KR101254212B1 - Esd 보호 디바이스 - Google Patents
Esd 보호 디바이스 Download PDFInfo
- Publication number
- KR101254212B1 KR101254212B1 KR1020117012814A KR20117012814A KR101254212B1 KR 101254212 B1 KR101254212 B1 KR 101254212B1 KR 1020117012814 A KR1020117012814 A KR 1020117012814A KR 20117012814 A KR20117012814 A KR 20117012814A KR 101254212 B1 KR101254212 B1 KR 101254212B1
- Authority
- KR
- South Korea
- Prior art keywords
- protection device
- discharge
- esd protection
- esd
- ceramic
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01T—SPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
- H01T2/00—Spark gaps comprising auxiliary triggering means
- H01T2/02—Spark gaps comprising auxiliary triggering means comprising a trigger electrode or an auxiliary spark gap
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01T—SPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
- H01T4/00—Overvoltage arresters using spark gaps
- H01T4/10—Overvoltage arresters using spark gaps having a single gap or a plurality of gaps in parallel
- H01T4/12—Overvoltage arresters using spark gaps having a single gap or a plurality of gaps in parallel hermetically sealed
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01T—SPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
- H01T1/00—Details of spark gaps
- H01T1/20—Means for starting arc or facilitating ignition of spark gap
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01T—SPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
- H01T4/00—Overvoltage arresters using spark gaps
- H01T4/10—Overvoltage arresters using spark gaps having a single gap or a plurality of gaps in parallel
Landscapes
- Thermistors And Varistors (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008314705 | 2008-12-10 | ||
JPJP-P-2008-314705 | 2008-12-10 | ||
PCT/JP2009/005466 WO2010067503A1 (ja) | 2008-12-10 | 2009-10-19 | Esd保護デバイス |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20110091749A KR20110091749A (ko) | 2011-08-12 |
KR101254212B1 true KR101254212B1 (ko) | 2013-04-18 |
Family
ID=42242501
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020117012814A KR101254212B1 (ko) | 2008-12-10 | 2009-10-19 | Esd 보호 디바이스 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8432653B2 (zh) |
EP (1) | EP2357709B1 (zh) |
JP (1) | JPWO2010067503A1 (zh) |
KR (1) | KR101254212B1 (zh) |
CN (1) | CN102246371B (zh) |
WO (1) | WO2010067503A1 (zh) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5437769B2 (ja) * | 2009-10-16 | 2014-03-12 | 田淵電機株式会社 | サージ吸収素子 |
JP5649391B2 (ja) * | 2010-09-29 | 2015-01-07 | 株式会社村田製作所 | Esd保護デバイス |
WO2012090730A1 (ja) * | 2010-12-27 | 2012-07-05 | 株式会社村田製作所 | Esd保護装置及びその製造方法 |
JP5648696B2 (ja) * | 2010-12-27 | 2015-01-07 | 株式会社村田製作所 | Esd保護装置及びその製造方法 |
WO2012105497A1 (ja) * | 2011-02-02 | 2012-08-09 | 株式会社村田製作所 | Esd保護装置 |
WO2012111456A1 (ja) * | 2011-02-14 | 2012-08-23 | 株式会社村田製作所 | Esd保護装置及びその製造方法 |
US8885324B2 (en) | 2011-07-08 | 2014-11-11 | Kemet Electronics Corporation | Overvoltage protection component |
US9142353B2 (en) | 2011-07-08 | 2015-09-22 | Kemet Electronics Corporation | Discharge capacitor |
JP5713112B2 (ja) * | 2011-09-14 | 2015-05-07 | 株式会社村田製作所 | Esd保護デバイスおよびその製造方法 |
JP2013219019A (ja) * | 2012-03-13 | 2013-10-24 | Tdk Corp | 静電気対策素子 |
JP5221794B1 (ja) * | 2012-08-09 | 2013-06-26 | 立山科学工業株式会社 | 静電気保護素子とその製造方法 |
JP5692470B2 (ja) * | 2012-08-13 | 2015-04-01 | 株式会社村田製作所 | Esd保護装置 |
CN104541418B (zh) * | 2012-08-13 | 2016-09-28 | 株式会社村田制作所 | Esd保护装置 |
JP5733480B2 (ja) * | 2012-08-26 | 2015-06-10 | 株式会社村田製作所 | Esd保護デバイスおよびその製造方法 |
