KR101213587B1 - 시료검사장치 - Google Patents

시료검사장치 Download PDF

Info

Publication number
KR101213587B1
KR101213587B1 KR1020077027719A KR20077027719A KR101213587B1 KR 101213587 B1 KR101213587 B1 KR 101213587B1 KR 1020077027719 A KR1020077027719 A KR 1020077027719A KR 20077027719 A KR20077027719 A KR 20077027719A KR 101213587 B1 KR101213587 B1 KR 101213587B1
Authority
KR
South Korea
Prior art keywords
focus
focus value
electron beam
value
beam apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
KR1020077027719A
Other languages
English (en)
Korean (ko)
Other versions
KR20080011304A (ko
Inventor
도시후미 김바
Original Assignee
가부시키가이샤 에바라 세이사꾸쇼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 에바라 세이사꾸쇼 filed Critical 가부시키가이샤 에바라 세이사꾸쇼
Publication of KR20080011304A publication Critical patent/KR20080011304A/ko
Application granted granted Critical
Publication of KR101213587B1 publication Critical patent/KR101213587B1/ko
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/21—Focus adjustment
    • H01J2237/216—Automatic focusing methods
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/248—Components associated with the control of the tube
    • H01J2237/2482—Optical means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
KR1020077027719A 2005-05-02 2006-04-27 시료검사장치 Expired - Lifetime KR101213587B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005134136A JP4959149B2 (ja) 2005-05-02 2005-05-02 試料検査装置
JPJP-P-2005-00134136 2005-05-02
PCT/JP2006/308843 WO2006120917A1 (ja) 2005-05-02 2006-04-27 試料検査装置

Publications (2)

Publication Number Publication Date
KR20080011304A KR20080011304A (ko) 2008-02-01
KR101213587B1 true KR101213587B1 (ko) 2013-01-18

Family

ID=37396426

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077027719A Expired - Lifetime KR101213587B1 (ko) 2005-05-02 2006-04-27 시료검사장치

Country Status (5)

Country Link
US (1) US7964844B2 (https=)
JP (1) JP4959149B2 (https=)
KR (1) KR101213587B1 (https=)
TW (1) TWI390648B (https=)
WO (1) WO2006120917A1 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010517233A (ja) * 2007-01-25 2010-05-20 エヌエフエイビー・リミテッド 改良された粒子ビーム発生装置
JP2008252070A (ja) * 2007-03-07 2008-10-16 Nuflare Technology Inc 荷電粒子ビームの焦点合わせ方法及び荷電粒子ビームの非点調整方法
JP5243912B2 (ja) * 2008-01-24 2013-07-24 日本電子株式会社 荷電粒子ビーム装置におけるビーム位置較正方法
JP5325802B2 (ja) * 2010-01-28 2013-10-23 株式会社日立ハイテクノロジーズ 観察方法および観察装置
US8519353B2 (en) * 2010-12-29 2013-08-27 Varian Semiconductor Equipment Associates, Inc. Method and apparatus for controlling an asymmetric electrostatic lens about a central ray trajectory of an ion beam
JP5331828B2 (ja) * 2011-01-14 2013-10-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US8912488B2 (en) * 2012-11-15 2014-12-16 Fei Company Automated sample orientation
US9110039B2 (en) * 2013-07-25 2015-08-18 Kla-Tencor Corporation Auto-focus system and methods for die-to-die inspection
JP6309366B2 (ja) * 2014-06-30 2018-04-11 株式会社ホロン 荷電粒子線装置における高さ測定装置およびオートフォーカス装置
JP7455676B2 (ja) * 2020-06-05 2024-03-26 株式会社日立ハイテク 電子顕微鏡および電子顕微鏡のフォーカス調整方法
WO2021250733A1 (ja) * 2020-06-08 2021-12-16 株式会社日立ハイテク 荷電粒子線装置、およびそのフォーカス調整方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000228166A (ja) * 1999-02-05 2000-08-15 Horon:Kk 試料観察装置
JP2003007243A (ja) * 2001-06-19 2003-01-10 Seiko Instruments Inc レーザ欠陥検出機能を備えた走査型電子顕微鏡のオートフォーカス方式

