TW200602806A - Radiation-sensitive resin composition, interlayer insulation film, microlens and process for producing them - Google Patents

Radiation-sensitive resin composition, interlayer insulation film, microlens and process for producing them

Info

Publication number
TW200602806A
TW200602806A TW094105902A TW94105902A TW200602806A TW 200602806 A TW200602806 A TW 200602806A TW 094105902 A TW094105902 A TW 094105902A TW 94105902 A TW94105902 A TW 94105902A TW 200602806 A TW200602806 A TW 200602806A
Authority
TW
Taiwan
Prior art keywords
radiation
resin composition
sensitive resin
microlens
interlayer insulation
Prior art date
Application number
TW094105902A
Other languages
English (en)
Chinese (zh)
Other versions
TWI361951B (enrdf_load_stackoverflow
Inventor
Toru Kajita
Takaki Minowa
Hiroshi Shiho
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200602806A publication Critical patent/TW200602806A/zh
Application granted granted Critical
Publication of TWI361951B publication Critical patent/TWI361951B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
TW094105902A 2004-04-08 2005-02-25 Radiation-sensitive resin composition, interlayer insulation film, microlens and process for producing them TW200602806A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004114525 2004-04-08

Publications (2)

Publication Number Publication Date
TW200602806A true TW200602806A (en) 2006-01-16
TWI361951B TWI361951B (enrdf_load_stackoverflow) 2012-04-11

Family

ID=35150153

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094105902A TW200602806A (en) 2004-04-08 2005-02-25 Radiation-sensitive resin composition, interlayer insulation film, microlens and process for producing them

Country Status (5)

Country Link
JP (1) JP4650639B2 (enrdf_load_stackoverflow)
KR (1) KR101057850B1 (enrdf_load_stackoverflow)
CN (1) CN1898605B (enrdf_load_stackoverflow)
TW (1) TW200602806A (enrdf_load_stackoverflow)
WO (1) WO2005101124A1 (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7696292B2 (en) 2003-09-22 2010-04-13 Commonwealth Scientific And Industrial Research Organisation Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography
KR101250733B1 (ko) * 2005-03-15 2013-04-03 제이에스알 가부시끼가이샤 감방사선성 수지 조성물, 그로부터 형성된 돌기 및 스페이서, 및 이들을 구비하는 액정 표시 소자
JP4654867B2 (ja) * 2005-10-07 2011-03-23 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
JP4656316B2 (ja) * 2005-12-22 2011-03-23 Ｊｓｒ株式会社 層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
JP5177404B2 (ja) * 2007-07-30 2013-04-03 Ｊｓｒ株式会社 感放射線性樹脂組成物、ならびに層間絶縁膜およびマイクロレンズとそれらの製造方法
EP2277930A1 (en) * 2009-06-30 2011-01-26 Cytec Surface Specialties, S.A. Radiation curable compositions
KR102059430B1 (ko) * 2011-08-09 2019-12-26 제이에스알 가부시끼가이샤 마이크로렌즈 어레이 및 입체 화상 표시 장치

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000327877A (ja) * 1999-05-17 2000-11-28 Jsr Corp 感放射線性樹脂組成物、その層間絶縁膜およびマイクロレンズへの使用、並びに層間絶縁膜およびマイクロレンズ
JP2000347397A (ja) * 1999-06-04 2000-12-15 Jsr Corp 感放射線性樹脂組成物およびその層間絶縁膜への使用
JP3467488B2 (ja) * 2001-03-31 2003-11-17 アダムス テクノロジー カンパニー リミテッド 液晶表示素子のカラムスペーサ用レジスト組成物
JP2003041224A (ja) * 2001-07-31 2003-02-13 Kanegafuchi Chem Ind Co Ltd 粘着剤組成物
KR100784672B1 (ko) * 2001-08-20 2007-12-12 주식회사 동진쎄미켐 감광성 수지 조성물
KR100809544B1 (ko) * 2001-10-24 2008-03-04 주식회사 동진쎄미켐 퀴논디아지드 술폰산 에스테르 화합물을 포함하는 감광성수지조성물
JP2003140338A (ja) * 2001-10-31 2003-05-14 Nippon Steel Chem Co Ltd ポジ型感光性組成物
JP2003344998A (ja) * 2002-05-22 2003-12-03 Fuji Photo Film Co Ltd マゼンタ用感光性着色組成物、カラーフィルターの製造方法、及びカラーフィルター

Also Published As

Publication number Publication date
TWI361951B (enrdf_load_stackoverflow) 2012-04-11
KR20070020436A (ko) 2007-02-21
KR101057850B1 (ko) 2011-08-19
WO2005101124A1 (ja) 2005-10-27
CN1898605A (zh) 2007-01-17
JP4650639B2 (ja) 2011-03-16
CN1898605B (zh) 2010-08-18
JPWO2005101124A1 (ja) 2008-03-06

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees