KR101057850B1 - 감방사선성 수지 조성물, 층간 절연막, 마이크로 렌즈 및이들의 제조 방법 - Google Patents

감방사선성 수지 조성물, 층간 절연막, 마이크로 렌즈 및이들의 제조 방법 Download PDF

Info

Publication number
KR101057850B1
KR101057850B1 KR1020067020762A KR20067020762A KR101057850B1 KR 101057850 B1 KR101057850 B1 KR 101057850B1 KR 1020067020762 A KR1020067020762 A KR 1020067020762A KR 20067020762 A KR20067020762 A KR 20067020762A KR 101057850 B1 KR101057850 B1 KR 101057850B1
Authority
KR
South Korea
Prior art keywords
radiation
resin composition
sensitive resin
weight
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020067020762A
Other languages
English (en)
Korean (ko)
Other versions
KR20070020436A (ko
Inventor
도루 가지따
다까끼 미노와
히로시 시호
Original Assignee
제이에스알 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 제이에스알 가부시끼가이샤 filed Critical 제이에스알 가부시끼가이샤
Publication of KR20070020436A publication Critical patent/KR20070020436A/ko
Application granted granted Critical
Publication of KR101057850B1 publication Critical patent/KR101057850B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
KR1020067020762A 2004-04-08 2005-02-18 감방사선성 수지 조성물, 층간 절연막, 마이크로 렌즈 및이들의 제조 방법 Expired - Fee Related KR101057850B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004114525 2004-04-08
JPJP-P-2004-00114525 2004-04-08
PCT/JP2005/003071 WO2005101124A1 (ja) 2004-04-08 2005-02-18 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法

Publications (2)

Publication Number Publication Date
KR20070020436A KR20070020436A (ko) 2007-02-21
KR101057850B1 true KR101057850B1 (ko) 2011-08-19

Family

ID=35150153

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067020762A Expired - Fee Related KR101057850B1 (ko) 2004-04-08 2005-02-18 감방사선성 수지 조성물, 층간 절연막, 마이크로 렌즈 및이들의 제조 방법

Country Status (5)

Country Link
JP (1) JP4650639B2 (enrdf_load_stackoverflow)
KR (1) KR101057850B1 (enrdf_load_stackoverflow)
CN (1) CN1898605B (enrdf_load_stackoverflow)
TW (1) TW200602806A (enrdf_load_stackoverflow)
WO (1) WO2005101124A1 (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7696292B2 (en) 2003-09-22 2010-04-13 Commonwealth Scientific And Industrial Research Organisation Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography
KR101250733B1 (ko) * 2005-03-15 2013-04-03 제이에스알 가부시끼가이샤 감방사선성 수지 조성물, 그로부터 형성된 돌기 및 스페이서, 및 이들을 구비하는 액정 표시 소자
JP4654867B2 (ja) * 2005-10-07 2011-03-23 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
JP4656316B2 (ja) * 2005-12-22 2011-03-23 Ｊｓｒ株式会社 層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
JP5177404B2 (ja) * 2007-07-30 2013-04-03 Ｊｓｒ株式会社 感放射線性樹脂組成物、ならびに層間絶縁膜およびマイクロレンズとそれらの製造方法
EP2277930A1 (en) * 2009-06-30 2011-01-26 Cytec Surface Specialties, S.A. Radiation curable compositions
KR102059430B1 (ko) * 2011-08-09 2019-12-26 제이에스알 가부시끼가이샤 마이크로렌즈 어레이 및 입체 화상 표시 장치

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000327877A (ja) * 1999-05-17 2000-11-28 Jsr Corp 感放射線性樹脂組成物、その層間絶縁膜およびマイクロレンズへの使用、並びに層間絶縁膜およびマイクロレンズ

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000347397A (ja) * 1999-06-04 2000-12-15 Jsr Corp 感放射線性樹脂組成物およびその層間絶縁膜への使用
TWI266146B (en) * 2001-03-31 2006-11-11 Samyang Ems Co Ltd Resist composition for column spacer of liquid crystal display element
JP2003041224A (ja) * 2001-07-31 2003-02-13 Kanegafuchi Chem Ind Co Ltd 粘着剤組成物
KR100784672B1 (ko) * 2001-08-20 2007-12-12 주식회사 동진쎄미켐 감광성 수지 조성물
KR100809544B1 (ko) * 2001-10-24 2008-03-04 주식회사 동진쎄미켐 퀴논디아지드 술폰산 에스테르 화합물을 포함하는 감광성수지조성물
JP2003140338A (ja) * 2001-10-31 2003-05-14 Nippon Steel Chem Co Ltd ポジ型感光性組成物
JP2003344998A (ja) * 2002-05-22 2003-12-03 Fuji Photo Film Co Ltd マゼンタ用感光性着色組成物、カラーフィルターの製造方法、及びカラーフィルター

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000327877A (ja) * 1999-05-17 2000-11-28 Jsr Corp 感放射線性樹脂組成物、その層間絶縁膜およびマイクロレンズへの使用、並びに層間絶縁膜およびマイクロレンズ

Also Published As

Publication number Publication date
TWI361951B (enrdf_load_stackoverflow) 2012-04-11
CN1898605B (zh) 2010-08-18
JPWO2005101124A1 (ja) 2008-03-06
TW200602806A (en) 2006-01-16
CN1898605A (zh) 2007-01-17
KR20070020436A (ko) 2007-02-21
JP4650639B2 (ja) 2011-03-16
WO2005101124A1 (ja) 2005-10-27

Similar Documents

Publication Publication Date Title
KR100976031B1 (ko) 감방사선성 수지 조성물, 층간 절연막 및 마이크로 렌즈및 이들의 제조 방법
KR100858446B1 (ko) 감방사선성 수지 조성물, 층간 절연막 및 마이크로렌즈, 및그들의 제조방법
KR101409552B1 (ko) 감방사선성 수지 조성물, 층간 절연막 및 마이크로렌즈, 및이들의 형성 방법
KR101421299B1 (ko) 감방사선성 수지 조성물, 층간 절연막 및 마이크로렌즈, 및이들의 제조 방법
CN101546127B (zh) 感射线性树脂组合物以及层间绝缘膜和微透镜的制造方法
KR100776121B1 (ko) 감방사선성 수지 조성물, 층간 절연막 및 마이크로렌즈,및 이들의 제조 방법
KR101538804B1 (ko) 감방사선성 수지 조성물, 및 층간 절연막과 그의 제조 방법
JP5177404B2 (ja) 感放射線性樹脂組成物、ならびに層間絶縁膜およびマイクロレンズとそれらの製造方法
KR101355223B1 (ko) 감방사선성 수지 조성물, 층간 절연막 및 마이크로렌즈, 및이들의 제조 방법
KR101021725B1 (ko) 감방사선성 수지 조성물, 층간 절연막 및 마이크로렌즈 및이들의 제조 방법
KR101057850B1 (ko) 감방사선성 수지 조성물, 층간 절연막, 마이크로 렌즈 및이들의 제조 방법
KR100806495B1 (ko) 감방사선성 수지 조성물, 층간 절연막 및 마이크로렌즈,및 이들의 제조 방법
JP4654867B2 (ja) 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
JP2007128061A (ja) 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズの形成方法ならびに層間絶縁膜およびマイクロレンズ
KR100989018B1 (ko) 감방사선성 수지 조성물, 층간 절연막 및 마이크로렌즈,및 이들의 제조 방법

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20140801

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20160729

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

FPAY Annual fee payment

Payment date: 20170804

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 10

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 11

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20220812

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20220812