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2542356C2 (de) * 1975-09-19 1977-10-20 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Fokussierung der Objektivlinse eines Korpuskular-Durchstrahlungs-Rastermikroskops und Einrichtung zur selbsttätigen Durchführung des Verfahrens, sowie Anwendung
JPH053013A (ja) * 1991-06-24 1993-01-08 Shimadzu Corp 自動焦点調節装置
JPH07245075A (ja) * 1994-03-04 1995-09-19 Horon:Kk 自動焦点合わせ装置
JPH1048163A (ja) * 1996-08-07 1998-02-20 Shimadzu Corp 表面分析方法およびその装置
US6107637A (en) * 1997-08-11 2000-08-22 Hitachi, Ltd. Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
JPH11149895A (ja) * 1997-08-11 1999-06-02 Hitachi Ltd 電子線式検査または測定装置およびその方法、高さ検出装置並びに電子線式描画装置
WO2003007330A1 (fr) * 2001-07-12 2003-01-23 Hitachi, Ltd. Procede de mesure de l'electrisation d'un echantillon et dispositif a faisceau de particules chargees
JP4388270B2 (ja) * 2002-11-18 2009-12-24 株式会社日立ハイテクノロジーズ 表面検査方法及び表面検査装置
EP1630862B1 (en) * 2003-05-30 2016-01-13 Ebara Corporation Sample inspection device and method, and device manufacturing method using the sample inspection device and method
US7440086B2 (en) * 2005-09-21 2008-10-21 Kla-Tencor Technologies Corp. Methods and systems for creating a recipe for a defect review process

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000228166A (ja) * 1999-02-05 2000-08-15 Horon:Kk 試料観察装置
JP2003007243A (ja) * 2001-06-19 2003-01-10 Seiko Instruments Inc レーザ欠陥検出機能を備えた走査型電子顕微鏡のオートフォーカス方式

Also Published As

Publication number Publication date
US7964844B2 (en) 2011-06-21
US20090212214A1 (en) 2009-08-27
JP2006310223A (ja) 2006-11-09
WO2006120917A1 (ja) 2006-11-16
JP4959149B2 (ja) 2012-06-20
KR20080011304A (ko) 2008-02-01
TWI390648B (zh) 2013-03-21
TW200701384A (en) 2007-01-01

Similar Documents

Publication Publication Date Title
KR101202527B1 (ko) 결함 관찰 장치 및 결함 관찰 방법
JP4638800B2 (ja) 走査電子顕微鏡装置における機差管理システムおよびその方法
US7164127B2 (en) Scanning electron microscope and a method for evaluating accuracy of repeated measurement using the same
JP5832345B2 (ja) 検査装置および検査方法
JP5230740B2 (ja) 欠陥レビュー装置および方法、並びにプログラム
US8509516B2 (en) Circuit pattern examining apparatus and circuit pattern examining method
KR102194152B1 (ko) 주사형 전자 현미경
JP2009085657A (ja) 走査型電子顕微鏡を用いた試料の観察方法およびそのシステム
US20150146967A1 (en) Pattern evaluation device and pattern evaluation method
JP2007218711A (ja) 電子顕微鏡装置を用いた計測対象パターンの計測方法
WO2010029700A1 (ja) 荷電粒子線装置
US8013299B2 (en) Review method and review device
JPS6317523A (ja) 電子ビ−ム描画装置
KR101213587B1 (ko) 시료검사장치
JP5069904B2 (ja) 指定位置特定方法及び指定位置測定装置
JP2008147143A (ja) Ｓｅｍ装置又はｓｅｍシステムにおける撮像レシピ生成方法及び計測レシピ生成方法並びにｓｅｍ装置又はｓｅｍシステム
JP2005332593A (ja) 走査電子顕微鏡
JP3961438B2 (ja) パターン計測装置、パターン計測方法および半導体装置の製造方法
JP4231831B2 (ja) 走査型電子顕微鏡
JP2006153837A (ja) 走査型電子顕微鏡及びそれを用いたパターン計測方法並びに走査型電子顕微鏡の機差補正装置
JP2001330779A (ja) 走査式顕微鏡の焦点補正方法及び走査式顕微鏡
JP6207893B2 (ja) 試料観察装置用のテンプレート作成装置
JP2021190407A (ja) 電子顕微鏡および電子顕微鏡のフォーカス調整方法
CN114628210B (zh) 带电粒子束装置
JP2002116017A (ja) パターン寸法測定方法及び装置

Legal Events

Date Code Title Description
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20151118

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 20161123

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20171117

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

FPAY Annual fee payment

Payment date: 20181115

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 10

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 11

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 12

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 13

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000