JP4650639B2 - 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法 - Google Patents

感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法 Download PDF

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JP4650639B2
JP4650639B2 JP2006519375A JP2006519375A JP4650639B2 JP 4650639 B2 JP4650639 B2 JP 4650639B2 JP 2006519375 A JP2006519375 A JP 2006519375A JP 2006519375 A JP2006519375 A JP 2006519375A JP 4650639 B2 JP4650639 B2 JP 4650639B2
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radiation
weight
resin composition
sensitive resin
microlens
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Japanese (ja)
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JPWO2005101124A1 (ja
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徹 梶田
貴樹 蓑輪
浩司 志保
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JSR Corp
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JSR Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
JP2006519375A 2004-04-08 2005-02-18 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法 Expired - Fee Related JP4650639B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004114525 2004-04-08
JP2004114525 2004-04-08
PCT/JP2005/003071 WO2005101124A1 (ja) 2004-04-08 2005-02-18 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法

Publications (2)

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JPWO2005101124A1 JPWO2005101124A1 (ja) 2008-03-06
JP4650639B2 true JP4650639B2 (ja) 2011-03-16

Family

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Family Applications (1)

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JP2006519375A Expired - Fee Related JP4650639B2 (ja) 2004-04-08 2005-02-18 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法

Country Status (5)

Country Link
JP (1) JP4650639B2 (enrdf_load_stackoverflow)
KR (1) KR101057850B1 (enrdf_load_stackoverflow)
CN (1) CN1898605B (enrdf_load_stackoverflow)
TW (1) TW200602806A (enrdf_load_stackoverflow)
WO (1) WO2005101124A1 (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7696292B2 (en) 2003-09-22 2010-04-13 Commonwealth Scientific And Industrial Research Organisation Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography
KR101250733B1 (ko) * 2005-03-15 2013-04-03 제이에스알 가부시끼가이샤 감방사선성 수지 조성물, 그로부터 형성된 돌기 및 스페이서, 및 이들을 구비하는 액정 표시 소자
JP4654867B2 (ja) * 2005-10-07 2011-03-23 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
JP4656316B2 (ja) * 2005-12-22 2011-03-23 Ｊｓｒ株式会社 層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
JP5177404B2 (ja) * 2007-07-30 2013-04-03 Ｊｓｒ株式会社 感放射線性樹脂組成物、ならびに層間絶縁膜およびマイクロレンズとそれらの製造方法
EP2277930A1 (en) * 2009-06-30 2011-01-26 Cytec Surface Specialties, S.A. Radiation curable compositions
KR102059430B1 (ko) * 2011-08-09 2019-12-26 제이에스알 가부시끼가이샤 마이크로렌즈 어레이 및 입체 화상 표시 장치

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000327877A (ja) * 1999-05-17 2000-11-28 Jsr Corp 感放射線性樹脂組成物、その層間絶縁膜およびマイクロレンズへの使用、並びに層間絶縁膜およびマイクロレンズ
JP2000347397A (ja) * 1999-06-04 2000-12-15 Jsr Corp 感放射線性樹脂組成物およびその層間絶縁膜への使用
WO2003017001A1 (en) * 2001-08-20 2003-02-27 Dongjin Semichem Co., Ltd. Photosensitive resin composition for photoresist
WO2003036388A1 (en) * 2001-10-24 2003-05-01 Dongjin Semichem Co., Ltd. Photosnesitive resin composition comprising quinonediazide sulfate ester compound
JP2003140338A (ja) * 2001-10-31 2003-05-14 Nippon Steel Chem Co Ltd ポジ型感光性組成物
JP2003344998A (ja) * 2002-05-22 2003-12-03 Fuji Photo Film Co Ltd マゼンタ用感光性着色組成物、カラーフィルターの製造方法、及びカラーフィルター

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3467488B2 (ja) * 2001-03-31 2003-11-17 アダムス テクノロジー カンパニー リミテッド 液晶表示素子のカラムスペーサ用レジスト組成物
JP2003041224A (ja) * 2001-07-31 2003-02-13 Kanegafuchi Chem Ind Co Ltd 粘着剤組成物

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000327877A (ja) * 1999-05-17 2000-11-28 Jsr Corp 感放射線性樹脂組成物、その層間絶縁膜およびマイクロレンズへの使用、並びに層間絶縁膜およびマイクロレンズ
JP2000347397A (ja) * 1999-06-04 2000-12-15 Jsr Corp 感放射線性樹脂組成物およびその層間絶縁膜への使用
WO2003017001A1 (en) * 2001-08-20 2003-02-27 Dongjin Semichem Co., Ltd. Photosensitive resin composition for photoresist
WO2003036388A1 (en) * 2001-10-24 2003-05-01 Dongjin Semichem Co., Ltd. Photosnesitive resin composition comprising quinonediazide sulfate ester compound
JP2003140338A (ja) * 2001-10-31 2003-05-14 Nippon Steel Chem Co Ltd ポジ型感光性組成物
JP2003344998A (ja) * 2002-05-22 2003-12-03 Fuji Photo Film Co Ltd マゼンタ用感光性着色組成物、カラーフィルターの製造方法、及びカラーフィルター

Also Published As

Publication number Publication date
TWI361951B (enrdf_load_stackoverflow) 2012-04-11
KR20070020436A (ko) 2007-02-21
TW200602806A (en) 2006-01-16
KR101057850B1 (ko) 2011-08-19
WO2005101124A1 (ja) 2005-10-27
CN1898605A (zh) 2007-01-17
CN1898605B (zh) 2010-08-18
JPWO2005101124A1 (ja) 2008-03-06

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