KR101088250B1 - 조리개 변경 장치 - Google Patents

조리개 변경 장치 Download PDF

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Publication number
KR101088250B1
KR101088250B1 KR1020067010273A KR20067010273A KR101088250B1 KR 101088250 B1 KR101088250 B1 KR 101088250B1 KR 1020067010273 A KR1020067010273 A KR 1020067010273A KR 20067010273 A KR20067010273 A KR 20067010273A KR 101088250 B1 KR101088250 B1 KR 101088250B1
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KR
South Korea
Prior art keywords
aperture
image forming
optical image
forming apparatus
beam path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020067010273A
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English (en)
Korean (ko)
Other versions
KR20060088904A (ko
Inventor
헤르만 비크
마르쿠스 빌
토마스 비숍
임-분 패트릭 콴
우이-리엠 뉴옌
슈테판 크살터
미카엘 뮐바이어
Original Assignee
칼 짜이스 에스엠테 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 칼 짜이스 에스엠테 게엠베하 filed Critical 칼 짜이스 에스엠테 게엠베하
Publication of KR20060088904A publication Critical patent/KR20060088904A/ko
Application granted granted Critical
Publication of KR101088250B1 publication Critical patent/KR101088250B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/005—Diaphragms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G21K1/04—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using variable diaphragms, shutters, choppers
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/067—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using surface reflection, e.g. grazing incidence mirrors, gratings

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Diaphragms For Cameras (AREA)
KR1020067010273A 2003-10-29 2003-12-18 조리개 변경 장치 Expired - Fee Related KR101088250B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10350545 2003-10-29
DE10350545.8 2003-10-29
PCT/EP2003/014551 WO2005050322A1 (en) 2003-10-29 2003-12-18 Diaphragm changing device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020117011730A Division KR101179286B1 (ko) 2003-10-29 2003-12-18 조리개 변경 장치

Publications (2)

Publication Number Publication Date
KR20060088904A KR20060088904A (ko) 2006-08-07
KR101088250B1 true KR101088250B1 (ko) 2011-11-30

Family

ID=34608889

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1020067010273A Expired - Fee Related KR101088250B1 (ko) 2003-10-29 2003-12-18 조리개 변경 장치
KR1020117011730A Expired - Fee Related KR101179286B1 (ko) 2003-10-29 2003-12-18 조리개 변경 장치
KR1020127019652A Expired - Fee Related KR101281445B1 (ko) 2003-10-29 2003-12-18 조리개 변경 장치

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR1020117011730A Expired - Fee Related KR101179286B1 (ko) 2003-10-29 2003-12-18 조리개 변경 장치
KR1020127019652A Expired - Fee Related KR101281445B1 (ko) 2003-10-29 2003-12-18 조리개 변경 장치

Country Status (6)

Country Link
US (4) US7684125B2 (https=)
EP (1) EP1678558A1 (https=)
JP (3) JP5065596B2 (https=)
KR (3) KR101088250B1 (https=)
AU (1) AU2003292889A1 (https=)
WO (1) WO2005050322A1 (https=)

Families Citing this family (16)

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Publication number Priority date Publication date Assignee Title
US7684125B2 (en) 2003-10-29 2010-03-23 Carl Zeiss Smt Ag Diaphragm changing device
US7724351B2 (en) 2006-01-30 2010-05-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and exchangeable optical element
US20070211352A1 (en) * 2006-03-09 2007-09-13 Nikon Corporation Aperture changing apparatus and method
TWI439815B (zh) 2006-07-03 2014-06-01 Zeiss Carl Smt Gmbh 校正／修復微影投影曝光裝置中之投影物鏡的方法與此投影物鏡
DE102006050835A1 (de) * 2006-10-27 2008-05-08 Carl Zeiss Smt Ag Verfahren und Vorrichtung zum Austausch von Objetkivteilen
CN101548240B (zh) 2006-12-01 2014-09-17 卡尔蔡司Smt有限责任公司 具有用于减小像差的可替换、可操纵的校正布置的光学系统
DE102007009867A1 (de) 2007-02-28 2008-09-11 Carl Zeiss Smt Ag Abbildungsvorrichtung mit auswechselbaren Blenden sowie Verfahren hierzu
JP5533656B2 (ja) * 2008-09-18 2014-06-25 株式会社ニコン 結像光学系、露光装置及び電子デバイスの製造方法
KR20100044625A (ko) * 2008-10-22 2010-04-30 삼성전자주식회사 주기적으로 활성화되는 복제 경로를 구비하는 지연 동기 루프를 구비하는 반도체 장치
US8351022B2 (en) * 2009-06-15 2013-01-08 Asml Netherlands B.V. Radiation beam modification apparatus and method
DE102011003145A1 (de) 2010-02-09 2011-08-11 Carl Zeiss SMT GmbH, 73447 Optisches System mit Blendeneinrichtung
DE102011077315A1 (de) 2011-06-09 2012-08-02 Carl Zeiss Smt Gmbh Optische Anordnung in einem Projektionsobjektiv einer EUV-Projektionsbelichtungsanlage
US10293485B2 (en) * 2017-03-30 2019-05-21 Brain Corporation Systems and methods for robotic path planning
KR102028307B1 (ko) * 2019-06-25 2019-11-04 이기현 메쉬망체 이송장치 및 이를 이용한 메쉬망체 이송방법
US12066761B2 (en) * 2021-08-30 2024-08-20 Taiwan Semiconductor Manufacturing Company, Ltd. Inspection tool for an extreme ultraviolet radiation source to observe tin residual
DE102025115150A1 (de) * 2025-04-17 2026-02-26 Carl Zeiss Smt Gmbh Handhabungsvorrichtung zum Handhaben wenigstens eines Elements für eine Anlage der Halbleitertechnologie

