JP2009284732A5 - - Google Patents
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- Publication number
- JP2009284732A5 JP2009284732A5 JP2008137077A JP2008137077A JP2009284732A5 JP 2009284732 A5 JP2009284732 A5 JP 2009284732A5 JP 2008137077 A JP2008137077 A JP 2008137077A JP 2008137077 A JP2008137077 A JP 2008137077A JP 2009284732 A5 JP2009284732 A5 JP 2009284732A5
- Authority
- JP
- Japan
- Prior art keywords
- output
- power supply
- switching
- bipolar pulse
- pulse power
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims description 22
- 238000004544 sputter deposition Methods 0.000 claims description 18
- 238000010891 electric arc Methods 0.000 description 32
- 238000001514 detection method Methods 0.000 description 19
- 230000010355 oscillation Effects 0.000 description 10
- 239000000758 substrate Substances 0.000 description 9
- 239000002245 particle Substances 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 230000001360 synchronised effect Effects 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 3
- 230000002159 abnormal effect Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910000846 In alloy Inorganic materials 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008137077A JP5124344B2 (ja) | 2008-05-26 | 2008-05-26 | バイポーラパルス電源及び複数のバイポーラパルス電源からなる電源装置並びに出力方法 |
| KR1020107029230A KR101190138B1 (ko) | 2008-05-26 | 2009-05-20 | 바이폴라 펄스 전원 및 복수의 바이폴라 펄스 전원으로 구성된 전원 장치 |
| PCT/JP2009/059271 WO2009145091A1 (ja) | 2008-05-26 | 2009-05-20 | バイポーラパルス電源及び複数のバイポーラパルス電源からなる電源装置 |
| US12/989,444 US8467211B2 (en) | 2008-05-26 | 2009-05-20 | Bipolar pulsed power supply and power supply apparatus having plurality of bipolar pulsed power supplies |
| CN200980116930.0A CN102027667B (zh) | 2008-05-26 | 2009-05-20 | 双极脉冲电源以及由多个双极脉冲电源构成的电源装置 |
| TW098117293A TW201014148A (en) | 2008-05-26 | 2009-05-25 | Bipolar pulsed power supply and power supply consisting of multiple bipolar pulse power supplies |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008137077A JP5124344B2 (ja) | 2008-05-26 | 2008-05-26 | バイポーラパルス電源及び複数のバイポーラパルス電源からなる電源装置並びに出力方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009284732A JP2009284732A (ja) | 2009-12-03 |
| JP2009284732A5 true JP2009284732A5 (enExample) | 2011-04-28 |
| JP5124344B2 JP5124344B2 (ja) | 2013-01-23 |
Family
ID=41376970
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008137077A Active JP5124344B2 (ja) | 2008-05-26 | 2008-05-26 | バイポーラパルス電源及び複数のバイポーラパルス電源からなる電源装置並びに出力方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8467211B2 (enExample) |
| JP (1) | JP5124344B2 (enExample) |
| KR (1) | KR101190138B1 (enExample) |
| CN (1) | CN102027667B (enExample) |
| TW (1) | TW201014148A (enExample) |
| WO (1) | WO2009145091A1 (enExample) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5124345B2 (ja) * | 2008-05-26 | 2013-01-23 | 株式会社アルバック | バイポーラパルス電源及びこのバイポーラパルス電源を複数台並列接続してなる電源装置 |
| JP5186281B2 (ja) * | 2008-05-26 | 2013-04-17 | 株式会社アルバック | バイポーラパルス電源及びこのバイポーラパルス電源を複数台並列接続してなる電源装置 |
| JP5339965B2 (ja) | 2009-03-02 | 2013-11-13 | 株式会社アルバック | スパッタリング装置用の交流電源 |
| JP5363281B2 (ja) * | 2009-11-25 | 2013-12-11 | 株式会社アルバック | 電源装置 |
| JP2011146251A (ja) * | 2010-01-14 | 2011-07-28 | Fuji Mach Mfg Co Ltd | プラズマ化ガス発生装置 |
| KR101421483B1 (ko) * | 2010-08-18 | 2014-07-22 | 가부시키가이샤 알박 | 직류 전원 장치 |
| US9685297B2 (en) | 2012-08-28 | 2017-06-20 | Advanced Energy Industries, Inc. | Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system |
| DE102013110883B3 (de) * | 2013-10-01 | 2015-01-15 | TRUMPF Hüttinger GmbH + Co. KG | Vorrichtung und Verfahren zur Überwachung einer Entladung in einem Plasmaprozess |
| EP2905801B1 (en) | 2014-02-07 | 2019-05-22 | TRUMPF Huettinger Sp. Z o. o. | Method of monitoring the discharge in a plasma process and monitoring device for monitoring the discharge in a plasma |
| DE102016012460A1 (de) * | 2016-10-19 | 2018-04-19 | Grenzebach Maschinenbau Gmbh | Vorrichtung und Verfahren zur Herstellung definierter Eigenschaften von Gradientenschichten in einem System mehrlagiger Beschichtungen bei Sputter - Anlagen |
