TW201014148A - Bipolar pulsed power supply and power supply consisting of multiple bipolar pulse power supplies - Google Patents
Bipolar pulsed power supply and power supply consisting of multiple bipolar pulse power supplies Download PDFInfo
- Publication number
- TW201014148A TW201014148A TW098117293A TW98117293A TW201014148A TW 201014148 A TW201014148 A TW 201014148A TW 098117293 A TW098117293 A TW 098117293A TW 98117293 A TW98117293 A TW 98117293A TW 201014148 A TW201014148 A TW 201014148A
- Authority
- TW
- Taiwan
- Prior art keywords
- output
- power supply
- switching
- circuit
- bipolar pulse
- Prior art date
Links
- 238000004544 sputter deposition Methods 0.000 claims description 16
- 230000001360 synchronised effect Effects 0.000 claims description 6
- 239000002245 particle Substances 0.000 abstract description 8
- 238000010891 electric arc Methods 0.000 description 29
- 238000001514 detection method Methods 0.000 description 11
- 239000000758 substrate Substances 0.000 description 9
- 230000010355 oscillation Effects 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 230000008859 change Effects 0.000 description 6
- 230000008569 process Effects 0.000 description 5
- 239000013078 crystal Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 229910000846 In alloy Inorganic materials 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 230000005405 multipole Effects 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M7/00—Conversion of AC power input into DC power output; Conversion of DC power input into AC power output
- H02M7/42—Conversion of DC power input into AC power output without possibility of reversal
- H02M7/44—Conversion of DC power input into AC power output without possibility of reversal by static converters
- H02M7/48—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode
- H02M7/53—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal
- H02M7/537—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters
- H02M7/5387—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters in a bridge configuration
- H02M7/53871—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters in a bridge configuration with automatic control of output voltage or current
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M7/00—Conversion of AC power input into DC power output; Conversion of DC power input into AC power output
- H02M7/42—Conversion of DC power input into AC power output without possibility of reversal
- H02M7/44—Conversion of DC power input into AC power output without possibility of reversal by static converters
- H02M7/48—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode
- H02M7/493—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode the static converters being arranged for operation in parallel
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Power Engineering (AREA)
- Plasma Technology (AREA)
- Inverter Devices (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008137077A JP5124344B2 (ja) | 2008-05-26 | 2008-05-26 | バイポーラパルス電源及び複数のバイポーラパルス電源からなる電源装置並びに出力方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW201014148A true TW201014148A (en) | 2010-04-01 |
Family
ID=41376970
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW098117293A TW201014148A (en) | 2008-05-26 | 2009-05-25 | Bipolar pulsed power supply and power supply consisting of multiple bipolar pulse power supplies |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8467211B2 (enExample) |
| JP (1) | JP5124344B2 (enExample) |
| KR (1) | KR101190138B1 (enExample) |
| CN (1) | CN102027667B (enExample) |
