KR101190138B1 - 바이폴라 펄스 전원 및 복수의 바이폴라 펄스 전원으로 구성된 전원 장치 - Google Patents

바이폴라 펄스 전원 및 복수의 바이폴라 펄스 전원으로 구성된 전원 장치 Download PDF

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KR101190138B1
KR101190138B1 KR1020107029230A KR20107029230A KR101190138B1 KR 101190138 B1 KR101190138 B1 KR 101190138B1 KR 1020107029230 A KR1020107029230 A KR 1020107029230A KR 20107029230 A KR20107029230 A KR 20107029230A KR 101190138 B1 KR101190138 B1 KR 101190138B1
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output
power supply
bipolar pulse
switching
pulse power
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KR20110010820A (ko
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요시쿠니 호리시타
시노부 마츠바라
아쯔시 오노
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가부시키가이샤 알박
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    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M7/00—Conversion of AC power input into DC power output; Conversion of DC power input into AC power output
    • H02M7/42—Conversion of DC power input into AC power output without possibility of reversal
    • H02M7/44—Conversion of DC power input into AC power output without possibility of reversal by static converters
    • H02M7/48—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode
    • H02M7/53—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal
    • H02M7/537—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters
    • H02M7/5387—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters in a bridge configuration
    • H02M7/53871—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters in a bridge configuration with automatic control of output voltage or current
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M7/00—Conversion of AC power input into DC power output; Conversion of DC power input into AC power output
    • H02M7/42—Conversion of DC power input into AC power output without possibility of reversal
    • H02M7/44—Conversion of DC power input into AC power output without possibility of reversal by static converters
    • H02M7/48—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode
    • H02M7/493—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode the static converters being arranged for operation in parallel

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
  • Inverter Devices (AREA)
KR1020107029230A 2008-05-26 2009-05-20 바이폴라 펄스 전원 및 복수의 바이폴라 펄스 전원으로 구성된 전원 장치 Active KR101190138B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2008-137077 2008-05-26
JP2008137077A JP5124344B2 (ja) 2008-05-26 2008-05-26 バイポーラパルス電源及び複数のバイポーラパルス電源からなる電源装置並びに出力方法
PCT/JP2009/059271 WO2009145091A1 (ja) 2008-05-26 2009-05-20 バイポーラパルス電源及び複数のバイポーラパルス電源からなる電源装置

Publications (2)

Publication Number Publication Date
KR20110010820A KR20110010820A (ko) 2011-02-07
KR101190138B1 true KR101190138B1 (ko) 2012-10-12

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KR1020107029230A Active KR101190138B1 (ko) 2008-05-26 2009-05-20 바이폴라 펄스 전원 및 복수의 바이폴라 펄스 전원으로 구성된 전원 장치

Country Status (6)

Country Link
US (1) US8467211B2 (enExample)
JP (1) JP5124344B2 (enExample)
KR (1) KR101190138B1 (enExample)
CN (1) CN102027667B (enExample)
TW (1) TW201014148A (enExample)
WO (1) WO2009145091A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220038717A (ko) * 2019-07-29 2022-03-29 에이이에스 글로벌 홀딩스 피티이 리미티드 다수의 부하의 펄스 구동을 위한 채널 오프셋을 갖는 멀티플렉싱된 전력 발생기 출력