| EP3396700A1 (en) * | 2017-04-27 | 2018-10-31 | TRUMPF Hüttinger GmbH + Co. KG | Power converter unit, plasma processing equipment and method of controlling several plasma processes |
| US11437221B2 (en) | 2017-11-17 | 2022-09-06 | Advanced Energy Industries, Inc. | Spatial monitoring and control of plasma processing environments |
| CN111788655B (zh) | 2017-11-17 | 2024-04-05 | 先进工程解决方案全球控股私人有限公司 | 对等离子体处理的离子偏置电压的空间和时间控制 |
| JP6657535B2 (ja) * | 2017-12-26 | 2020-03-04 | キヤノントッキ株式会社 | スパッタ成膜装置およびスパッタ成膜方法 |
| EP3791420B1 (en) * | 2018-05-06 | 2024-06-12 | AES Global Holdings, Pte. Ltd. | Deposition system to reduce crazing |
| CN109811324B (zh) * | 2019-03-14 | 2021-02-09 | 哈尔滨工业大学 | 基于异质双靶高功率脉冲磁控溅射制备掺杂类薄膜的装置及方法 |
| CN110138362B (zh) * | 2019-04-10 | 2020-10-27 | 北京航空航天大学 | 一种从靶材泵出离子的新型脉动等离子体的电源 |
| JP7603649B2 (ja) | 2019-07-12 | 2024-12-20 | エーイーエス グローバル ホールディングス， プライベート リミテッド | 単一制御型スイッチを伴うバイアス供給装置 |
| CN114424447A (zh) | 2019-07-29 | 2022-04-29 | 先进工程解决方案全球控股私人有限公司 | 用于多个负载的脉冲驱动的具有通道偏移的多路复用功率发生器输出 |
| SG10201913413YA (en) * | 2019-12-26 | 2021-07-29 | Zero2 5 Biotech Pte Ltd | System and device for air purification |
| JP2023518170A (ja) * | 2020-03-10 | 2023-04-28 | スロベンスカ テクニッカ ウニベラヂッタ べ ブラチスラバ | 特にマグネトロン・スパッタリングのための高性能パルス放電プラズマ発生器の接続物 |
| US12125674B2 (en) | 2020-05-11 | 2024-10-22 | Advanced Energy Industries, Inc. | Surface charge and power feedback and control using a switch mode bias system |
| US20220074043A1 (en) * | 2020-09-04 | 2022-03-10 | Changxin Memory Technologies, Inc. | Initial treatment method for target material for physical vapor deposition process, and controller |
| US20230050841A1 (en) * | 2021-08-13 | 2023-02-16 | Advanced Energy Industries, Inc. | Configurable bias supply with bidirectional switch |
| US11942309B2 (en) | 2022-01-26 | 2024-03-26 | Advanced Energy Industries, Inc. | Bias supply with resonant switching |
| US12046448B2 (en) | 2022-01-26 | 2024-07-23 | Advanced Energy Industries, Inc. | Active switch on time control for bias supply |
| US11670487B1 (en) | 2022-01-26 | 2023-06-06 | Advanced Energy Industries, Inc. | Bias supply control and data processing |
| US11978613B2 (en) | 2022-09-01 | 2024-05-07 | Advanced Energy Industries, Inc. | Transition control in a bias supply |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2386458A (en) | 1944-01-05 | 1945-10-09 | Salle Nat Bank | Constant current regulator |
| DE9109503U1 (de) * | 1991-07-31 | 1991-10-17 | Magtron Magneto Elektronische Geraete Gmbh, 7583 Ottersweier | Schaltungsanordnung für ein Stromversorgungsgerät für Geräte und Anlagen der Plasma- und Oberflächentechnik |
| US5773799A (en) * | 1996-04-01 | 1998-06-30 | Gas Research Institute | High-frequency induction heating power supply |
| DE19651615C1 (de) * | 1996-12-12 | 1997-07-10 | Fraunhofer Ges Forschung | Verfahren zum Aufbringen von Kohlenstoffschichten durch reaktives Magnetron-Sputtern |
| DE19651811B4 (de) * | 1996-12-13 | 2006-08-31 | Unaxis Deutschland Holding Gmbh | Vorrichtung zum Belegen eines Substrats mit dünnen Schichten |
| JP3829233B2 (ja) * | 1999-05-24 | 2006-10-04 | 富士電機ホールディングス株式会社 | 高周波電源の制御方法 |
| JP4513376B2 (ja) * | 2004-03-26 | 2010-07-28 | パナソニック電工株式会社 | 高圧放電灯点灯装置及び照明器具 |
| EP1864313B1 (de) * | 2005-03-24 | 2012-12-19 | Oerlikon Trading AG, Trübbach | Vakuumplasmagenerator |
| JP5186281B2 (ja) * | 2008-05-26 | 2013-04-17 | 株式会社アルバック | バイポーラパルス電源及びこのバイポーラパルス電源を複数台並列接続してなる電源装置 |
| JP5124345B2 (ja) * | 2008-05-26 | 2013-01-23 | 株式会社アルバック | バイポーラパルス電源及びこのバイポーラパルス電源を複数台並列接続してなる電源装置 |
| JP5429771B2 (ja) * | 2008-05-26 | 2014-02-26 | 株式会社アルバック | スパッタリング方法 |
-
2008
- 2008-05-26 JP JP2008137077A patent/JP5124344B2/ja active Active
-
2009
- 2009-05-20 US US12/989,444 patent/US8467211B2/en active Active
- 2009-05-20 CN CN200980116930.0A patent/CN102027667B/zh active Active
- 2009-05-20 WO PCT/JP2009/059271 patent/WO2009145091A1/ja not_active Ceased
- 2009-05-20 KR KR1020107029230A patent/KR101190138B1/ko active Active
- 2009-05-25 TW TW098117293A patent/TW201014148A/zh unknown
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