KR101120386B1 - 방현 필름 및 화상 표시 장치 - Google Patents

방현 필름 및 화상 표시 장치 Download PDF

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Publication number
KR101120386B1
KR101120386B1 KR1020040088747A KR20040088747A KR101120386B1 KR 101120386 B1 KR101120386 B1 KR 101120386B1 KR 1020040088747 A KR1020040088747 A KR 1020040088747A KR 20040088747 A KR20040088747 A KR 20040088747A KR 101120386 B1 KR101120386 B1 KR 101120386B1
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KR
South Korea
Prior art keywords
film
area
glare
unevenness
concave
Prior art date
Application number
KR1020040088747A
Other languages
English (en)
Korean (ko)
Other versions
KR20050043647A (ko
Inventor
마사또 구와바라
마꼬또 나미오까
Original Assignee
스미또모 가가꾸 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2003375300A external-priority patent/JP2005140890A/ja
Priority claimed from JP2004023108A external-priority patent/JP4100350B2/ja
Application filed by 스미또모 가가꾸 가부시끼가이샤 filed Critical 스미또모 가가꾸 가부시끼가이샤
Publication of KR20050043647A publication Critical patent/KR20050043647A/ko
Application granted granted Critical
Publication of KR101120386B1 publication Critical patent/KR101120386B1/ko

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
    • G03F7/2063—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam for the production of exposure masks or reticles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
    • H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
    • H01L21/0337—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Toxicology (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
KR1020040088747A 2003-11-05 2004-11-03 방현 필름 및 화상 표시 장치 KR101120386B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2003375300A JP2005140890A (ja) 2003-11-05 2003-11-05 防眩フィルム及び画像表示装置
JPJP-P-2003-00375300 2003-11-05
JPJP-P-2004-00023108 2004-01-30
JP2004023108A JP4100350B2 (ja) 2004-01-30 2004-01-30 防眩フィルムの製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020110056103A Division KR101189305B1 (ko) 2003-11-05 2011-06-10 방현 필름의 제조 방법

Publications (2)

Publication Number Publication Date
KR20050043647A KR20050043647A (ko) 2005-05-11
KR101120386B1 true KR101120386B1 (ko) 2012-02-24

Family

ID=34797135

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020040088747A KR101120386B1 (ko) 2003-11-05 2004-11-03 방현 필름 및 화상 표시 장치
KR1020110056103A KR101189305B1 (ko) 2003-11-05 2011-06-10 방현 필름의 제조 방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020110056103A KR101189305B1 (ko) 2003-11-05 2011-06-10 방현 필름의 제조 방법

Country Status (3)

Country Link
KR (2) KR101120386B1 (zh)
CN (1) CN100401113C (zh)
TW (1) TWI354120B (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007156132A (ja) * 2005-12-06 2007-06-21 Sumitomo Chemical Co Ltd 防眩フィルム及び画像表示装置
JP4513921B2 (ja) * 2008-12-09 2010-07-28 ソニー株式会社 光学体およびその製造方法、窓材、ブラインド、ロールカーテン、ならびに障子
JP2012003026A (ja) * 2010-06-16 2012-01-05 Sony Corp 光学体、窓材、建具および日射遮蔽装置
CN109270620B (zh) 2018-11-16 2022-07-19 京东方科技集团股份有限公司 金属线栅偏振片的制作方法及显示面板
TWI817475B (zh) * 2022-04-29 2023-10-01 元太科技工業股份有限公司 防眩層及其製作方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0583765U (ja) * 1992-04-10 1993-11-12 旭光学工業株式会社 パターン分割露光装置
JP2002040215A (ja) 2000-07-26 2002-02-06 Optrex Corp 光拡散膜の製造方法
JP2002196115A (ja) 2000-12-22 2002-07-10 Andes Intekku:Kk 反射体及び液晶表示装置
JP2003004916A (ja) 2001-06-20 2003-01-08 Dainippon Printing Co Ltd 表示装置の窓材、その製造方法、及び表示装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1144805A (ja) * 1997-07-28 1999-02-16 Denso Corp 防眩透明樹脂成形体
JP3931408B2 (ja) * 1997-12-25 2007-06-13 凸版印刷株式会社 防眩性ハードコートフィルム
JP2003075604A (ja) * 2001-09-03 2003-03-12 Nitto Denko Corp 反射防止防眩フィルムおよびその製造方法、光学素子、画像表示装置
JP4059710B2 (ja) * 2001-10-23 2008-03-12 シャープ株式会社 防眩性フィルム及び偏光素子及び表示装置の製造方法
JP4001320B2 (ja) * 2001-10-26 2007-10-31 大日本印刷株式会社 防眩フィルム、偏光フィルム及び透過型表示装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0583765U (ja) * 1992-04-10 1993-11-12 旭光学工業株式会社 パターン分割露光装置
JP2002040215A (ja) 2000-07-26 2002-02-06 Optrex Corp 光拡散膜の製造方法
JP2002196115A (ja) 2000-12-22 2002-07-10 Andes Intekku:Kk 反射体及び液晶表示装置
JP2003004916A (ja) 2001-06-20 2003-01-08 Dainippon Printing Co Ltd 表示装置の窓材、その製造方法、及び表示装置

Also Published As

Publication number Publication date
TW200516276A (en) 2005-05-16
CN100401113C (zh) 2008-07-09
KR20110084856A (ko) 2011-07-26
KR101189305B1 (ko) 2012-10-09
CN1616992A (zh) 2005-05-18
KR20050043647A (ko) 2005-05-11
TWI354120B (en) 2011-12-11

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