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JP5124345B2 (ja) * 2008-05-26 2013-01-23 株式会社アルバック バイポーラパルス電源及びこのバイポーラパルス電源を複数台並列接続してなる電源装置
JP5186281B2 (ja) * 2008-05-26 2013-04-17 株式会社アルバック バイポーラパルス電源及びこのバイポーラパルス電源を複数台並列接続してなる電源装置
JP5339965B2 (ja) * 2009-03-02 2013-11-13 株式会社アルバック スパッタリング装置用の交流電源
US10707055B2 (en) 2017-11-17 2020-07-07 Advanced Energy Industries, Inc. Spatial and temporal control of ion bias voltage for plasma processing
JP5363281B2 (ja) * 2009-11-25 2013-12-11 株式会社アルバック 電源装置
JP2011146251A (ja) * 2010-01-14 2011-07-28 Fuji Mach Mfg Co Ltd プラズマ化ガス発生装置
CN103069928B (zh) * 2010-08-18 2015-03-25 株式会社爱发科 直流电源装置
US9685297B2 (en) 2012-08-28 2017-06-20 Advanced Energy Industries, Inc. Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system
DE102013110883B3 (de) * 2013-10-01 2015-01-15 TRUMPF Hüttinger GmbH + Co. KG Vorrichtung und Verfahren zur Überwachung einer Entladung in einem Plasmaprozess
EP2905801B1 (en) 2014-02-07 2019-05-22 TRUMPF Huettinger Sp. Z o. o. Method of monitoring the discharge in a plasma process and monitoring device for monitoring the discharge in a plasma
DE102016012460A1 (de) 2016-10-19 2018-04-19 Grenzebach Maschinenbau Gmbh Vorrichtung und Verfahren zur Herstellung definierter Eigenschaften von Gradientenschichten in einem System mehrlagiger Beschichtungen bei Sputter - Anlagen
EP3396700A1 (en) * 2017-04-27 2018-10-31 TRUMPF Hüttinger GmbH + Co. KG Power converter unit, plasma processing equipment and method of controlling several plasma processes
US11437221B2 (en) 2017-11-17 2022-09-06 Advanced Energy Industries, Inc. Spatial monitoring and control of plasma processing environments
JP6657535B2 (ja) * 2017-12-26 2020-03-04 キヤノントッキ株式会社 スパッタ成膜装置およびスパッタ成膜方法
DE19723614T1 (de) * 2018-05-06 2021-07-15 Aes Global Holdings, Pte. Ltd. Vorrichtung, system und verfahren zur reduzierung von haarrissbildung
CN109811324B (zh) * 2019-03-14 2021-02-09 哈尔滨工业大学 基于异质双靶高功率脉冲磁控溅射制备掺杂类薄膜的装置及方法
CN110138362B (zh) * 2019-04-10 2020-10-27 北京航空航天大学 一种从靶材泵出离子的新型脉动等离子体的电源
CN114222958B (zh) 2019-07-12 2024-03-19 先进工程解决方案全球控股私人有限公司 具有单个受控开关的偏置电源
SG10201913413YA (en) * 2019-12-26 2021-07-29 Zero2 5 Biotech Pte Ltd System and device for air purification
JP2023518170A (ja) * 2020-03-10 2023-04-28 スロベンスカ テクニッカ ウニベラヂッタ べ ブラチスラバ 特にマグネトロン・スパッタリングのための高性能パルス放電プラズマ発生器の接続物
US12125674B2 (en) 2020-05-11 2024-10-22 Advanced Energy Industries, Inc. Surface charge and power feedback and control using a switch mode bias system
US20220074043A1 (en) * 2020-09-04 2022-03-10 Changxin Memory Technologies, Inc. Initial treatment method for target material for physical vapor deposition process, and controller
US20230050841A1 (en) * 2021-08-13 2023-02-16 Advanced Energy Industries, Inc. Configurable bias supply with bidirectional switch
US11670487B1 (en) 2022-01-26 2023-06-06 Advanced Energy Industries, Inc. Bias supply control and data processing
US12046448B2 (en) 2022-01-26 2024-07-23 Advanced Energy Industries, Inc. Active switch on time control for bias supply
US11942309B2 (en) 2022-01-26 2024-03-26 Advanced Energy Industries, Inc. Bias supply with resonant switching
US11978613B2 (en) 2022-09-01 2024-05-07 Advanced Energy Industries, Inc. Transition control in a bias supply

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JP4513376B2 (ja) * 2004-03-26 2010-07-28 パナソニック電工株式会社 高圧放電灯点灯装置及び照明器具
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JP5186281B2 (ja) * 2008-05-26 2013-04-17 株式会社アルバック バイポーラパルス電源及びこのバイポーラパルス電源を複数台並列接続してなる電源装置

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220038717A (ko) * 2019-07-29 2022-03-29 에이이에스 글로벌 홀딩스 피티이 리미티드 다수의 부하의 펄스 구동을 위한 채널 오프셋을 갖는 멀티플렉싱된 전력 발생기 출력
KR102886124B1 (ko) * 2019-07-29 2025-11-14 에이이에스 글로벌 홀딩스 피티이 리미티드 다수의 부하의 펄스 구동을 위한 채널 오프셋을 갖는 멀티플렉싱된 전력 발생기 출력

Also Published As

Publication number Publication date
JP2009284732A (ja) 2009-12-03
WO2009145091A1 (ja) 2009-12-03
CN102027667B (zh) 2014-02-12
JP5124344B2 (ja) 2013-01-23
US20110038187A1 (en) 2011-02-17
TW201014148A (en) 2010-04-01
US8467211B2 (en) 2013-06-18
KR20110010820A (ko) 2011-02-07
CN102027667A (zh) 2011-04-20

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