KR101327674B1 - 액체 토출 헤드의 제조 방법 - Google Patents
액체 토출 헤드의 제조 방법 Download PDFInfo
- Publication number
- KR101327674B1 KR101327674B1 KR1020127014169A KR20127014169A KR101327674B1 KR 101327674 B1 KR101327674 B1 KR 101327674B1 KR 1020127014169 A KR1020127014169 A KR 1020127014169A KR 20127014169 A KR20127014169 A KR 20127014169A KR 101327674 B1 KR101327674 B1 KR 101327674B1
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- liquid
- mold
- flow path
- discharge port
- Prior art date
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 113
- 238000000034 method Methods 0.000 title claims abstract description 47
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 21
- 239000000758 substrate Substances 0.000 claims abstract description 45
- 238000007599 discharging Methods 0.000 claims abstract description 7
- 229920005989 resin Polymers 0.000 claims description 26
- 239000011347 resin Substances 0.000 claims description 26
- 239000000463 material Substances 0.000 claims description 24
- 239000005871 repellent Substances 0.000 claims description 21
- 230000002940 repellent Effects 0.000 claims description 18
- 239000000203 mixture Substances 0.000 claims description 12
- 230000002093 peripheral effect Effects 0.000 claims 4
- 239000010410 layer Substances 0.000 description 126
- 239000011247 coating layer Substances 0.000 description 18
- 230000008569 process Effects 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 9
- 238000011161 development Methods 0.000 description 8
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 239000008096 xylene Substances 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 4
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000001035 drying Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- ZGHFDIIVVIFNPS-UHFFFAOYSA-N 3-Methyl-3-buten-2-one Chemical compound CC(=C)C(C)=O ZGHFDIIVVIFNPS-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- MTHSVFCYNBDYFN-UHFFFAOYSA-N anhydrous diethylene glycol Natural products OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000005499 meniscus Effects 0.000 description 2
- 239000003595 mist Substances 0.000 description 2
- ORQBXQOJMQIAOY-UHFFFAOYSA-N nobelium Chemical compound [No] ORQBXQOJMQIAOY-UHFFFAOYSA-N 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000001846 repelling effect Effects 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000000018 DNA microarray Methods 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 206010047571 Visual impairment Diseases 0.000 description 1
- 235000019241 carbon black Nutrition 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- XIXADJRWDQXREU-UHFFFAOYSA-M lithium acetate Chemical compound [Li+].CC([O-])=O XIXADJRWDQXREU-UHFFFAOYSA-M 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 125000003566 oxetanyl group Chemical group 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000001454 recorded image Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
- B41J2/1639—Manufacturing processes molding sacrificial molding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49401—Fluid pattern dispersing device making, e.g., ink jet
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009258192A JP5279686B2 (ja) | 2009-11-11 | 2009-11-11 | 液体吐出ヘッドの製造方法 |
JPJP-P-2009-258192 | 2009-11-11 | ||
PCT/JP2010/006474 WO2011058719A1 (en) | 2009-11-11 | 2010-11-02 | Method for manufacturing liquid ejection head |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20120079171A KR20120079171A (ko) | 2012-07-11 |
KR101327674B1 true KR101327674B1 (ko) | 2013-11-08 |
Family
ID=43528301
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020127014169A KR101327674B1 (ko) | 2009-11-11 | 2010-11-02 | 액체 토출 헤드의 제조 방법 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20120222308A1 (de) |
EP (1) | EP2470372B1 (de) |
JP (1) | JP5279686B2 (de) |
KR (1) | KR101327674B1 (de) |
CN (1) | CN102596575B (de) |
WO (1) | WO2011058719A1 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6000715B2 (ja) * | 2011-09-29 | 2016-10-05 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
JP2014162038A (ja) * | 2013-02-22 | 2014-09-08 | Seiko Epson Corp | 流路ユニット、液体噴射ヘッド、液体噴射装置、流路ユニットの製造方法 |
US9656469B2 (en) | 2013-02-28 | 2017-05-23 | Hewlett-Packard Development Company, L.P. | Molded fluid flow structure with saw cut channel |
US10821729B2 (en) | 2013-02-28 | 2020-11-03 | Hewlett-Packard Development Company, L.P. | Transfer molded fluid flow structure |
US9731509B2 (en) | 2013-02-28 | 2017-08-15 | Hewlett-Packard Development Company, L.P. | Fluid structure with compression molded fluid channel |
KR20150112029A (ko) | 2013-02-28 | 2015-10-06 | 휴렛-팩커드 디벨롭먼트 컴퍼니, 엘.피. | 성형된 프린트 바 |
KR101827070B1 (ko) * | 2013-02-28 | 2018-02-07 | 휴렛-팩커드 디벨롭먼트 컴퍼니, 엘.피. | 유체 유동 구조체 성형 |
US9724920B2 (en) | 2013-03-20 | 2017-08-08 | Hewlett-Packard Development Company, L.P. | Molded die slivers with exposed front and back surfaces |
KR102030735B1 (ko) | 2018-01-26 | 2019-10-11 | 광주과학기술원 | 분광장치 및 분광방법 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007063690A1 (en) | 2005-12-02 | 2007-06-07 | Canon Kabushiki Kaisha | Liquid discharge head producing method |
US20090065474A1 (en) | 2007-09-06 | 2009-03-12 | Canon Kabushiki Kaisha | Liquid-ejection head and method for manufacturing liquid-ejection head substrate |
US20090162797A1 (en) | 2007-12-19 | 2009-06-25 | Canon Kabushiki Kaisha | Method of manufacturing liquid ejection head |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3143307B2 (ja) * | 1993-02-03 | 2001-03-07 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法 |
JPH08174833A (ja) * | 1994-12-21 | 1996-07-09 | Canon Inc | インクジェット記録装置の記録ヘッドおよびその基板端面への酸化皮膜形成方法 |
EP0734866B1 (de) * | 1995-03-31 | 1999-08-11 | Canon Kabushiki Kaisha | Verfahren zum Herstellen eines Tintenstrahlkopfes |
JP3343875B2 (ja) * | 1995-06-30 | 2002-11-11 | キヤノン株式会社 | インクジェットヘッドの製造方法 |
US6137510A (en) * | 1996-11-15 | 2000-10-24 | Canon Kabushiki Kaisha | Ink jet head |
US7090325B2 (en) * | 2001-09-06 | 2006-08-15 | Ricoh Company, Ltd. | Liquid drop discharge head and manufacture method thereof, micro device ink-jet head ink cartridge and ink-jet printing device |
US6986982B2 (en) * | 2002-02-20 | 2006-01-17 | Canon Kabushiki Kaisha | Resist material and method of manufacturing inkjet recording head using the same |
US6869541B2 (en) * | 2002-02-21 | 2005-03-22 | Canon Kabushiki Kaisha | Epoxy resin composition, surface treating method, ink-jet recording head, and ink-jet recording apparatus |
JP2005074747A (ja) * | 2003-08-29 | 2005-03-24 | Canon Inc | インクジェットヘッドの製造方法およびインクジェットヘッド |
