KR101028598B1 - 레이저 조사 장치 - Google Patents

레이저 조사 장치 Download PDF

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Publication number
KR101028598B1
KR101028598B1 KR1020087023807A KR20087023807A KR101028598B1 KR 101028598 B1 KR101028598 B1 KR 101028598B1 KR 1020087023807 A KR1020087023807 A KR 1020087023807A KR 20087023807 A KR20087023807 A KR 20087023807A KR 101028598 B1 KR101028598 B1 KR 101028598B1
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KR
South Korea
Prior art keywords
laser beam
laser
axis direction
strip
irradiation area
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KR1020087023807A
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English (en)
Korean (ko)
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KR20080109788A (ko
Inventor
료타로 도가시
도시오 이나미
준이치 시다
히데아키 구사마
나오유키 고바야시
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더 재팬 스틸 워크스 엘티디
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Publication of KR20080109788A publication Critical patent/KR20080109788A/ko
Application granted granted Critical
Publication of KR101028598B1 publication Critical patent/KR101028598B1/ko
Assigned to 제이에스더블유 악티나 시스템 가부시키가이샤 reassignment 제이에스더블유 악티나 시스템 가부시키가이샤 권리의 전부이전등록 Assignors: 더 재팬 스틸 워크스 엘티디
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/083Devices involving movement of the workpiece in at least one axial direction
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/082Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
    • B23K26/0821Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head using multifaceted mirrors, e.g. polygonal mirror
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00Articles made by soldering, welding or cutting
    • B23K2101/36Electric or electronic devices
    • B23K2101/40Semiconductor devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P34/00Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices
    • H10P34/40Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices with high-energy radiation
    • H10P34/42Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices with high-energy radiation with electromagnetic radiation, e.g. laser annealing

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Lasers (AREA)
  • Recrystallisation Techniques (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Semiconductor Lasers (AREA)
KR1020087023807A 2006-03-30 2007-02-13 레이저 조사 장치 Active KR101028598B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2006-00094484 2006-03-30
JP2006094484A JP4549996B2 (ja) 2006-03-30 2006-03-30 レーザ照射装置

Publications (2)

Publication Number Publication Date
KR20080109788A KR20080109788A (ko) 2008-12-17
KR101028598B1 true KR101028598B1 (ko) 2011-04-11

Family

ID=38580878

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087023807A Active KR101028598B1 (ko) 2006-03-30 2007-02-13 레이저 조사 장치

Country Status (5)

Country Link
JP (1) JP4549996B2 (https=)
KR (1) KR101028598B1 (https=)
DE (1) DE112007000735T5 (https=)
TW (1) TW200737352A (https=)
WO (1) WO2007116576A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9209347B2 (en) * 2011-10-27 2015-12-08 Applied Materials, Inc. Laser crystallization and polycrystal efficiency improvement for thin film solar
KR101881423B1 (ko) 2011-11-24 2018-07-25 삼성디스플레이 주식회사 결정화 장치, 결정화 방법 및 유기 발광 표시 장치의 제조 방법
KR101997095B1 (ko) * 2016-07-22 2019-07-08 전자부품연구원 수평 분해능 및 영상획득 프레임이 제어되는 스캐닝 라이다
JP7270652B2 (ja) * 2019-01-23 2023-05-10 ギガフォトン株式会社 レーザ加工装置及び被加工物の加工方法
JP7795880B2 (ja) * 2021-07-12 2026-01-08 住友重機械工業株式会社 アニール装置の制御装置、アニール装置、及びアニール方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52143755A (en) 1976-05-26 1977-11-30 Hitachi Ltd Laser, zone melting device
JPH09260684A (ja) * 1996-01-17 1997-10-03 Toshiba Corp 液晶表示装置の製造方法
JP2004349415A (ja) 2003-05-21 2004-12-09 Hitachi Ltd アクティブ・マトリクス基板の製造方法およびこれを用いた画像表示装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0410216A (ja) 1990-04-26 1992-01-14 Fuji Photo Film Co Ltd 磁気記録媒体及びその製造方法
KR20050070109A (ko) * 2002-11-05 2005-07-05 소니 가부시끼 가이샤 광조사장치 및 광조사방법

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52143755A (en) 1976-05-26 1977-11-30 Hitachi Ltd Laser, zone melting device
JPH09260684A (ja) * 1996-01-17 1997-10-03 Toshiba Corp 液晶表示装置の製造方法
JP2004349415A (ja) 2003-05-21 2004-12-09 Hitachi Ltd アクティブ・マトリクス基板の製造方法およびこれを用いた画像表示装置

Also Published As

Publication number Publication date
JP2007273539A (ja) 2007-10-18
TWI380369B (https=) 2012-12-21
KR20080109788A (ko) 2008-12-17
TW200737352A (en) 2007-10-01
WO2007116576A1 (ja) 2007-10-18
DE112007000735T5 (de) 2009-01-22
JP4549996B2 (ja) 2010-09-22

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