KR101013943B1 - 스테이지 장치, 노광장치 및 디바이스 제조방법 - Google Patents

스테이지 장치, 노광장치 및 디바이스 제조방법 Download PDF

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Publication number
KR101013943B1
KR101013943B1 KR1020080032517A KR20080032517A KR101013943B1 KR 101013943 B1 KR101013943 B1 KR 101013943B1 KR 1020080032517 A KR1020080032517 A KR 1020080032517A KR 20080032517 A KR20080032517 A KR 20080032517A KR 101013943 B1 KR101013943 B1 KR 101013943B1
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KR
South Korea
Prior art keywords
stage
reticle
holding
length
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020080032517A
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English (en)
Korean (ko)
Other versions
KR20080094566A (ko
Inventor
야스히로 후지와라
Original Assignee
캐논 가부시끼가이샤
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Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20080094566A publication Critical patent/KR20080094566A/ko
Application granted granted Critical
Publication of KR101013943B1 publication Critical patent/KR101013943B1/ko
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020080032517A 2007-04-19 2008-04-08 스테이지 장치, 노광장치 및 디바이스 제조방법 Expired - Fee Related KR101013943B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007110833A JP5013941B2 (ja) 2007-04-19 2007-04-19 ステージ装置、露光装置、及びデバイス製造方法
JPJP-P-2007-00110833 2007-04-19

Publications (2)

Publication Number Publication Date
KR20080094566A KR20080094566A (ko) 2008-10-23
KR101013943B1 true KR101013943B1 (ko) 2011-02-14

Family

ID=39591965

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080032517A Expired - Fee Related KR101013943B1 (ko) 2007-04-19 2008-04-08 스테이지 장치, 노광장치 및 디바이스 제조방법

Country Status (5)

Country Link
US (1) US7952686B2 (https=)
EP (1) EP1983371B1 (https=)
JP (1) JP5013941B2 (https=)
KR (1) KR101013943B1 (https=)
TW (1) TWI405045B (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5406510B2 (ja) 2008-11-18 2014-02-05 キヤノン株式会社 走査露光装置およびデバイス製造方法
NL2006190A (en) 2010-03-11 2011-09-13 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP2014134771A (ja) * 2012-12-12 2014-07-24 Dainippon Printing Co Ltd 光学フィルム、画像表示装置、露光用部材、露光マスクの保持部材
JP6251559B2 (ja) * 2013-02-28 2017-12-20 株式会社ニューフレアテクノロジー 試料支持装置
JP6681982B2 (ja) * 2015-11-23 2020-04-15 エーエスエムエル ネザーランズ ビー．ブイ． 位置決めデバイス、リソグラフィ装置、及びデバイス製造方法
CN113811818B (zh) * 2019-05-08 2024-08-16 Asml控股股份有限公司 带有形状记忆合金和磁耦合机构的掩模版笼式致动器
KR20250008062A (ko) * 2022-05-12 2025-01-14 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치용 가동 스테이지
WO2025242380A1 (en) * 2024-05-20 2025-11-27 Asml Netherlands B.V. Split chuck

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001201846A (ja) * 2000-01-21 2001-07-27 Nikon Corp 枠部材、マスクと露光装置
JP2005235890A (ja) * 2004-02-18 2005-09-02 Canon Inc 露光装置
JP2006041302A (ja) * 2004-07-29 2006-02-09 Canon Inc 露光装置
JP2006261156A (ja) * 2005-03-15 2006-09-28 Canon Inc 原版保持装置およびそれを用いた露光装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3745167B2 (ja) * 1998-07-29 2006-02-15 キヤノン株式会社 ステージ装置、露光装置およびデバイス製造方法ならびにステージ駆動方法
JP2003324053A (ja) * 2002-04-30 2003-11-14 Nikon Corp ステージ装置および露光装置
JP4447872B2 (ja) * 2003-09-17 2010-04-07 キヤノン株式会社 ステージ装置、該ステージ装置を用いた露光装置および該露光装置を用いたデバイス製造方法
JPWO2005074015A1 (ja) * 2004-01-29 2007-09-13 株式会社ニコン 板部材の支持方法、板部材支持装置、ステージ装置、露光装置、及びデバイスの製造方法
JP4307288B2 (ja) * 2004-02-25 2009-08-05 キヤノン株式会社 位置決め装置
JP4298547B2 (ja) 2004-03-01 2009-07-22 キヤノン株式会社 位置決め装置およびそれを用いた露光装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001201846A (ja) * 2000-01-21 2001-07-27 Nikon Corp 枠部材、マスクと露光装置
JP2005235890A (ja) * 2004-02-18 2005-09-02 Canon Inc 露光装置
JP2006041302A (ja) * 2004-07-29 2006-02-09 Canon Inc 露光装置
JP2006261156A (ja) * 2005-03-15 2006-09-28 Canon Inc 原版保持装置およびそれを用いた露光装置

Also Published As

Publication number Publication date
JP5013941B2 (ja) 2012-08-29
TWI405045B (zh) 2013-08-11
KR20080094566A (ko) 2008-10-23
EP1983371A1 (en) 2008-10-22
US20080259309A1 (en) 2008-10-23
JP2008270491A (ja) 2008-11-06
US7952686B2 (en) 2011-05-31
TW200910016A (en) 2009-03-01
EP1983371B1 (en) 2014-11-12

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