| TW (1) | TW201014148A (enExample) |
| WO (1) | WO2009145091A1 (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI646867B (zh) * | 2013-10-01 | 2019-01-01 | 德商創富許廷格有限及兩合公司 | 在電漿製程中監控放電的裝置及方法 |
| US10290477B2 (en) | 2014-02-07 | 2019-05-14 | Trumpf Huettinger Sp. Z O. O. | Monitoring a discharge in a plasma process |
| TWI748401B (zh) * | 2019-04-10 | 2021-12-01 | 北京航空航天大學 | 從靶材泵出離子的新型脈動等離子體的電源及使用該電源之磁控濺射系統和空間推進器 |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5124345B2 (ja) * | 2008-05-26 | 2013-01-23 | 株式会社アルバック | バイポーラパルス電源及びこのバイポーラパルス電源を複数台並列接続してなる電源装置 |
| JP5186281B2 (ja) * | 2008-05-26 | 2013-04-17 | 株式会社アルバック | バイポーラパルス電源及びこのバイポーラパルス電源を複数台並列接続してなる電源装置 |
| JP5339965B2 (ja) * | 2009-03-02 | 2013-11-13 | 株式会社アルバック | スパッタリング装置用の交流電源 |
| JP5363281B2 (ja) * | 2009-11-25 | 2013-12-11 | 株式会社アルバック | 電源装置 |
| JP2011146251A (ja) * | 2010-01-14 | 2011-07-28 | Fuji Mach Mfg Co Ltd | プラズマ化ガス発生装置 |
| WO2012023276A1 (ja) * | 2010-08-18 | 2012-02-23 | 株式会社アルバック | 直流電源装置 |
| US9685297B2 (en) | 2012-08-28 | 2017-06-20 | Advanced Energy Industries, Inc. | Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system |
| DE102016012460A1 (de) | 2016-10-19 | 2018-04-19 | Grenzebach Maschinenbau Gmbh | Vorrichtung und Verfahren zur Herstellung definierter Eigenschaften von Gradientenschichten in einem System mehrlagiger Beschichtungen bei Sputter - Anlagen |
| EP3396700A1 (en) * | 2017-04-27 | 2018-10-31 | TRUMPF Hüttinger GmbH + Co. KG | Power converter unit, plasma processing equipment and method of controlling several plasma processes |
| TWI872423B (zh) | 2017-11-17 | 2025-02-11 | 新加坡商Aes 全球公司 | 用於在空間域和時間域上控制基板上的電漿處理之系統和方法，及相關的電腦可讀取媒體 |
| US12505986B2 (en) | 2017-11-17 | 2025-12-23 | Advanced Energy Industries, Inc. | Synchronization of plasma processing components |
| US11437221B2 (en) | 2017-11-17 | 2022-09-06 | Advanced Energy Industries, Inc. | Spatial monitoring and control of plasma processing environments |
| JP6657535B2 (ja) * | 2017-12-26 | 2020-03-04 | キヤノントッキ株式会社 | スパッタ成膜装置およびスパッタ成膜方法 |
| KR102773804B1 (ko) | 2018-05-06 | 2025-02-26 | 에이이에스 글로벌 홀딩스 피티이 리미티드 | 크레이징을 감소시키기 위한 장치, 시스템 및 방법 |
| CN109811324B (zh) * | 2019-03-14 | 2021-02-09 | 哈尔滨工业大学 | 基于异质双靶高功率脉冲磁控溅射制备掺杂类薄膜的装置及方法 |
| US11887812B2 (en) | 2019-07-12 | 2024-01-30 | Advanced Energy Industries, Inc. | Bias supply with a single controlled switch |
| CN114424447A (zh) | 2019-07-29 | 2022-04-29 | 先进工程解决方案全球控股私人有限公司 | 用于多个负载的脉冲驱动的具有通道偏移的多路复用功率发生器输出 |
| SG10201913413YA (en) * | 2019-12-26 | 2021-07-29 | Zero2 5 Biotech Pte Ltd | System and device for air purification |
| WO2021181295A1 (en) * | 2020-03-10 | 2021-09-16 | Slovenská Technická Univerzita V Bratislave | Connection of high-performance pulse discharge plasma generator, especially for magnetron sputtering |
| US12125674B2 (en) | 2020-05-11 | 2024-10-22 | Advanced Energy Industries, Inc. | Surface charge and power feedback and control using a switch mode bias system |
| CN114134466B (zh) * | 2020-09-04 | 2023-06-30 | 长鑫存储技术有限公司 | 用于物理气相沉积工艺的靶材初始处理方法与控制器 |
| US20230050841A1 (en) * | 2021-08-13 | 2023-02-16 | Advanced Energy Industries, Inc. | Configurable bias supply with bidirectional switch |
| US12046448B2 (en) | 2022-01-26 | 2024-07-23 | Advanced Energy Industries, Inc. | Active switch on time control for bias supply |
| US11670487B1 (en) | 2022-01-26 | 2023-06-06 | Advanced Energy Industries, Inc. | Bias supply control and data processing |
| US11942309B2 (en) | 2022-01-26 | 2024-03-26 | Advanced Energy Industries, Inc. | Bias supply with resonant switching |
