KR101028598B1 - 레이저 조사 장치 - Google Patents
레이저 조사 장치 Download PDFInfo
- Publication number
- KR101028598B1 KR101028598B1 KR1020087023807A KR20087023807A KR101028598B1 KR 101028598 B1 KR101028598 B1 KR 101028598B1 KR 1020087023807 A KR1020087023807 A KR 1020087023807A KR 20087023807 A KR20087023807 A KR 20087023807A KR 101028598 B1 KR101028598 B1 KR 101028598B1
- Authority
- KR
- South Korea
- Prior art keywords
- laser beam
- laser
- axis direction
- strip
- irradiation area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
- B23K26/0821—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head using multifaceted mirrors, e.g. polygonal mirror
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P34/00—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices
- H10P34/40—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices with high-energy radiation
- H10P34/42—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices with high-energy radiation with electromagnetic radiation, e.g. laser annealing
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
- Lasers (AREA)
- Recrystallisation Techniques (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2006-00094484 | 2006-03-30 | ||
| JP2006094484A JP4549996B2 (ja) | 2006-03-30 | 2006-03-30 | レーザ照射装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20080109788A KR20080109788A (ko) | 2008-12-17 |
| KR101028598B1 true KR101028598B1 (ko) | 2011-04-11 |
Family
ID=38580878
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020087023807A Active KR101028598B1 (ko) | 2006-03-30 | 2007-02-13 | 레이저 조사 장치 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP4549996B2 (https=) |
| KR (1) | KR101028598B1 (https=) |
| DE (1) | DE112007000735T5 (https=) |
| TW (1) | TW200737352A (https=) |
| WO (1) | WO2007116576A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9209347B2 (en) * | 2011-10-27 | 2015-12-08 | Applied Materials, Inc. | Laser crystallization and polycrystal efficiency improvement for thin film solar |
| KR101881423B1 (ko) | 2011-11-24 | 2018-07-25 | 삼성디스플레이 주식회사 | 결정화 장치, 결정화 방법 및 유기 발광 표시 장치의 제조 방법 |
| KR101997095B1 (ko) * | 2016-07-22 | 2019-07-08 | 전자부품연구원 | 수평 분해능 및 영상획득 프레임이 제어되는 스캐닝 라이다 |
| JP7270652B2 (ja) * | 2019-01-23 | 2023-05-10 | ギガフォトン株式会社 | レーザ加工装置及び被加工物の加工方法 |
| JP7795880B2 (ja) * | 2021-07-12 | 2026-01-08 | 住友重機械工業株式会社 | アニール装置の制御装置、アニール装置、及びアニール方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52143755A (en) | 1976-05-26 | 1977-11-30 | Hitachi Ltd | Laser, zone melting device |
| JPH09260684A (ja) * | 1996-01-17 | 1997-10-03 | Toshiba Corp | 液晶表示装置の製造方法 |
| JP2004349415A (ja) | 2003-05-21 | 2004-12-09 | Hitachi Ltd | アクティブ・マトリクス基板の製造方法およびこれを用いた画像表示装置 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0410216A (ja) | 1990-04-26 | 1992-01-14 | Fuji Photo Film Co Ltd | 磁気記録媒体及びその製造方法 |
| KR20050070109A (ko) * | 2002-11-05 | 2005-07-05 | 소니 가부시끼 가이샤 | 광조사장치 및 광조사방법 |
-
2006
- 2006-03-30 JP JP2006094484A patent/JP4549996B2/ja not_active Expired - Fee Related
-
2007
- 2007-01-17 TW TW096101711A patent/TW200737352A/zh not_active IP Right Cessation
- 2007-02-13 DE DE112007000735T patent/DE112007000735T5/de not_active Withdrawn
- 2007-02-13 WO PCT/JP2007/000079 patent/WO2007116576A1/ja not_active Ceased
- 2007-02-13 KR KR1020087023807A patent/KR101028598B1/ko active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52143755A (en) | 1976-05-26 | 1977-11-30 | Hitachi Ltd | Laser, zone melting device |
| JPH09260684A (ja) * | 1996-01-17 | 1997-10-03 | Toshiba Corp | 液晶表示装置の製造方法 |
| JP2004349415A (ja) | 2003-05-21 | 2004-12-09 | Hitachi Ltd | アクティブ・マトリクス基板の製造方法およびこれを用いた画像表示装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2007273539A (ja) | 2007-10-18 |
| TWI380369B (https=) | 2012-12-21 |
| KR20080109788A (ko) | 2008-12-17 |
| TW200737352A (en) | 2007-10-01 |
| WO2007116576A1 (ja) | 2007-10-18 |
| DE112007000735T5 (de) | 2009-01-22 |
| JP4549996B2 (ja) | 2010-09-22 |
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