KR101169839B1 - 도포막형성 장치 - Google Patents

도포막형성 장치 Download PDF

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Publication number
KR101169839B1
KR101169839B1 KR1020050014780A KR20050014780A KR101169839B1 KR 101169839 B1 KR101169839 B1 KR 101169839B1 KR 1020050014780 A KR1020050014780 A KR 1020050014780A KR 20050014780 A KR20050014780 A KR 20050014780A KR 101169839 B1 KR101169839 B1 KR 101169839B1
Authority
KR
South Korea
Prior art keywords
substrate
board
carrying
coating
coating film
Prior art date
Application number
KR1020050014780A
Other languages
English (en)
Korean (ko)
Other versions
KR20060043097A (ko
Inventor
카즈히토 미야자키
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20060043097A publication Critical patent/KR20060043097A/ko
Application granted granted Critical
Publication of KR101169839B1 publication Critical patent/KR101169839B1/ko

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706—Mechanical details, e.g. roller, belt

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Liquid Crystal (AREA)
KR1020050014780A 2004-02-24 2005-02-23 도포막형성 장치 KR101169839B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2004-00047310 2004-02-24
JP2004047310A JP4069980B2 (ja) 2004-02-24 2004-02-24 塗布膜形成装置

Publications (2)

Publication Number Publication Date
KR20060043097A KR20060043097A (ko) 2006-05-15
KR101169839B1 true KR101169839B1 (ko) 2012-07-30

Family

ID=35025118

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050014780A KR101169839B1 (ko) 2004-02-24 2005-02-23 도포막형성 장치

Country Status (2)

Country Link
JP (1) JP4069980B2 (ja)
KR (1) KR101169839B1 (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4349528B2 (ja) * 2005-01-25 2009-10-21 大日本印刷株式会社 基板搬送装置、基板制御方法、カラーフィルタ製造方法、電子回路製造方法
WO2009011165A1 (ja) * 2007-07-17 2009-01-22 Ihi Corporation 薄板移送装置、薄板処理移送システム、及び薄板移送方法
JP5076697B2 (ja) * 2007-07-17 2012-11-21 株式会社Ｉｈｉ 薄板移送装置、薄板処理移送システム、及び薄板移送方法
JP4985170B2 (ja) * 2007-07-17 2012-07-25 株式会社Ｉｈｉ 薄板移送装置、薄板処理移送システム、及び薄板移送方法
JP5308647B2 (ja) * 2007-09-19 2013-10-09 東京応化工業株式会社 浮上搬送塗布装置
JP5317618B2 (ja) * 2008-10-06 2013-10-16 株式会社日立ハイテクノロジーズ 表示パネルモジュール組立装置及び基板搬送装置
KR101077846B1 (ko) 2010-02-05 2011-10-28 주식회사 나래나노텍 기판 부상 유닛용 부상 스테이지, 및 이를 구비한 기판 부상 유닛, 기판 이송 장치 및 코팅 장치
TW201214609A (en) 2010-09-27 2012-04-01 Toray Eng Co Ltd Substrate conveying apparatus
KR102086798B1 (ko) * 2013-01-31 2020-03-09 세메스 주식회사 기판 처리 장치
KR102002733B1 (ko) * 2018-11-15 2019-07-22 김명기 슬라이더 모듈 및 이를 포함하는 컨베이어 장치

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010071542A (ko) * 1998-06-19 2001-07-28 추후제출 기판 이송장치
KR20010105108A (ko) * 2000-05-19 2001-11-28 윤종용 포토레지스터 코팅 설비
JP2003100623A (ja) * 2001-07-05 2003-04-04 Tokyo Electron Ltd 液処理装置および液処理方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010071542A (ko) * 1998-06-19 2001-07-28 추후제출 기판 이송장치
KR20010105108A (ko) * 2000-05-19 2001-11-28 윤종용 포토레지스터 코팅 설비
JP2003100623A (ja) * 2001-07-05 2003-04-04 Tokyo Electron Ltd 液処理装置および液処理方法

Also Published As

Publication number Publication date
KR20060043097A (ko) 2006-05-15
JP4069980B2 (ja) 2008-04-02
JP2005243670A (ja) 2005-09-08

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