KR101161950B1 - 반사형 마스크 블랭크와 반사형 마스크, 및 이들의 제조 방법 - Google Patents

반사형 마스크 블랭크와 반사형 마스크, 및 이들의 제조 방법 Download PDF

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Publication number
KR101161950B1
KR101161950B1 KR1020090093904A KR20090093904A KR101161950B1 KR 101161950 B1 KR101161950 B1 KR 101161950B1 KR 1020090093904 A KR1020090093904 A KR 1020090093904A KR 20090093904 A KR20090093904 A KR 20090093904A KR 101161950 B1 KR101161950 B1 KR 101161950B1
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South Korea
Prior art keywords
film
reflective mask
protective film
reflective
oxide layer
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KR1020090093904A
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English (en)
Korean (ko)
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KR20100038276A (ko
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모리오 호소야
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호야 가부시키가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/52—Reflectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/40—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials
    • H10P76/405—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their composition, e.g. multilayer masks

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020090093904A 2008-10-04 2009-10-01 반사형 마스크 블랭크와 반사형 마스크, 및 이들의 제조 방법 Active KR101161950B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008259137A JP5372455B2 (ja) 2008-10-04 2008-10-04 反射型マスクブランク及び反射型マスク、並びにこれらの製造方法
JPJP-P-2008-259137 2008-10-04

Publications (2)

Publication Number Publication Date
KR20100038276A KR20100038276A (ko) 2010-04-14
KR101161950B1 true KR101161950B1 (ko) 2012-07-04

Family

ID=42215136

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020090093904A Active KR101161950B1 (ko) 2008-10-04 2009-10-01 반사형 마스크 블랭크와 반사형 마스크, 및 이들의 제조 방법

Country Status (4)

Country Link
US (1) US8021807B2 (enExample)
JP (1) JP5372455B2 (enExample)
KR (1) KR101161950B1 (enExample)
TW (1) TWI396935B (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5841710B2 (ja) * 2010-03-17 2016-01-13 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
US8679707B2 (en) 2012-08-01 2014-03-25 Taiwan Semiconductor Manufacturing Company, Ltd. Method of fabricating a lithography mask
JP2014045075A (ja) * 2012-08-27 2014-03-13 Asahi Glass Co Ltd Ｅｕｖリソグラフィ用反射型マスクブランクおよびｅｕｖリソグラフィ用反射型マスク
DE102013202372A1 (de) * 2013-02-14 2013-12-19 Carl Zeiss Smt Gmbh Verfahren zur Herstellung einer elektromagnetische Wellen beugenden Struktur für eine Wellenfrontquelle
JP6301127B2 (ja) * 2013-12-25 2018-03-28 Hoya株式会社 反射型マスクブランク及び反射型マスク、並びに半導体装置の製造方法
JP6564362B2 (ja) * 2014-03-11 2019-08-21 芝浦メカトロニクス株式会社 反射型マスクの洗浄装置および反射型マスクの洗浄方法
JP6739960B2 (ja) * 2016-03-28 2020-08-12 Hoya株式会社 反射型マスクブランク、反射型マスク及び半導体装置の製造方法
JP7590915B2 (ja) 2021-04-30 2024-11-27 信越化学工業株式会社 反射型マスクブランク及び反射型マスクの製造方法
JP7547305B2 (ja) 2021-11-11 2024-09-09 信越化学工業株式会社 フォトマスクブランク、フォトマスクの製造方法及びフォトマスク
JP7800410B2 (ja) * 2022-12-21 2026-01-16 信越化学工業株式会社 反射型マスクブランク

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005268750A (ja) * 2004-02-19 2005-09-29 Hoya Corp 反射型マスクブランクス及び反射型マスク並びに半導体装置の製造方法
US20060175616A1 (en) * 2005-02-07 2006-08-10 Manish Chandhok Pre-oxidized protective layer for lithography

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0727198A (ja) 1993-07-15 1995-01-27 Tsudomi Keiko 回転力伝動装置
JP5371162B2 (ja) 2000-10-13 2013-12-18 三星電子株式会社 反射型フォトマスク
US20030090636A1 (en) * 2001-10-26 2003-05-15 Corning, Inc. Anti-reflective coating on a photomask
JP4521753B2 (ja) * 2003-03-19 2010-08-11 Ｈｏｙａ株式会社 反射型マスクの製造方法及び半導体装置の製造方法
JP2006049761A (ja) * 2004-08-09 2006-02-16 Nikon Corp 光学素子、光学素子の製造方法及び投影露光装置
JP2006173490A (ja) * 2004-12-17 2006-06-29 Nikon Corp 光学素子及びこれを用いた投影露光装置
WO2007039161A1 (en) * 2005-09-27 2007-04-12 Schott Ag Mask blanc and photomasks having antireflective properties
JP4666365B2 (ja) * 2005-10-14 2011-04-06 Ｈｏｙａ株式会社 多層反射膜付き基板、その製造方法、反射型マスクブランクおよび反射型マスク
JP4905914B2 (ja) * 2005-10-14 2012-03-28 Ｈｏｙａ株式会社 多層反射膜付き基板、その製造方法、反射型マスクブランクおよび反射型マスク
JP4926522B2 (ja) * 2006-03-31 2012-05-09 Ｈｏｙａ株式会社 反射型マスクブランクス及び反射型マスク並びに半導体装置の製造方法
US7700245B2 (en) * 2006-05-03 2010-04-20 Hoya Corporation Reflective mask blank, reflective mask, and method of manufacturing semiconductor device
TWI417647B (zh) * 2006-06-08 2013-12-01 旭硝子股份有限公司 Ｅｕｖ微影術用之反射性空白遮光罩及用於彼之具有功能性薄膜的基板
JP4910856B2 (ja) * 2006-06-08 2012-04-04 旭硝子株式会社 Ｅｕｖリソグラフィ用反射型マスクブランク、および該マスクブランク用の機能膜付基板

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005268750A (ja) * 2004-02-19 2005-09-29 Hoya Corp 反射型マスクブランクス及び反射型マスク並びに半導体装置の製造方法
US20060175616A1 (en) * 2005-02-07 2006-08-10 Manish Chandhok Pre-oxidized protective layer for lithography

Also Published As

Publication number Publication date
US8021807B2 (en) 2011-09-20
TW201024913A (en) 2010-07-01
US20100136464A1 (en) 2010-06-03
JP2010092947A (ja) 2010-04-22
JP5372455B2 (ja) 2013-12-18
TWI396935B (zh) 2013-05-21
KR20100038276A (ko) 2010-04-14

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