KR101150319B1 - 기판 위에 다공성 반도체 필름을 제조하는 방법 - Google Patents

기판 위에 다공성 반도체 필름을 제조하는 방법 Download PDF

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Publication number
KR101150319B1
KR101150319B1 KR1020067021975A KR20067021975A KR101150319B1 KR 101150319 B1 KR101150319 B1 KR 101150319B1 KR 1020067021975 A KR1020067021975 A KR 1020067021975A KR 20067021975 A KR20067021975 A KR 20067021975A KR 101150319 B1 KR101150319 B1 KR 101150319B1
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South Korea
Prior art keywords
suspension
semiconductor particles
semiconductor
particles
semiconductor film
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Expired - Fee Related
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KR1020067021975A
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English (en)
Korean (ko)
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KR20060135909A (ko
Inventor
미하엘 뒤어르
가브릴레 넬레스
아키오 야스다
Original Assignee
소니 도이칠란트 게엠베하
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Publication of KR20060135909A publication Critical patent/KR20060135909A/ko
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Publication of KR101150319B1 publication Critical patent/KR101150319B1/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M14/00—Electrochemical current or voltage generators not provided for in groups H01M6/00 - H01M12/00; Manufacture thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00—Individual photovoltaic cells, e.g. solar cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12014—All metal or with adjacent metals having metal particles
    • Y10T428/12028—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Hybrid Cells (AREA)
  • Photovoltaic Devices (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
KR1020067021975A 2004-04-23 2005-02-22 기판 위에 다공성 반도체 필름을 제조하는 방법 Expired - Fee Related KR101150319B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP04009743A EP1589549A1 (en) 2004-04-23 2004-04-23 A method of producing a porous semiconductor film on a substrate
EP04009743.8 2004-04-23
PCT/EP2005/001842 WO2005104152A1 (en) 2004-04-23 2005-02-22 A method of producing a porous semiconductor film on a substrate

Publications (2)

Publication Number Publication Date
KR20060135909A KR20060135909A (ko) 2006-12-29
KR101150319B1 true KR101150319B1 (ko) 2012-06-08

Family

ID=34924719

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067021975A Expired - Fee Related KR101150319B1 (ko) 2004-04-23 2005-02-22 기판 위에 다공성 반도체 필름을 제조하는 방법

Country Status (6)

Country Link
US (1) US20080283119A1 (https=)
EP (1) EP1589549A1 (https=)
JP (1) JP4909885B2 (https=)
KR (1) KR101150319B1 (https=)
AU (1) AU2005236527B2 (https=)
WO (1) WO2005104152A1 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1209708B1 (en) * 2000-11-24 2007-01-17 Sony Deutschland GmbH Hybrid solar cells with thermal deposited semiconductive oxide layer
WO2008139479A2 (en) * 2007-05-15 2008-11-20 3Gsolar Ltd. Photovoltaic cell
GB2432722A (en) 2005-11-25 2007-05-30 Seiko Epson Corp Electrochemical cell and method of manufacture
EP2015325A3 (en) * 2006-12-13 2009-11-25 Sony Deutschland GmbH A porous semiconductor film on a substrate
JP5452898B2 (ja) * 2008-08-20 2014-03-26 積水化学工業株式会社 電極装置及びその製造方法
KR100945742B1 (ko) * 2009-07-28 2010-03-05 (주)켐웰텍 염료감응형 태양전지의 광전극 제조방법
KR101682575B1 (ko) 2009-08-24 2016-12-06 삼성전자주식회사 전기 변색 소자 및 그 제조 방법
KR20120040322A (ko) * 2010-10-19 2012-04-27 주식회사 동진쎄미켐 광산란층을 구비한 염료감응 태양전지모듈 및 그 제조 방법
KR101305119B1 (ko) * 2010-11-05 2013-09-12 현대자동차주식회사 잉크젯 인쇄용 반도체 산화물 잉크 조성물과 이의 제조방법 및 이를 이용한 광전변환 소자의 제조방법
KR101285355B1 (ko) * 2011-08-16 2013-07-11 주식회사 씨드 디스플레이 및 염료감응형 태양 전지용 광 경화 잉크젯 잉크 조성물의 제조방법
KR101285357B1 (ko) * 2011-08-16 2013-07-11 주식회사 씨드 극초고분자량 고분자 막을 사용한 전지나 커패시터용 광 경화 잉크젯 잉크의 제조 방법
TW201324795A (zh) * 2011-12-01 2013-06-16 Univ Hsiuping Sci & Tech 染料敏化太陽能工作電極結構及其製作方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002324591A (ja) * 2001-02-21 2002-11-08 Showa Denko Kk 色素増感型太陽電池用光活性電極及びその製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4751528A (en) * 1987-09-09 1988-06-14 Spectra, Inc. Platen arrangement for hot melt ink jet apparatus
US6252156B1 (en) * 1997-06-24 2001-06-26 Fuji Xerox Co., Ltd. Photosensitive semiconductor electrode, method of manufacturing photosensitive semiconductor electrode, and photoelectric converter using photosensitive semiconductor
JP3952103B2 (ja) * 1998-05-29 2007-08-01 触媒化成工業株式会社 光電気セルおよび光電気セル用金属酸化物半導体膜の製造方法
US6706963B2 (en) * 2002-01-25 2004-03-16 Konarka Technologies, Inc. Photovoltaic cell interconnection
EP1271227A1 (en) * 2001-06-26 2003-01-02 Nanomat Limited Electrochromic display for high resolution and method of producing the same
JP2003100357A (ja) * 2001-09-20 2003-04-04 Fuji Photo Film Co Ltd 光電変換素子の作製方法、光電変換素子及び光電池
JP2003187881A (ja) * 2001-12-21 2003-07-04 Fuji Photo Film Co Ltd 光電変換素子の作製方法、光電変換素子及び光電池
JP4384389B2 (ja) * 2002-04-18 2009-12-16 株式会社ブリヂストン 金属酸化物半導体膜の形成方法、有機色素増感型金属酸化物半導体電極及びこの半導体電極を有する太陽電池
EP1463073A1 (en) * 2003-03-24 2004-09-29 Sony International (Europe) GmbH Porous film having a gradient of light scattering strength
EP1610170A1 (en) * 2004-06-25 2005-12-28 Sony Deutschland GmbH A method of applying a particle film to create a surface having light-diffusive and/or reduced glare properties

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002324591A (ja) * 2001-02-21 2002-11-08 Showa Denko Kk 色素増感型太陽電池用光活性電極及びその製造方法

Also Published As

Publication number Publication date
US20080283119A1 (en) 2008-11-20
AU2005236527A1 (en) 2005-11-03
JP4909885B2 (ja) 2012-04-04
JP2007534120A (ja) 2007-11-22
KR20060135909A (ko) 2006-12-29
WO2005104152A1 (en) 2005-11-03
AU2005236527B2 (en) 2010-12-16
EP1589549A1 (en) 2005-10-26

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