US7322104B2 (en) * | 2004-06-25 | 2008-01-29 | Canon Kabushiki Kaisha | Method for producing an ink jet head |
JP4484774B2 (ja) | 2004-06-28 | 2010-06-16 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
JP4533256B2 (ja) * | 2004-06-28 | 2010-09-01 | キヤノン株式会社 | 微細構造体の製造方法および液体吐出ヘッドの製造方法 |
JP4761498B2 (ja) * | 2004-06-28 | 2011-08-31 | キヤノン株式会社 | 感光性樹脂組成物、ならびにこれを用いた段差パターンの製造方法及びインクジェットヘッドの製造方法 |
WO2006001530A2 (en) * | 2004-06-28 | 2006-01-05 | Canon Kabushiki Kaisha | Liquid discharge head manufacturing method, and liquid discharge head obtained using this method |
JP2006069009A (ja) * | 2004-09-01 | 2006-03-16 | Canon Inc | インクジェットヘッドの製造方法 |
JP4614383B2 (ja) * | 2004-12-09 | 2011-01-19 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法、及びインクジェット記録ヘッド |
KR100657334B1 (ko) * | 2005-09-13 | 2006-12-14 | 삼성전자주식회사 | 잉크젯 프린터 헤드의 제조 방법 및 상기 방법에 의하여제조된 잉크젯 프린터 헤드 |
JP2008046584A (ja) * | 2006-07-19 | 2008-02-28 | Fujifilm Corp | カラーフィルタの製造方法 |
US7909428B2 (en) * | 2006-07-28 | 2011-03-22 | Hewlett-Packard Development Company, L.P. | Fluid ejection devices and methods of fabrication |
KR20090030111A (ko) * | 2007-09-19 | 2009-03-24 | 삼성전자주식회사 | 잉크젯 프린터 헤드의 제조 방법 및 상기 방법에 의하여제조된 잉크젯 프린터 헤드 |
KR101452705B1 (ko) * | 2008-01-10 | 2014-10-24 | 삼성전자주식회사 | 잉크젯 프린터 헤드의 제조 방법 및 상기 방법에 의하여제조된 잉크젯 프린터 헤드 |
JP5094519B2 (ja) | 2008-04-14 | 2012-12-12 | オリンパス株式会社 | 走査型レーザ顕微鏡 |
KR20090117010A (ko) * | 2008-05-08 | 2009-11-12 | 삼성전자주식회사 | 잉크젯 프린터 헤드의 제조 방법 및 상기 방법에 의하여제조된 잉크젯 프린터 헤드 |
JP5312202B2 (ja) * | 2008-06-20 | 2013-10-09 | キヤノン株式会社 | 液体吐出ヘッド及びその製造方法 |
US8262199B2 (en) * | 2008-09-30 | 2012-09-11 | Fujifilm Corporation | Droplet jetting head, method of manufacturing droplet jetting head, and droplet jetting apparatus equipped with droplet jetting head |
US8844123B2 (en) * | 2009-12-03 | 2014-09-30 | Chin-Chi Yang | Method of manufacturing a hollow surface mount type electronic component |
-
2009
- 2009-11-11 JP JP2009258192A patent/JP5279686B2/ja not_active Expired - Fee Related
-
2010
- 2010-11-02 KR KR1020127014169A patent/KR101327674B1/ko active IP Right Grant
- 2010-11-02 US US13/505,574 patent/US20120222308A1/en not_active Abandoned
- 2010-11-02 EP EP20100795781 patent/EP2470372B1/de not_active Not-in-force
- 2010-11-02 WO PCT/JP2010/006474 patent/WO2011058719A1/en active Application Filing
- 2010-11-02 CN CN201080050773.0A patent/CN102596575B/zh not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007063690A1 (en) | 2005-12-02 | 2007-06-07 | Canon Kabushiki Kaisha | Liquid discharge head producing method |
US20090065474A1 (en) | 2007-09-06 | 2009-03-12 | Canon Kabushiki Kaisha | Liquid-ejection head and method for manufacturing liquid-ejection head substrate |
US20090162797A1 (en) | 2007-12-19 | 2009-06-25 | Canon Kabushiki Kaisha | Method of manufacturing liquid ejection head |
Also Published As
Publication number | Publication date |
---|---|
EP2470372A1 (de) | 2012-07-04 |
JP2011102001A (ja) | 2011-05-26 |
CN102596575A (zh) | 2012-07-18 |
US20120222308A1 (en) | 2012-09-06 |
EP2470372B1 (de) | 2015-05-20 |
WO2011058719A1 (en) | 2011-05-19 |
CN102596575B (zh) | 2014-08-27 |
KR20120079171A (ko) | 2012-07-11 |
JP5279686B2 (ja) | 2013-09-04 |
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