の側面図である。The same operation | movement is shown, (g) is a side view of a 7th step, (h) is a side view of an 8th step. 同動作を示し、(i)は第9段階の側面図、(j)は第10段階の側面図である。The same operation is shown, (i) is a side view of the ninth stage, and (j) is a side view of the tenth stage. 同動作を示し、(k)は第11段階の側面図、(l)は第12段階の側面図である。The same operation is shown, (k) is a side view of the eleventh stage, and (l) is a side view of the twelfth stage. 同動作を示し、(m)は第13段階の側面図である。The same operation is shown, and (m) is a side view of the thirteenth stage. コンベア機構を示し、(a)はその平面図、(b)〜(g)は動作を示す側面図である。A conveyor mechanism is shown, (a) is the top view, (b)-(g) is a side view which shows operation | movement.

符号の説明Explanation of symbols

1 搬送移載機(スタッカクレーン)
11 ハンド
2 レール
3 カセット
3A カセット
31 基板収納部
32 支持部材
34 昇降装置
35 搬送用支持部材
36 送り機構
37 ベース
38 エア浮上機構
39 位置決め機構
4 基板移載機(コンベア機構)
41 送りローラ
42 ハンド
43 真空吸着機構
5 製造装置等
51 基板置台
52 支持棒
6 空気清浄機構
7 区画壁
71 スリット部
R1 区画
R2 区画
S カセット収納棚
W 基板
1 Conveyance transfer machine (stacker crane)
DESCRIPTION OF SYMBOLS 11 Hand 2 Rail 3 Cassette 3A Cassette 31 Substrate storage part 32 Support member 34 Elevating device 35 Transfer support member 36 Feed mechanism 37 Base 38 Air floating mechanism 39 Positioning mechanism 4 Substrate transfer machine (conveyor mechanism)
41 Feed roller 42 Hand 43 Vacuum suction mechanism 5 Manufacturing apparatus etc. 51 Substrate table 52 Support bar 6 Air cleaning mechanism 7 Partition wall 71 Slit section R1 Section R2 Section S Cassette storage shelf W Substrate

Claims (4)

製造装置等との間で、1枚単位で基板の受け渡しを行うようにした基板の搬送装置において、基板を収容可能なカセットを昇降装置に載置し、昇降装置と製造装置等との間に配設した基板移載機構の移載面と、前記カセットの基板収納位置とが略一致するようにカセットを昇降することにより、カセットと製造装置等との間で基板を略同一レベルで移載するようにしたことを特徴とする基板の搬送装置。   In a substrate transfer apparatus that transfers substrates in units of one sheet with a manufacturing apparatus, etc., a cassette that can accommodate a substrate is placed on the lifting apparatus, and the substrate is placed between the lifting apparatus and the manufacturing apparatus. By moving the cassette up and down so that the transfer surface of the arranged substrate transfer mechanism and the substrate storage position of the cassette substantially coincide with each other, the substrate is transferred at substantially the same level between the cassette and the manufacturing apparatus. A substrate transfer apparatus characterized by comprising: 前記昇降装置に載置したカセットと基板移載機構との間に区画壁を配設し、該区画壁に基板が通過可能なスリット部を形成したことを特徴とする請求項1記載の基板の搬送装置。   2. The substrate according to claim 1, wherein a partition wall is disposed between the cassette placed on the lifting device and the substrate transfer mechanism, and a slit portion through which the substrate can pass is formed in the partition wall. Conveying device. 前記区画壁により区画された製造装置等及び基板移載機構を配設した区画の内圧を、搬送移載機及び複数台のカセットを収容可能なカセット収納棚を配設した区画の内圧より高く維持するようにしたことを特徴とする請求項2記載の基板の搬送装置。   Maintaining the internal pressure of the compartment provided with the manufacturing apparatus and the substrate transfer mechanism partitioned by the partition wall higher than the internal pressure of the compartment provided with the transfer / transfer machine and a cassette storage shelf capable of accommodating a plurality of cassettes. The substrate transfer apparatus according to claim 2, wherein: 前記昇降装置及び基板移載機構を製造装置等に対応して設置するとともに、搬送移載機により、昇降装置と複数台のカセットを収容可能なカセット収納棚との間でのカセットの搬送を行うようにしたことを特徴とする請求項1、2又は3記載の基板の搬送装置。   The lifting device and the substrate transfer mechanism are installed in correspondence with the manufacturing device and the like, and the transfer of the cassette is carried between the lifting device and a cassette storage shelf capable of storing a plurality of cassettes. 4. The substrate transfer apparatus according to claim 1, wherein the substrate transfer apparatus is configured as described above.
JP2004016073A 2003-08-29 2004-01-23 Conveying device of substrate Pending JP2005145713A (en)

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JP2003305913 2003-08-29
JP2003361769 2003-10-22
JP2004016073A JP2005145713A (en) 2003-08-29 2004-01-23 Conveying device of substrate

Related Child Applications (1)

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JP2007003216A Division JP4602359B2 (en) 2003-08-29 2007-01-11 Liquid crystal substrate transfer device

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005332846A (en) * 2004-05-18 2005-12-02 Dainippon Screen Mfg Co Ltd Substrate transfer apparatus
JP2008143696A (en) * 2006-12-13 2008-06-26 Daifuku Co Ltd Conveying device for plate-like body
JP2011051748A (en) * 2009-09-03 2011-03-17 Murata Machinery Ltd Loader-unloader and loading-unloading method between carrier and device
CN110047789A (en) * 2019-03-29 2019-07-23 武汉华星光电技术有限公司 A kind of cassette and its transmission equipment

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JPH0729963A (en) * 1993-07-15 1995-01-31 Kokusai Electric Co Ltd Semiconductor manufacturing device
JPH07297257A (en) * 1994-04-22 1995-11-10 Tokyo Electron Ltd Processing equipment
JPH10120109A (en) * 1996-10-17 1998-05-12 Sanki Eng Co Ltd Inline type paper sheet stocker
JP2001319957A (en) * 2000-05-02 2001-11-16 Tokyo Electron Ltd Substrate transfer and device therefor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0729963A (en) * 1993-07-15 1995-01-31 Kokusai Electric Co Ltd Semiconductor manufacturing device
JPH07297257A (en) * 1994-04-22 1995-11-10 Tokyo Electron Ltd Processing equipment
JPH10120109A (en) * 1996-10-17 1998-05-12 Sanki Eng Co Ltd Inline type paper sheet stocker
JP2001319957A (en) * 2000-05-02 2001-11-16 Tokyo Electron Ltd Substrate transfer and device therefor

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005332846A (en) * 2004-05-18 2005-12-02 Dainippon Screen Mfg Co Ltd Substrate transfer apparatus
JP2008143696A (en) * 2006-12-13 2008-06-26 Daifuku Co Ltd Conveying device for plate-like body
JP2011051748A (en) * 2009-09-03 2011-03-17 Murata Machinery Ltd Loader-unloader and loading-unloading method between carrier and device
CN102009843A (en) * 2009-09-03 2011-04-13 村田机械株式会社 Loader/unloader, and load unload method between guided vehicle and equipment
CN110047789A (en) * 2019-03-29 2019-07-23 武汉华星光电技术有限公司 A kind of cassette and its transmission equipment

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