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JPH05234850A (ja) * 1992-02-18 1993-09-10 Canon Inc 投影露光装置及びそれを用いた半導体デバイスの製造方法
EP0969327A2 (en) * 1998-06-30 2000-01-05 Canon Kabushiki Kaisha Multiple exposure method

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CA2058396C (en) * 1990-12-25 1995-05-30 Osamu Sato Light-quantity control device
JPH06177008A (ja) * 1992-12-01 1994-06-24 Nippon Telegr & Teleph Corp <Ntt> 投影露光装置
JPH10125590A (ja) 1996-10-21 1998-05-15 Canon Inc 照明装置及びそれを用いた投影露光装置
JPH10170808A (ja) * 1996-12-10 1998-06-26 Asahi Optical Co Ltd レンズ鏡筒の電動絞装置
DE19724903A1 (de) * 1997-06-12 1998-12-17 Zeiss Carl Fa Lichtintensitätsmeßanordnung
JP3599537B2 (ja) * 1997-08-29 2004-12-08 株式会社ニデック 眼屈折力測定装置
JP2001244168A (ja) * 2000-02-25 2001-09-07 Nikon Corp 露光装置および該露光装置を用いてマイクロデバイスを製造する方法
US6396067B1 (en) * 1998-05-06 2002-05-28 Koninklijke Philips Electronics N.V. Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
US6255661B1 (en) 1998-05-06 2001-07-03 U.S. Philips Corporation Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
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JP4296701B2 (ja) * 2000-10-11 2009-07-15 株式会社ニコン 投影光学系，該投影光学系を備えた露光装置，及び該露光装置を用いたデバイスの製造方法
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JP2002372735A (ja) * 2001-06-14 2002-12-26 Canon Inc 光学絞り装置、露光装置、露光方法、デバイス製造方法及びデバイス
KR100969056B1 (ko) * 2002-11-21 2010-07-09 칼 짜이스 에스엠티 아게 마이크로 리도그라피를 위한 투사 렌즈
US7684125B2 (en) 2003-10-29 2010-03-23 Carl Zeiss Smt Ag Diaphragm changing device
JP5533656B2 (ja) 2008-09-18 2014-06-25 株式会社ニコン 結像光学系、露光装置及び電子デバイスの製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05234850A (ja) * 1992-02-18 1993-09-10 Canon Inc 投影露光装置及びそれを用いた半導体デバイスの製造方法
EP0969327A2 (en) * 1998-06-30 2000-01-05 Canon Kabushiki Kaisha Multiple exposure method

Also Published As

Publication number Publication date
WO2005050322A1 (en) 2005-06-02
KR101281445B1 (ko) 2013-07-02
KR20120089779A (ko) 2012-08-13
JP2012094916A (ja) 2012-05-17
US20120075611A1 (en) 2012-03-29
JP5444390B2 (ja) 2014-03-19
JP2007515772A (ja) 2007-06-14
US20160282724A1 (en) 2016-09-29
US20070053076A1 (en) 2007-03-08
JP5882286B2 (ja) 2016-03-09
US10139733B2 (en) 2018-11-27
US7684125B2 (en) 2010-03-23
JP2014064019A (ja) 2014-04-10
EP1678558A1 (en) 2006-07-12
KR101179286B1 (ko) 2012-09-03
US8089707B2 (en) 2012-01-03
KR20060088904A (ko) 2006-08-07
US20100134777A1 (en) 2010-06-03
AU2003292889A1 (en) 2005-06-08
KR20110074925A (ko) 2011-07-04
JP5065596B2 (ja) 2012-11-07

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