CN103077790B (zh) * | 2012-09-20 | 2015-09-02 | 立昌先进科技股份有限公司 | 一种低电容层积型芯片变阻器及其所使用的过电压保护层 |
JP5757372B2 (ja) * | 2012-12-19 | 2015-07-29 | 株式会社村田製作所 | Esd保護デバイス |
WO2015170584A1 (ja) | 2014-05-09 | 2015-11-12 | 株式会社村田製作所 | 静電気放電保護デバイス |
DE102015116278A1 (de) * | 2015-09-25 | 2017-03-30 | Epcos Ag | Überspannungsschutzbauelement und Verfahren zur Herstellung eines Überspannungsschutzbauelements |
CN107438355A (zh) * | 2016-05-25 | 2017-12-05 | 佳邦科技股份有限公司 | 积层式电子冲击保护电磁干扰滤波组件及其制造方法 |
US11178800B2 (en) | 2018-11-19 | 2021-11-16 | Kemet Electronics Corporation | Ceramic overvoltage protection device having low capacitance and improved durability |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4317155A (en) * | 1979-03-27 | 1982-02-23 | Mikio Harada | Surge absorber |
US6721157B2 (en) * | 2000-07-10 | 2004-04-13 | Samsung Electro-Mechanics Co., Ltd. | Electrostatic discharge device of surface mount type and fabricating method thereof |
US20070285866A1 (en) | 2003-02-28 | 2007-12-13 | Mitsubishi Materials Corporation | Surge Absorber and Production Method Therefor |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1177550A (en) * | 1981-08-17 | 1984-11-06 | Richard L. Wahlers | Resistance material, resistor and method of making the same |
JPH03124585A (ja) * | 1989-10-09 | 1991-05-28 | Yoshida Kogyo Kk <Ykk> | 流動性物質の加圧吐出容器 |
JPH0697626B2 (ja) * | 1989-12-25 | 1994-11-30 | 岡谷電機産業株式会社 | 放電型サージ吸収素子 |
JPH071750Y2 (ja) * | 1990-03-30 | 1995-01-18 | 岡谷電機産業株式会社 | 放電型サージ吸収素子 |
US5137848A (en) * | 1990-12-13 | 1992-08-11 | E. I. Du Pont De Nemours And Company | Dielectric composition containing kerf additive |
JP3194878B2 (ja) * | 1996-12-26 | 2001-08-06 | 松下電器産業株式会社 | データ伝送方法及びデータ伝送システム |
JP2001043954A (ja) * | 1999-07-30 | 2001-02-16 | Tokin Corp | サージ吸収素子及びその製造方法 |
JP4479470B2 (ja) * | 2004-11-05 | 2010-06-09 | 三菱マテリアル株式会社 | サージアブソーバ |
JP2008010278A (ja) * | 2006-06-28 | 2008-01-17 | Mitsubishi Materials Corp | サージアブソーバ及びサージアブソーバの製造方法 |
JP4946225B2 (ja) * | 2006-07-13 | 2012-06-06 | 株式会社村田製作所 | 多層セラミック電子部品、多層セラミック基板、および多層セラミック電子部品の製造方法 |
WO2008146514A1 (ja) * | 2007-05-28 | 2008-12-04 | Murata Manufacturing Co., Ltd. | Esd保護デバイス |
KR101072673B1 (ko) | 2008-02-05 | 2011-10-11 | 가부시키가이샤 무라타 세이사쿠쇼 | Esd 보호 디바이스 |
-
2009
- 2009-10-19 EP EP09831612.8A patent/EP2357709B1/en active Active
- 2009-10-19 WO PCT/JP2009/005466 patent/WO2010067503A1/ja active Application Filing
- 2009-10-19 CN CN2009801500473A patent/CN102246371B/zh active Active
- 2009-10-19 KR KR1020117012814A patent/KR101254212B1/ko active IP Right Grant
- 2009-10-19 JP JP2010510596A patent/JPWO2010067503A1/ja active Pending
-
2011
- 2011-06-06 US US13/153,589 patent/US8432653B2/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4317155A (en) * | 1979-03-27 | 1982-02-23 | Mikio Harada | Surge absorber |
US6721157B2 (en) * | 2000-07-10 | 2004-04-13 | Samsung Electro-Mechanics Co., Ltd. | Electrostatic discharge device of surface mount type and fabricating method thereof |
US20070285866A1 (en) | 2003-02-28 | 2007-12-13 | Mitsubishi Materials Corporation | Surge Absorber and Production Method Therefor |
Also Published As
Publication number | Publication date |
---|---|
EP2357709B1 (en) | 2019-03-20 |
EP2357709A1 (en) | 2011-08-17 |
US8432653B2 (en) | 2013-04-30 |
KR20110091749A (ko) | 2011-08-12 |
JPWO2010067503A1 (ja) | 2012-05-17 |
CN102246371B (zh) | 2013-11-13 |
US20110227196A1 (en) | 2011-09-22 |
WO2010067503A1 (ja) | 2010-06-17 |
EP2357709A4 (en) | 2013-03-06 |
CN102246371A (zh) | 2011-11-16 |
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