KR101213587B1 - 시료검사장치 - Google Patents

시료검사장치 Download PDF

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Publication number
KR101213587B1
KR101213587B1 KR1020077027719A KR20077027719A KR101213587B1 KR 101213587 B1 KR101213587 B1 KR 101213587B1 KR 1020077027719 A KR1020077027719 A KR 1020077027719A KR 20077027719 A KR20077027719 A KR 20077027719A KR 101213587 B1 KR101213587 B1 KR 101213587B1
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KR
South Korea
Prior art keywords
focus
focus value
electron beam
value
beam apparatus
Prior art date
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KR1020077027719A
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English (en)
Korean (ko)
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KR20080011304A (ko
Inventor
도시후미 김바
Original Assignee
가부시키가이샤 에바라 세이사꾸쇼
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Publication of KR20080011304A publication Critical patent/KR20080011304A/ko
Application granted granted Critical
Publication of KR101213587B1 publication Critical patent/KR101213587B1/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/21—Focus adjustment
    • H01J2237/216—Automatic focusing methods
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/248—Components associated with the control of the tube
    • H01J2237/2482—Optical means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
KR1020077027719A 2005-05-02 2006-04-27 시료검사장치 Active KR101213587B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00134136 2005-05-02
JP2005134136A JP4959149B2 (ja) 2005-05-02 2005-05-02 試料検査装置
PCT/JP2006/308843 WO2006120917A1 (ja) 2005-05-02 2006-04-27 試料検査装置

Publications (2)

Publication Number Publication Date
KR20080011304A KR20080011304A (ko) 2008-02-01
KR101213587B1 true KR101213587B1 (ko) 2013-01-18

Family

ID=37396426

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077027719A Active KR101213587B1 (ko) 2005-05-02 2006-04-27 시료검사장치

Country Status (5)

Country Link
US (1) US7964844B2 (enExample)
JP (1) JP4959149B2 (enExample)
KR (1) KR101213587B1 (enExample)
TW (1) TWI390648B (enExample)
WO (1) WO2006120917A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2126955A1 (en) * 2007-01-25 2009-12-02 NFAB Limited Improved particle beam generator
JP2008252070A (ja) * 2007-03-07 2008-10-16 Nuflare Technology Inc 荷電粒子ビームの焦点合わせ方法及び荷電粒子ビームの非点調整方法
JP5243912B2 (ja) * 2008-01-24 2013-07-24 日本電子株式会社 荷電粒子ビーム装置におけるビーム位置較正方法
JP5325802B2 (ja) 2010-01-28 2013-10-23 株式会社日立ハイテクノロジーズ 観察方法および観察装置
US8519353B2 (en) * 2010-12-29 2013-08-27 Varian Semiconductor Equipment Associates, Inc. Method and apparatus for controlling an asymmetric electrostatic lens about a central ray trajectory of an ion beam
JP5331828B2 (ja) * 2011-01-14 2013-10-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US8912488B2 (en) * 2012-11-15 2014-12-16 Fei Company Automated sample orientation
US9110039B2 (en) * 2013-07-25 2015-08-18 Kla-Tencor Corporation Auto-focus system and methods for die-to-die inspection
JP6309366B2 (ja) * 2014-06-30 2018-04-11 株式会社ホロン 荷電粒子線装置における高さ測定装置およびオートフォーカス装置
JP7455676B2 (ja) 2020-06-05 2024-03-26 株式会社日立ハイテク 電子顕微鏡および電子顕微鏡のフォーカス調整方法
JP7367215B2 (ja) * 2020-06-08 2023-10-23 株式会社日立ハイテク 荷電粒子線装置、およびそのフォーカス調整方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000228166A (ja) * 1999-02-05 2000-08-15 Horon:Kk 試料観察装置
JP2003007243A (ja) * 2001-06-19 2003-01-10 Seiko Instruments Inc レーザ欠陥検出機能を備えた走査型電子顕微鏡のオートフォーカス方式

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2542356C2 (de) * 1975-09-19 1977-10-20 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Fokussierung der Objektivlinse eines Korpuskular-Durchstrahlungs-Rastermikroskops und Einrichtung zur selbsttätigen Durchführung des Verfahrens, sowie Anwendung
JPH053013A (ja) * 1991-06-24 1993-01-08 Shimadzu Corp 自動焦点調節装置
JPH07245075A (ja) * 1994-03-04 1995-09-19 Horon:Kk 自動焦点合わせ装置
JPH1048163A (ja) * 1996-08-07 1998-02-20 Shimadzu Corp 表面分析方法およびその装置
JPH11149895A (ja) * 1997-08-11 1999-06-02 Hitachi Ltd 電子線式検査または測定装置およびその方法、高さ検出装置並びに電子線式描画装置
US6107637A (en) * 1997-08-11 2000-08-22 Hitachi, Ltd. Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
US6946656B2 (en) * 2001-07-12 2005-09-20 Hitachi, Ltd. Sample electrification measurement method and charged particle beam apparatus
JP4388270B2 (ja) * 2002-11-18 2009-12-24 株式会社日立ハイテクノロジーズ 表面検査方法及び表面検査装置
TWI345054B (en) * 2003-05-30 2011-07-11 Ebara Corp Specimen inspection device and method, and method for making a semiconductor device using such specimen inspection device and method
WO2007035834A2 (en) * 2005-09-21 2007-03-29 Kla-Tencor Technologies Corporation Methods and systems for creating a recipe for a defect review process

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000228166A (ja) * 1999-02-05 2000-08-15 Horon:Kk 試料観察装置
JP2003007243A (ja) * 2001-06-19 2003-01-10 Seiko Instruments Inc レーザ欠陥検出機能を備えた走査型電子顕微鏡のオートフォーカス方式

Also Published As

Publication number Publication date
JP4959149B2 (ja) 2012-06-20
TW200701384A (en) 2007-01-01
JP2006310223A (ja) 2006-11-09
US20090212214A1 (en) 2009-08-27
TWI390648B (zh) 2013-03-21
KR20080011304A (ko) 2008-02-01
WO2006120917A1 (ja) 2006-11-16
US7964844B2 (en) 2011-06-21

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