| US11978613B2 (en) | 2022-09-01 | 2024-05-07 | Advanced Energy Industries, Inc. | Transition control in a bias supply |
| CN115811303B (zh) * | 2022-12-05 | 2026-04-17 | 华中科技大学 | 一种电感储能型脉冲功率电源 |
| US12567572B2 (en) | 2023-07-11 | 2026-03-03 | Advanced Energy Industries, Inc. | Plasma behaviors predicted by current measurements during asymmetric bias waveform application |
| US12700578B2 (en) | 2024-02-29 | 2026-08-04 | Advanced Energy Industries, Inc. | Plasma processing based on bias supply reporting |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2386458A (en) | 1944-01-05 | 1945-10-09 | Salle Nat Bank | Constant current regulator |
| DE9109503U1 (de) | 1991-07-31 | 1991-10-17 | Magtron Magneto Elektronische Geraete Gmbh, 7583 Ottersweier | Schaltungsanordnung für ein Stromversorgungsgerät für Geräte und Anlagen der Plasma- und Oberflächentechnik |
| US5773799A (en) | 1996-04-01 | 1998-06-30 | Gas Research Institute | High-frequency induction heating power supply |
| DE19651615C1 (de) * | 1996-12-12 | 1997-07-10 | Fraunhofer Ges Forschung | Verfahren zum Aufbringen von Kohlenstoffschichten durch reaktives Magnetron-Sputtern |
| DE19651811B4 (de) * | 1996-12-13 | 2006-08-31 | Unaxis Deutschland Holding Gmbh | Vorrichtung zum Belegen eines Substrats mit dünnen Schichten |
| JP3829233B2 (ja) * | 1999-05-24 | 2006-10-04 | 富士電機ホールディングス株式会社 | 高周波電源の制御方法 |
| JP4513376B2 (ja) * | 2004-03-26 | 2010-07-28 | パナソニック電工株式会社 | 高圧放電灯点灯装置及び照明器具 |
| PL1864313T3 (pl) * | 2005-03-24 | 2013-05-31 | Oerlikon Trading Ag | Próżniowy generator plazmowy |
| JP5429771B2 (ja) * | 2008-05-26 | 2014-02-26 | 株式会社アルバック | スパッタリング方法 |
| JP5124345B2 (ja) * | 2008-05-26 | 2013-01-23 | 株式会社アルバック | バイポーラパルス電源及びこのバイポーラパルス電源を複数台並列接続してなる電源装置 |
| JP5186281B2 (ja) * | 2008-05-26 | 2013-04-17 | 株式会社アルバック | バイポーラパルス電源及びこのバイポーラパルス電源を複数台並列接続してなる電源装置 |
-
2008
- 2008-05-26 JP JP2008137077A patent/JP5124344B2/ja active Active
-
2009
- 2009-05-20 KR KR1020107029230A patent/KR101190138B1/ko active Active
- 2009-05-20 WO PCT/JP2009/059271 patent/WO2009145091A1/ja not_active Ceased
- 2009-05-20 US US12/989,444 patent/US8467211B2/en active Active
- 2009-05-20 CN CN200980116930.0A patent/CN102027667B/zh active Active
- 2009-05-25 TW TW098117293A patent/TW201014148A/zh unknown
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI646867B (zh) * | 2013-10-01 | 2019-01-01 | 德商創富許廷格有限及兩合公司 | 在電漿製程中監控放電的裝置及方法 |
| US10181392B2 (en) | 2013-10-01 | 2019-01-15 | Trumpf Huettinger Gmbh + Co. Kg | Monitoring a discharge in a plasma process |
| US10290477B2 (en) | 2014-02-07 | 2019-05-14 | Trumpf Huettinger Sp. Z O. O. | Monitoring a discharge in a plasma process |
| TWI748401B (zh) * | 2019-04-10 | 2021-12-01 | 北京航空航天大學 | 從靶材泵出離子的新型脈動等離子體的電源及使用該電源之磁控濺射系統和空間推進器 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2009145091A1 (ja) | 2009-12-03 |
| US20110038187A1 (en) | 2011-02-17 |
| US8467211B2 (en) | 2013-06-18 |
| KR20110010820A (ko) | 2011-02-07 |
| JP2009284732A (ja) | 2009-12-03 |
| CN102027667A (zh) | 2011-04-20 |
| KR101190138B1 (ko) | 2012-10-12 |
| JP5124344B2 (ja) | 2013-01-23 |
| CN102027667B (zh) | 2014-02-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101190138B1 (ko) | 바이폴라 펄스 전원 및 복수의 바이폴라 펄스 전원으로 구성된 전원 장치 | |
| KR101181875B1 (ko) | 바이폴라 펄스 전원 및 이 바이폴라 펄스 전원을 복수대 병렬 접속하여 구성되는 전원 장치 | |
| JP2009284732A5 (enExample) | ||
| CN102084024B (zh) | 电源装置 | |
| JP5186281B2 (ja) | バイポーラパルス電源及びこのバイポーラパルス電源を複数台並列接続してなる電源装置 | |
| JP5429771B2 (ja) | スパッタリング方法 | |
| CN103069928B (zh) | 直流电源装置 | |
| TW201006317A (en) | Power source device | |
| TWI523583B (zh) | Power supply | |
| JPWO2009025306A1 (ja) | スパッタリング方法 |